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    Line narrowing module
    1.
    发明申请
    Line narrowing module 有权

    公开(公告)号：US20060114957A1

    公开(公告)日：2006-06-01

    申请号：US11000684

    申请日：2004-11-30

    申请人： J. Martin Algots ,  Robert Bergstedt ,  Walter Gillespie ,  Vladimir Kulgeyko ,  William Partlo ,  German Rylov ,  Richard Sandstrom ,  Brian Strate ,  Timothy Dyer

    发明人： J. Martin Algots ,  Robert Bergstedt ,  Walter Gillespie ,  Vladimir Kulgeyko ,  William Partlo ,  German Rylov ,  Richard Sandstrom ,  Brian Strate ,  Timothy Dyer

    IPC分类号： H01S3/22

    CPC分类号： H01S3/1055 ,  G03F7/70025 ,  G03F7/70041 ,  H01S3/005 ,  H01S3/036 ,  H01S3/08 ,  H01S3/08004 ,  H01S3/08059 ,  H01S3/097 ,  H01S3/106 ,  H01S3/2251

    摘要： A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse by changing the position of the dispersive center wavelength selection optic relative to the nominal optical path of the line narrowing module; wherein the second tuning mechanism coarsely selects a value for the center wavelength and the first tuning mechanism more finely selects the value for the center wavelength. The apparatus and method may further comprise at least one beam expanding and redirecting prism in the optical path of the line narrowing module; the first tuning mechanism selecting an angle of incidence of the at least a first spatially defined portion of the laser light pulse beam by changing the position of the at least one beam expanding prism relative to the nominal optical path of the line narrowing module. The first and second tuning mechanisms may be controlled by a center wavelength controller during a burst based upon feedback from a center wavelength detector detecting the center wavelength of at least one other pulse in the burst of pulses and the controller providing the feedback based upon an algorithm employing the detected center wavelength for the at least one other pulse in the burst. The first tuning mechanism may comprise an electro-mechanical course positioning mechanism and a fine positioning mechanism comprising an actuatable material that changes position or shape when actuated.

    Gas discharge laser line narrowing module
    2.
    发明申请
    Gas discharge laser line narrowing module 有权
    气体放电激光线变窄模块

    公开(公告)号：US20070002919A1

    公开(公告)日：2007-01-04

    申请号：US11173955

    申请日：2005-06-30

    申请人： Raymond Cybulski ,  Robert Bergstedt ,  William Partlo ,  Richard Sandstrom ,  Gon Wang

    发明人： Raymond Cybulski ,  Robert Bergstedt ,  William Partlo ,  Richard Sandstrom ,  Gon Wang

    IPC分类号： H01S3/22 ,  H01S3/03

    CPC分类号： H01S3/03 ,  H01S3/034 ,  H01S3/036 ,  H01S3/1055 ,  H01S3/225

    摘要： A line narrowed gas discharge laser system and method of operating same is disclosed which may comprise a dispersive center wavelength selective element; a beam expander comprising a plurality of refractive elements; a refractive element positioning mechanism positioning at least one of the refractive elements to modify an angle of incidence of a laser light beam on the dispersive center wavelength selection element; each of the dispersive center wavelength selection element and the beam expander being aligned with each other and with a housing containing at least the dispersive center wavelength selection element; a housing positioning mechanism positioning the housing with respect to an optical axis of the gas discharge laser system. The dispersive element may comprise a grating and the beam expander may comprise a plurality of prisms. The housing may contain the dispersive center wavelength selective element and the beam expander. The housing positioning element may comprise a position locking mechanism.

    摘要翻译： 公开了一种窄气体放电激光系统及其操作方法，其可以包括分散中心波长选择元件; 包括多个折射元件的光束扩展器; 折射元件定位机构，其定位折射元件中的至少一个，以改变激光束在分散中心波长选择元件上的入射角; 分散中心波长选择元件和扩束器中的每一个彼此对准并且至少包含分散中心波长选择元件的壳体; 壳体定位机构相对于气体放电激光系统的光轴定位壳体。 色散元件可以包括光栅，并且光束扩展器可以包括多个棱镜。 壳体可以包含分散中心波长选择元件和扩束器。 壳体定位元件可以包括位置锁定机构。

    Active bandwidth control for a laser
    3.
    发明申请
    Active bandwidth control for a laser 有权
    激光器的有源带宽控制

