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    Cerium oxide sol and abrasive
    3.
    发明授权
    Cerium oxide sol and abrasive 失效
    氧化铈溶胶和磨料

    公开(公告)号：US06887289B2

    公开(公告)日：2005-05-03

    申请号：US10780568

    申请日：2004-02-19

    申请人： Isao Ota ,  Kenji Tanimoto ,  Tohru Nishimura

    发明人： Isao Ota ,  Kenji Tanimoto ,  Tohru Nishimura

    IPC分类号： C01F17/00 ,  C09G1/02 ,  C09K3/14 ,  C09G1/04

    CPC分类号： B82Y30/00 ,  C01F17/0043 ,  C01P2002/01 ,  C01P2002/72 ,  C01P2004/10 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/12 ,  C09G1/02 ,  C09K3/1472

    摘要： There is provided an abrasive used for polishing a substrate which comprises silica as a main component, for example a rock crystal, a quartz glass for photomask, for CMP of an organic film, Inter Layer Dielectric (ILD) and shallow trench isolation of a semiconductor device, or for polishing a hard disk made of glass. A sol which particles are dispersed in a medium, wherein the particles have a particle size of 0.005 to 1 μm and comprise as a main component crystalline cerium oxide of the cubic system and as an additional component a lanthanum compound, a neodymium compound or a combination thereof, wherein the additional component is contained in X/(Ce+X) molar ratio of 0.001 to 0.5 in which X is lanthanum atoms, neodymium atoms or a combination thereof. The sol is prepared by reacting an aqueous solution which a cerium (III) salt is mixed with a lanthanum (III) salt and/or a neodymium (III) salt, with an alkaline substance to give a suspension in which cerium (III) hydroxide is homogeneously mixed with lanthanum (III) hydroxide and/or neodymium (III) hydroxide, and blowing oxygen or a gas containing oxygen into the suspension.

    摘要翻译： 提供了用于抛光基底的磨料，其包括二氧化硅作为主要成分，例如岩石晶体，用于光掩模的石英玻璃，用于有机膜的CMP，层间介电（ILD）和半导体的浅沟槽隔离 装置或用于抛光由玻璃制成的硬盘。 一种溶胶，其中颗粒分散在介质中，其中颗粒的粒度为0.005-1μm，并且包含作为主要组分的立方晶系的结晶二氧化铈，并且作为附加组分的镧化合物，钕化合物或组合 其中所述附加成分以X =（Ce + X）摩尔比为0.001〜0.5，X为镧原子，钕原子或其组合。 通过使铈（III）盐与镧（III）盐和/或钕（III）盐混合的水溶液与碱性物质反应制备溶胶，得到悬浮液，其中氢氧化铈（III） 与氢氧化镧（III）和/或氢氧化钕（III）均匀混合，并将氧气或含有氧的气体吹入悬浮液中。

    Cerium oxide sol and abrasive
    4.
    发明授权
    Cerium oxide sol and abrasive 失效
    氧化铈溶胶和磨料

    公开(公告)号：US07887714B2

    公开(公告)日：2011-02-15

    申请号：US10015675

    申请日：2001-12-17

    申请人： Isao Ota ,  Kenji Tanimoto ,  Tohru Nishimura

    发明人： Isao Ota ,  Kenji Tanimoto ,  Tohru Nishimura

    IPC分类号： C09K13/00

    CPC分类号： B82Y30/00 ,  C01F17/0043 ,  C01P2002/01 ,  C01P2002/72 ,  C01P2004/10 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/12 ,  C09G1/02 ,  C09K3/1472

    摘要： There is provided an abrasive used for polishing a substrate which comprises silica as a main component, for example a rock crystal, a quartz glass for photomask, for CMP of an organic film, Inter Layer Dielectric (ILD) and shallow trench isolation of a semiconductor device, or for polishing a hard disk made of glass.A sol which particles are dispersed in a medium, wherein the particles have a particle size of 0.005 to 1 μm and comprise as a main component crystalline cerium oxide of the cubic system and as an additional component a lanthanum compound, a neodymium compound or a combination thereof, wherein the additional component is contained in X/(Ce+X) molar ratio of 0.001 to 0.5 in which X is lanthanum atoms, neodymium atoms or a combination thereof.The sol is prepared by reacting an aqueous solution which a cerium (III) salt is mixed with a lanthanum (III) salt and/or a neodymium (III) salt, with an alkaline substance to give a suspension in which cerium (III) hydroxide is homogeneously mixed with lanthanum (III) hydroxide and/or neodymium (III) hydroxide, and blowing oxygen or a gas containing oxygen into the suspension.

