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1.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US07098994B2
公开(公告)日：2006-08-29
申请号：US10758270
申请日：2004-01-16
申请人： Johannes Hubertus Josephina Moors , Uwe Mickan , Harm-Jan Voorma , Johannes Christiaan Leonardus Franken
发明人： Johannes Hubertus Josephina Moors , Uwe Mickan , Harm-Jan Voorma , Johannes Christiaan Leonardus Franken
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70175 , G03F7/70891
摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the beam with a pattern in its cross-section. The apparatus further includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a collector which is arranged for transmitting radiation, received from a first radiation source, to the illumination system. The apparatus includes at least a heater for heating the collector when the collector receives substantially no radiation from the first radiation source. Further aspects of the invention relate to a device manufacturing method as well as a device manufactured thereby.
摘要翻译： 光刻设备包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，所述图案形成装置用于在其横截面中赋予光束图案。 该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统以及被布置成用于将从第一辐射源接收的辐射传送到照明系统的收集器。 当收集器基本上不接收来自第一辐射源的辐射时，该装置至少包括用于加热集电器的加热器。 本发明的其它方面涉及一种装置制造方法以及由此制造的装置。
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2.发明授权公开(公告)号：US07092072B2
公开(公告)日：2006-08-15
申请号：US10882684
申请日：2004-07-02
CPC分类号： G03F7/70558
摘要： A calibration apparatus is provided for calibrating a radiation sensor in a lithographic apparatus. The calibration apparatus includes a window formed of substantially radiation-transparent material for allowing radiation to pass therethrough to reach the radiation sensor. A first reference sensor is located behind the window, having an active surface abutting the window, for measuring the intensity of radiation which passes through the window. A second reference sensor is located a short distance behind the window, having an active surface facing the window, for measuring the intensity of radiation which passes through the window, a first contamination layer formed on the window, and a second contamination layer formed on the active surface of the second reference sensor. The radiation sensor can be calibrated by combining the measurements from the first and second radiation sensors.
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3.发明授权Lithographic system, method for adapting transmission characteristics of an optical pathway within a lithographic system, semiconductor device, method of manufacturing a reflective element for use in a lithographic system, and reflective element manufactured thereby 有权平版印刷系统，用于适应光刻系统内的光学通路的传输特性的方法，半导体器件，制造用于光刻系统的反射元件的方法和由此制造的反射元件公开(公告)号：US07369216B2
公开(公告)日：2008-05-06
申请号：US10964817
申请日：2004-10-15
CPC分类号： G03F7/70575
摘要： A lithographic system includes a radiation system configured to provide a beam of radiation; an illumination system configured to condition the beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the projection beam with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; and transmission adaptor arranged along an optical pathway. The radiation system includes a source configured to generate a beam of radiation. The transmission adaptor adapts an intensity profile as a function of wavelength of the beam of radiation and/or the patterned beam in such a way that the intensity profile equals a predetermined intensity profile.
摘要翻译： 光刻系统包括被配置为提供辐射束的辐射系统; 配置成调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置被构造成在其横截面中赋予所述投影光束图案; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 和传输适配器沿着光学路径布置。 辐射系统包括被配置为产生辐射束的源。 传输适配器以强度分布等于预定强度分布的方式适应作为辐射束和/或图案化束的波长的函数的强度分布。
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公开(公告)号：US06980281B2
公开(公告)日：2005-12-27
申请号：US10762565
申请日：2004-01-23
CPC分类号： G03F7/70483 , G03F7/7085 , G03F7/70916 , G03F7/70983
摘要： In a lithographic apparatus, a beam of radiation passes along a beam path to a substrate, for applying patterned illumination to the substrate. An exchangeable aperture screen is inserted in the beam path to partially block out the beam from a remainder of the path onto the substrate. A test surface is provided on the aperture screen, so that the test surface receives a part of the beam that is not passed along the remainder of the beam path. The test surface is made of a material that is sensitive, under influence of radiation from the beam, to chemical alterations that also affect the optical element under influence of radiation from the beam. The test surface is later analyzed for chemical alterations after exposure to the beam.
