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1.发明授权公开(公告)号：US08809111B2
公开(公告)日：2014-08-19
申请号：US13502584
申请日：2010-10-20
IPC分类号： H01L51/40
CPC分类号： G03F7/11 , G03F7/0046 , H01L51/0016 , H01L51/0039 , H01L51/0043
摘要： Methods and compositions for obtaining patterned structures comprising fluorine-containing polymeric materials. The fluorine-containing polymeric materials have sufficient fluorine content such that the materials can be patterned using conventional photolithographic/pattern transfer methods and maintain desirable mechanical and physical properties. The patterned structures can be used, for example, in light-emitting devices.
摘要翻译： 用于获得包含含氟聚合材料的图案结构的方法和组合物。 含氟聚合材料具有足够的氟含量，使得可以使用常规的光刻/图案转移方法对材料进行图案化并保持所需的机械和物理性能。 图案化结构可以用于例如发光器件中。
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2.发明申请公开(公告)号：US20120305897A1
公开(公告)日：2012-12-06
申请号：US13502584
申请日：2010-10-20
IPC分类号： H01L51/50
CPC分类号： G03F7/11 , G03F7/0046 , H01L51/0016 , H01L51/0039 , H01L51/0043
摘要： Methods and compositions for obtaining patterned structures comprising fluorine-containing polymeric materials. The fluorine-containing polymeric materials have sufficient fluorine content such that the materials can be patterned using conventional photolithographic/pattern transfer methods and maintain desirable mechanical and physical properties. The patterned structures can be used, for example, in light-emitting devices.
摘要翻译： 用于获得包含含氟聚合材料的图案结构的方法和组合物。 含氟聚合材料具有足够的氟含量，使得可以使用常规的光刻/图案转移方法对材料进行图案化并保持所需的机械和物理性能。 图案化结构可以用于例如发光器件中。
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公开(公告)号：US11484393B2
公开(公告)日：2022-11-01
申请号：US16566936
申请日：2019-09-11
申请人： Jin-Kyun Lee
发明人： Jin-Kyun Lee
摘要： An object of the present invention is to provide forceps for removing a dental implant fixture, in which pinching portions securely hold a fixture to remove the fixture implanted in an alveolar bone, and thus to prevent the pinching portions from slipping out of the fixture. Forceps for removing a dental implant fixture according to the exemplary embodiment of the present invention include: a pair of handles; coupling portions extended from the handles, crossed, and hingedly coupled; pinching portions connected to the coupling portions; and holding pieces protruding from ends of the pinching portions in a direction toward a center of a dental implant fixture and each having an arc corresponding to at least a part of an outer circumference of the fixture so that the holding pieces are inserted into a trough of a threaded portion formed on the outer circumference of the fixture.
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4.发明申请Patterning of Biomaterials Using Fluorinated Materials and Fluorinated Solvents 有权使用氟化材料和氟化溶剂的生物材料图案化公开(公告)号：US20130115430A1
公开(公告)日：2013-05-09
申请号：US13582082
申请日：2011-03-01
摘要： A method for patterning biomaterials is presented. The biomaterials exhibit biological activity after patterning. The use of bio-compatible imaging materials and solvents allows conventional lithographic patterning methods to be applied to patterning biomolecules. The method allows deposition of multiple layers without subsequent layers affecting earlier laid deposits and can pattern multiple different biomolecules on a single surface.
