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公开(公告)号：US09385017B2
公开(公告)日：2016-07-05
申请号：US13567507
申请日：2012-08-06
申请人： James P. Fazio , David K. Foote , James D. Getty
发明人： James P. Fazio , David K. Foote , James D. Getty
IPC分类号： H01L21/677 , H01L21/687 , C23C16/458
CPC分类号： H01L21/67742 , C23C16/458 , C23C16/4582 , C23C16/4583 , C23C16/4585 , H01L21/67745 , H01L21/67748 , H01L21/67751 , H01L21/68735 , H01L21/68771
摘要： Apparatus and methods for plasma processing workpieces of different diameters. The apparatus includes a lift plate having an outer perimeter, an opening inside of the outer perimeter, and a gap extending between the opening and the outer perimeter. The lift plate includes annular rims of different inner diameters and that are configured to respectively support the first and second workpieces.
摘要翻译： 用于等离子体处理不同直径工件的装置和方法。 该装置包括具有外周边的提升板，外周边的内部的开口以及在开口和外周之间延伸的间隙。 提升板包括不同内径的环形轮辋，并且构造成分别支撑第一和第二工件。
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公开(公告)号：US20140034610A1
公开(公告)日：2014-02-06
申请号：US13567507
申请日：2012-08-06
申请人： James P. Fazio , David K. Foote , James D. Getty
发明人： James P. Fazio , David K. Foote , James D. Getty
CPC分类号： H01L21/67742 , C23C16/458 , C23C16/4582 , C23C16/4583 , C23C16/4585 , H01L21/67745 , H01L21/67748 , H01L21/67751 , H01L21/68735 , H01L21/68771
摘要： Apparatus and methods for plasma processing workpieces of different diameters. The apparatus includes a lift plate having an outer perimeter, an opening inside of the outer perimeter, and a gap extending between the opening and the outer perimeter. The lift plate includes annular rims of different inner diameters and that are configured to respectively support the first and second workpieces.
摘要翻译： 用于等离子体处理不同直径工件的装置和方法。 该装置包括具有外周边的提升板，外周边的内部的开口以及在开口和外周之间延伸的间隙。 提升板包括不同内径的环形轮辋，并且构造成分别支撑第一和第二工件。
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公开(公告)号：US06852169B2
公开(公告)日：2005-02-08
申请号：US10145518
申请日：2002-05-14
申请人： James P. Fazio , James D. Getty , Leslie D. Wood
发明人： James P. Fazio , James D. Getty , Leslie D. Wood
CPC分类号： C03C25/68 , C03C25/6293 , Y10S414/139
摘要： Plasma processing system and methods for stripping the buffer and, optionally, removing the cladding from an optical fiber. The plasma processing system includes a holder capable of holding one or more optical fibers such that a mid-span portion of each optical fiber is exposed to a plasma generated within a processing chamber of the system and the ends of each optical fiber are unaffected by the plasma treatment. Tapered transition zones are created between the plasma-treated portion of the optical fiber and the shielded ends. Treatment may be accomplished using a plasma containing atomic and molecular radicals and ions of fluorine and oxygen.
摘要翻译： 等离子体处理系统和用于剥离缓冲器的方法，以及可选地从光纤去除包层。 等离子体处理系统包括能够保持一个或多个光纤的保持器，使得每个光纤的中跨部分暴露于在系统的处理室内产生的等离子体，并且每个光纤的端部不受 等离子体处理。 在光纤的等离子体处理部分和屏蔽端之间产生锥形过渡区。 可以使用含有原子和分子自由基以及氟和氧的离子的等离子体进行处理。
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公开(公告)号：US07845309B2
公开(公告)日：2010-12-07
申请号：US10710457
申请日：2004-07-13
IPC分类号： C23C16/50 , C23C16/503 , C23C16/509 , H01L21/306 , C23F1/00 , C23C16/06 , C23C16/22
CPC分类号： H01J37/32834 , H01J37/32633
摘要： An apparatus for processing a substrate with a plasma. The apparatus includes first and second electrodes positioned with a spaced apart relationship. A separating ring has a vacuum-tight engagement with confronting surfaces of the first electrode and the second electrode to define an evacuatable processing region therebetween. Communicating with the processing region is a process gas port for introducing a process gas to the processing region. The processing region may be evacuated through a vacuum port defined in one of the first and second electrodes to a pressure suitable for exciting a plasma from the process gas in the processing region when the first and second electrodes are powered.
