-
公开(公告)号：US07845309B2
公开(公告)日：2010-12-07
申请号：US10710457
申请日：2004-07-13
IPC分类号： C23C16/50 , C23C16/503 , C23C16/509 , H01L21/306 , C23F1/00 , C23C16/06 , C23C16/22
CPC分类号： H01J37/32834 , H01J37/32633
摘要： An apparatus for processing a substrate with a plasma. The apparatus includes first and second electrodes positioned with a spaced apart relationship. A separating ring has a vacuum-tight engagement with confronting surfaces of the first electrode and the second electrode to define an evacuatable processing region therebetween. Communicating with the processing region is a process gas port for introducing a process gas to the processing region. The processing region may be evacuated through a vacuum port defined in one of the first and second electrodes to a pressure suitable for exciting a plasma from the process gas in the processing region when the first and second electrodes are powered.
摘要翻译： 一种用等离子体处理衬底的装置。 该装置包括以间隔开的关系定位的第一和第二电极。 分离环与第一电极和第二电极的相对表面具有真空密封接合，以在它们之间限定可抽空的处理区域。 与处理区域通信是用于将处理气体引入到处理区域的处理气体端口。 处理区域可以通过在第一和第二电极中的一个中限定的真空端口抽真空至适于在第一和第二电极通电时从处理区域中的处理气体激发等离子体的压力。
-
2.发明授权Plasma processing apparatus and methods for removing extraneous material from selected areas on a substrate 有权等离子体处理装置和从衬底上的选定区域去除外来材料的方法公开(公告)号：US07635418B2
公开(公告)日：2009-12-22
申请号：US11003062
申请日：2004-12-03
IPC分类号： H01L21/306 , C23C16/00 , C23C16/04
CPC分类号： H01L21/67069 , C23F4/00 , H01J37/32623 , H01L2924/0002 , H01L2924/00
摘要： Apparatus and methods for shielding a feature projecting from a first area on a substrate to a plasma while simultaneously removing extraneous material from a different area on the substrate with the plasma. The apparatus includes at least one concavity positioned and dimensioned to receive the feature such that the feature is shielded from the plasma. The apparatus further includes a window through which the plasma removes the extraneous material. The method generally includes removing the extraneous material while shielding the feature against plasma exposure.
摘要翻译： 用于屏蔽从衬底上的第一区域突出到等离子体的特征的装置和方法，同时使用等离子体从衬底上的不同区域去除外来材料。 该装置包括至少一个位置和尺寸以容纳特征的凹陷，使得该特征与等离子体屏蔽。 该装置还包括一个窗口，等离子体通过这个窗口去除外来材料。 该方法通常包括去除外来材料，同时屏蔽特征免受等离子体暴露。
-
3.发明授权Material handling system and method for a multi-workpiece plasma treatment system 失效多工件等离子体处理系统的材料处理系统和方法公开(公告)号：US06841033B2
公开(公告)日：2005-01-11
申请号：US09998875
申请日：2001-10-31
IPC分类号： H05H1/46 , H01L21/00 , H01L21/02 , H01L21/205 , H01L21/3065 , H01L21/677 , C23F1/00 , B65G49/07 , C23C16/00 , H01L21/306
CPC分类号： H01L21/67069 , H01J37/32743 , Y10S414/139
摘要： A plasma treatment system in which untreated workpieces are serially received one at a time on an infeed table but stored in parallel on the infeed table. The untreated workpieces are transferred simultaneously, in parallel, into a plasma treatment chamber. Thereafter, treated workpieces are transferred simultaneously, in parallel, out of the plasma treatment chamber onto an outfeed table; and the outfeed table serially discharges the treated workpieces one at a time from the outfeed table.
