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    OPTICAL PICKUP AND OPTICAL DISC APPARATUS
    1.
    发明申请
    OPTICAL PICKUP AND OPTICAL DISC APPARATUS 审中-公开
    光学拾取和光盘设备

    公开(公告)号：US20070247996A1

    公开(公告)日：2007-10-25

    申请号：US11695801

    申请日：2007-04-03

    申请人： Satoshi Kawakita ,  Motoo Aiba ,  Kyu Kanno ,  Jin Sato ,  Takatoshi Yamada

    发明人： Satoshi Kawakita ,  Motoo Aiba ,  Kyu Kanno ,  Jin Sato ,  Takatoshi Yamada

    IPC分类号： G11B7/00

    CPC分类号： G11B7/1275 ,  G11B7/1353 ,  G11B7/13922 ,  G11B2007/0006

    摘要： An optical pickup includes: a light source that emits first, second and third wavelengths of optical beam; and an objective lens unit including a diffraction element whose one surface includes a first diffraction pattern where the first wavelength is diffracted while the second and third wavelengths pass through and whose other surface includes a second diffraction pattern where the second wavelength is diffracted while the first and third wavelengths pass through; and an objective lens that collects the optical beam from the diffraction element, wherein the second and third wavelengths traveling through the objective lens unit are on the optical axis of the objective lens unit while the first wavelength traveling through the objective lens unit have an angle with respect to the optical axis; and the first diffraction pattern is located at a position so as to minimize aberration of the first wavelength of optical beam.

    摘要翻译： 光拾取器包括：发射第一，第二和第三波长的光束的光源; 以及物镜单元，其包括衍射元件，所述衍射元件的一个表面包括第一波长衍射的第一衍射图案，而第二和第三波长通过，并且其另一个表面包括第二衍射图案，其中第二波长被衍射， 第三波长通过; 以及从衍射元件收集光束的物镜，其中通过物镜单元行进的第二和第三波长在物镜单元的光轴上，而穿过物镜单元的第一波长与 相对于光轴; 并且第一衍射图案位于使得光束的第一波长的像差最小的位置。

    DIFFRACTION ELEMENT, OBJECTIVE LENS UNIT, OPTICAL PICKUP AND OPTICAL DISC APPARATUS
    2.
    发明申请
    DIFFRACTION ELEMENT, OBJECTIVE LENS UNIT, OPTICAL PICKUP AND OPTICAL DISC APPARATUS 失效
    衍射元件，目标透镜单元，光学拾取器和光盘设备

    公开(公告)号：US20070230311A1

    公开(公告)日：2007-10-04

    申请号：US11684133

    申请日：2007-03-09

    申请人： Satoshi Kawakita ,  Motoo Aiba ,  Kyu Kanno ,  Jin Sato ,  Takatoshi Yamada

    发明人： Satoshi Kawakita ,  Motoo Aiba ,  Kyu Kanno ,  Jin Sato ,  Takatoshi Yamada

    IPC分类号： G11B7/00

    CPC分类号： G11B7/1374 ,  G02B5/1895 ,  G11B7/1353 ,  G11B2007/0006

    摘要： A diffraction element for diffracting a particular wavelength of incident optical beam includes: a base section made from a first resin and provided with a predetermined diffraction pattern; and a cover section made from a second resin and covering the diffraction pattern, wherein a rate of change of refraction index of the first resin is substantially the same as a rate of change of refraction index of the second resin in a temperature range between a first temperature and a second temperature.

    摘要翻译： 用于衍射入射光束的特定波长的衍射元件包括：由第一树脂制成并具有预定衍射图案的基部; 以及由第二树脂制成并覆盖衍射图案的覆盖部分，其中第一树脂的折射率变化率与第一树脂的第一树脂之间的温度范围内的第二树脂的折射率变化率基本相同， 温度和第二温度。

    DIFFRACTION ELEMENT, OPTICAL PICKUP AND OPTICAL DISC APPARATUS
    3.
    发明申请
    DIFFRACTION ELEMENT, OPTICAL PICKUP AND OPTICAL DISC APPARATUS 审中-公开
    衍射元件，光学拾取器和光盘设备

    公开(公告)号：US20070229930A1

    公开(公告)日：2007-10-04

    申请号：US11690344

    申请日：2007-03-23

    申请人： Jin Sato ,  Takatoshi Yamada ,  Satoshi Kawakita ,  Kyu Kanno ,  Motoo Aiba

    发明人： Jin Sato ,  Takatoshi Yamada ,  Satoshi Kawakita ,  Kyu Kanno ,  Motoo Aiba

    IPC分类号： G02B26/08

    CPC分类号： G11B7/13922 ,  G11B7/1353 ,  G11B7/22 ,  G11B2007/0006

    摘要： A diffraction element includes: an injection-molded transparent first member having two optical surfaces; and a second member firmly attached to one of the optical surfaces of the first member and provided with a first diffraction pattern on a surface, wherein the second member is a first ultraviolet curable resin having a refraction index in a range of ±0.013 with respect to a refraction index of the first member.

