公开(公告)号：US07193231B2

公开(公告)日：2007-03-20

申请号：US10648785

申请日：2003-08-27

申请人： Joeri Lof ,  Fransiscus Godefridus Casper Bijnen ,  Henricus Wilhelmus Maria Van Buel ,  Cheng-Qun Gui

发明人： Joeri Lof ,  Fransiscus Godefridus Casper Bijnen ,  Henricus Wilhelmus Maria Van Buel ,  Cheng-Qun Gui

IPC分类号： G01B11/00

CPC分类号： G03F9/7084 ,  G03F9/7076

摘要： An optical element is placed in the alignment beam during alignment. The optical element serves to focus the alignment beam onto the substrate alignment mark when it is at a different focal length from the front surface of the substrate.

摘要翻译： 在对准期间将光学元件放置在对准光束中。 当光学元件处于与衬底的前表面不同的焦距时，该光学元件用于将对准光束聚焦到衬底对准标记上。

公开(公告)号：US06936385B2

公开(公告)日：2005-08-30

申请号：US10374510

申请日：2003-02-27

申请人： Joeri Lof ,  Henricus Wilhelmus Maria Van Buel ,  Cheng-Qun Gui ,  Fransiscus Godefridus Casper Bijnen

发明人： Joeri Lof ,  Henricus Wilhelmus Maria Van Buel ,  Cheng-Qun Gui ,  Fransiscus Godefridus Casper Bijnen

IPC分类号： G03F9/02 ,  G03F9/00 ,  H01L21/027 ,  G01B11/00 ,  G03B27/42 ,  G03C5/00

CPC分类号： G03F9/7019 ,  G03F9/7011 ,  G03F9/7084

摘要： To calibrate a front-to-backside alignment system a transparent calibration substrate with reference markers on opposite sides is used. A plane plate is inserted to displace the focal position of the alignment system from the top to bottom surface of the calibration substrate.

摘要翻译： 为了校准前后对齐系统，使用带有相对侧的参考标记的透明校准基板。 插入平板以从校准基板的顶面到底面移动对准系统的焦点位置。

公开(公告)号：US07420676B2

公开(公告)日：2008-09-02

申请号：US10900393

申请日：2004-07-28

申请人： Joeri Lof ,  Fransiscus Godefridus Casper Bijnen ,  Henricus Wilhelmus Maria Van Buel ,  Gerardus Johannes Joseph Keijsers ,  Robertus Victorius Maria Scheepens

发明人： Joeri Lof ,  Fransiscus Godefridus Casper Bijnen ,  Henricus Wilhelmus Maria Van Buel ,  Gerardus Johannes Joseph Keijsers ,  Robertus Victorius Maria Scheepens

IPC分类号： G01B11/00 ,  G03F9/00 ,  G03C5/00

CPC分类号： G03F9/7088 ,  G03F9/7003 ,  G03F9/7015 ,  G03F9/708 ,  G03F9/7084

摘要： In a method of measuring front to backside alignment error according to one embodiment, a transparent substrate has a plurality of marks on both the front and backside. The relative location of the marks on the front and backside of the substrate is determined to calculate the front to backside alignment error for the whole substrate. In a further embodiment, the substrate is rotated by 180° within the plane of the substrate and the front relative location of the marks is again determined.

摘要翻译： 在根据一个实施例的测量前后对准误差的方法中，透明基板在前侧和后侧具有多个标记。 确定基板正面和背面上的标记的相对位置以计算整个基板的正面到背面对准误差。 在另一个实施例中，衬底在衬底的平面内旋转180°，并再次确定标记的前部相对位置。

公开(公告)号：US07113258B2

公开(公告)日：2006-09-26

申请号：US10939999

申请日：2004-09-14

申请人： Henricus Wilhelmus Maria Van Buel ,  Keith Frank Best ,  Joseph J. Consolini ,  Joeri Lof ,  Edwin Ross Shafer

发明人： Henricus Wilhelmus Maria Van Buel ,  Keith Frank Best ,  Joseph J. Consolini ,  Joeri Lof ,  Edwin Ross Shafer

IPC分类号： G03B27/42 ,  G03B27/58 ,  G01B11/00 ,  G03B27/52

CPC分类号： G03F7/70691 ,  G03F7/70341 ,  G03F9/7084

摘要： A lithographic projection apparatus is provided with an optical system built into the wafer table for producing an image of a wafer mark that is provided on the back side of the wafer. The image is located at the plane of the front side of the wafer and can be viewed by an alignment system from the front side of the wafer. Simultaneous alignment between marks on the back and front of the wafer and a mask can be performed using a pre-existing alignment system. The lithographic projection apparatus is further provided with immersion system for providing a fluid between the lens and the substrate.

