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    Calibration method for a lithographic apparatus and device manufacturing method
    1.
    发明授权
    Calibration method for a lithographic apparatus and device manufacturing method 有权
    光刻设备的校准方法及器件制造方法

    公开(公告)号：US07239393B2

    公开(公告)日：2007-07-03

    申请号：US10871699

    申请日：2004-06-21

    申请人： Arno Jan Bleeker ,  Henricus Wilhelmus Maria Van Buel ,  Joeri Lof

    发明人： Arno Jan Bleeker ,  Henricus Wilhelmus Maria Van Buel ,  Joeri Lof

    IPC分类号： G01B11/00

    CPC分类号： G03F9/7019 ,  G03F7/70291 ,  G03F9/7011

    摘要： A calibration method comprising generating a pattern with an array of individually controllable elements, providing a substrate table with a radiation sensor, using radiation to generate an image of the pattern at the substrate table, moving at least one of the generated pattern and the substrate table relative to each other in order to move the image relative to the sensor, detecting radiation intensity with the sensor, and calculating a calibration establishing a relationship between coordinates of the coordinate system of the array of individually controllable elements and coordinates of the coordinate system of the substrate table, based on the detected intensity and the positions of the array of individually controllable elements and the substrate table.

    摘要翻译： 一种校准方法，包括用独立可控元件的阵列生成图案，使用辐射来提供具有辐射传感器的衬底台，以在衬底台上产生图案的图像，移动所生成的图案和衬底台中的至少一个 相对于彼此相对于传感器移动图像，利用传感器检测辐射强度，并且计算建立单独可控元件的阵列的坐标系的坐标与坐标系的坐标之间的关系的校准 基于检测到的强度和单独可控元件阵列的位置和基板台。

    Inspection apparatus and method
    2.
    发明授权
    Inspection apparatus and method 有权
    检验仪器及方法

    公开(公告)号：US09304077B2

    公开(公告)日：2016-04-05

    申请号：US13166384

    申请日：2011-06-22

    申请人： Lucas Henricus Johannes Stevens ,  Arno Jan Bleeker

    发明人： Lucas Henricus Johannes Stevens ,  Arno Jan Bleeker

    IPC分类号： G01N21/00 ,  G01N21/17 ,  G01N21/956

    CPC分类号： G01N21/1717 ,  G01N21/00 ,  G01N21/95623

    摘要： Ghost reflections in a catadioptric scatterometer objective are excluded from an angle-resolved spectrum measurement by using a partial pupil for illumination and for the measurement excluding the area of the pupil plane that has been illuminated. Ghost reflections are reflected back into same point in the pupil plane. The ghost reflections do not interfere with the signal in the non-illuminated area of the pupil plane. An illumination system provides a beam of electromagnetic radiation to illuminate a first area in an illumination pupil plane of the objective. The objective is arranged as to illuminate the substrate with the beam of electromagnetic radiation. The illumination pupil plane is the back projected image of the pupil plane of the objective and is also imaged into the measurement pupil plane at the back focal plane of the objective, via auxiliary optics. A detector is configured to measure an angle resolved spectrum arising from the illumination of the substrate, in a measurement area of the measurement pupil plane of the objective excluding an area corresponding to the first area.

    摘要翻译： 通过使用用于照明的部分光瞳和除了被照明的光瞳面的区域之外的测量，从角度分辨光谱测量中排除反射折射式散射仪物镜中的鬼反射。 幽灵反射回到瞳孔平面上的相同点。 幽灵反射不影响瞳孔平面的非照明区域中的信号。 照明系统提供电磁辐射束以照射物镜的照明光瞳平面中的第一区域。 该目的被布置为用电磁辐射束照射基板。 照明光瞳平面是物镜的光瞳平面的背投影像，并且还通过辅助光学器件在物镜的后焦平面处成像到测量光瞳平面中。 检测器被配置为测量除了与第一区域相对应的区域之外的物镜的测量光瞳平面的测量区域中由基板照射产生的角度分辨光谱。

