Method for producing image contrast by phase shifting in electron optics
    1.
    发明授权
    Method for producing image contrast by phase shifting in electron optics 有权
    用于通过电子光学中的相移产生图像对比度的方法

    公开(公告)号:US07973289B2

    公开(公告)日:2011-07-05

    申请号:US12405279

    申请日:2009-03-17

    IPC分类号: G01N23/00

    CPC分类号: H01J37/263 H01J2237/2614

    摘要: According to the invention, the image contrast in electron optics can be improved without causing aberrations that are no longer tolerable by using, for production and correction of the at least one anamorphic image, quadrupole fields before and after this image whose extent in the direction of the optical axis is equal to at least twice their focal length, and wherein at least one of the axial rays, by an appropriate choice of the magnification M of the intermediate image, enters the quadrupole field before the at least one anamorphic image at a slope 1/M such that a length of the anamorphic image is achieved at which any aberrations caused are still within a tolerable range. The invention also relates to devices for implementing this method.

    摘要翻译: 根据本发明,可以改善电子光学中的图像对比度,而不会引起不能容忍的像差,用于生成和校正至少一个变形图像,该图像之前和之后的四极场的程度在 光轴等于其焦距的至少两倍,并且其中通过适当选择中间图像的放大率M的轴向光线中的至少一个在斜率的至少一个变形图像之前进入四极场 1 / M,使得实现了导致任何像差的变形图像的长度仍然在可容许的范围内。 本发明还涉及用于实现该方法的装置。

    Detector objective for scanning microscopes
    2.
    发明授权
    Detector objective for scanning microscopes 失效
    扫描显微镜检测器的目的

    公开(公告)号:US4896036A

    公开(公告)日:1990-01-23

    申请号:US150245

    申请日:1988-01-29

    CPC分类号: H01J37/28 H01J37/141

    摘要: In a high resolution imaging system for close inspection of sub-micrometer structures, a scanning electron microscope includes a detector objective essentially composed of an immersion lens and an annular detector which is arranged between a source side electrode lying at a positive potential and a middle electrode of the immersion lens which likewise lies at a variable positive potential and is arranged concentrically relative to a beam axis of a scanning microscope. The middle electrode and the source side electrode are preferrably formed as truncated cones. The two-stage deflection element for positioning the primary electron beam on the specimen is preferrably integrated into the source side electrode of the immersion lens, the source side electrode being composed of an annular diaphragm and a hollow cylinder.

    摘要翻译: 在用于仔细检查亚微米结构的高分辨率成像系统中,扫描电子显微镜包括基本上由浸没透镜组成的检测器物镜和布置在位于正电位的源极电极和中间电极之间的环形检测器 的浸没透镜同样位于可变的正电位并且相对于扫描显微镜的光束轴线同心地布置。 中间电极和源极电极优选地形成为截锥体。 用于将一次电子束定位在试样上的两级偏转元件优选地集成到浸没透镜的源极侧电极中,源极电极由环形隔膜和中空圆筒构成。

    Corrector for axial and off-axial beam paths
    3.
    发明授权
    Corrector for axial and off-axial beam paths 有权
    用于轴向和离轴光束路径的校正器

    公开(公告)号:US07807965B2

    公开(公告)日:2010-10-05

    申请号:US12230632

    申请日:2008-09-03

    IPC分类号: H01J37/153 H01J37/26 G21K1/08

    摘要: A corrector (1) for the axial and off-axial beam path of a particle-optical system, comprises a first (10) and a second (20) correction piece, which are disposed one behind the other in the beam path (2) on an optical axis (3). Each correction piece (10, 20) comprises four successive multipole elements (11, 12, 13, 14; 24, 23, 22, 21) disposed symmetrically with respect to a center plane (5) and with the following fields: wherein the first (11; 24) and the fourth (14; 21) multipole elements of the multipole elements (11, 12, 13, 14; 24, 23, 22, 21) are used to generate quadrupole fields (11′, 14′; 24′, 21′) and the second (12; 23) and third (13; 22) are used to generate octupole fields (12′″, 13′″; 23′″,22′″) and quadrupole fields (12′, 13′; 23′,22′), wherein the latter are superposed magnetic (12′, 13′; 23′, 22′) and electric fields (12″, 13″; 23″, 22″), wherein the quadrupole fields (11′, 12′, 13′, 14′; 24′, 23′, 22′, 21′) of all four multipole elements (11, 12, 13, 14; 24, 23, 22,21) are rotated from one to the next through 90°. An astigmatism of third order is corrected by a central multipole element disposed in the center plane and generating an octupole field.

