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    Lithographic apparatus and device manufacturing method
    3.
    发明申请
    Lithographic apparatus and device manufacturing method 审中-公开
    平版印刷设备和器件制造方法

    公开(公告)号：US20050002003A1

    公开(公告)日：2005-01-06

    申请号：US10847656

    申请日：2004-05-18

    申请人： Jan Hoogkamp ,  Albert Klomp ,  Johannes Franssen

    发明人： Jan Hoogkamp ,  Albert Klomp ,  Johannes Franssen

    IPC分类号： G03F1/08 ,  G03F7/20 ,  H01L21/00 ,  H01L21/027 ,  G03B27/52

    CPC分类号： G03F7/70933 ,  G03F7/70741 ,  G03F7/7075 ,  G03F7/70808 ,  H01L21/67017 ,  H01L21/67201

    摘要： The present invention relates to a lithographic projection apparatus and a method for transferring an object via a load lock between a lithography patterning chamber and a second environment. The load lock forms an inner space that is enclosed by a wall that forms the inner space. The load lock includes a first door that faces the lithography patterning chamber and a second door that faces the second environment. The load lock is at least during part of the transfer vented with a gas that is essentially free from at least one of particles, oxygen, hydrocarbon, and H2O.

    摘要翻译： 本发明涉及光刻投影装置和通过光刻图案化室和第二环境之间的负载锁转移物体的方法。 装载锁形成一个由形成内部空间的墙围住的内部空间。 负载锁定包括面向光刻图案化室的第一门和面向第二环境的第二门。 至少在传送的一部分期间，负载锁定与基本上没有颗粒，氧气，烃和H 2 O中的至少一种的气体排出。

    Lithographic apparatus and device manufacturing method
    5.
    发明申请
    Lithographic apparatus and device manufacturing method 失效

    公开(公告)号：US20050280798A1

    公开(公告)日：2005-12-22

    申请号：US10892394

    申请日：2004-07-16

    申请人： Jan Kuit ,  Petrus Bartray ,  Dirk Bijvoet ,  Jan Hoogkamp

    发明人： Jan Kuit ,  Petrus Bartray ,  Dirk Bijvoet ,  Jan Hoogkamp

    IPC分类号： G03B27/58 ,  G03F7/20

    CPC分类号： G03F7/7075 ,  Y10S414/14

    摘要： A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.

    Lithographic Apparatus, Support, Device Manufacturing Method, and a Method of Supporting
    6.
    发明申请
    Lithographic Apparatus, Support, Device Manufacturing Method, and a Method of Supporting 审中-公开
    平版印刷设备，支持，设备制造方法和支持方法

    公开(公告)号：US20070228295A1

    公开(公告)日：2007-10-04

    申请号：US10562211

    申请日：2004-12-23

    申请人： Dirk-Jan Bijvoet ,  Jan Hoogkamp

    发明人： Dirk-Jan Bijvoet ,  Jan Hoogkamp

    IPC分类号： G21K5/10 ,  B23Q1/25

    CPC分类号： G03F7/70691

    摘要： A lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; wherein the support is arranged to subject, at least when the support is accelerated, a first side of the patterning device to at least one first force normal to the direction of the acceleration so that an acceleration of the patterning device with respect to the support is counteracted by frictional forces occurring at a contact area between the patterning device and the support, wherein the support is associated with a clamping device which is arranged to subject a second side of the patterning device to at least one second force, at least when the support is accelerated.

    摘要翻译： 一种光刻设备，包括：被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 其中所述支撑件布置成至少当所述支撑件被加速时使所述图案形成装置的第一侧至少一个垂直于所述加速度方向的第一力，使得所述图案形成装置相对于所述支撑件的加速度为 通过在图案形成装置和支撑件之间的接触区域处产生的摩擦力抵消，其中支撑件与夹持装置相关联，该夹紧装置布置成将图案形成装置的第二侧承受至少一个第二力，至少在支撑件 加速了

    Lithographic apparatus and device manufacturing method
    7.
    发明申请
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号：US20060087636A1

    公开(公告)日：2006-04-27

    申请号：US10969244

    申请日：2004-10-21

    申请人： Jan Kuit ,  Jan Hoogkamp ,  Hubert Segers ,  Raimond Visser ,  Johannes Maquine

    发明人： Jan Kuit ,  Jan Hoogkamp ,  Hubert Segers ,  Raimond Visser ,  Johannes Maquine

    IPC分类号： G03B27/58

    CPC分类号： G03F7/70741

    摘要： The present invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam; a patterning device support constructed to support a patterning device, the patterning device placed on the patterning device support being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a patterning device handling apparatus, including a single robot for exchanging a patterning device with the patterning device support and a loading station, wherein the robot includes a first holding device configured to hold a patterning device in a first holding position and a second holding device configured to hold a patterning device in a second holding position. Such single robot makes a rapid and accurate exchange of patterning devices possible.