摘要翻译： 一种用等离子体处理衬底的装置。 该装置包括以间隔开的关系定位的第一和第二电极。 分离环与第一电极和第二电极的相对表面具有真空密封接合，以在它们之间限定可抽空的处理区域。 与处理区域通信是用于将处理气体引入到处理区域的处理气体端口。 处理区域可以通过在第一和第二电极中的一个中限定的真空端口抽真空至适于在第一和第二电极通电时从处理区域中的处理气体激发等离子体的压力。
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公开(公告)号：US08245663B2
公开(公告)日：2012-08-21
申请号：US12376175
申请日：2007-08-17
申请人： James P. Fazio
发明人： James P. Fazio
CPC分类号： H01L21/67748 , H01L21/6719
摘要： Apparatus and methods for handling workpieces in a processing system. The workpiece vertical lift mechanism (200), which is disposed inside a process chamber (40) of the processing system, is adapted to transfer a workpiece (55) to and from a pedestal portion (286) of an electrode (24). The pedestal portion (286) is configured to support the workpiece (55) during processing. The workpiece vertical lift mechanism (200) including a workpiece fixture (290) movable relative to the pedestal portion (286) between a first position in which the workpiece fixture (290) holds the workpiece (55) in a non-contacting relationship with the pedestal portion (286) and a second position in which the pedestal portion (286) projects above workpiece fixture (290) so as to transfer the workpiece (55) from the workpiece fixture (290) to the pedestal portion (286).
摘要翻译： 在处理系统中处理工件的装置和方法。 设置在处理系统的处理室（40）内的工件垂直提升机构（200）适于将工件（55）传送到电极（24）的基座部分（286）。 基座部分（286）构造成在加工期间支撑工件（55）。 工件垂直提升机构（200）包括在第一位置和第二位置之间可移动的工件夹具（290），工件固定件（290）以与工件夹具（290）非接触关系的方式保持工件 基座部分（286）和第二位置，其中基座部分（286）突出到工件夹具（290）上方，以将工件（55）从工件夹具（290）传送到基座部分（286）。
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6.发明授权Material handling system and method for a multi-workpiece plasma treatment system 失效多工件等离子体处理系统的材料处理系统和方法公开(公告)号：US06841033B2
公开(公告)日：2005-01-11
申请号：US09998875
申请日：2001-10-31
IPC分类号： H05H1/46 , H01L21/00 , H01L21/02 , H01L21/205 , H01L21/3065 , H01L21/677 , C23F1/00 , B65G49/07 , C23C16/00 , H01L21/306
CPC分类号： H01L21/67069 , H01J37/32743 , Y10S414/139
摘要： A plasma treatment system in which untreated workpieces are serially received one at a time on an infeed table but stored in parallel on the infeed table. The untreated workpieces are transferred simultaneously, in parallel, into a plasma treatment chamber. Thereafter, treated workpieces are transferred simultaneously, in parallel, out of the plasma treatment chamber onto an outfeed table; and the outfeed table serially discharges the treated workpieces one at a time from the outfeed table.
摘要翻译： 一种等离子体处理系统，其中在进料台上一次一个地连续地接收未处理的工件，但是平行地存储在进料台上。 未处理的工件同时并行地转移到等离子体处理室中。 此后，经处理的工件同时并行地从等离子体处理室转移到出料台上; 并且出料台从出料台一次一个地排出经处理的工件。
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公开(公告)号：US08986564B2
公开(公告)日：2015-03-24
申请号：US13551308
申请日：2012-07-17
申请人： James P. Fazio
发明人： James P. Fazio
IPC分类号： C23F1/00 , C23F1/08 , H01L21/677 , H01L21/67
CPC分类号： H01L21/67748 , H01L21/6719
摘要： Apparatus and methods for handling workpieces in a processing system. The workpiece vertical lift mechanism (200), which is disposed inside a process chamber (40) of the processing system, is adapted to transfer a workpiece (55) to and from a pedestal portion (286) of an electrode (24). The pedestal portion (286) is configured to support the workpiece (55) during processing. The workpiece vertical lift mechanism (200) including a workpiece fixture (290) movable relative to the pedestal portion (286) between a first position in which the workpiece fixture (290) holds the workpiece (55) in a non-contacting relationship with the pedestal portion (286) and a second position in which the pedestal portion (286) projects above workpiece fixture (290) so as to transfer the workpiece (55) from the workpiece fixture (290) to the pedestal portion (286).