摘要翻译： 提出了生物材料图案的方法。 生物材料在图案化后表现出生物活性。 使用生物相容的成像材料和溶剂允许将常规的平版印刷图案化方法应用于图案化生物分子。 该方法允许沉积多层而没有后续层影响较早沉积的沉积物，并且可以在单个表面上图案化多个不同的生物分子。
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5.发明申请Orthogonal Procesing of Organic Materials Used in Electronic and Electrical Devices 有权用于电子电气设备的有机材料的正交处理公开(公告)号：US20110159252A1
公开(公告)日：2011-06-30
申请号：US12994353
申请日：2009-05-21
申请人： Christopher K. Ober , George Malliaras , Jin-Kyun Lee , Alexander Zakhidov , Margarita Chatzichristidi , Priscilla Taylor
发明人： Christopher K. Ober , George Malliaras , Jin-Kyun Lee , Alexander Zakhidov , Margarita Chatzichristidi , Priscilla Taylor
CPC分类号： G03F7/20 , G03F7/0046 , G03F7/0048 , G03F7/0392 , G03F7/16 , G03F7/30 , G03F7/325 , G03F7/40 , H01L51/0018 , Y02E10/549 , Y10T428/24802
摘要： An orthogonal process for photolithographic patterning organic structures is disclosed. The disclosed process utilizes fluorinated solvents or supercritical CO2 as the solvent so that the performance of the organic conductors and semiconductors would not be adversely affected by other aggressive solvent. One disclosed method may also utilize a fluorinated photoresist together with the HFE solvent, but other fluorinated solvents can be used. In one embodiment, the fluorinated photoresist is a resorcinarene, but various fluorinated polymer photoresists and fluorinated molecular glass photoresists can be used as well. For example, a copolymer perfluorodecyl methacrylate (FDMA) and 2-nitrobenzyl methacrylate (NBMA) is a suitable orthogonal fluorinated photoresist for use with fluorinated solvents and supercritical carbon dioxide in a photolithography process. The combination of the fluorinated photoresist and the fluorinated solvent provides a robust, orthogonal process that is yet to be achieved by methods or devices known in the art.
摘要翻译： 公开了一种用于光刻图案化有机结构的正交方法。 所公开的方法使用氟化溶剂或超临界CO 2作为溶剂，使得有机导体和半导体的性能不会受其它侵蚀性溶剂的不利影响。 一种公开的方法也可以与HFE溶剂一起使用氟化光致抗蚀剂，但也可以使用其它氟化溶剂。 在一个实施方案中，氟化光致抗蚀剂是间苯二酚，但是也可以使用各种氟化聚合物光致抗蚀剂和氟化分子玻璃光致抗蚀剂。 例如，甲基丙烯酸全氟癸基酯共聚物（FDMA）和甲基丙烯酸2-硝基苄酯（NBMA）是在光刻工艺中与氟化溶剂和超临界二氧化碳一起使用的合适的正交氟化光致抗蚀剂。 氟化光致抗蚀剂和氟化溶剂的组合提供了通过本领域已知的方法或装置尚未实现的鲁棒的正交方法。
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6.发明授权Patterning of biomaterials using fluorinated materials and fluorinated solvents 有权使用氟化材料和氟化溶剂的生物材料图案化公开(公告)号：US09259759B2
公开(公告)日：2016-02-16
申请号：US13582082
申请日：2011-03-01
摘要： A method for patterning biomaterials is presented. The biomaterials exhibit biological activity after patterning. The use of bio-compatible imaging materials and solvents allows conventional lithographic patterning methods to be applied to patterning biomolecules. The method allows deposition of multiple layers without subsequent layers affecting earlier laid deposits and can pattern multiple different biomolecules on a single surface.
摘要翻译： 提出了生物材料图案的方法。 生物材料在图案化后表现出生物活性。 使用生物相容的成像材料和溶剂允许将常规的平版印刷图案化方法应用于图案化生物分子。 该方法允许沉积多层而没有后续层影响较早沉积的沉积物，并且可以在单个表面上图案化多个不同的生物分子。
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公开(公告)号：US20140322850A1
公开(公告)日：2014-10-30
申请号：US13638049
申请日：2011-04-27
申请人： Jin-Kyun Lee , Alexander Zakhidov , John Defranco
发明人： Jin-Kyun Lee , Alexander Zakhidov , John Defranco
CPC分类号： H01L51/0002 , G03F7/0046 , G03F7/0048 , G03F7/0392 , G03F7/325 , G03F7/40 , H01L51/0018 , H01L51/0023 , H01L51/56 , Y02E10/549
摘要： The present invention provides a method for forming an organic device having a patterned conductive layer that includes providing a substrate, depositing organic materials over the substrate to form one or more organic layers, coating a photoresist solution over the one or more organic layers to form a photo-patternable layer, wherein the solution includes a fluorinated photoresist material and a first fluorinated solvent, selectively exposing portions of the photo-patternable layer to radiation to form a first pattern of exposed fluorinated photoresist material and a second pattern of unexposed fluorinated photoresist material, exposing the substrate to a second fluorinated solvent to develop the photo-patternable layer, removing the second pattern of unexposed fluorinated photoresist material without removing the first pattern of exposed fluorinated photoresist material, coating one or more conductive layers over the one or more organic layers and removing a portion of the one or more of the conductive layers to form a pattern. Particular embodiments of the present invention for forming arrays of top contact TFTs and a pixilated organic device are also provided.
