公开(公告)号：US20220278038A1

公开(公告)日：2022-09-01

申请号：US17742816

申请日：2022-05-12

Applicant: Intel Corporation

Inventor： Ji Yong Park ,  Kyu Oh Lee ,  Yikang Deng ,  Zhichao Zhang ,  Liwei Cheng ,  Andrew James Brown ,  Cheng Xu ,  Jiwei Sun

IPC: H01L23/498 ,  H01L23/00 ,  H01L21/48

Abstract: Microelectronic assemblies, and related devices and methods, are disclosed herein. For example, in some embodiments, a microelectronic assembly may include a package substrate having a core substrate with a first conductive structure having a first thickness on the core substrate, and a second conductive structure having a second thickness on the core substrate, where the first thickness is different than the second thickness.

公开(公告)号：US10971492B2

公开(公告)日：2021-04-06

申请号：US16855376

申请日：2020-04-22

Applicant: Intel Corporation

Inventor： Cheng Xu ,  Rahul Jain ,  Seo Young Kim ,  Kyu Oh Lee ,  Ji Yong Park ,  Sai Vadlamani ,  Junnan Zhao

IPC: H01L27/07 ,  H01L23/64 ,  H01L23/522 ,  H01L23/00 ,  H01L49/02

Abstract: Disclosed embodiments include an embedded thin-film capacitor and a magnetic inductor that are assembled in two adjacent build-up layers of a semiconductor package substrate. The thin-film capacitor is seated on a surface of a first of the build-up layers and the magnetic inductor is partially disposed in a recess in the adjacent build up layer. The embedded thin-film capacitor and the integral magnetic inductor are configured within a die shadow that is on a die side of the semiconductor package substrate.

公开(公告)号：US20190393217A1

公开(公告)日：2019-12-26

申请号：US16402588

申请日：2019-05-03

Applicant: Intel Corporation

Inventor： Cheng Xu ,  Rahul Jain ,  Seo Young Kim ,  Kyu Oh Lee ,  Ji Yong Park ,  Sai Vadlamani ,  Junnan Zhao

IPC: H01L27/07 ,  H01L49/02 ,  H01L23/64 ,  H01L23/522 ,  H01L23/00

Abstract: Disclosed embodiments include an embedded thin-film capacitor and a magnetic inductor that are assembled in two adjacent build-up layers of a semiconductor package substrate. The thin-film capacitor is seated on a surface of a first of the build-up layers and the magnetic inductor is partially disposed in a recess in the adjacent build up layer. The embedded thin-film capacitor and the integral magnetic inductor are configured within a die shadow that is on a die side of the semiconductor package substrate.

公开(公告)号：US20190385780A1

公开(公告)日：2019-12-19

申请号：US16012259

申请日：2018-06-19

Applicant: Intel Corporation

Inventor： Cheng Xu ,  Yikang Deng ,  Kyu Oh Lee ,  Ji Yong Park ,  Srinivas Pietambaram ,  Ying Wang ,  Chong Zhang ,  Rui Zhang ,  Junnan Zhao

IPC: H01F27/28 ,  H01F27/24 ,  H04B5/00 ,  H01L21/822 ,  H01L23/522 ,  H01L49/02 ,  H01F41/04

Abstract: Techniques are provided for an inductor at a first level interface between a first die and a second die. In an example, the inductor can include a winding and a core disposed inside the winding. The winding can include first conductive traces of a first die, second conductive traces of a second die, and a plurality of connectors configured to connect the first die with the second die. Each connector of the plurality of connecters can be located between a trace of the first conductive traces and a corresponding trace of the second conductive traces.

公开(公告)号：US20190304661A1

公开(公告)日：2019-10-03

申请号：US15938119

申请日：2018-03-28

Applicant: Intel Corporation

Inventor： Cheng Xu ,  Kyu-Oh Lee ,  Junnan Zhao ,  Rahul Jain ,  Ji Yong Park ,  Sai Vadlamani ,  Seo Young Kim

IPC: H01F27/28 ,  H01F27/24 ,  H01F27/02

Abstract: Embodiments include an inductor that comprises an inductor trace and a magnetic body surrounding the inductor trace. In an embodiment, the magnetic body comprises a first step surface and a second step surface. Additional embodiments include an inductor that includes a barrier layer. In an embodiment, an inductor trace is formed over a first surface of the barrier layer. Embodiments include a first magnetic body over the inductor trace and the first surface of the barrier layer, and a second magnetic body over a second surface of the barrier layer opposite the first surface. In an embodiment, a width of the second magnetic body is greater than a width of the first magnetic body.

