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    Layer configuration with improved stability to sunlight exposure
    1.
    发明授权
    Layer configuration with improved stability to sunlight exposure 有权
    层状结构具有改善的阳光照射的稳定性

    公开(公告)号：US07147936B2

    公开(公告)日：2006-12-12

    申请号：US10642933

    申请日：2003-08-18

    申请人： Frank Louwet ,  Geert Van Dyck ,  Johan Loccufier ,  Bert Groenendaal ,  Hieronymus Andriessen

    发明人： Frank Louwet ,  Geert Van Dyck ,  Johan Loccufier ,  Bert Groenendaal ,  Hieronymus Andriessen

    IPC分类号： C07D211/021 ,  H01L51/50

    CPC分类号： C08G61/126 ,  C08L25/08 ,  C08L2666/06 ,  C09J165/00 ,  H01G11/48 ,  H01G11/56 ,  Y02E60/13 ,  Y10S428/917

    摘要： A layer configuration on a support, the layer configuration comprising a layer containing a polymer containing optionally substituted 3,4-alkylenedioxythiophene structural units, in which the two alkoxy groups may be the same or different or together represent an optionally substituted oxy-alkylene-oxy bridge, and a compound selected from the group consisting of polyphosphoric acids, polyphosphoric acid salts, thia-alkanedicarboxylic acids, cyclohexadiene compounds and polyhydroxy-compounds selected from the group consisting of tetronic acid derivatives; ortho-dihydroxybenzene compounds with at least one sulpho group, compounds according to formula (I): HO—CH2—CH(OH)—(CH2)m—S—CH2—C(R1)(R2)—CH2—S—(CH2)n—CH(OH)—CH2—OH  (I) wherein R1 and R2 are independently H, —OH or alkyl, and n and m are independently 1, 2 or 3; compounds according to formula (II): HO—(CH2)p—S—CH2—S—(CH2)q—OH  (II) wherein p and q are independently 2, 3 or 4; compounds hydrolyzable to tetronic acid derivatives; compounds hydrolyzable to compounds according to formula (I); and sulpho-substituted 2-thia-alkyl-benzimidazole compounds.

    摘要翻译： 在支撑体上的层构型，该层构型包括含有含有任选取代的3,4-亚烷基二氧噻吩结构单元的聚合物的层，其中两个烷氧基可以相同或不同，或一起代表任选取代的氧基 - 桥，以及选自多磷酸，多磷酸盐，硫杂烷二羧酸，环己二烯化合物和选自由以下组成的组的多羟基化合物的化合物：四氢酸衍生物; 具有至少一个磺酸基的邻二羟基苯化合物，根据式（I）的化合物：<？in-line-formula description =“In-line formula”end =“lead”？> HO-CH 2 -CH（OH） - （CH 2 CH 2）m -S- CH 2 -C（R 1） （R 2） - CH 2 -S-（CH 2）n - （CH 2）n - （CH 2） -CH 2 -O-OH（I）<β在线公式描述=“在线式”末端=“尾”→其中R 1和R 2， SUP> 2独立地是H，-OH或烷基，n和m独立地是1,2或3; 根据式（II）的化合物：<？in-line-formula description =“In-line Formulas”end =“lead”？> HO-（CH 2） > -S-CH 2 -S-（CH 2）2 -O-OH（II）<β在线配方说明书=“ 其中p和q独立地为2,3或4; 可水解成四氢酸衍生物的化合物; 可水解成根据式（I）的化合物的化合物的化合物; 和磺基取代的2-硫代 - 烷基 - 苯并咪唑化合物。

    Method for preparing a conductive polythiophene layer at low temperature
    2.
    发明授权
    Method for preparing a conductive polythiophene layer at low temperature 有权
    在低温下制备导电聚噻吩层的方法

    公开(公告)号：US06333145B1

    公开(公告)日：2001-12-25

    申请号：US09433971

    申请日：1999-11-04

    申请人： Tom Cloots ,  Johan Loccufier ,  Frank Louwet ,  Hieronymus Andriessen

    发明人： Tom Cloots ,  Johan Loccufier ,  Frank Louwet ,  Hieronymus Andriessen

    IPC分类号： G03C185

    CPC分类号： H01B1/127 ,  H01G9/028 ,  H01G11/48 ,  H01G11/56 ,  H01L51/5203 ,  Y02E60/13

    摘要： A method for producing a polymeric conductive layer on an object comprising the steps of: providing an aqueous composition containing a polythiophene, a polyanion compound and an aprotic compound with a dielectric constant, &egr;, ≧15, applying said composition to said object forming a layer and drying said layer to form a conductive polymeric layer on said object, characterised in that during said production said object and said layer are kept at a temperature below 100° C. and said conductive polymeric layer has a resistivity of at most 2 k&OHgr;/square.