    摘要翻译： 提供了用于抛光基底的磨料，其包括二氧化硅作为主要成分，例如岩石晶体，用于光掩模的石英玻璃，用于有机膜的CMP，层间介电（ILD）和半导体的浅沟槽隔离 装置或用于抛光由玻璃制成的硬盘。 一种溶胶，其中颗粒分散在介质中，其中颗粒的粒度为0.005至1μm，并且包含作为立方体系的结晶二氧化铈的主要组分，并且作为附加组分的镧化合物，钕化合物或组合 其中所述附加成分以X =（Ce + X）摩尔比为0.001〜0.5，X为镧原子，钕原子或其组合。 通过使铈（III）盐与镧（III）盐和/或钕（III）盐混合的水溶液与碱性物质反应制备溶胶，得到悬浮液，其中氢氧化铈（III） 与氢氧化镧（III）和/或氢氧化钕（III）均匀混合，并将氧气或含有氧的气体吹入悬浮液中。

    Abrasive compound for glass hard disk platter
    5.
    发明授权
    Abrasive compound for glass hard disk platter 有权
    玻璃硬盘拼盘

    公开(公告)号：US07578862B2

    公开(公告)日：2009-08-25

    申请号：US10678093

    申请日：2003-10-06

    申请人： Isao Ota ,  Tohru Nishimura ,  Kenji Tanimoto

    发明人： Isao Ota ,  Tohru Nishimura ,  Kenji Tanimoto

    IPC分类号： C09K3/14 ,  C03C19/00 ,  B24B37/00

    CPC分类号： C09G1/02 ,  C01F17/0043 ,  C01P2002/72 ,  C01P2004/61 ,  C01P2006/12 ,  C03C19/00 ,  C09K3/1463

    摘要： The present invention provides an abrasive compound suitable for polishing the surface of a glass substrate for an optical disk platter or a magnetic disk platter. More specifically, the present invention provides an abrasive compound for a glass hard disk platter, characterized as comprising a stable slurry having water and, dispersed therein as an abrasive, cerium(IV) oxide particles having an average secondary particle size of 0.1 to 0.5 μm and containing CeO2 in a concentration of 0.2 to 30 wt %. Preferably, the present invention provides the above abrasive compound in which cerium amounts for 95% or more in terms of oxides of the total amount of rare earth elements in the abrasive.

    摘要翻译： 本发明提供一种适用于抛光用于光盘盘或磁盘盘的玻璃基板的表面的磨料化合物。 更具体地说，本发明提供了一种用于玻璃硬盘盘的磨料化合物，其特征在于包括一种具有水的稳定的浆料，并在其中分散为研磨剂，其平均二次粒径为0.1-0.5μm的氧化铈（IV）颗粒 并含有浓度为0.2〜30重量％的CeO 2。 优选地，本发明提供了上述磨料化合物，其中铈以磨料中稀土元素总量的氧化物计为95％以上。

    Crystalline ceric oxide sol and process for producing the same
    6.
    发明授权
    Crystalline ceric oxide sol and process for producing the same 失效
    结晶氧化铈溶胶及其制备方法

    公开(公告)号：US06706082B2

    公开(公告)日：2004-03-16

    申请号：US10076500

    申请日：2002-02-19

    申请人： Isao Ota ,  Tohru Nishimura ,  Kenji Tanimoto

    发明人： Isao Ota ,  Tohru Nishimura ,  Kenji Tanimoto

    IPC分类号： C01P1700

    CPC分类号： C09G1/02 ,  B82Y30/00 ,  C01F17/0043 ,  C01P2004/53 ,  C01P2004/64 ,  C01P2006/12 ,  C01P2006/40 ,  C09K3/1436 ,  C09K3/1463

    摘要： Substantially monodisperse crystalline ceric oxide sols and processes for producing such sols are provided. Sols include crystalline ceric oxide particles having a particle size I (particle size converted from specific surface area by gas absorption method) ranging from 10 nm to 200 nm and a ratio of particle size II (particle size measured by dynamic light scattering method) to particle size I ranging from 2 to 6. Sols can be prepared by reacting a cerium (III) salt with an alkaline substance in an aqueous medium under an inert gas atmosphere to obtain a suspension of cerium (III) hydroxide, immediately blowing oxygen or a gas containing oxygen into the suspension to obtain a sol comprising crystalline ceric oxide particles, and wet grinding the resulting sol. Sols are also prepared by calcining cerium carbonate at a temperature of 300 to 1100° C. to give cerium oxide particles, and wet-grinding the resulting particles.

