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    Illumination system particularly for microlithography
    3.
    发明授权
    Illumination system particularly for microlithography 有权
    照明系统特别适用于微光刻

    公开(公告)号：US06438199B1

    公开(公告)日：2002-08-20

    申请号：US09679718

    申请日：2000-09-29

    申请人： Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Wolfgang Singer ,  Martin Antoni

    发明人： Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Wolfgang Singer ,  Martin Antoni

    IPC分类号： G21K504

    CPC分类号： G21K1/06 ,  B82Y10/00 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70091 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/708 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/06 ,  G21K2201/064

    摘要： The invention concerns an illumination system, particularly for microlithography with wavelengths ≦193 nm, comprising a light source, a first optical component, a second optical component, an image plane and an exit pupil. The first optical component transforms the light source into a plurality of secondary light sources being imaged by the second optical component in said exit pupil. The first optical component comprises a first optical element having a plurality of first raster elements, which are imaged into said image plane producing a plurality of images being superimposed at least partially on a field in said image plane. The first raster elements deflect incoming ray bundles with first deflection angles, wherein at least two of the first deflection angles are different. The first raster elements are preferably rectangular, wherein the field is a segment of an annulus. To transform the rectangular images of the first raster elements into the segment of the annulus, the second optical component comprises a first field mirror for shaping the field to the segment of the annulus.

    摘要翻译： 本发明涉及一种照明系统，特别是对于具有波长<= 193nm的微光刻，其包括光源，第一光学部件，第二光学部件，图像平面和出射光瞳。 第一光学部件将光源变换成由所述出射光瞳中的第二光学部件成像的多个次级光源。 第一光学部件包括具有多个第一光栅元件的第一光学元件，其被成像到所述图像平面中，产生至少部分地叠加在所述图像平面中的场上的多个图像。 第一光栅元件以第一偏转角偏转入射光束，其中第一偏转角中的至少两个是不同的。 第一光栅元件优选地是矩形的，其中该场是环的一段。 为了将第一光栅元件的矩形图像变换成环形的区段，第二光学部件包括用于将场成形为环形部分的第一场镜。

    Illumination system particularly for EUV lithography
    5.
    发明授权
    Illumination system particularly for EUV lithography 有权
    照明系统尤其适用于EUV光刻

    公开(公告)号：US06198793B1

    公开(公告)日：2001-03-06

    申请号：US09305017

    申请日：1999-05-04

    申请人： Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger

    发明人： Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger

    IPC分类号： G21K504

    CPC分类号： G21K1/06 ,  B82Y10/00 ,  G02B27/0905 ,  G02B27/0961 ,  G02B27/0983 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/708 ,  G21K2201/06

    摘要： The invention concerns an illumination system for wavelengths ≦193 nm, particularly for EUV lithography, with at least one light source, which has an illumination A in a predetermined surface; at least one device for producing secondary light sources; at least one mirror or lens device comprising at least one mirror or one lens, which is or are organized into raster elements; one or more optical elements, which are arranged between the mirror or lens device comprising at least one mirror or one lens, which is or are organized into raster elements and the reticle plane, whereby the optical elements image the secondary light sources in the exit pupil of the illumination system. The illumination system is characterized by the fact that the raster elements of the one or more mirror or lenses are shaped and arranged in such a way that the images of the raster elements cover by means of the optical elements the major portion of the reticle plane and that the exit pupil defined by aperture and filling degree is illuminated.

    摘要翻译： 本发明涉及用于波长<= 193nm的照明系统，特别是对于EUV光刻，具有至少一个在预定表面具有照明A的光源; 至少一个用于产生二次光源的装置; 至少一个镜子或透镜装置，其包括至少一个反射镜或一个透镜，其被组合成光栅元件; 布置在包括至少一个反射镜或一个透镜的反射镜或透镜装置之间的一个或多个光学元件，其被组织成光栅元件和光罩平面，由此光学元件将出射光瞳中的次级光源成像 照明系统的特征在于，一个或多个镜子或透镜的光栅元件被成形和布置成使得光栅元件的图像通过光学元件覆盖主要部分 并且照明由孔径和填充度限定的出射光瞳。