利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

16 条记录 (耗时 0.019 秒)

    Cerium oxide sol and abrasive
    1.
    发明授权
    Cerium oxide sol and abrasive 失效
    氧化铈溶胶和磨料

    公开(公告)号：US06887289B2

    公开(公告)日：2005-05-03

    申请号：US10780568

    申请日：2004-02-19

    申请人： Isao Ota ,  Kenji Tanimoto ,  Tohru Nishimura

    发明人： Isao Ota ,  Kenji Tanimoto ,  Tohru Nishimura

    IPC分类号： C01F17/00 ,  C09G1/02 ,  C09K3/14 ,  C09G1/04

    CPC分类号： B82Y30/00 ,  C01F17/0043 ,  C01P2002/01 ,  C01P2002/72 ,  C01P2004/10 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/12 ,  C09G1/02 ,  C09K3/1472

    摘要： There is provided an abrasive used for polishing a substrate which comprises silica as a main component, for example a rock crystal, a quartz glass for photomask, for CMP of an organic film, Inter Layer Dielectric (ILD) and shallow trench isolation of a semiconductor device, or for polishing a hard disk made of glass. A sol which particles are dispersed in a medium, wherein the particles have a particle size of 0.005 to 1 μm and comprise as a main component crystalline cerium oxide of the cubic system and as an additional component a lanthanum compound, a neodymium compound or a combination thereof, wherein the additional component is contained in X/(Ce+X) molar ratio of 0.001 to 0.5 in which X is lanthanum atoms, neodymium atoms or a combination thereof. The sol is prepared by reacting an aqueous solution which a cerium (III) salt is mixed with a lanthanum (III) salt and/or a neodymium (III) salt, with an alkaline substance to give a suspension in which cerium (III) hydroxide is homogeneously mixed with lanthanum (III) hydroxide and/or neodymium (III) hydroxide, and blowing oxygen or a gas containing oxygen into the suspension.

    摘要翻译： 提供了用于抛光基底的磨料，其包括二氧化硅作为主要成分，例如岩石晶体，用于光掩模的石英玻璃，用于有机膜的CMP，层间介电（ILD）和半导体的浅沟槽隔离 装置或用于抛光由玻璃制成的硬盘。 一种溶胶，其中颗粒分散在介质中，其中颗粒的粒度为0.005-1μm，并且包含作为主要组分的立方晶系的结晶二氧化铈，并且作为附加组分的镧化合物，钕化合物或组合 其中所述附加成分以X =（Ce + X）摩尔比为0.001〜0.5，X为镧原子，钕原子或其组合。 通过使铈（III）盐与镧（III）盐和/或钕（III）盐混合的水溶液与碱性物质反应制备溶胶，得到悬浮液，其中氢氧化铈（III） 与氢氧化镧（III）和/或氢氧化钕（III）均匀混合，并将氧气或含有氧的气体吹入悬浮液中。

    Cerium oxide sol and abrasive
    3.
    发明授权
    Cerium oxide sol and abrasive 失效
    氧化铈溶胶和磨料

    公开(公告)号：US07887714B2

    公开(公告)日：2011-02-15

    申请号：US10015675

    申请日：2001-12-17

    申请人： Isao Ota ,  Kenji Tanimoto ,  Tohru Nishimura

    发明人： Isao Ota ,  Kenji Tanimoto ,  Tohru Nishimura

    IPC分类号： C09K13/00

    CPC分类号： B82Y30/00 ,  C01F17/0043 ,  C01P2002/01 ,  C01P2002/72 ,  C01P2004/10 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/12 ,  C09G1/02 ,  C09K3/1472

    摘要： There is provided an abrasive used for polishing a substrate which comprises silica as a main component, for example a rock crystal, a quartz glass for photomask, for CMP of an organic film, Inter Layer Dielectric (ILD) and shallow trench isolation of a semiconductor device, or for polishing a hard disk made of glass.A sol which particles are dispersed in a medium, wherein the particles have a particle size of 0.005 to 1 μm and comprise as a main component crystalline cerium oxide of the cubic system and as an additional component a lanthanum compound, a neodymium compound or a combination thereof, wherein the additional component is contained in X/(Ce+X) molar ratio of 0.001 to 0.5 in which X is lanthanum atoms, neodymium atoms or a combination thereof.The sol is prepared by reacting an aqueous solution which a cerium (III) salt is mixed with a lanthanum (III) salt and/or a neodymium (III) salt, with an alkaline substance to give a suspension in which cerium (III) hydroxide is homogeneously mixed with lanthanum (III) hydroxide and/or neodymium (III) hydroxide, and blowing oxygen or a gas containing oxygen into the suspension.

