中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

6 records (took 0.01 seconds)

    COMPOSITION FOR PATTERN FORMATION AND PATTERN-FORMING METHOD
    1.
    发明申请
    COMPOSITION FOR PATTERN FORMATION AND PATTERN-FORMING METHOD 审中-公开
    用于图案形成和图案形成方法的组合物

    公开(公告)号：US20150093508A1

    公开(公告)日：2015-04-02

    申请号：US14566841

    申请日：2014-12-11

    Applicant: JSR CORPORATION

    Inventor： Tomoki NAGAI ,  Shinya Minegishi ,  Takuo Sone ,  Yuji Namie

    IPC: C09D153/00

    CPC classification number: C09D153/00 ,  B82Y40/00 ,  C08F297/02 ,  C08L53/00 ,  G03F7/0002 ,  H01L21/0337

    Abstract: A composition for pattern formation includes a block copolymer that includes a block represented by formula (I) and a block represented by formula (II). R1 and R3 each independently represent a hydrogen atom, a methyl group, a fluorine atom or a trifluoromethyl group. R2 represents a monovalent organic group. R4 represents a hydrocarbon group having a valency of (1+b) and having 1 to 5 carbon atoms. R5 represents a monovalent group having a hetero atom. m and n are each independently an integer of 10 to 5,000. a is an integer of 0 to 5. b is an integer of 1 to 3.

    Abstract translation: 用于图案形成的组合物包括嵌段共聚物，其包含由式（I）表示的嵌段和由式（II）表示的嵌段。 R 1和R 3各自独立地表示氢原子，甲基，氟原子或三氟甲基。 R2表示一价有机基团。 R4表示具有（1 + b）化合价且具有1至5个碳原子的烃基。 R5表示具有杂原子的一价基团。 m和n各自独立地为10〜5000的整数。 a为0〜5的整数。b为1〜3的整数。

    Block copolymer
    2.
    发明授权
    Block copolymer 有权

    公开(公告)号：US10308752B2

    公开(公告)日：2019-06-04

    申请号：US15479705

    申请日：2017-04-05

    Applicant: JSR CORPORATION

    Inventor： Yuji Namie ,  Shinya Minegishi ,  Tomoki Nagai ,  Takuo Sone

    IPC: C08F297/02 ,  H01L21/033 ,  G03F7/00 ,  H01L21/308 ,  H01L21/3213 ,  B81C1/00 ,  C08L53/00 ,  G03F7/20 ,  H01L21/027

    Abstract: A block copolymer includes a polystyrene block including a styrene unit, and a polyalkyl (meth)acrylate block including an alkyl (meth)acrylate unit. The block copolymer includes an organic group that is bound to at least one end of a main chain of the block copolymer and that comprises a hetero atom. A polymerization initiation end of the block copolymer includes a structure derived from an alkyl lithium. The organic group included in the block copolymer includes a nitrogen atom, a sulfur atom, a phosphorus atom, a tin atom, or a combination thereof, or is represented by formula (1). R1 represents a single bond or a divalent organic group having 1 to 30 carbon atoms; and R2 represents a hydrogen atom, an aliphatic linear hydrocarbon group having 1 to 30 carbon atoms, an alicyclic hydrocarbon group having 3 to 30 carbon atoms, or the like.

Patent Agency Ranking