公开(公告)号：US12007221B2

公开(公告)日：2024-06-11

申请号：US17562019

申请日：2021-12-27

Applicant: Industrial Technology Research Institute

Inventor： Hsiang-Chun Wei ,  Chih-Hsiang Liu ,  Yi-Sha Ku ,  Chung-Lun Kuo ,  Chun-Wei Lo ,  Chieh-Yi Lo

IPC: G01B11/22 ,  G01B9/02 ,  G01B9/02015

CPC classification number: G01B11/22 ,  G01B9/0203 ,  G01B9/02049

Abstract: A heterogeneous integration detecting method and a heterogeneous integration detecting apparatus are provided. The heterogeneous integration detecting method includes the following. Under the condition of maintaining the same relative distance between an interference objective lens and a sample, the relative posture of the interference objective lens and the sample is continuously adjusted according to the change of an image of the sample in the field of view of the interference objective lens until a first optical axis of the interference objective lens is determined to be substantially perpendicular to the surface of the sample according to the image. The interference objective lens is replaced with an imaging objective lens and the geometric profile of at least one via of the sample is detected. A second optical axis of the imaging objective lens after replacement overlaps with the first optical axis of the interference objective lens before replacement.

公开(公告)号：US12270638B2

公开(公告)日：2025-04-08

申请号：US18089547

申请日：2022-12-27

Applicant: Industrial Technology Research Institute

Inventor： Hsiang-Chun Wei ,  Chun-Wei Lo ,  Chung-Lun Kuo ,  Chih-Hsiang Liu

IPC: G01B11/25 ,  G01B11/24

Abstract: A measurement system including an excitation light source, an image sensor, and a calculator is provided. The excitation light source is configured to emit an excitation light beam. The image sensor is configured to record an image of the excitation light beam passing through a glass substrate having a plurality of vias. The image is a 2D interference pattern. The calculator is electrically connected to the image sensor. The calculator analyzes a 3D geometric-structure image of the vias in the glass substrate according to the image. A measurement method is also provided.

公开(公告)号：US20240200935A1

公开(公告)日：2024-06-20

申请号：US18089547

申请日：2022-12-27

Applicant: Industrial Technology Research Institute

Inventor： Hsiang-Chun Wei ,  Chun-Wei Lo ,  Chung-Lun Kuo ,  Chih-Hsiang Liu

IPC: G01B11/25 ,  G01B11/24

CPC classification number: G01B11/254 ,  G01B11/2441

Abstract: A measurement system including an excitation light source, an image sensor, and a calculator is provided. The excitation light source is configured to emit an excitation light beam. The image sensor is configured to record an image of the excitation light beam passing through a glass substrate having a plurality of vias. The image is a 2D interference pattern. The calculator is electrically connected to the image sensor. The calculator analyzes a 3D geometric-structure image of the vias in the glass substrate according to the image. A measurement method is also provided.

公开(公告)号：US20230152086A1

公开(公告)日：2023-05-18

申请号：US17562019

申请日：2021-12-27

Applicant: Industrial Technology Research Institute

Inventor： Hsiang-Chun Wei ,  Chih-Hsiang Liu ,  Yi-Sha Ku ,  Chung-Lun Kuo ,  Chun-Wei Lo ,  Chieh-Yi Lo

IPC: G01B11/22 ,  G01B9/02 ,  G01B9/02015

CPC classification number: G01B11/22 ,  G01B9/02049 ,  G01B9/0203

Abstract: A heterogeneous integration detecting method and a heterogeneous integration detecting apparatus are provided. The heterogeneous integration detecting method includes the following. Under the condition of maintaining the same relative distance between an interference objective lens and a sample, the relative posture of the interference objective lens and the sample is continuously adjusted according to the change of an image of the sample in the field of view of the interference objective lens until a first optical axis of the interference objective lens is determined to be substantially perpendicular to the surface of the sample according to the image. The interference objective lens is replaced with an imaging objective lens and the geometric profile of at least one via of the sample is detected. A second optical axis of the imaging objective lens after replacement overlaps with the first optical axis of the interference objective lens before replacement.