    摘要翻译： 提供了用于抛光基底的磨料，其包括二氧化硅作为主要成分，例如岩石晶体，用于光掩模的石英玻璃，用于有机膜的CMP，层间介电（ILD）和半导体的浅沟槽隔离 装置或用于抛光由玻璃制成的硬盘。 一种溶胶，其中颗粒分散在介质中，其中颗粒的粒度为0.005至1μm，并且包含作为立方体系的结晶二氧化铈的主要组分，并且作为附加组分的镧化合物，钕化合物或组合 其中所述附加成分以X =（Ce + X）摩尔比为0.001〜0.5，X为镧原子，钕原子或其组合。 通过使铈（III）盐与镧（III）盐和/或钕（III）盐混合的水溶液与碱性物质反应制备溶胶，得到悬浮液，其中氢氧化铈（III） 与氢氧化镧（III）和/或氢氧化钕（III）均匀混合，并将氧气或含有氧的气体吹入悬浮液中。

    Abrasive compound for glass hard disk platter
    4.
    发明授权
    Abrasive compound for glass hard disk platter 有权
    玻璃硬盘拼盘

    公开(公告)号：US07578862B2

    公开(公告)日：2009-08-25

    申请号：US10678093

    申请日：2003-10-06

    申请人： Isao Ota ,  Tohru Nishimura ,  Kenji Tanimoto

    发明人： Isao Ota ,  Tohru Nishimura ,  Kenji Tanimoto

    IPC分类号： C09K3/14 ,  C03C19/00 ,  B24B37/00

    CPC分类号： C09G1/02 ,  C01F17/0043 ,  C01P2002/72 ,  C01P2004/61 ,  C01P2006/12 ,  C03C19/00 ,  C09K3/1463

    摘要： The present invention provides an abrasive compound suitable for polishing the surface of a glass substrate for an optical disk platter or a magnetic disk platter. More specifically, the present invention provides an abrasive compound for a glass hard disk platter, characterized as comprising a stable slurry having water and, dispersed therein as an abrasive, cerium(IV) oxide particles having an average secondary particle size of 0.1 to 0.5 μm and containing CeO2 in a concentration of 0.2 to 30 wt %. Preferably, the present invention provides the above abrasive compound in which cerium amounts for 95% or more in terms of oxides of the total amount of rare earth elements in the abrasive.

    摘要翻译： 本发明提供一种适用于抛光用于光盘盘或磁盘盘的玻璃基板的表面的磨料化合物。 更具体地说，本发明提供了一种用于玻璃硬盘盘的磨料化合物，其特征在于包括一种具有水的稳定的浆料，并在其中分散为研磨剂，其平均二次粒径为0.1-0.5μm的氧化铈（IV）颗粒 并含有浓度为0.2〜30重量％的CeO 2。 优选地，本发明提供了上述磨料化合物，其中铈以磨料中稀土元素总量的氧化物计为95％以上。

    Crystalline ceric oxide sol and process for producing the same
    5.
    发明授权
    Crystalline ceric oxide sol and process for producing the same 失效
    结晶氧化铈溶胶及其制备方法

    公开(公告)号：US06706082B2

    公开(公告)日：2004-03-16

    申请号：US10076500

    申请日：2002-02-19

    申请人： Isao Ota ,  Tohru Nishimura ,  Kenji Tanimoto

    发明人： Isao Ota ,  Tohru Nishimura ,  Kenji Tanimoto

    IPC分类号： C01P1700

    CPC分类号： C09G1/02 ,  B82Y30/00 ,  C01F17/0043 ,  C01P2004/53 ,  C01P2004/64 ,  C01P2006/12 ,  C01P2006/40 ,  C09K3/1436 ,  C09K3/1463