摘要翻译： 光刻投影装置设置有内置在晶片台中的光学系统，用于产生设置在晶片背面的晶片标记的图像。 图像位于晶片正面的平面上，并且可以通过对准系统从晶片的正面观察。 可以使用预先存在的对准系统来执行晶片背面和前面的标记与掩模之间的同时对准。 光刻投影装置还设置有用于在透镜和基板之间提供流体的浸没系统。

公开(公告)号：US07239393B2

公开(公告)日：2007-07-03

申请号：US10871699

申请日：2004-06-21

申请人： Arno Jan Bleeker ,  Henricus Wilhelmus Maria Van Buel ,  Joeri Lof

发明人： Arno Jan Bleeker ,  Henricus Wilhelmus Maria Van Buel ,  Joeri Lof

IPC分类号： G01B11/00

CPC分类号： G03F9/7019 ,  G03F7/70291 ,  G03F9/7011

摘要： A calibration method comprising generating a pattern with an array of individually controllable elements, providing a substrate table with a radiation sensor, using radiation to generate an image of the pattern at the substrate table, moving at least one of the generated pattern and the substrate table relative to each other in order to move the image relative to the sensor, detecting radiation intensity with the sensor, and calculating a calibration establishing a relationship between coordinates of the coordinate system of the array of individually controllable elements and coordinates of the coordinate system of the substrate table, based on the detected intensity and the positions of the array of individually controllable elements and the substrate table.

摘要翻译： 一种校准方法，包括用独立可控元件的阵列生成图案，使用辐射来提供具有辐射传感器的衬底台，以在衬底台上产生图案的图像，移动所生成的图案和衬底台中的至少一个 相对于彼此相对于传感器移动图像，利用传感器检测辐射强度，并且计算建立单独可控元件的阵列的坐标系的坐标与坐标系的坐标之间的关系的校准 基于检测到的强度和单独可控元件阵列的位置和基板台。

公开(公告)号：US09195153B2

公开(公告)日：2015-11-24

申请号：US13692865

申请日：2012-12-03

申请人： Joeri Lof ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

发明人： Joeri Lof ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

IPC分类号： G03B27/52 ,  G03F9/00 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

摘要： A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.

公开(公告)号：US09057967B2

公开(公告)日：2015-06-16

申请号：US12512754

申请日：2009-07-30

申请人： Joeri Lof ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Helmar Van Santen

发明人： Joeri Lof ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Helmar Van Santen

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system configured to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface configured to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

摘要翻译： 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 投影系统，被配置为将图案化的光束投影到基板的目标部分上; 被配置为保持所述基板的基板台，所述基板台包括支撑表面，所述支撑表面被构造成支撑所述投影系统与所述基板和位于所述基板台上的物体中的至少一个之间的中间板，并且不与所述至少一个 的基材和物体; 以及液体供应系统，其构造成在所述投影系统和所述基板和所述物体中的至少一个之间的空间中提供待投射所述光束的液体。

公开(公告)号：US08797503B2

公开(公告)日：2014-08-05

申请号：US13149404

申请日：2011-05-31

申请人： Joeri Lof ,  Antonius Theodorus Anna Maria Derksen ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

发明人： Joeri Lof ,  Antonius Theodorus Anna Maria Derksen ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

摘要： In a lithographic apparatus, a liquid supply system to provide a liquid to a space between the table and an optical element and to contact a surface of the optical element, the space having a cross-sectional area smaller than the area of the substrate, the liquid supply system comprising a liquid confinement structure extending along at least a part of a boundary of the space between the optical element surface and the table, wherein at least part of the liquid confinement structure is positioned between the optical element surface and the table, the at least part of the liquid confinement structure has an aperture through which the patterned beam can pass, the liquid confinement structure comprises an inlet to supply the liquid to the space above the aperture, and the liquid confinement structure comprises an outlet to remove the liquid, supplied by the inlet, from the space below the aperture.

摘要翻译： 在光刻设备中，液体供应系统将液体提供到工作台与光学元件之间的空间并与光学元件的表面相接触，该空间的横截面积小于衬底的面积， 液体供应系统包括沿着光学元件表面和工作台之间的空间的边界的至少一部分延伸的液体限制结构，其中液体限制结构的至少一部分位于光学元件表面和工作台之间， 所述液体限制结构的至少一部分具有所述图案化束可以穿过的孔，所述液体限制结构包括将所述液体供应到所述孔上方的空间的入口，并且所述液体限制结构包括用于除去所述液体的出口， 由入口提供，从孔下方的空间。

公开(公告)号：US08711323B2

公开(公告)日：2014-04-29

申请号：US11482121

申请日：2006-07-07

申请人： Bob Streefkerk ,  Antonius Theodorus Anna Maria Derksen ,  Joeri Lof ,  Klaus Simon ,  Alexander Straaijer

发明人： Bob Streefkerk ,  Antonius Theodorus Anna Maria Derksen ,  Joeri Lof ,  Klaus Simon ,  Alexander Straaijer

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/68 ,  G03B27/54 ,  G03B27/58

CPC分类号： G03F7/70875 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70891

摘要： An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.

公开(公告)号：US08208120B2

公开(公告)日：2012-06-26

申请号：US12078997

申请日：2008-04-09

申请人： Joeri Lof ,  Antonius Theodorus Anna Maria Derksen ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen ,  Sjoerd Nicolaas Lambertus Donders

发明人： Joeri Lof ,  Antonius Theodorus Anna Maria Derksen ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen ,  Sjoerd Nicolaas Lambertus Donders

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.

摘要翻译： 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在结构和衬底的表面之间使用气体以在空间中容纳液体。