PIEZOELECTRIC INKJET PRINTHEAD AND METHOD OF MANUFACTURING THE SAME
    1.
    发明申请
    PIEZOELECTRIC INKJET PRINTHEAD AND METHOD OF MANUFACTURING THE SAME 失效
    压电喷墨印刷机及其制造方法

    公开(公告)号:US20070171260A1

    公开(公告)日:2007-07-26

    申请号:US11468954

    申请日:2006-08-31

    IPC分类号: B41J2/045

    摘要: A piezoelectric inkjet printhead including an upper substrate formed of a single crystal silicon substrate or an SOI substrate and having an ink inlet therethrough, and a lower substrate formed of an SOI substrate having a sequentially stacked structure with a first silicon layer, an intervening oxide layer, and a second silicon layer in which a manifold, pressure chambers, and dampers are formed in the second silicon layer by wet or dry etching, and nozzles are formed through the intervening oxide layer and the first silicon layer by dry etching, and a method of manufacturing the same.

    摘要翻译: 一种压电喷墨打印头,包括由单晶硅衬底或SOI衬底形成的上衬底,并且具有墨入口,以及由具有第一硅层的顺序层叠结构的SOI衬底形成的下衬底,中间氧化物层 以及通过湿法或干蚀刻在第二硅层中形成歧管,压力室和阻尼器的第二硅层,并且通过干法蚀刻形成穿过中间氧化物层和第一硅层的喷嘴,以及方法 的制造相同。

    Piezoelectric inkjet printhead and method of manufacturing the same
    2.
    发明授权
    Piezoelectric inkjet printhead and method of manufacturing the same 有权
    压电喷墨打印头及其制造方法

    公开(公告)号:US08813363B2

    公开(公告)日:2014-08-26

    申请号:US12722843

    申请日:2010-03-12

    摘要: A method of manufacturing a piezoelectric inkjet printhead includes processing a lower silicon-on-insulator substrate having a sequentially stacked structure with a first silicon layer, an intervening oxide layer, and a second silicon layer, processing the lower silicon-on-insulator substrate by etching the second silicon layer to form a manifold, a plurality of pressure chambers arranged along at least one side of the manifold and connected with the manifold, and a plurality of dampers connected with the pressure chambers, and by etching the first silicon layer and the intervening oxide layer to form a plurality of vertical nozzles through the first silicon layer and the intervening oxide layer to corresponding ones of the plurality of dampers, stacking and bonding an upper substrate on the lower substrate, reducing the upper substrate to a predetermined thickness, and forming a piezoelectric actuator on the upper substrate.

    摘要翻译: 一种制造压电喷墨打印头的方法包括:通过第一硅层,中间氧化物层和第二硅层处理具有顺序层叠结构的下硅绝缘体上基板,通过以下方式处理下硅绝缘体上基板: 蚀刻所述第二硅层以形成歧管,沿所述歧管的至少一侧布置并与所述歧管连接的多个压力室以及与所述压力室连接的多个阻尼器,并且通过蚀刻所述第一硅层和所述第二硅层 形成多个垂直喷嘴,通过第一硅层和中间氧化物层到多个阻尼器中的相应的阻尼器,堆叠并结合下基板上的上基板,将上基板还原成预定厚度;以及 在上基板上形成压电致动器。

    PIEZOELECTRIC INKJET PRINTHEAD AND METHOD OF MANUFACTURING THE SAME
    3.
    发明申请
    PIEZOELECTRIC INKJET PRINTHEAD AND METHOD OF MANUFACTURING THE SAME 有权
    压电喷墨印刷机及其制造方法

    公开(公告)号:US20100167433A1

    公开(公告)日:2010-07-01

    申请号:US12722843

    申请日:2010-03-12

    IPC分类号: H01L21/306

    摘要: A piezoelectric inkjet printhead including an upper substrate formed of a single crystal silicon substrate or an SOI substrate and having an ink inlet therethrough, and a lower substrate formed of an SOI substrate having a sequentially stacked structure with a first silicon layer, an intervening oxide layer, and a second silicon layer in which a manifold, pressure chambers, and dampers are formed in the second silicon layer by wet or dry etching, and nozzles are formed through the intervening oxide layer and the first silicon layer by dry etching, and a method of manufacturing the same.

    摘要翻译: 一种压电喷墨打印头,包括由单晶硅衬底或SOI衬底形成的上衬底,并且具有墨入口,以及由具有第一硅层的顺序层叠结构的SOI衬底形成的下衬底,中间氧化物层 以及通过湿法或干蚀刻在第二硅层中形成歧管,压力室和阻尼器的第二硅层,并且通过干法蚀刻形成穿过中间氧化物层和第一硅层的喷嘴,以及方法 的制造相同。

    Piezoelectric inkjet printhead and method of manufacturing the same
    4.
    发明授权
    Piezoelectric inkjet printhead and method of manufacturing the same 失效
    压电喷墨打印头及其制造方法

    公开(公告)号:US07695118B2

    公开(公告)日:2010-04-13

    申请号:US11468954

    申请日:2006-08-31

    IPC分类号: B41J2/045

    摘要: A piezoelectric inkjet printhead including an upper substrate formed of a single crystal silicon substrate or an SOI substrate and having an ink inlet therethrough, and a lower substrate formed of an SOI substrate having a sequentially stacked structure with a first silicon layer, an intervening oxide layer, and a second silicon layer in which a manifold, pressure chambers, and dampers are formed in the second silicon layer by wet or dry etching, and nozzles are formed through the intervening oxide layer and the first silicon layer by dry etching, and a method of manufacturing the same.