摘要翻译： 一种等离子体处理系统，其中在进料台上一次一个地连续地接收未处理的工件，但是平行地存储在进料台上。 未处理的工件同时并行地转移到等离子体处理室中。 此后，经处理的工件同时并行地从等离子体处理室转移到出料台上; 并且出料台从出料台一次一个地排出经处理的工件。
-
公开(公告)号：US08623471B2
公开(公告)日：2014-01-07
申请号：US13353823
申请日：2012-01-19
IPC分类号： H05H1/24 , H05H1/00 , C23C14/02 , H01L21/306 , H01L21/302 , H01L21/461
CPC分类号： H01J37/32082 , H01J37/32357 , H01J37/32422
摘要： A plasma treatment system for treating a workpiece with a downstream-type plasma. The processing chamber of the plasma treatment system includes a chamber lid having a plasma cavity disposed generally between a powered electrode and a grounded plate, a processing space separated from the plasma cavity by the grounded plate, and a substrate support in the processing space for holding the workpiece. A direct plasma is generated in the plasma cavity. The grounded plate is adapted with openings that remove electrons and ions from the plasma admitted from the plasma cavity into the processing space to provide a downstream-type plasma of free radicals. The openings may also eliminate line-of-sight paths for light between the plasma cavity and processing space. In another aspect, the volume of the processing chamber may be adjusted by removing or inserting at least one removable sidewall section from the chamber lid.
摘要翻译： 一种用下游式等离子体处理工件的等离子体处理系统。 等离子体处理系统的处理室包括具有通常设置在供电电极和接地板之间的等离子体空腔的室盖，通过接地板与等离子体腔分离的处理空间以及用于保持的处理空间中的基板支撑 工件。 在等离子体腔中产生直接等离子体。 接地板适于具有从等离子体空腔中进入处理空间的等离子体中的电子和离子的开口，以提供自由基的下游型等离子体。 开口还可以消除等离子体腔和处理空间之间的光线的视线路径。 在另一方面，可以通过从室盖移除或插入至少一个可拆卸的侧壁部分来调节处理室的体积。
-
公开(公告)号：US20120118857A1
公开(公告)日：2012-05-17
申请号：US13353823
申请日：2012-01-19
CPC分类号： H01J37/32082 , H01J37/32357 , H01J37/32422
摘要： A plasma treatment system for treating a workpiece with a downstream-type plasma. The processing chamber of the plasma treatment system includes a chamber lid having a plasma cavity disposed generally between a powered electrode and a grounded plate, a processing space separated from the plasma cavity by the grounded plate, and a substrate support in the processing space for holding the workpiece. A direct plasma is generated in the plasma cavity. The grounded plate is adapted with openings that remove electrons and ions from the plasma admitted from the plasma cavity into the processing space to provide a downstream-type plasma of free radicals. The openings may also eliminate line-of-sight paths for light between the plasma cavity and processing space. In another aspect, the volume of the processing chamber may be adjusted by removing or inserting at least one removable sidewall section from the chamber lid.
摘要翻译： 一种用下游式等离子体处理工件的等离子体处理系统。 等离子体处理系统的处理室包括具有通常设置在供电电极和接地板之间的等离子体空腔的室盖，通过接地板与等离子体腔分离的处理空间以及用于保持的处理空间中的基板支撑 工件。 在等离子体腔中产生直接等离子体。 接地板适于具有从等离子体空腔中进入处理空间的等离子体中的电子和离子的开口，以提供自由基的下游型等离子体。 开口还可以消除等离子体腔和处理空间之间的光线的视线路径。 在另一方面，可以通过从室盖移除或插入至少一个可拆卸的侧壁部分来调节处理室的体积。
-
6.发明申请PLASMA PROCESSING APPARATUS AND METHODS FOR REMOVING EXTRANEOUS MATERIAL FROM SELECTED AREAS ON A SUBSTRATE 有权等离子体处理装置和从基板上选择的区域去除特殊材料的方法公开(公告)号：US20100075505A1
公开(公告)日：2010-03-25
申请号：US12614551
申请日：2009-11-09
IPC分类号： H01L21/3065
CPC分类号： H01L21/67069 , C23F4/00 , H01J37/32623 , H01L2924/0002 , H01L2924/00
摘要： Apparatus and methods for shielding a feature projecting from a first area on a substrate to a plasma while simultaneously removing extraneous material from a different area on the substrate with the plasma. The apparatus includes at least one concavity positioned and dimensioned to receive the feature such that the feature is shielded from the plasma. The apparatus further includes a window through which the plasma removes the extraneous material. The method generally includes removing the extraneous material while shielding the feature against plasma exposure.