    摘要翻译： 本发明提供一种光刻设备，其包括配置成调节辐射束的照明系统; 构造成支撑图案形成装置的图案形成装置支撑件，放置在图案形成装置支撑件上的图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 配置成将图案化的辐射束投射到基板的目标部分上的投影系统，以及包括用于与图案形成装置支撑件和装载站更换图案形成装置的单个机器人的图案形成装置处理装置，其中，所述机器人包括第一 保持装置，其构造成将图案形成装置保持在第一保持位置，以及第二保持装置，其构造成将图案形成装置保持在第二保持位置。 这种单机器人可以快速准确地交换图案形成装置。

    Lithographic apparatus and device manufacturing method
    8.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20060066833A1

    公开(公告)日：2006-03-30

    申请号：US11015763

    申请日：2004-12-20

    申请人： Jan Kuit ,  Dirk Bijvoet ,  Jan Hoogkamp ,  Hubert Segers ,  Raimond Visser ,  Johannes Maquine

    发明人： Jan Kuit ,  Dirk Bijvoet ,  Jan Hoogkamp ,  Hubert Segers ,  Raimond Visser ,  Johannes Maquine

    IPC分类号： G03B27/58

    CPC分类号： G03F7/70733

    摘要： The present invention relates to a lithographic apparatus including a projection system configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate support, the patterned beam of radiation being patterned with a patterning device held by a patterning device support. The lithographic apparatus includes an exchangeable object handling apparatus for exchanging an exchangeable object with a exchangeable object station and a support, the exchangeable object being one of the substrate and the patterning device and the support being one of the substrate support and the patterning device support, the exchangeable object handling apparatus including an intermediate holding device for holding an exchangeable object, which intermediate holding device can interact with the support to place an exchangeable object on or take an exchangeable object from the support, and a robot which can exchange an exchangeable object with the support, the intermediate holding device and said exchangeable object station.

    摘要翻译： 本发明涉及一种包括投影系统的光刻设备，该投影系统被配置为将图案化的辐射束投影到保持在基板支撑件上的基板的目标部分上，图案化的辐射束被图案化装置支撑的图案形成装置图案化。 光刻设备包括可交换物体处理装置，用于与可交换物体站和支撑体交换可交换物体，可交换物体是基板和图案形成装置之一，支撑体是基板支撑件和图案形成装置支架之一， 所述可交换物体处理装置包括用于保持可更换物体的中间保持装置，所述中间保持装置可以与所述支撑件相互作用以将可更换对象放置在所述支撑件上或从所述支撑件获取可更换物体;以及机器人，其可以与 支撑件，中间保持装置和所述可更换对象站。

    Lithographic apparatus and device manufacturing method
    9.
    发明申请
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号：US20050280797A1

    公开(公告)日：2005-12-22

    申请号：US10871528

    申请日：2004-06-21

    申请人： Jan Kuit ,  Petrus Bartray ,  Dirk Bijvoet ,  Jan Hoogkamp

    发明人： Jan Kuit ,  Petrus Bartray ,  Dirk Bijvoet ,  Jan Hoogkamp

    IPC分类号： G03B27/58 ,  G03F7/20

    CPC分类号： G03F7/70733 ,  G03F7/7075 ,  H01L21/67742 ,  Y10S414/14

    摘要： A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.

    摘要翻译： 提出了一种具有改进的转印单元的光刻设备。 光刻设备包括处理单元，该处理单元执行涉及可更换物体的光刻处理，其中处理单元包括提供辐射束的照明系统，支撑结构，其被配置为支撑图案形成装置，所述图案形成装置将期望的图案赋予辐射束 ，被配置为保持衬底的衬底保持器，以及配置成将所述图案化的光束投影到所述衬底的目标部分上的投影系统。 光刻设备还包括包括单个机器人的传送单元。 单个机器人被配置为将第一可交换对象从加载站传送到处理单元，并将第二可更换对象从处理单元传送到放电站。

    Lithographic apparatus and device manufacturing method
    10.
    发明申请
    Lithographic apparatus and device manufacturing method 失效

    公开(公告)号：US20050280788A1

    公开(公告)日：2005-12-22

    申请号：US10927532

    申请日：2004-08-27

    申请人： Jan Kuit ,  Petrus Bartray ,  Dirk Bijvoet ,  Jan Hoogkamp

    发明人： Jan Kuit ,  Petrus Bartray ,  Dirk Bijvoet ,  Jan Hoogkamp

    IPC分类号： G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/70733 ,  G03F7/7075

    摘要： A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.