Abstract:
Methods of fabricating a capped interconnect for a microelectronic device which includes a sealing feature for any gaps between a capping layer and an interconnect and structures formed therefrom. The sealing features improve encapsulation of the interconnect, which substantially reduces or prevents electromigration and/or diffusion of conductive material from the capped interconnect.
Abstract:
Methods of fabricating a capped interconnect for a microelectronic device which includes a sealing feature for any gaps between a capping layer and an interconnect and structures formed therefrom. The sealing features improve encapsulation of the interconnect, which substantially reduces or prevents electromigration and/or diffusion of conductive material from the capped interconnect.
Abstract:
Embodiments are generally directed to signal phase optimization in memory interface training. An embodiment of an apparatus includes an interface for at least one signal; and interface training logic capable of automatically adjusting a phase relationship between the signal and a strobe or clock, including establishing a phase delay of the signal and a phase delay of the strobe or clock for training of the interface, wherein the interface training logic is capable of determining a phase delay reduction for the signal subsequent to measurement of an eye margin for the signal, the phase delay reduction to retain a sufficient delay to maintain the eye margin for sampling of the signal.