    摘要翻译: 一种用于粒子光学系统的轴向和非轴向光束路径的校正器(1)包括在光束路径(2)中一个在另一个之后设置的第一(10)和第二(20)校正片, 在光轴(3)上。 每个校正件(10,20)包括相对于中心平面(5)对称设置的四个连续的多极元件(11,12,13,14,24,23,22,21),并具有以下场:其中第一 (11; 24)和多极元件(11,12,13,14; 24,23,22,21)的第四(14; 21)多极元件用于产生四极场(11',14'; 24 ',21')和第二(12; 23)和第三(13; 22)用于产生八极场(12“,13”“23”“22”“)和四极场(12' 13'; 23',22'),其中后者是重叠的磁(12',13'; 23',22')和电场(12“,13”; 23“,22”),其中四极场 所有四个多极元件(11,12,13,14; 24,23,22,21)的所述四个多极元件(11,12,13,14; 24,23,22,21)的所述四个多极元件(11',12',13',14'; 24',23',22',21' 一个到下一个到90°。 通过设置在中心平面中的中心多极元件校正三阶散光并产生八极场。

    Particle beam blanking system
    5.
    发明授权
    Particle beam blanking system 失效
    粒子束消隐系统

    公开(公告)号:US4623794A

    公开(公告)日:1986-11-18

    申请号:US612850

    申请日:1984-05-22

    CPC分类号: H01J37/045

    摘要: In a corpuscular-optical beam path, the generation of short electron pulses with steep leading edges is to be effected without a probe movement in the probe plane taking place. For this purpose, the particle beam blanking system comprises at least two deflection systems and a knife edge arranged between two deflection systems in an intermediate image plane, the operating parameters of the deflection systems and the knife edge being matched to the energy distribution of the particles in such a fashion that shifting of the particle beam in the probe plane disappears.

    摘要翻译: 在红外光束路径中,具有尖锐前沿的短电子脉冲的产生将在探针平面发生时没有探针移动的情况下实现。 为此,粒子束消隐系统包括至少两个偏转系统和布置在中间像平面中的两个偏转系统之间的刀刃,偏转系统的操作参数和刀刃与颗粒的能量分布相匹配 使得探针平面中的粒子束的移动消失。

    Method
    6.
    发明申请
    Method 有权
    方法

    公开(公告)号:US20100213369A1

    公开(公告)日:2010-08-26

    申请号:US12405279

    申请日:2009-03-17

    IPC分类号: G01N23/00 G21K7/00

    CPC分类号: H01J37/263 H01J2237/2614

    摘要: The invention relates to a method for producing image contrast by phase shifting in the electron optics, wherein, from an intermediate image (5), an anamorphic image (6, 6′) of the axial rays (xα, yβ) is produced by quadrupole fields (Q1′, Q2′, Q3′; Q11′, Q12′, Q13′) with simultaneous passage through zero of the field rays (xγ, yδ) in at least one diffraction intermediate image plane (8, 8′), where a relative phase shift between a region (14) around the electron beam of zeroth order of diffraction (13) and the electron beams of higher orders of diffraction (15) is caused by a magnetic or electric field (9, 9′), and thereafter the at least one anamorphosis of the beam path produced is corrected again by further quadrupole fields (Q4′, Q5′; Q13′, Q14′, Q15′). According to the invention, the image contrast can be further improved without causing aberrations that are no longer tolerable by using, for production and correction of the at least one anamorphic image (6, 6′), quadrupole fields (Q2′, Q4′; Q12′, Q14′) before and after this image (6, 6′) whose extent in the direction of the optical axis (10) is equal to at least twice their focal length, and wherein at least one of the axial rays (xα, yβ), by an appropriate choice of the magnification M of the intermediate image (5), enters the quadrupole field (Q2′, Q12′) before the at least one anamorphic image (6, 6′) at a slope 1/M such that a length (7) of the anamorphic image (6, 6′) is achieved at which any aberrations caused are still within a tolerable range. The invention also relates to devices for implementing this method.