    摘要翻译: 一种压电喷墨打印头,包括由单晶硅衬底或SOI衬底形成的上衬底,并且具有墨入口,以及由具有第一硅层的顺序层叠结构的SOI衬底形成的下衬底,中间氧化物层 以及通过湿法或干蚀刻在第二硅层中形成歧管,压力室和阻尼器的第二硅层,并且通过干法蚀刻形成穿过中间氧化物层和第一硅层的喷嘴,以及方法 的制造相同。

    Silicon wet etching method using parylene mask and method of manufacturing nozzle plate of inkjet printhead using the same
    5.
    发明申请
    Silicon wet etching method using parylene mask and method of manufacturing nozzle plate of inkjet printhead using the same 审中-公开
    使用聚对二苯乙烯掩模的硅湿式蚀刻方法和使用其制造喷墨打印头的喷嘴板的方法

    公开(公告)号:US20070134928A1

    公开(公告)日:2007-06-14

    申请号:US11505416

    申请日:2006-08-17

    IPC分类号: H01L21/302

    摘要: A silicon wet etching method to form at least two elements having different shapes in a silicon substrate using at least two wet etching processes includes forming a first etch mask made of parylene on a surface of the silicon substrate, forming a first element in the substrate by wet etching the silicon substrate for a first time using the first etch mask, forming a second etch mask made of a silicon oxide layer on the surface of the silicon substrate, and forming a second element by wet etching the silicon substrate for a second time using the second etch mask.

    摘要翻译: 使用至少两个湿蚀刻工艺在硅衬底中形成具有不同形状的至少两种元件的硅湿式蚀刻方法包括在硅衬底的表面上形成由聚对二甲苯制成的第一蚀刻掩模,在衬底中形成第一元件,通过 使用第一蚀刻掩模第一次湿蚀刻硅衬底,在硅衬底的表面上形成由氧化硅层制成的第二蚀刻掩模,并且通过湿法蚀刻硅衬底第二次来形成第二元件,第二次使用 第二蚀刻掩模。

    Transistor and electronic apparatus including same
    8.
    发明申请
    Transistor and electronic apparatus including same 有权
    晶体管和包括它的电子设备

    公开(公告)号:US20110133176A1

    公开(公告)日:2011-06-09

    申请号:US12923089

    申请日:2010-09-01

    IPC分类号: H01L29/12

    摘要: Transistors and electronic apparatuses including the same are provided, the transistors include a channel layer on a substrate. The channel layer includes a zinc (Zn)-containing oxide. The transistors include a source and a drain, respectively, contacting opposing ends of the channel layer, a gate corresponding to the channel layer, and a gate insulating layer insulating the channel layer from the gate. The channel layer has a first surface adjacent to the substrate, a second surface facing the first surface, and a channel layer-protection portion on the second surface. The channel layer-protection portion includes a fluoride material.

    摘要翻译: 提供了包括它们的晶体管和电子设备,晶体管包括在衬底上的沟道层。 沟道层包括含锌(Zn)的氧化物。 晶体管分别包括与沟道层的相对端接触的源极和漏极,对应于沟道层的栅极以及将沟道层与栅极绝缘的栅极绝缘层。 沟道层具有与基板相邻的第一表面,与第一表面相对的第二表面和在第二表面上的沟道层保护部分。 沟道层保护部分包括氟化物材料。

    Method of fabricating black matrix of a color filter
    10.
    发明申请
    Method of fabricating black matrix of a color filter 有权
    制造滤色片黑矩阵的方法

    公开(公告)号:US20070122721A1

    公开(公告)日:2007-05-31

    申请号:US11505018

    申请日:2006-08-16

    IPC分类号: G02B5/20

    摘要: A method of fabricating a black matrix of a color filter is provided. In the method, a black matrix layer formed of a hydrophobic organic material is formed on an upper surface of a transparent substrate. A black matrix is formed by patterning the black matrix layer. Side surfaces of the black matrix are made hydrophilic by irradiating a lower surface of the transparent substrate with ultraviolet rays while heating the black matrix. A black matrix provided by the method is also disclosed.

    摘要翻译: 提供一种制造滤色器的黑矩阵的方法。 在该方法中,在透明基板的上表面上形成由疏水性有机材料形成的黑矩阵层。 通过构图黑矩阵层形成黑矩阵。 通过在加热黑色矩阵的同时用紫外线照射透明基板的下表面,使黑色矩阵的侧表面变得亲水。 还公开了由该方法提供的黑矩阵。