摘要翻译： 用于屏蔽从衬底上的第一区域突出到等离子体的特征的装置和方法，同时使用等离子体从衬底上的不同区域去除外来材料。 该装置包括至少一个位置和尺寸以容纳特征的凹陷，使得该特征与等离子体屏蔽。 该装置还包括一个窗口，等离子体通过这个窗口去除外来材料。 该方法通常包括去除外来材料，同时屏蔽特征免受等离子体暴露。
-
7.发明授权Plasma processing apparatus and methods for removing extraneous material from selected areas on a substrate 有权等离子体处理装置和从衬底上的选定区域去除外来材料的方法公开(公告)号：US08329590B2
公开(公告)日：2012-12-11
申请号：US12614551
申请日：2009-11-09
IPC分类号： H01L21/302
CPC分类号： H01L21/67069 , C23F4/00 , H01J37/32623 , H01L2924/0002 , H01L2924/00
摘要： Apparatus and methods for shielding a feature projecting from a first area on a substrate to a plasma while simultaneously removing extraneous material from a different area on the substrate with the plasma. The apparatus includes at least one concavity positioned and dimensioned to receive the feature such that the feature is shielded from the plasma. The apparatus further includes a window through which the plasma removes the extraneous material. The method generally includes removing the extraneous material while shielding the feature against plasma exposure.
摘要翻译： 用于屏蔽从衬底上的第一区域突出到等离子体的特征的装置和方法，同时使用等离子体从衬底上的不同区域去除外来材料。 该装置包括至少一个位置和尺寸以容纳特征的凹陷，使得该特征与等离子体屏蔽。 该装置还包括一个窗口，等离子体通过这个窗口去除外来材料。 该方法通常包括去除外来材料，同时屏蔽特征免受等离子体暴露。
-
8.发明申请Communication cable having electrically isolated shield providing enhanced return loss 有权具有电隔离屏蔽的通信电缆提供增强的回波损耗公开(公告)号：US20100101853A1
公开(公告)日：2010-04-29
申请号：US12653804
申请日：2009-12-18
CPC分类号： H01B11/1008 , H01B13/26
摘要： A tape can comprise a strip of dielectric material, with adhering patches of electrical conductive material. The patches can be substantially electrically isolated from one another. The strip can be disposed in a communication cable to provide a shield that is electrically discontinuous or has high resistance between opposite cable ends. Each patch can interact with electromagnetic radiation associated with electrical signals transmitting over the cable. The patches can collectively interact with the transmitting electrical signals in a cumulative or resonant manner to produce a spike in return loss at a particular frequency of the transmitting signals. The frequency location of the spike can depend upon the sizes of the patches, with size impacting manufacturability. The patches can be sized such that the spike falls within an operating frequency of the transmitting signal but is suppressed, so the cable meets return loss specifications while offering manufacturing advantage.
