公开(公告)号：US20220389279A1

公开(公告)日：2022-12-08

申请号：US17775887

申请日：2020-10-12

Applicant: JSR CORPORATION

Inventor： Yuuya Yamada ,  Pengyu Wang ,  Norihiko Sugie ,  Yasutaka Kamei

IPC: C09G1/02 ,  C09K13/00 ,  C09K3/14

Abstract: Provided are a chemical-mechanical polishing composition and a chemical-mechanical polishing method capable of polishing a semiconductor substrate containing a conductive metal such as tungsten or cobalt flatly and at high speed as well as reducing surface defects after polishing. The composition for chemical-mechanical polishing contains (A) silica particles having a functional group represented by general formula (1) and (B) a silane compound. —COO-M+ . . . (1) (M+ represents a monovalent cation.)

公开(公告)号：US12104087B2

公开(公告)日：2024-10-01

申请号：US17775887

申请日：2020-10-12

Applicant: JSR CORPORATION

Inventor： Yuuya Yamada ,  Pengyu Wang ,  Norihiko Sugie ,  Yasutaka Kamei

IPC: C09G1/02 ,  C09K3/14 ,  C09K13/00 ,  H01L21/321 ,  H01L21/768

CPC classification number: C09G1/02 ,  C09K3/1436 ,  C09K13/00 ,  H01L21/3212 ,  H01L21/7684

Abstract: Provided are a chemical-mechanical polishing composition and a chemical-mechanical polishing method capable of polishing a semiconductor substrate containing a conductive metal such as tungsten or cobalt flatly and at high speed as well as reducing surface defects after polishing. The composition for chemical-mechanical polishing contains (A) silica particles having a functional group represented by general formula (1) and (B) a silane compound. —COO-M+ . . . (1) (M+ represents a monovalent cation.)

公开(公告)号：US08697344B2

公开(公告)日：2014-04-15

申请号：US13854214

申请日：2013-04-01

Applicant: JSR Corporation

Inventor： Daita Kouno ,  Norihiko Sugie ,  Gouji Wakamatsu ,  Norihiro Natsume ,  Yukio Nishimura ,  Makoto Sugiura

IPC: G03F7/20 ,  G03F7/11

CPC classification number: G03F7/11 ,  G03F7/2041

Abstract: A composition for forming an upper layer film includes a solvent and a resin component including a first resin having a first repeating unit and a second repeating unit. The first repeating unit is a repeating unit represented by a formula (1-1), a repeating unit represented by a formula (1-2), a repeating unit represented by a formula (1-3), or a combination thereof. The second repeating unit is a repeating unit represented by a formula (2-1), a repeating unit represented by a formula (2-2), or both thereof. The composition is to be used for forming the upper layer film in liquid immersion lithography.

Abstract translation: 用于形成上层膜的组合物包括溶剂和包含具有第一重复单元和第二重复单元的第一树脂的树脂组分。 第一重复单元是由式（1-1）表示的重复单元，由式（1-2）表示的重复单元，由式（1-3）表示的重复单元或其组合。 第二重复单元是由式（2-1）表示的重复单元，由式（2-2）表示的重复单元或它们两者。 该组合物用于在液浸光刻中形成上层膜。

公开(公告)号：US08980529B2

公开(公告)日：2015-03-17

申请号：US13830880

申请日：2013-03-14

Applicant: JSR Corporation

Inventor： Yasuhiko Matsuda ,  Norihiko Sugie ,  Tomohiro Kakizawa ,  Takakazu Kimoto

IPC: G03F7/004 ,  C08F220/30 ,  C08F224/00 ,  G03F7/039 ,  G03F7/20

CPC classification number: G03F7/004 ,  C08F220/30 ,  C08F224/00 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  Y10S430/114

Abstract: A radiation-sensitive resin composition includes a polymer component, a radiation-sensitive acid generating agent, and a nitrogen-containing compound having a ring structure. The polymer component includes, in an identical polymer or different polymers, a first structural unit represented by a formula (1) and a second structural unit represented by a formula (2). R1 represents a hydrogen atom or a methyl group. Z is a group which represents a divalent monocyclic alicyclic hydrocarbon group taken together with R2. R2 represents a carbon atom. R3 represents a methyl group or an ethyl group. R4 represents a hydrogen atom or a methyl group. X is a group which represents a divalent bridged alicyclic hydrocarbon group having no less than 10 carbon atoms taken together with R5. R5 represents a carbon atom. R6 represents a branched alkyl group having 3 or 4 carbon atoms.

Abstract translation: 辐射敏感性树脂组合物包括聚合物组分，辐射敏感性酸产生剂和具有环结构的含氮化合物。 聚合物组分包括在相同聚合物或不同聚合物中的由式（1）表示的第一结构单元和由式（2）表示的第二结构单元。 R1表示氢原子或甲基。 Z表示与R2一起取代的二价单环脂肪族烃基的基团。 R2表示碳原子。 R3表示甲基或乙基。 R4表示氢原子或甲基。 X表示与R5一起具有不少于10个碳原子的二价桥连脂环烃基的基团。 R5表示碳原子。 R6表示具有3或4个碳原子的支链烷基。