    摘要翻译： 提供了基本上单分散的结晶二氧化铈溶胶和制备这种溶胶的方法。 熔体包括10nm至200nm范围内的粒径I（通过气体吸收法从比表面积转化的粒径）和粒径II（通过动态光散射法测量的粒径）与粒子的比例的结晶二氧化铈粒子 尺寸I范围为2至6.可以通过在惰性气体气氛下在水性介质中使铈（III）盐与碱性物质反应制备，以获得氢氧化铈（III）的悬浮液，立即吹入氧气或气体 将氧气加入到悬浮液中以获得包含结晶二氧化铈颗粒的溶胶，并湿法研磨所得溶胶。 还可以通过在300〜1100℃的温度下煅烧碳酸铈以制备氧化铈颗粒并湿磨研磨所得的颗粒来制备。

    Method of milling cerium compound by means of ball mill
    7.
    发明申请
    Method of milling cerium compound by means of ball mill 审中-公开
    通过球磨机研磨铈化合物的方法

    公开(公告)号：US20080156908A1

    公开(公告)日：2008-07-03

    申请号：US12071785

    申请日：2008-02-26

    申请人： Isao Ota ,  Kenji Tanimoto ,  Gen Yamada ,  Noriyuki Takakuma

    发明人： Isao Ota ,  Kenji Tanimoto ,  Gen Yamada ,  Noriyuki Takakuma

    IPC分类号： B02C17/20

    CPC分类号： B02C17/00 ,  B02C17/20 ,  C09K3/1409

    摘要： A method of milling cerium compound by means of a ball mill using a milling medium, characterized in that ratio Hb/r of radius r of a cylindrical ball mill container and depth Hb of the milling medium in the ball mill container disposed horizontally ranges from 1.2 to 1.9, and the ball mill container is rotated at a rotational speed which is 50% or less of critical rotational speed Nc=299/r1/2 of the ball mill container converted from the radius r expressed in centimeter. The milling method can be carried out in a wet or dry process, and the cerium compound is preferably cerium oxide. The method can be also applied for producing a cerium compound slurry.

    摘要翻译： 一种通过使用研磨介质的球磨机研磨铈化合物的方法，其特征在于，圆柱形球磨机容器的半径r与深度H b b的比值H b / 水平设置的球磨机容器中的研磨介质的SUB> 1.2〜1.9，球磨容器以临界旋转速度N C = 50％以下的转速旋转， 从以半径r表示的半径r转换的球磨机容器的299 / r 1/2倍。 研磨方法可以在湿法或干法中进行，铈化合物优选为氧化铈。 该方法也可用于制备铈化合物浆料。

    Method of milling cerium compound by means of ball mill
    8.
    发明授权
    Method of milling cerium compound by means of ball mill 失效
    通过球磨机研磨铈化合物的方法

    公开(公告)号：US07484679B2

    公开(公告)日：2009-02-03

    申请号：US10518769

    申请日：2003-07-03

    申请人： Isao Ota ,  Kenji Tanimoto ,  Gen Yamada ,  Noriyuki Takakuma

    发明人： Isao Ota ,  Kenji Tanimoto ,  Gen Yamada ,  Noriyuki Takakuma

    IPC分类号： B02C1/00 ,  B02C11/08 ,  B02C21/00 ,  B02C23/00

    CPC分类号： B02C17/00 ,  B02C17/20 ,  C09K3/1409

    摘要： A method of milling cerium compound by means of a ball mill using a milling medium, characterized in that ratio Hb/r of radius r of a cylindrical ball mill container and depth Hb of the milling medium in the ball mill container disposed horizontally ranges from 1.2 to 1.9, and the ball mill container is rotated at a rotational speed which is 50% or less of critical rotational speed Nc=299/r1/2 of the ball mill container converted from the radius r expressed in centimeter. The milling method can be carried out in a wet or dry process, and the cerium compound is preferably cerium oxide. The method can be also applied for producing a cerium compound slurry.

    摘要翻译： 一种通过使用研磨介质的球磨机研磨铈化合物的方法，其特征在于，圆柱形球磨机容器的半径r的比率Hb / r和水平设置的球磨机容器中的研磨介质的深度Hb范围为1.2 到1.9，球磨容器以从以半径r表示的半径r转换的球磨机容器的临界转速Nc = 299 / r1 / 2的50％以下的转速旋转。 研磨方法可以在湿法或干法中进行，铈化合物优选为氧化铈。 该方法也可用于制备铈化合物浆料。

    Production Method of Polishing Composition
    9.
    发明申请
    Production Method of Polishing Composition 失效
    抛光组合物的生产方法