公开(公告)号：US11842981B2

公开(公告)日：2023-12-12

申请号：US17466842

申请日：2021-09-03

Applicant: Intel Corporation

Inventor： Rahul Jain ,  Ji Yong Park ,  Kyu Oh Lee

IPC: H01L23/00 ,  H01L25/00 ,  H01L23/538 ,  H01L25/065

CPC classification number: H01L24/81 ,  H01L23/5385 ,  H01L24/17 ,  H01L25/0652 ,  H01L25/50 ,  H01L23/5383 ,  H01L23/5384 ,  H01L2224/16113 ,  H01L2224/16235

Abstract: Examples relate to a die interconnect substrate comprising a bridge die comprising at least one bridge interconnect connecting a first bridge die pad of the bridge die to a second bridge die pad of the bridge die. The die interconnect substrate further comprises a substrate structure comprising a substrate interconnect electrically insulated from the bridge die, wherein the bridge die is embedded in the substrate structure. The die interconnect substrate further comprises a first interface structure for attaching a semiconductor die to the substrate structure, wherein the first interface structure is connected to the first bridge die pad. The die interconnect substrate further comprises a second interface structure for attaching a semiconductor die to the substrate structure, wherein the second interface structure is connected to the substrate interconnect. A surface of the first interface structure and a surface of the second interface structure are at the same height.

公开(公告)号：US11417614B2

公开(公告)日：2022-08-16

申请号：US15938114

申请日：2018-03-28

Applicant: Intel Corporation

Inventor： Cheng Xu ,  Kyu-Oh Lee ,  Junnan Zhao ,  Rahul Jain ,  Ji Yong Park ,  Sai Vadlamani ,  Seo Young Kim

IPC: H01L23/64 ,  H01L23/498 ,  H01L23/00 ,  H01L21/48

Abstract: Embodiments include an electronic package that includes a first layer that comprises a dielectric material and a second layer over the first layer, where the second layer comprises a magnetic material. In an embodiment, a third layer is formed over the second layer, where the third layer comprises a dielectric material. In an embodiment, the third layer entirely covers a first surface of the second layer. In an embodiment a first conductive layer and a second conductive layer are embedded within the second layer. In an embodiment, sidewalls of the first conductive layer and the second conductive layer are substantially vertical.

公开(公告)号：US11217534B2

公开(公告)日：2022-01-04

申请号：US16646932

申请日：2017-12-30

Applicant: Intel Corporation

Inventor： Cheng Xu ,  Junnan Zhao ,  Ji Yong Park ,  Kyu Oh Lee

IPC: H01L23/538 ,  H01L21/48 ,  H01L21/56 ,  H01L23/31 ,  H01L23/00 ,  H01L25/065 ,  H01L23/498

Abstract: Techniques of protecting cored or coreless semiconductor packages having materials formed from dissimilar metals from galvanic corrosion are described. An exemplary semiconductor package comprises one or more build-up layers; first and second semiconductor components (e.g., die, EMIB, etc.) on or embedded in the one or more build-up layers. The first semiconductor component may be electrically coupled to the second semiconductor component via a contact pad and an interconnect structure that are formed in the one or more build-up layers. The contact pad can comprise a contact region, a non-contact region, and a gap region that separates the contact region from the non-contact region. Coupling of the contact pad and an interconnect structure is performed by coupling only the contact region with the interconnect structure. Also, a surface area of the contact region can be designed to substantially equal to a surface area of the interconnect structure.

公开(公告)号：US11031360B2

公开(公告)日：2021-06-08

申请号：US16990782

申请日：2020-08-11

Applicant: Intel Corporation

Inventor： Cheng Xu ,  Yikang Deng ,  Kyu Oh Lee ,  Ji Yong Park ,  Srinivas Pietambaram ,  Ying Wang ,  Chong Zhang ,  Rui Zhang ,  Junnan Zhao

IPC: H01L23/64 ,  H05K1/16 ,  H01L23/522 ,  H01L23/528 ,  H01F27/24 ,  H01L27/04 ,  H01F27/28 ,  H01L21/822

Abstract: Techniques are provided for an inductor at a second level interface between a first substrate and a second substrate. In an example, the inductor can include a winding and a core disposed inside the winding. The winding can include first conductive traces of a first substrate, second conductive traces of a second non-semiconductor substrate, and a plurality of connectors configured to connect the first substrate with the second substrate. Each connector of the plurality of connectors can be located between a trace of the first conductive traces and a corresponding trace of the second conductive traces.

公开(公告)号：US20190385959A1

公开(公告)日：2019-12-19

申请号：US16012371

申请日：2018-06-19

Applicant: Intel Corporation

Inventor： Cheng Xu ,  Yikang Deng ,  Kyu Oh Lee ,  Ji Yong Park ,  Srinivas Pietambaram ,  Ying Wang ,  Chong Zhang ,  Rui Zhang ,  Junnan Zhao

IPC: H01L23/64 ,  H01L23/522 ,  H01L23/528 ,  H01L21/822 ,  H01L27/04 ,  H01F27/28 ,  H01F27/24

Abstract: Techniques are provided for an inductor at a second level interface between a first substrate and a second substrate. In an example, the inductor can include a winding and a core disposed inside the winding. The winding can include first conductive traces of a first substrate, second conductive traces of a second non-semiconductor substrate, and a plurality of connectors configured to connect the first substrate with the second substrate. Each connector of the plurality of connecters can be located between a trace of the first conductive traces and a corresponding trace of the second conductive traces.