公开(公告)号：US12099053B2

公开(公告)日：2024-09-24

申请号：US17563701

申请日：2021-12-28

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Hsiang-Chun Wei ,  Chih-Hsiang Liu ,  Chung-Lun Kuo ,  Chun-Wei Lo ,  Chia-Hung Cho ,  Wei-Hsiung Tsai

IPC: G01N33/50 ,  G01N15/1433 ,  G03H1/00 ,  G03H1/04 ,  G03H1/08 ,  G06T7/00

CPC classification number: G01N33/505 ,  G01N15/1433 ,  G03H1/0005 ,  G03H1/0443 ,  G03H1/0866 ,  G06T7/0012 ,  G03H2001/0033 ,  G03H2001/005 ,  G06T2207/10056 ,  G06T2207/10064 ,  G06T2207/20081 ,  G06T2207/20084 ,  G06T2207/30024

Abstract: A method of training AI for label-free cell viability determination includes a step of providing a cell sample, a step of obtaining a fluorescence image and a DHM image of the cell sample, a step of determining a first cell viability of the cell sample according to the fluorescence image of the cell sample, a step of labeling the DHM image of the cell sample as a model specifying the first cell viability, and a step of performing AI training by using the model containing the DHM image of the cell sample.

公开(公告)号：US10094774B2

公开(公告)日：2018-10-09

申请号：US15369190

申请日：2016-12-05

Applicant: Industrial Technology Research Institute

Inventor： Chia-Liang Yeh ,  Yi-Chang Chen ,  Yi-Sha Ku ,  Chun-Wei Lo

IPC: G01B11/30 ,  G01N21/47 ,  G01B11/24 ,  H01L21/66

Abstract: A scattering measurement system is provided, including: a light source generator for generating a detection light beam with discontinuous multi-wavelengths, and generating a multi-order diffraction light beam with three-dimensional feature information when the detection light beam is incident on an object; a detector having a photosensitive array for receiving and converting the multi-order diffraction light beam into multi-order diffraction signals with the three-dimensional feature information; and a processing module for receiving the multi-order diffraction signals and comparing the multi-order diffraction signals with multi-order diffraction feature patterns in a database so as to analyze the three-dimensional feature information of the object.

公开(公告)号：US11507020B2

公开(公告)日：2022-11-22

申请号：US17028012

申请日：2020-09-22

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Hsiang-Chun Wei ,  Chung-Lun Kuo ,  Chia-Hung Cho ,  Chun-Wei Lo ,  Chih-Hsiang Liu

IPC: G03H1/04 ,  G06T15/08 ,  G01B9/02091 ,  G03H1/00

Abstract: An optical measurement system comprises a polarization beam splitter for dividing an incident beam into a reference beam and a measurement beam, a first beam splitter for reflecting the measurement beam to form a first reflected measurement beam, a spatial light modulator for modulating the first reflected measurement beam to form a modulated measurement beam, a condenser lens for focusing the modulated measurement beam to an object to form a penetrating measurement beam, an objective lens for converting the penetrating measurement beam into a parallel measurement beam, a mirror for reflecting the parallel measurement beam to form an object beam, a second beam splitter for reflecting the reference beam to a path coincident with that of the object beam, and a camera for receiving an interference signal generated by the reference beam and the object beam to generate an image of the object.

公开(公告)号：US09752866B2

公开(公告)日：2017-09-05

申请号：US14983053

申请日：2015-12-29

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Hsiang-Chun Wei ,  Yi-Sha Ku ,  Chia-Hung Cho ,  Chieh-Yu Wu ,  Chun-Wei Lo ,  Chih-Hsiang Liu

IPC: G01B11/22 ,  G01B11/02 ,  G01B11/06 ,  G01B11/24

CPC classification number: G01B11/22 ,  G01B11/0616 ,  G01B11/2441 ,  G01B2210/56 ,  H01L22/12

Abstract: A measurement system is configured to measure a surface structure of a sample. The surface of the sample has a thin film and a via, the depth of the via is larger than the thickness of the thin film. The measurement system includes a light source, a first light splitter, a first aperture stop, a lens assembly, a second aperture stop, a spectrum analyzer and an analysis module. The first light splitter disposed in the light emitting direction of the light source. The first aperture stop disposed between the light source and the first light splitter. The lens assembly is disposed between the first light splitter and the sample. The second aperture stop is disposed between the lens assembly and the first light splitter. The spectrum analyzer is disposed to at a side of the first light splitter opposite to the sample.