    摘要： Substantially monodisperse crystalline ceric oxide sols and processes for producing such sols are provided. Sols include crystalline ceric oxide particles having a particle size I (particle size converted from specific surface area by gas absorption method) ranging from 10 nm to 200 nm and a ratio of particle size II (particle size measured by dynamic light scattering method) to particle size I ranging from 2 to 6. Sols can be prepared by reacting a cerium (III) salt with an alkaline substance in an aqueous medium under an inert gas atmosphere to obtain a suspension of cerium (III) hydroxide, immediately blowing oxygen or a gas containing oxygen into the suspension to obtain a sol comprising crystalline ceric oxide particles, and wet grinding the resulting sol. Sols are also prepared by calcining cerium carbonate at a temperature of 300 to 1100° C. to give cerium oxide particles, and wet-grinding the resulting particles.

    摘要翻译： 提供了基本上单分散的结晶二氧化铈溶胶和制备这种溶胶的方法。 熔体包括10nm至200nm范围内的粒径I（通过气体吸收法从比表面积转化的粒径）和粒径II（通过动态光散射法测量的粒径）与粒子的比例的结晶二氧化铈粒子 尺寸I范围为2至6.可以通过在惰性气体气氛下在水性介质中使铈（III）盐与碱性物质反应制备，以获得氢氧化铈（III）的悬浮液，立即吹入氧气或气体 将氧气加入到悬浮液中以获得包含结晶二氧化铈颗粒的溶胶，并湿法研磨所得溶胶。 还可以通过在300〜1100℃的温度下煅烧碳酸铈以制备氧化铈颗粒并湿磨研磨所得的颗粒来制备。

    Alumina powder, process for producing the same and polishing composition
    7.
    发明授权
    Alumina powder, process for producing the same and polishing composition 失效
    氧化铝粉，其制造方法和抛光组合物

    公开(公告)号：US06440187B1

    公开(公告)日：2002-08-27

    申请号：US09581084

    申请日：2000-07-18

    申请人： Toshio Kasai ,  Kiyomi Ema ,  Isao Ota ,  Tohru Nishimura

    发明人： Toshio Kasai ,  Kiyomi Ema ,  Isao Ota ,  Tohru Nishimura

    IPC分类号： C09K314

    CPC分类号： B82Y30/00 ,  C01F7/02 ,  C01F7/448 ,  C01P2002/00 ,  C01P2004/10 ,  C01P2004/20 ,  C01P2004/30 ,  C01P2004/50 ,  C01P2004/54 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/12 ,  C01P2006/40 ,  C01P2006/90 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1463

    摘要： Production of an alumina powder characterized by having a single or multiple crystal structure selected from the group consisting of &ggr;, &dgr; and &thgr;-forms, a primary particle size of 10 to 50 nm, a mean secondary particle size of 100 to 500 nm, and a granular primary particle shape, or an alumina powder characterized by having an a-form crystal structure, a primary particle size of 60 to 150 nm, a mean secondary particle size of 200 to 500 nm, and a granular primary particle shape, using as a raw material an alumina hydrate comprising rectangular plate-like primary particles having a boehmite structure and having a length of one side of 10 to 50 nm; and preparation of a polishing composition comprising the alumina powder, water and a polishing accelerator.

