摘要:
A filter assembly, panel filter element, and servicing method is provided for reducing inlet flow restriction from a housing inlet into an inlet plenum and reducing outlet flow restriction from an outlet plenum to a housing outlet.
摘要:
A filter assembly, panel filter element, and servicing method is provided for reducing inlet flow restriction from a housing inlet into an inlet plenum and reducing outlet flow restriction from an outlet plenum to a housing outlet.
摘要:
The present invention relates to a back sheet for solar cell and a method of manufacturing the same. The back sheet for solar cell comprises a substrate and a fluoropolymer layer, wherein the components by weight of the fluoropolymer layer are as follows: 25˜45 parts of fluororesin; 1.5˜3 parts of modified resin; 0.5˜3 parts of polymeric filler; 0.1˜1 parts of inorganic filler; and 50˜70 parts of solvent. The back sheet for solar cell provided by the present invention has low cost and excellent performances, such as high peeling strength, good waterproof performance, and good weathering resistance. The method of manufacturing the back sheet for solar cell provided by the present invention is simple in process, and thus can achieve continuous industrial production.
摘要:
The present invention relates to a back sheet for solar cell and a method of manufacturing the same. The back sheet for solar cell comprises a substrate and a fluoropolymer layer, wherein the components by weight of the fluoropolymer layer are as follows: 25˜45 parts of fluororesin; 1.5˜3 parts of modified resin; 0.5˜3 parts of polymeric filler; 0.1˜1 parts of inorganic filler; and 50˜70 parts of solvent. The back sheet for solar cell provided by the present invention has low cost and excellent performances, such as high peeling strength, good waterproof performance, and good weathering resistance. The method of manufacturing the back sheet for solar cell provided by the present invention is simple in process, and thus can achieve continuous industrial production.
摘要:
An apparatus having a multiple gas injection port system for providing a high uniform etching rate across the substrate is provided. In one embodiment, the apparatus includes a nozzle in the semiconductor processing apparatus having a hollow cylindrical body having a first outer diameter defining a hollow cylindrical sleeve and a second outer diameter defining a tip, a longitudinal passage formed longitudinally through the body of the hollow cylindrical sleeve and at least partially extending to the tip, and a lateral passage formed in the tip coupled to the longitudinal passage, the lateral passage extending outward from the longitudinal passage having an opening formed on an outer surface of the tip.
摘要:
A method and apparatus are provided for plasma etching a substrate in a processing chamber. A focus ring assembly circumscribes a substrate support, providing uniform processing conditions near the edge of the substrate. The focus ring assembly comprises two rings, a first ring and a second ring, the first ring comprising quartz, and the second ring comprising monocrystalline silicon, silicon carbide, silicon nitride, silicon oxycarbide, silicon oxynitride, or combinations thereof. The second ring is disposed above the first ring near the edge of the substrate, and creates a uniform electric field and gas composition above the edge of the substrate that results in uniform etching across the substrate surface.
摘要:
Methods for treating landfill leachate taught herein comprise: (a) coagulatively settling leachate; (b) filtering the resultant supernatant liquid through multistage cartridges; (c) filtering the filtered liquid by reverse osmosis; and (d) treating the resultant liquid with chlorine-based oxidant. These methods provide the advantages of efficient wastewater treatment, compact equipment size, short process flow, and low startup and operational costs.