摘要翻译： 本发明提供一种用于形成具有图案化导电层的有机器件的方法，其包括提供衬底，在衬底上沉积有机材料以形成一个或多个有机层，在一个或多个有机层上涂覆光致抗蚀剂溶液以形成 光刻图层，其中所述溶液包括氟化光致抗蚀剂材料和第一氟化溶剂，选择性地将可光可图层的部分暴露于辐射以形成暴露的氟化光致抗蚀剂材料的第一图案和未曝光的氟化光致抗蚀剂材料的第二图案， 将衬底暴露于第二氟化溶剂以显影光可图案层，除去未曝光的氟化光致抗蚀剂材料的第二图案，而不去除暴露的氟化光致抗蚀剂材料的第一图案，在一个或多个有机层上涂覆一个或多个导电层，以及 删除一部分或一部分 e的导电层以形成图案。 还提供了用于形成顶部接触TFT阵列和像素化有机器件的本发明的特定实施例。
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公开(公告)号：US08871545B2
公开(公告)日：2014-10-28
申请号：US13638062
申请日：2011-04-27
申请人： Jin-Kyun Lee , Alexander Zakhidov , John DeFranco
发明人： Jin-Kyun Lee , Alexander Zakhidov , John DeFranco
IPC分类号： H01L21/00 , H01L51/40 , G03F7/004 , H01L51/56 , H01L51/00 , G03F7/32 , H05B33/10 , H01L27/32
CPC分类号： H01L51/0016 , G03F7/0046 , G03F7/325 , H01L27/3206 , H01L27/3211 , H01L27/3281 , H01L51/0018 , H01L51/504 , H01L51/56 , H05B33/10
摘要： A method is provided for forming a multi-color OLED device that includes providing a substrate, coating the substrate with a fluorinated photoresist solution to form a first photo-patternable layer and exposing it to produce a first pattern of exposed fluorinated photoresist material and a second pattern of unexposed fluorinated photoresist material, developing the photo-patternable layer with a fluorinated solvent to remove the second pattern of unexposed fluorinated photoresist material without removing the first pattern of exposed fluorinated photoresist material, depositing a first organic light-emitting material over the substrate to form a first organic light-emitting layer for emitting a first color of light and applying the first pattern of exposed fluorinated photoresist material to control the removal of a portion of the first organic light-emitting layer. A second fluorinated photoresist solution is then coated over the first patterened organic light-emitting layer and exposed to form a third pattern of exposed fluorinated photoresist material having a pattern different from the first pattern and a fourth pattern of unexposed fluorinated photoresist material, and developing the photo-patternable layer in a fluorinated solvent to remove the fourth pattern of unexposed fluorinated photoresist material without removing the third pattern of exposed fluorinated photoresist material, depositing at least a second light-emitting material to form a second light-emitting layer for emitting a second color of light that is different than the first color of light and applying the third pattern of exposed fluorinated photoresist material to control the removal of a portion of the second organic light-emitting layer.