    摘要翻译： 其特征在于具有选自γ，δ和θ形式的一种或多种晶体结构，一次粒径为10-50nm，二次平均粒径为100-500nm的氧化铝粉末，以及 颗粒状一次粒子形状或特征在于具有a型晶体结构，一次粒径为60〜150nm，平均二次粒径为200〜500nm的氧化铝粉末和粒状一次粒子形状，使用为 原料为氧化铝水合物，其包含具有勃姆石结构且长度为10〜50nm的矩形板状一次粒子; 以及制备包含氧化铝粉末，水和抛光促进剂的抛光组合物。

    Polishing composition
    8.
    发明授权
    Polishing composition 失效
    抛光组成

    公开(公告)号：US06398827B1

    公开(公告)日：2002-06-04

    申请号：US09605542

    申请日：2000-06-29

    申请人： Isao Ota ,  Tohru Nishimura ,  Yoshitane Watanabe ,  Yoshiyuki Kashima ,  Kiyomi Ema ,  Yutaka Ohmori

    发明人： Isao Ota ,  Tohru Nishimura ,  Yoshitane Watanabe ,  Yoshiyuki Kashima ,  Kiyomi Ema ,  Yutaka Ohmori

    IPC分类号： C09K314

    CPC分类号： C09K3/1463 ,  C09G1/02

    摘要： The present invention relates to a polishing composition for polishing alumina disks, polishing substrates having silica surfaces and semiconductor wafers, comprising a stable aqueous silica sol containing moniliform colloidal silica particles having a ratio (D1/D2) of a particle diameter D1 nm (as measured by dynamic light scattering method) to a mean particle diameter D2 (as measured by nitrogen absorption method) of 3 or more, wherein D1 is between 50 to 800 nm and D2 is between 10 to 120 nm, said moniliform colloidal silica particles being composed of spherical colloidal silica particles and a metal oxide-containing silica bond which bonds these spherical colloidal silica particles together, wherein the spherical colloidal silica particles are linked together in rows in only one plane by observation through an electron microscope, and further wherein said polishing composition contains 0.5 to 50% by weight of said moniliform colloidal silica particles.

    摘要翻译： 本发明涉及一种用于抛光氧化铝盘的抛光组合物，具有二氧化硅表面的抛光衬底和半导体晶片，其包含稳定的含水二氧化硅溶胶，其含有粒径为D1nm（D1 / D2）的粒径为D1nm 通过动态光散射法）至平均粒径D2（通过氮吸收法测定）为3以上，其中D1为50〜800nm，D2为10〜120nm，所述观察胶体二氧化硅粒子为 球形胶体二氧化硅颗粒和将这些球形胶体二氧化硅颗粒结合在一起的含金属氧化物的二氧化硅结合体，其中通过电子显微镜观察，球形胶体二氧化硅颗粒在一个平面内以行排列在一起，并且其中所述抛光组合物含有 0.5〜50重量％的所述念珠状胶体二氧化硅粒子。

    Process for preparing crystalline ceric oxide
    9.
    发明授权
    Process for preparing crystalline ceric oxide 失效
    制备结晶二氧化铈的方法

    公开(公告)号：US5543126A

    公开(公告)日：1996-08-06

    申请号：US490612

    申请日：1995-06-15

    申请人： Isao Ota ,  Tohru Nishimura

    发明人： Isao Ota ,  Tohru Nishimura

    IPC分类号： C01F17/00 ,  C03C1/00 ,  C09K3/14

    CPC分类号： C03C1/00 ,  B82Y30/00 ,  C01F17/0043 ,  C09K3/1409 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2004/64 ,  Y10S516/02

    摘要： The present invention is to provide a process for preparing ceric oxide particles used as an abrasive or polishing material for producing semiconductors or as a UV ray-absorbing material for plastics, glass and the like.The present invention relates to a process for preparing cerium (IV) oxide particles having a particle size of from 0.03 .mu.m to 5 .mu.m, which comprises adjusting an aqueous medium containing cerium (IV) hydroxide and a nitrate to a pH of from 8 to 11 with an alkaline substance and heating the aqueous medium at a temperature of from 100.degree. to 200.degree. C. under pressure.

    摘要翻译： 本发明提供一种制备用作制造半导体的磨料或抛光材料的氧化铈颗粒的方法或用作塑料，玻璃等的紫外线吸收材料。 本发明涉及一种制备粒度为0.03μm至5μm的氧化铈（IV）颗粒的方法，其包括将含有氢氧化铈（IV）和硝酸盐的水性介质调节至pH为8 至11，并在100℃至200℃的温度下加压水性介质。