    摘要翻译: 本发明涉及通过电子光学器件中的相移产生图像对比度的方法,其中,从中间图像(5),通过以下方式产生轴向射线(xα,y&bgr)的变形图像(6,6'), 在至少一个衍射中间像平面(8,8')中同时穿过场射线(xγ,yδ)的零点的四极场(Q1',Q2',Q3'; Q11',Q12',Q13' 其中绕着衍射(13)的电子束周围的区域(14)和较高衍射级(15)的电子束之间的相对相移由磁场或电场(9,9')引起, 此后,通过另外的四极场(Q4',Q5'; Q13',Q14',Q15'再次校正产生的光束路径的至少一个变形。 根据本发明,可以进一步改善图像对比度,而不会导致用于生成和校正至少一个变形图像(6,6'),四极场(Q2',Q4'; ...)的不再容忍的像差。 Q12',Q14')在其在光轴(10)的方向上的程度等于它们的焦距的至少两倍的该图像(6,6')之前和之后,并且其中至少一个轴向射线 通过适当选择中间图像(5)的放大倍率M,在斜率1/2的至少一个变形图像(6,6')之前进入四极场(Q2',Q12'), 使得实现变形图像(6,6')的长度(7),其中所引起的任何像差仍然在可容许的范围内。 本发明还涉及用于实现该方法的装置。

    Corrector for axial and off-axial beam paths
    7.
    发明申请
    Corrector for axial and off-axial beam paths 有权
    用于轴向和离轴光束路径的校正器

    公开(公告)号:US20090146056A1

    公开(公告)日:2009-06-11

    申请号:US12230632

    申请日:2008-09-03

    IPC分类号: G01N23/00

    摘要: A corrector (1) for the axial and off-axial beam path of a particle-optical system, comprises a first (10) and a second (20) correction piece, which are disposed one behind the other in the beam path (2) on an optical axis (3). Each correction piece (10, 20) comprises four successive multipole elements (11, 12, 13, 14; 24, 23, 22, 21) disposed symmetrically with respect to a center plane (5) and with the following fields: wherein the first (11; 24) and the fourth (14; 21) multipole elements of the multipole elements (11, 12, 13, 14; 24, 23, 22, 21) are used to generate quadrupole fields (11′, 14′; 24′, 21′) and the second (12; 23) and third (13; 22) are used to generate octupole fields (12′″, 13′″;23′″,22′″) and quadrupole fields (12′, 13′; 23′,22′), wherein the latter are superposed magnetic (12′, 13′; 23′, 22′) and electric fields (12″, 13″; 23″, 22″), wherein the quadrupole fields (11′, 12′, 13′, 14′; 24′, 23′, 22′, 21′) of all four multipole elements (11, 12, 13, 14; 24, 23, 22,21) are rotated from one to the next through 90°. An astigmatism of third order is corrected by a central multipole element disposed in the center plane and generating an octupole field.

    摘要翻译: 一种用于粒子光学系统的轴向和非轴向光束路径的校正器(1)包括在光束路径(2)中一个在另一个之后设置的第一(10)和第二(20)校正片, 在光轴(3)上。 每个校正件(10,20)包括相对于中心平面(5)对称设置的四个连续的多极元件(11,12,13,14,24,23,22,21),并具有以下场:其中第一 (11; 24)和多极元件(11,12,13,14; 24,23,22,21)的第四(14; 21)多极元件用于产生四极场(11',14'; 24 ',21')和第二(12; 23)和第三(13; 22)用于产生八极场(12“',13”',23“',22”')和四极场 (12',13'; 23',22'),其中后者是重叠的磁体(12',13'; 23',22')和电场(12“,13”; 23“,22' “),其中所有四个多极元件(11,12,13,14; 24,23)的四极场(11',12',13',14'; 24',23',22',21' ,22,21)从一个向下旋转90°。 通过设置在中心平面中的中心多极元件校正三阶散光并产生八极场。

    Multipole coils
    8.
    发明申请
    Multipole coils 失效
    多极线圈

    公开(公告)号:US20090084975A1

    公开(公告)日:2009-04-02

    申请号:US12232638

    申请日:2008-09-22

    IPC分类号: H01J3/14

    摘要: Multipole coils (1, 2, 3, 4, 5, 6) for influencing particle beams have at least two coils (1, 2) which concentrically enclose an imaginary axis (10), wherein a winding (7) made from a flexible circuit board (8) is formed by means of conducting paths (9) disposed thereon for each coil (1, 2, 3, 4, 5, 6) and the circuit boards (8) are rolled into at least one circuit board layer (11, 12, 13, 14). Multipole coils of this kind (1, 2, 3, 4, 5, 6) are utilized for aberration correction in particle optics, wherein the windings (7) of the multipole coils (1, 2, 3, 4, 5, 6) form windows (16) whose width in the peripheral direction is chosen in such a fashion that no secondary interfering fields occur and whose length in the axial direction corresponds at least to its width.