摘要翻译： 提供了一种用于形成多色OLED器件的方法，其包括提供衬底，用氟化光致抗蚀剂溶液涂覆衬底以形成第一可光刻图层并使其暴露以产生暴露的氟化光致抗蚀剂材料的第一图案，并且第二 未曝光的氟化光致抗蚀剂材料的图案，用氟化溶剂显影光图案层以除去未曝光的氟化光致抗蚀剂材料的第二图案，而不去除暴露的氟化光致抗蚀剂材料的第一图案，将第一有机发光材料沉积在衬底上 形成用于发射第一颜色的光的第一有机发光层，并施加暴露的氟化光致抗蚀剂材料的第一图案以控制去除第一有机发光层的一部分。 然后将第二氟化光致抗蚀剂溶液涂覆在第一光刻的有机发光层上并暴露以形成具有不同于第一图案的图案和未曝光的氟化光致抗蚀剂材料的第四图案的暴露的氟化光致抗蚀剂材料的第三图案， 在氟化溶剂中的光图案化层，以去除未曝光的氟化光致抗蚀剂材料的第四图案，而不去除暴露的氟化光致抗蚀剂材料的第三图案，沉积至少第二发光材料以形成第二发光层，用于发射第二 与第一颜色的光不同的光的颜色，并施加暴露的氟化光致抗蚀剂材料的第三图案，以控制第二有机发光层的一部分的去除。
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9.发明授权Methods of making patterned structures of materials, patterned structures of materials, and methods of using same 有权制造材料的图案结构，材料的图案化结构及其使用方法的方法公开(公告)号：US09389511B2
公开(公告)日：2016-07-12
申请号：US14005964
申请日：2012-03-19
CPC分类号： G03F7/16 , B81C1/00031 , B81C2201/0149 , G03F7/0002 , G03F7/038 , H01L21/027 , Y10T428/24851
摘要： A method for forming patterns of organic polymer materials. The method can be used to form a layer with two patterned organic polymer materials. The photoresist and solvents used in the photoresist deposition and removal steps do not substantially affect the organic polymer materials.
摘要翻译： 一种形成有机聚合物材料图案的方法。 该方法可用于形成具有两个图案化有机聚合物材料的层。 在光致抗蚀剂沉积和去除步骤中使用的光致抗蚀剂和溶剂基本上不影响有机聚合物材料。
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10.发明授权Orthogonal processing of organic materials used in electronic and electrical devices 有权用于电子和电气设备的有机材料的正交处理公开(公告)号：US08846301B2
公开(公告)日：2014-09-30
申请号：US12994353
申请日：2009-05-21
申请人： Christopher K. Ober , George Malliaras , Jin-Kyun Lee , Alexander Zakhidov , Margarita Chatzichristidi , Priscilla Taylor
发明人： Christopher K. Ober , George Malliaras , Jin-Kyun Lee , Alexander Zakhidov , Margarita Chatzichristidi , Priscilla Taylor
CPC分类号： G03F7/20 , G03F7/0046 , G03F7/0048 , G03F7/0392 , G03F7/16 , G03F7/30 , G03F7/325 , G03F7/40 , H01L51/0018 , Y02E10/549 , Y10T428/24802
摘要： An orthogonal process for photolithographic patterning organic structures is disclosed. The disclosed process utilizes fluorinated solvents or supercritical CO2 as the solvent so that the performance of the organic conductors and semiconductors would not be adversely affected by other aggressive solvent. One disclosed method may also utilize a fluorinated photoresist together with the HFE solvent, but other fluorinated solvents can be used. In one embodiment, the fluorinated photoresist is a resorcinarene, but various fluorinated polymer photoresists and fluorinated molecular glass photoresists can be used as well. For example, a copolymer perfluorodecyl methacrylate (FDMA) and 2-nitrobenzyl methacrylate (NBMA) is a suitable orthogonal fluorinated photoresist for use with fluorinated solvents and supercritical carbon dioxide in a photolithography process. The combination of the fluorinated photoresist and the fluorinated solvent provides a robust, orthogonal process that is yet to be achieved by methods or devices known in the art.
摘要翻译： 公开了一种用于光刻图案化有机结构的正交方法。 所公开的方法使用氟化溶剂或超临界CO 2作为溶剂，使得有机导体和半导体的性能不会受其它侵蚀性溶剂的不利影响。 一种公开的方法也可以与HFE溶剂一起使用氟化光致抗蚀剂，但也可以使用其它氟化溶剂。 在一个实施方案中，氟化光致抗蚀剂是间苯二酚，但是也可以使用各种氟化聚合物光致抗蚀剂和氟化分子玻璃光致抗蚀剂。 例如，甲基丙烯酸全氟癸基酯共聚物（FDMA）和甲基丙烯酸2-硝基苄酯（NBMA）是在光刻工艺中与氟化溶剂和超临界二氧化碳一起使用的合适的正交氟化光致抗蚀剂。 氟化光致抗蚀剂和氟化溶剂的组合提供了通过本领域已知的方法或装置尚未实现的鲁棒的正交方法。
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