    公开(公告)号：US20070001127A1

    公开(公告)日：2007-01-04

    申请号：US11173988

    申请日：2005-06-30

    申请人： Daniel Reiley ,  German Rylov ,  Robert Bergstedt

    发明人： Daniel Reiley ,  German Rylov ,  Robert Bergstedt

    IPC分类号： A61N5/00

    CPC分类号： G03F7/70575 ,  G03F7/70025 ,  H01S3/005 ,  H01S3/08036 ,  H01S3/106 ,  H01S3/137 ,  H01S3/225

    摘要： In a first aspect, a lithography apparatus may comprise a mask designed using optical proximity correction (OPC), a pulsed laser source, and an active bandwidth control system configured to increase the bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is below a predetermined bandwidth range and increase a bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is above the predetermined bandwidth range. In another aspect an active bandwidth control system may include an optic for altering a wavefront of a laser beam in a laser cavity of the laser source to selectively adjust an output laser bandwidth in response to the control signal. In yet another aspect, the bandwidth of a laser having a wavelength variation across an aperture may be actively controlled by an aperture blocking element that is moveable to adjust a size of the aperture.

    摘要翻译： 在第一方面，光刻设备可以包括使用光学邻近校正（OPC），脉冲激光源和有源带宽控制系统设计的掩模，该有源带宽控制系统被配置为响应于测量的脉冲带宽来增加后续脉冲的带宽， 低于预定带宽范围，并且响应于高于预定带宽范围的测量脉冲带宽增加随后脉冲的带宽。 在另一方面，有源带宽控制系统可以包括用于改变激光源的激光腔中的激光束的波前的光学器件，用于响应于控制信号选择性地调节输出激光器带宽。 在另一方面，具有穿过孔的波长变化的激光器的带宽可以由可移动以调节孔径的孔径阻挡元件主动地控制。

    VERY HIGH POWER LASER CHAMBER OPTICAL IMPROVEMENTS
    4.
    发明申请
    VERY HIGH POWER LASER CHAMBER OPTICAL IMPROVEMENTS 审中-公开
    非常大的功率激光室光学改进

    公开(公告)号：US20120307858A1

    公开(公告)日：2012-12-06

    申请号：US13588170

    申请日：2012-08-17

    申请人： Hong Ye ,  Alex Ershov ,  Rajasekhar Rao ,  Daniel Brown ,  Slava Rokitski ,  Rong (Lauren) Liu ,  Ray Cybulski ,  James J. Ferrell ,  Robert Bergstedt ,  John Viatella ,  Thomas Duffey

    发明人： Hong Ye ,  Alex Ershov ,  Rajasekhar Rao ,  Daniel Brown ,  Slava Rokitski ,  Rong (Lauren) Liu ,  Ray Cybulski ,  James J. Ferrell ,  Robert Bergstedt ,  John Viatella ,  Thomas Duffey

    IPC分类号： H01S3/083 ,  G02B5/04

    CPC分类号： G02B5/04 ,  G02B5/12 ,  H01S3/0057 ,  H01S3/0346 ,  H01S3/081 ,  H01S3/225

    摘要： An aspect of the disclosed subject matter includes a method of reducing the laser absorption of a beam reverser prism consisting of at least one of the following: increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a first reflective surface of the prism and the chamfered corner is formed between the first reflective surface and a second reflective surface of the prism, wherein the chamfered corner has a chamfered surface; increasing a second distance between a second incident point and the chamfered corner, wherein the second incident point is on the second reflective surface of the prism; and increasing a reflectivity of the chamfered surface of the chamfered corner of the prism. A method of determining a prime cut for an optical component is also disclosed. A laser including at least one prime cut optical component is also disclosed.

    摘要翻译： 所公开的主题的一个方面包括减少由以下至少之一组成的光束反向棱镜的激光吸收的方法：增加第一入射点和倒角之间的第一距离，其中第一入射点在 在棱镜的第一反射面和第二反射面之间形成棱镜的第一反射面和倒角，其中倒角具有倒角面; 增加第二入射点和倒角之间的第二距离，其中第二入射点在棱镜的第二反射表面上; 并且增加棱镜倒角的倒角表面的反射率。 还公开了一种确定光学部件的主切割的方法。 还公开了包括至少一个初级切割光学部件的激光器。