    摘要翻译: 用于影响粒子束的多极线圈(1,2,3,4,5,6)具有至少两个同心地围绕虚轴(10)的线圈(1,2),其中由柔性电路制成的绕组(7) 板(8)通过为每个线圈(1,2,3,4,5,6)设置在其上的导电路径(9)形成,并且电路板(8)被卷入至少一个电路板层(11 ,12,13,14)。 这种多极线圈(1,2,3,4,5,6)用于粒子光学中的像差校正,其中多极线圈(1,2,3,4,5,6)的绕组(7) 选择圆周方向宽度的窗口(16),使得不产生二次干涉场,并且其在轴向上的长度至少等于其宽度。

    Corrector
    9.
    发明授权
    Corrector 有权
    校正者

    公开(公告)号:US07781742B2

    公开(公告)日:2010-08-24

    申请号:US12213493

    申请日:2008-06-20

    申请人: Joachim Zach

    发明人: Joachim Zach

    摘要: The invention concerns a corrector (10) for chromatic and aperture aberration correction in a scanning electron microscope or a scanning transmission electron microscope, comprising four multipole elements (1, 2, 3, 4) which are consecutively disposed in the optical path (9), the first (1) and fourth (4) of which are used to generate quadrupole fields (5, 6) and the second (2) and third (3) of which are used to generate octupole fields (11, 12) and quadrupole fields (7, 7′, 8, 8′), wherein the latter are superposed magnetic (7, 8) and electric (7′, 8′) fields, and wherein the quadrupole fields (5, 6, 7, 8) of all four multipole elements (1, 2, 3, 4) are successively rotated with respect to one another through 90°. Elimination of errors up to fifth order can be realized with a corrector (10) of this type in that the second (2) and the third (3) multipole elements are designed as twelve-pole elements, and an additional twelve-pole element (13) is inserted between the second (2) and the third (3) multipole element, and is loaded with current and/or voltage, such that an octupole field (14) is generated that is superposed by a twelve-pole field (15).

    摘要翻译: 本发明涉及一种用于扫描电子显微镜或扫描透射电子显微镜中的彩色和孔径像差校正的校正器(10),包括连续设置在光路(9)中的四个多极元件(1,2,3,4) ,其第一(1)和第四(4)用于产生四极场(5,6)和第二(2)和第三(3)用于产生八极场(11,12)和四极杆 (7,7',8,8'),其中后者是重叠的磁(7,8)和电(7',8')场,并且其中四极场(5,6,7,8) 所有四个多极元件(1,2,3,4)相对于彼此依次旋转90°。 可以用这种校正器(10)来实现高达五级的误差的消除,因为第二(2)和第三(3)多极元件被设计为十二极元件和另外的十二极元件 13)插入在第二(2)和第三(3)多极元件之间,并且被加载电流和/或电压,使得产生由十二极场(15)叠加的八极场(14) )。

    Method for detecting geometrical-optical aberrations
    10.
    发明授权
    Method for detecting geometrical-optical aberrations 有权
    几何光学像差检测方法

    公开(公告)号:US06858844B2

    公开(公告)日:2005-02-22

    申请号:US10181706

    申请日:2000-12-20

    申请人: Joachim Zach

    发明人: Joachim Zach

    CPC分类号: H01J37/153

    摘要: The invention relates to a method for determining geometrical-optical aberrations up to and including 3rd order in particle-optical, probe-forming systems, in particular scanning electron microscopes, comprising an essentially punctiform source, lenses, an object, and a detector, the image being recorded, the process being repeated with an overfocussed and an underfocussed beam, the images being transformed in Fourier space, the transformation of the overfocussed image, and the underfocussed image is divided by the transformed focussed image. The results are reverse transformed, and the brightness profiles of the probes, the images of the source, are determined in overfocus and underfocus. The asymmetry, the width and/or the curvature of the profile being determined in the center, and the image aberration being determined from the differences.

    摘要翻译: 本发明涉及一种用于在粒子光学,探针形成系统,特别是扫描电子显微镜中确定直至并包括3阶的几何光学像差的方法,其包括基本上点状的源,透镜,物体和检测器, 正在记录的图像,该过程是用过度聚焦和欠焦距的波束重复的,图像在傅立叶空间中变换,过焦点图像的变换和欠焦点图像被转换的聚焦图像分割。 结果被反向转换,并且探测器的亮度分布图,源的图像在过焦和欠焦距中确定。 在中心确定轮廓的不对称性,宽度和/或曲率,并且根据差异确定图像像差。