    摘要翻译： 一种用于在物体上制备聚合物导电层的方法，包括以下步骤：提供含有聚噻吩，聚阴离子化合物和介质常数εi= 15的非质子化合物的水性组合物，将所述组合物施加到所述物体上形成 层和干燥所述层以在所述物体上形成导电聚合物层，其特征在于，在所述生产期间，所述物体和所述层保持在低于100℃的温度，并且所述导电聚合物层具有至多2kOMEGA /平方的电阻率 。

    Lithographic printing plate comprising bi-functional compounds
    3.
    发明申请
    Lithographic printing plate comprising bi-functional compounds 有权
    含有双功能化合物的平版印刷版

    公开(公告)号：US20070105041A1

    公开(公告)日：2007-05-10

    申请号：US11546830

    申请日：2006-10-12

    申请人： Johan Loccufier ,  Hieronymus Andriessen

    发明人： Johan Loccufier ,  Hieronymus Andriessen

    IPC分类号： G03C1/00

    CPC分类号： B41C1/1041

    摘要： A heat-sensitive lithographic printing plate precursor comprising on a grained and anodized aluminum support a compound which is capable of converting form a hydrophobic state to a hydrophilic state or vice versa upon exposure to heat, and is represented by the following formula: A-(L)n-Bwherein L represents a linking group, n represents 0 or 1 and B represents a thermo-labile group; characterized in that the compound further comprises the group A which is a functional group capable of interacting with the surface of a grained and anodized aluminum support and is selected from the list consisting of a halosilanyl group, an alkoxysilanyl group, a phosphonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, a salicylic acid group or a salt thereof, a boronic acid group or an ester or a salt thereof, an optionally substituted di or tri-hydroxyaryl group, an optionally substituted salicaldoxime group, an optionally substituted salicaldimine group, an optionally substituted hydroxyheteroaryl group, an amidine group, a 1,3-dicarbonyl group or a group represented by the formula (i) wherein Q and Z independently represent the necessary atoms to form an optionally substituted five or six membered aromatic or heteroaromatic ring.

    摘要翻译： 包含在颗粒和阳极氧化的铝上的热敏平版印刷版前体包含能够在暴露于热时将其形成疏水状态或反之亦然的化合物，并且由下式表示： -line-formula description =“In-line Formulas”end =“lead”？> A-（L） -B <？in-line-formula description =“In-line Formulas”end =“尾”→其中L表示连接基，n表示0或1，B表示热不稳定基团; 其特征在于，所述化合物还包含基团A，其是能够与粒状和阳极氧化的铝载体的表面相互作用的官能团，并且选自卤代西兰基，烷氧基硅烷基，膦酸基或 其盐，磷酸基或其盐，水杨酸基或其盐，硼酸基或其酯或其盐，任选取代的二或三羟基芳基，任选取代的salicaldoxime基团， 任选取代的水杨基，任选取代的羟基杂芳基，脒基，1,3-二羰基或由式（ⅰ）表示的基团，其中Q和Z独立地表示必要的原子以形成任选被取代的五或六元 芳族或杂芳族环。

    Lithographic printing plate precursor comprising bi-functional compounds
    4.
    发明授权
    Lithographic printing plate precursor comprising bi-functional compounds 有权
    含有双功能化合物的平版印刷版前体

    公开(公告)号：US08313885B2

    公开(公告)日：2012-11-20

    申请号：US11546830

    申请日：2006-10-12

    申请人： Johan Loccufier ,  Hieronymus Andriessen

    发明人： Johan Loccufier ,  Hieronymus Andriessen

    IPC分类号： G03F7/00 ,  G03F7/26

    CPC分类号： B41C1/1041

    摘要： A heat-sensitive lithographic printing plate precursor comprising on a grained and anodized aluminum support a compound which is capable of converting form a hydrophobic state to a hydrophilic state or vice versa upon exposure to heat, and is represented by the following formula: A-(L)n-B wherein L represents a linking group, n represents 0 or 1 and B represents a thermo-labile group; characterized in that the compound further comprises the group A which is a functional group capable of interacting with the surface of a grained and anodized aluminum support and is selected from the list consisting of a halosilanyl group, an alkoxysilanyl group, a phosphonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, a salicylic acid group or a salt thereof, a boronic acid group or an ester or a salt thereof, an optionally substituted di or tri-hydroxyaryl group, an optionally substituted salicaldoxime group, an optionally substituted salicaldimine group, an optionally substituted hydroxyheteroaryl group, an amidine group, a 1,3-dicarbonyl group or a group represented by the formula (i) wherein Q and Z independently represent the necessary atoms to form an optionally substituted five or six membered aromatic or heteroaromatic ring.