    公开(公告)号：US20080254718A1

    公开(公告)日：2008-10-16

    申请号：US11920532

    申请日：2006-05-10

    申请人： Noriyuki Takakuma ,  Isao Ota ,  Kenji Tanimoto

    发明人： Noriyuki Takakuma ,  Isao Ota ,  Kenji Tanimoto

    IPC分类号： C09K3/14 ,  C01G25/02 ,  B24B29/00 ,  B02C23/18 ,  H01L21/304

    CPC分类号： C01G25/02 ,  B82Y30/00 ,  C01P2004/64 ,  C09K3/1409 ,  C09K3/1463

    摘要： [Problems to Be Solved] To provide a method for obtaining a polishing composition by which a polishing speed is high and the polished surface has little surface failure.[Means to Solve the Problems] The present invention relates to a production method of a polishing composition containing zirconia oxide sol including: baking at a temperature ranging from 400 to 1000° C., a zirconium compound having d50 (where d50 represents a particle diameter meaning that the number of particles having this particle diameter or less is 50% of the total number of particles) of zirconium compound particles of 5 to 25 μm and d99 (where d99 represents a particle diameter meaning that the number of particles having this particle diameter or less is 99% of the total number of particles) of zirconium compound particles of 60 μm or less, wherein d50 and d99 are measured by measuring a slurry of the zirconium compound by a laser diffractometry; and wet-grinding a powder of zirconium oxide obtained in the above baking in an aqueous medium until d50 of zirconium oxide particles becomes 80 to 150 nm and d99 of zirconium oxide particles becomes 150 to 500 nm, wherein d50 and d99 are measured by measuring the slurry of the zirconium compound by a laser diffractometry.

    摘要翻译： [待解决的问题]提供一种获得抛光速度高的抛光组合物和抛光表面几乎没有表面破坏的方法。 解决问题的方法本发明涉及包含氧化锆氧化物溶胶的抛光组合物的制造方法，其包括：在400〜1000℃的温度下焙烧具有d50的锆化合物（d50表示粒径 意味着具有5〜25μm的锆化合物粒子和d99的d99（其中d99表示具有该粒径的粒子的数量的粒径的粒子的总数的50％） 或更少为总数的99％）的锆化合物颗粒，其中d50和d99通过激光衍射测量锆化合物的浆料来测量; 在水性介质中湿式研磨上述焙烧得到的氧化锆粉末，直到氧化锆粒子的d50为80〜150nm，氧化锆粒子的d99为150〜500nm，通过测定d50和d99 锆化合物的浆料通过激光衍射法。

    Cerium oxide particles and production method therefor
    10.
    发明授权
    Cerium oxide particles and production method therefor 失效
    氧化铈颗粒及其制备方法

    公开(公告)号：US07431758B2

    公开(公告)日：2008-10-07

    申请号：US10532316

    申请日：2003-10-28

    申请人： Isao Ota ,  Kenji Tanimoto ,  Noriyuki Takakuma

    发明人： Isao Ota ,  Kenji Tanimoto ,  Noriyuki Takakuma

    IPC分类号： C09G1/02 ,  B01J23/00 ,  C01F17/00 ,  B24D3/02

    CPC分类号： C01F17/0043 ,  C01P2004/52 ,  C09K3/1409 ,  C09K3/1463

    摘要： The production method for cerium oxide particles of the present invention is a method of producing a cerium oxide particle by heating a cerium compound from a normal temperature to a temperature range of 400° C. to 1200° C., and comprises at least a temperature raising stage of a temperature rise speed of 2° C./hour to 60° C./hour, or proceeds via a stage of heating while supplying a humidified gas in a temperature raising process. By the method of the present invention, a cerium oxide powder whose particle diameter distribution of primary particles is narrow can be obtained. An aqueous cerium oxide slurry produced from the powder enables an improvement in the productivity and a reduction in the cost of a polishing step, because if it is used as an abrasive a high-quality polished face is obtained without deteriorating the polishing speed. The aqueous cerium oxide slurry of the present invention is particularly useful as an abrasive for final finish of a substrate whose main component is silica.

    摘要翻译： 本发明的氧化铈粒子的制造方法是通过将铈化合物从常温加热至400〜1200℃的温度范围来制造氧化铈粒子的方法，至少包含温度 升温速度为2℃/小时至60℃/小时，或者在升温过程中供给加湿气体的同时进行加热阶段。 通过本发明的方法，可以获得一次颗粒的粒径分布窄的氧化铈粉末。 由粉末制造的二氧化铈水泥浆能够提高生产率和降低抛光步骤的成本，因为如果将其用作磨料，则不会降低抛光速度而获得高质量的抛光面。 本发明的水氧化铈浆料特别可用作主要成分为二氧化硅的基材的最终光洁度的研磨剂。