摘要翻译： 在处理系统中处理工件的装置和方法。 设置在处理系统的处理室（40）内的工件垂直提升机构（200）适于将工件（55）传送到电极（24）的基座部分（286）。 基座部分（286）构造成在加工期间支撑工件（55）。 工件垂直提升机构（200）包括在第一位置和第二位置之间可移动的工件夹具（290），工件固定件（290）以与工件夹具（290）非接触关系的方式保持工件 基座部分（286）和第二位置，其中基座部分（286）突出到工件夹具（290）上方，以将工件（55）从工件夹具（290）传送到基座部分（286）。
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公开(公告)号：US20120279946A1
公开(公告)日：2012-11-08
申请号：US13551308
申请日：2012-07-17
申请人： James P. Fazio
发明人： James P. Fazio
IPC分类号： B23K10/00
CPC分类号： H01L21/67748 , H01L21/6719
摘要： Apparatus and methods for handling workpieces in a processing system. The workpiece vertical lift mechanism (200), which is disposed inside a process chamber (40) of the processing system, is adapted to transfer a workpiece (55) to and from a pedestal portion (286) of an electrode (24). The pedestal portion (286) is configured to support the workpiece (55) during processing. The workpiece vertical lift mechanism (200) including a workpiece fixture (290) movable relative to the pedestal portion (286) between a first position in which the workpiece fixture (290) holds the workpiece (55) in a non-contacting relationship with the pedestal portion (286) and a second position in which the pedestal portion (286) projects above workpiece fixture (290) so as to transfer the workpiece (55) from the workpiece fixture (290) to the pedestal portion (286).
摘要翻译： 在处理系统中处理工件的装置和方法。 设置在处理系统的处理室（40）内的工件垂直提升机构（200）适于将工件（55）传送到电极（24）的基座部分（286）。 基座部分（286）构造成在加工期间支撑工件（55）。 工件垂直提升机构（200）包括在第一位置和第二位置之间可移动的工件夹具（290），工件固定件（290）以与工件夹具（290）非接触关系的方式保持工件 基座部分（286）和第二位置，其中基座部分（286）突出到工件夹具（290）上方，以将工件（55）从工件夹具（290）传送到基座部分（286）。
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公开(公告)号：US20090311088A1
公开(公告)日：2009-12-17
申请号：US12376175
申请日：2007-08-17
申请人： James P. Fazio
发明人： James P. Fazio
IPC分类号： B65G47/22
CPC分类号： H01L21/67748 , H01L21/6719
摘要： Apparatus and methods for handling workpieces in a processing system. The workpiece vertical lift mechanism (200), which is disposed inside a process chamber (40) of the processing system is adapted to transfer a workpiece (55) to and from a pedestal portion (286) of an electrode (24). The pedestal portion (286) is configured to support the workpiece (55) during processing. The workpiece vertical lift mechanism (200) including a workpiece fixture (290) movable relative to the pedestal portion (286) between a first position in which the workpiece fixture (290) holds the workpiece (55) in a non-contacting relationship with the pedestal portion (286) and a second position in which the pedestal portion (286) projects above workpiece fixture (290) so as to transfer the workpiece (55) from the workpiece fixture (290) to the pedestal portion (286).
摘要翻译： 在处理系统中处理工件的装置和方法。 设置在处理系统的处理室（40）内部的工件垂直提升机构（200）适于将工件（55）传送到电极（24）的基座部分（286）。 基座部分（286）构造成在加工期间支撑工件（55）。 工件垂直提升机构（200）包括在第一位置和第二位置之间可移动的工件夹具（290），工件固定件（290）以与工件夹具（290）非接触关系的方式保持工件 基座部分（286）和第二位置，其中基座部分（286）突出到工件夹具（290）上方，以将工件（55）从工件夹具（290）传送到基座部分（286）。
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