    摘要翻译： 包含在颗粒和阳极氧化铝上的热敏平版印刷版原版支持能够在暴露于热后将其形成疏水状态或反之亦然的化合物，并由下式表示：A-（ L）nB其中L表示连接基团，n表示0或1，B表示热不稳定基团; 其特征在于，所述化合物还包含基团A，其是能够与粒状和阳极氧化的铝载体的表面相互作用的官能团，并且选自卤代西兰基，烷氧基硅烷基，膦酸基或 其盐，磷酸基或其盐，水杨酸基或其盐，硼酸基或其酯或其盐，任选取代的二或三羟基芳基，任选取代的salicaldoxime基团， 任选取代的水杨基，任选取代的羟基杂芳基，脒基，1,3-二羰基或由式（ⅰ）表示的基团，其中Q和Z独立地表示必要的原子以形成任选被取代的五或六元 芳族或杂芳族环。

    NEGATIVE WORKING, HEAT SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR
    8.
    发明申请
    NEGATIVE WORKING, HEAT SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR 有权
    负极工作，感光感光印刷机

    公开(公告)号：US20090258314A1

    公开(公告)日：2009-10-15

    申请号：US12300805

    申请日：2007-05-22

    申请人： Hieronymus Andriessen ,  Steven Lezy ,  Hubertus Van Aert ,  Joan Vermeersch

    发明人： Hieronymus Andriessen ,  Steven Lezy ,  Hubertus Van Aert ,  Joan Vermeersch

    IPC分类号： G03F7/004 ,  G03F7/20 ,  B41F1/18

    CPC分类号： B41C1/1025 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24 ,  Y10S430/145

    摘要： A heat-sensitive negative-working lithographic printing plate precursor include a support having a hydrophilic surface or which is provided with a hydrophilic layer and a coating provided thereon, the coating including an image-recording layer which includes hydrophobic thermoplastic polymer particles, a binder, and an infrared absorbing dye; wherein the hydrophobic thermoplastic polymer particles have an average particle diameter, measured by Photon Correlation Spectroscopy, of more than 10 nm and less than 40 nm; the amount of the IR-dye, without taking into account an optional counter ion, is more than 0.80 mg per m2 of the total surface of the thermoplastic polymer particles, measured by Hydrodynamic Fraction; and—the amount of hydrophobic thermoplastic polymer particles relative to the total weight of the ingredients of the imaging layer is at least 60-%.

    摘要翻译： 热敏负性平版印刷版原版包括具有亲水性表面的或具有亲水层的涂层和设置在其上的涂层的涂层，该涂层包括图像记录层，该图像记录层包括疏水性热塑性聚合物颗粒，粘合剂， 和红外吸收染料; 其中所述疏水热塑性聚合物颗粒具有通过光子相关光谱测量的平均粒径大于10nm且小于40nm; 通过流体力学分数测量，不考虑任选的抗衡离子的IR染料的量大于0.80mg / m 2热塑性聚合物颗粒的总表面; 和 - 相对于成像层的成分的总重量，疏水性热塑性聚合物颗粒的量为至少60％。

    METHOD FOR MAKING A LITHOGRAPHIC PRINTING PLATE
    9.
    发明申请
    METHOD FOR MAKING A LITHOGRAPHIC PRINTING PLATE 有权
    制作平版印刷版的方法

    公开(公告)号：US20090155722A1

    公开(公告)日：2009-06-18

    申请号：US12300801

    申请日：2007-05-22

    申请人： Hieronymus Andriessen ,  Steven Lezy ,  Hubertus Van Aert ,  Joan Vermeersch

    发明人： Hieronymus Andriessen ,  Steven Lezy ,  Hubertus Van Aert ,  Joan Vermeersch

    IPC分类号： G03F7/20 ,  B41M5/00

    CPC分类号： B41C1/1025 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  Y10S430/145

    摘要： A method for making a lithographic printing plate includes the steps of (i) providing a negative-working, heat-sensitive lithographic printing plate precursor including a support having a hydrophilic surface or which is provided with a hydrophilic layer and a coating provided thereon, the coating including an image-recording layer which includes hydrophobic thermoplastic polymer particles, a binder, and an infrared absorbing dye, wherein the hydrophobic thermoplastic polymer particles have an average particle diameter, measured by Photon Correlation Spectroscopy, of more than 10 nm and less than 40 nm, and the amount of the IR-dye, without taking into account an optional counter ion, is more than 0.70 mg per m2 of the total surface of the thermoplastic polymer particles, measured by Hydrodynamic Fractionation, and the amount of hydrophobic thermoplastic polymer particles relative to the total weight of the ingredients of the imaging layer is at least 60%; (ii) exposing the precursor to infrared light; and (iii) developing the exposed precursor in an alkaline aqueous solution.

    摘要翻译： 制备平版印刷版的方法包括以下步骤：（i）提供负型热敏平版印刷版原版，其包含具有亲水性表面的载体，或提供有亲水层和设置在其上的涂层， 包括包含疏水性热塑性聚合物颗粒，粘合剂和红外吸收染料的图像记录层的涂层，其中所述疏水性热塑性聚合物颗粒具有通过光子相关光谱测量的平均粒径大于10nm且小于40 nm，并且不考虑任选的抗衡离子的IR染料的量通过流体动力学分级测定的每摩尔热塑性聚合物颗粒的总表面的每摩尔浓度大于0.70mg，并且疏水性热塑性聚合物颗粒的量 相对于成像层的成分的总重量为至少60％; （ii）将前体暴露于红外光; 和（iii）在碱性水溶液中显影暴露的前体。