    Lithographic apparatus and device manufacturing method utilizing multiple die designs on a substrate using a data buffer that stores pattern variation data
    5.
    发明授权
    Lithographic apparatus and device manufacturing method utilizing multiple die designs on a substrate using a data buffer that stores pattern variation data 有权
    使用存储图案变化数据的数据缓冲器在衬底上利用多个管芯设计的平版印刷设备和器件制造方法

    公开(公告)号：US07728956B2

    公开(公告)日：2010-06-01

    申请号：US11098607

    申请日：2005-04-05

    申请人： Arno Jan Bleeker ,  Kars Zeger Troost ,  Adrianus Johannes Henricus Maas

    发明人： Arno Jan Bleeker ,  Kars Zeger Troost ,  Adrianus Johannes Henricus Maas

    IPC分类号： G03B27/32

    CPC分类号： G03F7/70508 ,  G03F7/70275 ,  G03F7/70291

    摘要： A lithographic system and method are provided that allow for variations of a basic device design to be generated without substantially increasing the cost of the data path hardware. The lithographic apparatus includes an array of individually controllable elements, a control system, a first data buffer, and a second data buffer. The control system provides control signals to the array of individually controllable elements. The first data buffer stores pattern data that corresponds to a pattern to be exposed on a plurality of areas on the substrate. The second data buffer stores pattern variation data, corresponding to at least one change to a part of the pattern. The control system is configured, such that at least one variation of the pattern is exposed on one of the areas on the substrate with the pattern variation data.

    摘要翻译： 提供了一种光刻系统和方法，其允许在不显着增加数据路径硬件的成本的情况下生成基本设备设计的变化。 光刻设备包括独立可控元件阵列，控制系统，第一数据缓冲器和第二数据缓冲器。 控制系统向独立可控元件阵列提供控制信号。 第一数据缓冲器存储对应于要暴露在基板上的多个区域上的图案的图案数据。 第二数据缓冲器存储对应于图案的一部分的至少一个改变的图案变化数据。 控制系统被配置为使得图案的至少一个变化在图案变化数据的基板上的一个区域上露出。

    Imaging apparatus
    9.
    发明授权
    Imaging apparatus 有权
    成像设备

    公开(公告)号：US07379579B2

    公开(公告)日：2008-05-27

    申请号：US10496630

    申请日：2002-11-27

    申请人： Karel Diederick Van Der Mast ,  Arno Jan Bleeker

    发明人： Karel Diederick Van Der Mast ,  Arno Jan Bleeker

    IPC分类号： G06K9/00

    CPC分类号： G03F7/70516 ,  G03F7/70291 ,  G03F7/70425

    摘要： An imaging apparatus having an illuminator configured to condition a beam of radiation having a wavelength equal to or shorter than 365 nm; a support structure to support a programmable patterning device, the programmable patterning device configured to pattern the beam according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a beam splitter located between the programmable patterning device and the substrate table configured to divert aside a portion of the patterned beam; and an image detector configured to analyze the portion of the patterned beam.

    摘要翻译： 一种成像装置，具有配置成调节波长等于或小于365nm的辐射束的照明器; 用于支撑可编程图案形成装置的支撑结构，所述可编程图案形成装置被配置为根据期望图案对所述光束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 位于所述可编程图案形成装置和所述衬底台之间的分束器，其被配置为将所述图案化束的一部分转向旁边; 以及被配置为分析图案化束的部分的图像检测器。

    Lithographic apparatus and device manufacturing method
    10.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07161661B2

    公开(公告)日：2007-01-09

    申请号：US10895999

    申请日：2004-07-22

    申请人： Arno Jan Bleeker

    发明人： Arno Jan Bleeker

    IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/54

    CPC分类号： G03F7/7005 ,  G03F7/70291

    摘要： In one embodiment, a pulse-to-pulse dose reproducibility of a radiation system for use in maskless lithography is improved by providing a plurality of lasers and combining the radiation beams produced by each to form a single projection beam of radiation.

    摘要翻译： 在一个实施例中，通过提供多个激光器并组合由每个激光器产生的辐射束以形成单个投影辐射束来改善用于无掩模光刻的辐射系统的脉冲 - 脉冲剂量再现性。