摘要翻译： 胶带可以包括电介质材料条，具有导电材料的附着贴片。 贴片可以基本上彼此电隔离。 带可以设置在通信电缆中，以提供电连接的屏蔽或在相对的电缆端之间具有高电阻。 每个贴片可以与通过电缆传输的电信号相关联的电磁辐射相互作用。 补片可以以累积或共振的方式与发射电信号共同交互，以在发射信号的特定频率产生回波损耗的尖峰。 尖峰的频率位置可以取决于贴片的尺寸，其尺寸影响可制造性。 这些贴片的尺寸可以使得尖峰落在发射信号的工作频率内，但被抑制，因此电缆在提供制造优势的同时符合回波损耗规格。
-
9.发明授权Communication cable having electrically isolated shield providing enhanced return loss 有权具有电隔离屏蔽的通信电缆提供增强的回波损耗公开(公告)号：US08450606B2
公开(公告)日：2013-05-28
申请号：US12653804
申请日：2009-12-18
IPC分类号： H01B7/00
CPC分类号： H01B11/1008 , H01B13/26
摘要： A tape can comprise a strip of dielectric material, with adhering patches of electrical conductive material. The patches can be substantially electrically isolated from one another. The strip can be disposed in a communication cable to provide a shield that is electrically discontinuous or has high resistance between opposite cable ends. Each patch can interact with electromagnetic radiation associated with electrical signals transmitting over the cable. The patches can collectively interact with the transmitting electrical signals in a cumulative or resonant manner to produce a spike in return loss at a particular frequency of the transmitting signals. The frequency location of the spike can depend upon the sizes of the patches, with size impacting manufacturability. The patches can be sized such that the spike falls within an operating frequency of the transmitting signal but is suppressed, so the cable meets return loss specifications while offering manufacturing advantage.
摘要翻译： 胶带可以包括电介质材料条，具有导电材料的附着贴片。 贴片可以基本上彼此电隔离。 带可以设置在通信电缆中，以提供电连接的屏蔽或在相对的电缆端之间具有高电阻。 每个贴片可以与通过电缆传输的电信号相关联的电磁辐射相互作用。 补片可以以累积或共振的方式与发射电信号共同交互，以在发射信号的特定频率产生回波损耗的尖峰。 尖峰的频率位置可以取决于贴片的尺寸，其尺寸影响可制造性。 这些贴片的尺寸可以使得尖峰落在发射信号的工作频率内，但被抑制，因此电缆在提供制造优势的同时符合回波损耗规格。
-
10.发明授权公开(公告)号：US08119906B1
公开(公告)日：2012-02-21
申请号：US12583797
申请日：2009-08-26
IPC分类号： H01B11/06
CPC分类号： H01B11/1008
摘要： A cable shield tape can comprise patches of electrically conductive material disposed adjacent a strip of dielectric material, with the patches electrically isolated from one another. An attachment system can mechanically attach the patches to the dielectric material, for example to avoid flammable adhesives. The attachment system can comprise one or more mechanical fasteners, rivets, staples, clips, clamps, metallic members, nonorganic materials, nonflammable materials, holes, holes with flared or mushroomed rims, protrusions, etc. The attachment system can also or alternatively comprise technology for knolling, punching, seating, surface patterning, peening, embossing, etc. The tape can be wrapped around one or more cable conductors, such as wires that transmit data, to provide electrical or electromagnetic shielding. The resulting cable can have a shield that is electrically discontinuous between opposite ends of the cable.
摘要翻译： 电缆屏蔽胶带可以包括邻近电介质材料条设置的导电材料片，其中电极彼此电隔离。 附接系统可以将贴片机械地附接到电介质材料，例如以避免易燃粘合剂。 连接系统可以包括一个或多个机械紧固件，铆钉，钉钉，夹子，夹具，金属构件，非有机材料，不可燃材料，孔，具有扩口或蘑菇状边缘的孔，突起等。附接系统还可以或者可选地包括技术 用于滚压，冲压，座位，表面图案化，喷丸处理，压花等。带可以缠绕在一个或多个电缆导体上，例如传输数据的电线，以提供电或电磁屏蔽。 所得到的电缆可以具有在电缆的相对端之间电连接的屏蔽。
-
-
-
-
-
-
-
-
-
搜索结果
20 条记录 (耗时 0.024 秒)