    摘要翻译： 衍射元件包括：具有两个光学表面的注塑成型透明第一元件; 以及第二构件，其牢固地附接到所述第一构件的一个光学表面并且在表面上设置有第一衍射图案，其中所述第二构件是第一紫外线固化树脂，其折射率在±0.013的范围内，相对于 第一成员的折射率。

    Diffraction element, objective lens unit, optical pickup and optical disc apparatus
    4.
    发明授权
    Diffraction element, objective lens unit, optical pickup and optical disc apparatus 失效
    衍射元件，物镜单元，光学拾取器和光盘装置

    公开(公告)号：US07715300B2

    公开(公告)日：2010-05-11

    申请号：US11684133

    申请日：2007-03-09

    申请人： Satoshi Kawakita ,  Motoo Aiba ,  Kyu Kanno ,  Jin Sato ,  Takatoshi Yamada

    发明人： Satoshi Kawakita ,  Motoo Aiba ,  Kyu Kanno ,  Jin Sato ,  Takatoshi Yamada

    IPC分类号： G11B7/00

    CPC分类号： G11B7/1374 ,  G02B5/1895 ,  G11B7/1353 ,  G11B2007/0006

    摘要： A diffraction element for diffracting a particular wavelength of incident optical beam includes: a base section made from a first resin and provided with a predetermined diffraction pattern; and a cover section made from a second resin and covering the diffraction pattern, wherein a rate of change of refraction index of the first resin is substantially the same as a rate of change of refraction index of the second resin in a temperature range between a first temperature and a second temperature.

    摘要翻译： 用于衍射入射光束的特定波长的衍射元件包括：由第一树脂制成并具有预定衍射图案的基部; 以及由第二树脂制成并覆盖衍射图案的覆盖部分，其中第一树脂的折射率变化率与第一树脂的第一树脂之间的温度范围内的第二树脂的折射率变化率基本相同， 温度和第二温度。

    METHOD FOR PRODUCING WAVELENGTH PLATE
    7.
    发明申请
    METHOD FOR PRODUCING WAVELENGTH PLATE 审中-公开
    生产波长板的方法

    公开(公告)号：US20130177717A1

    公开(公告)日：2013-07-11

    申请号：US13806960

    申请日：2011-06-23

    申请人： Nobuyuki Koike ,  Takatoshi Yamada ,  Akio Takada ,  Masatoshi Sasaki

    发明人： Nobuyuki Koike ,  Takatoshi Yamada ,  Akio Takada ,  Masatoshi Sasaki

    IPC分类号： C23C16/40

    CPC分类号： C23C16/40 ,  C23C14/226 ,  C23C14/5806 ,  G02B5/3083

    摘要： To produce a wavelength plate that is superior in durability and stability and has a high moisture resistant property. A dielectric material is obliquely vapor deposited on a substrate so as to form a birefringent layer that has columnar portions in each of which fine particles of the dielectric material are stacked in a columnar shape, and interstices that are respectively formed between the columnar portions, and the birefringent layer is subjected to an annealing treatment at a temperature within the range of 100° C. or more to 300° C. or less. Then, a protective film with low moisture permeability is formed on the annealed birefringent layer by forming an inorganic compound on the birefringent layer at high density.

    摘要翻译： 制造耐久性和稳定性优异且耐湿性高的波长板。 将电介质材料倾斜地气相沉积在基片上以形成双折射层，该双折射层具有柱状部分，其中每一个电介质材料的细颗粒以柱状形式堆叠，并且间隔分别形成在柱状部分之间，并且 在100℃以上300℃以下的温度下对双折射层进行退火处理。 然后，通过在双折射层上以高密度形成无机化合物，在退火的双折射层上形成具有低透湿性的保护膜。

    Polishing pad and semiconductor device manufacturing method
    9.
    发明授权
    Polishing pad and semiconductor device manufacturing method 有权
    抛光垫和半导体器件的制造方法

    公开(公告)号：US07731568B2

    公开(公告)日：2010-06-08

    申请号：US10598717

    申请日：2004-10-20

    申请人： Tetsuo Shimomura ,  Masahiko Nakamori ,  Takatoshi Yamada ,  Kazuyuki Ogawa ,  Atsushi Kazuno ,  Masahiro Watanabe

    发明人： Tetsuo Shimomura ,  Masahiko Nakamori ,  Takatoshi Yamada ,  Kazuyuki Ogawa ,  Atsushi Kazuno ,  Masahiro Watanabe

    IPC分类号： B24B7/00 ,  B24B7/19 ,  B24B5/00 ,  B24B29/00 ,  B24D11/00

    CPC分类号： B24B37/205 ,  H01L21/30625

    摘要： The object of the invention is to provide a polishing pad capable of maintaining high-precision end-point optical detection over a long period from the start of use to the end of use even if polishing is performed with an alkaline or acid slurry, as well as a method of manufacturing a semiconductor device with this polishing pad. The polishing pad of the invention is used in chemical mechanical polishing and has a polishing region and a light-transmitting region, wherein the light-transmitting region satisfies that the difference ΔT (ΔT=T0−T1) (%) between T0 and T1 is within 10(%) over the whole range of measurement wavelengths of from 400 to 700 nm, wherein T1 is the light transmittance (%) of the light-transmitting region measured at the measurement wavelength λ after dipping for 24 hours in a KOH aqueous solution at pH 11 or an H2O2 aqueous solution at pH 4 and T0 is the light-transmittance (%) measured at the measurement wavelength λ before the dipping.

    摘要翻译： 本发明的目的是提供一种抛光垫，即使在用碱性或酸性浆料进行研磨的同时，也能够在从使用开始到使用结束的长时间内保持高精度的端点光学检测 作为使用该研磨垫的半导体装置的制造方法。 本发明的抛光垫用于化学机械抛光，并具有抛光区域和透光区域，其中透光区域满足以下区别：Dgr; T（＆Dgr; T = T0-T1）（％） T0和T1在400〜700nm的测量波长的整个范围内在10（％）以内，其中T1是在浸渍24小时后在测量波长λ测量的透光区域的透光率（％） pH为11的KOH水溶液或pH4的H 2 O 2水溶液，T0为在浸渍前测定的波长λ下测定的透光率（％）。