摘要翻译： 在光刻设备中，辐射束沿着光束路径传递到衬底，用于将图案化照明施加到衬底。 可更换的孔径屏幕被插入到光束路径中以部分地将光束从路径的剩余部分阻挡到衬底上。 在孔眼屏幕上设置测试表面，使得测试表面接收不沿着光束路径的其余部分通过的光束的一部分。 测试表面由在来自梁的辐射的影响下敏感的材料制成的化学变化也在来自梁的辐射的影响下影响光学元件。 随后分析试验表面暴露于梁后的化学变化。
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5.发明申请公开(公告)号：US20050206869A1
公开(公告)日：2005-09-22
申请号：US10805526
申请日：2004-03-22
IPC分类号： H01L21/027 , G03F7/20 , G03B27/52
CPC分类号： G03F7/70558
摘要： A lithographic apparatus includes an illumination system for providing a projection beam of radiation, a support structure for supporting patterning structure for imparting a pattern to the projection beam, a substrate table for holding a wafer and a projection system for projecting the patterned beam onto a target portion of the wafer. In order to permit control of the radiation dose at the wafer so that the throughput of wafers can be optimised, a variable attenuator is provided to vary the intensity of the projection beam while not changing the position of the beam. The variable attenuator comprises two parallel mirrors positioned such that an input beam of radiation is incident on a first of the mirrors by which it is reflected towards a second of the mirrors by which the beam is reflected to produce an output beam of radiation of required intensity for input to the illumination system, and a tilting mechanism for tilting the mirrors such that the mirrors remain parallel to one another and the angles of incidence of the beams on the mirrors are changed so as to vary the intensity of the output beam. This allows the intensity of the projection beam to be varied continuously without changing the position of the beam, whether the input beam is converging, diverging or parallel.
摘要翻译： 光刻设备包括用于提供投射辐射束的照明系统，用于支撑用于将投影光束赋予图案的图形结构的支撑结构，用于保持晶片的基板台和用于将图案化光束投影到目标上的投影系统 部分晶片。 为了允许控制晶片上的辐射剂量，从而可以优化晶片的生产量，可以提供可变衰减器来改变投影光束的强度，同时不改变光束的位置。 可变衰减器包括两个平行的反射镜，其被定位成使得输入射线束入射在第一反射镜上，通过该反射镜被反射到第二反射镜，通过该反射镜反射光束以产生所需强度的辐射输出束 用于输入到照明系统，以及倾斜机构，用于倾斜反射镜，使得反射镜保持彼此平行，并且改变反射镜上的光束的入射角度，以便改变输出光束的强度。 这允许投影光束的强度连续变化而不改变光束的位置，无论输入光束是会聚，发散还是平行。
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6.发明申请Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US20050157284A1
公开(公告)日：2005-07-21
申请号：US10758270
申请日：2004-01-16
IPC分类号： G02B17/00 , G03F7/20 , H01L21/027 , G03B27/72
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70175 , G03F7/70891
摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the beam with a pattern in its cross-section. The apparatus further includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a collector which is arranged for transmitting radiation, received from a first radiation source, to the illumination system. The apparatus includes at least a heater for heating the collector when the collector receives substantially no radiation from the first radiation source. Further aspects of the invention relate to a device manufacturing method as well as a device manufactured thereby.
摘要翻译： 光刻设备包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，所述图案形成装置用于在其横截面中赋予光束图案。 该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统以及被布置成用于将从第一辐射源接收的辐射传送到照明系统的收集器。 当收集器基本上不接收来自第一辐射源的辐射时，该装置至少包括用于加热集电器的加热器。 本发明的其它方面涉及一种装置制造方法以及由此制造的装置。
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7.发明授权公开(公告)号：US07145640B2
公开(公告)日：2006-12-05
申请号：US10805526
申请日：2004-03-22
CPC分类号： G03F7/70558
摘要： A lithographic apparatus includes an illumination system for providing a projection beam of radiation, a support structure for supporting patterning structure for imparting a pattern to the projection beam, a substrate table for holding a wafer and a projection system for projecting the patterned beam onto a target portion of the wafer. In order to permit control of the radiation dose at the wafer so that the throughput of wafers can be optimised, a variable attenuator is provided to vary the intensity of the projection beam while not changing the position of the beam. The variable attenuator includes two parallel mirrors positioned such that an input beam of radiation is incident on a first of the mirrors by which it is reflected towards a second of the mirrors by which the beam is reflected to produce an output beam of radiation of required intensity for input to the illumination system, and a tilting mechanism for tilting the mirrors such that the mirrors remain parallel to one another and the angles of incidence of the beams on the mirrors are changed so as to vary the intensity of the output beam. This allows the intensity of the projection beam to be varied continuously without changing the position of the beam, whether the input beam is converging, diverging or parallel.
摘要翻译： 光刻设备包括用于提供投射辐射束的照明系统，用于支撑用于将投影光束赋予图案的图形结构的支撑结构，用于保持晶片的基板台和用于将图案化光束投影到目标上的投影系统 部分晶片。 为了允许控制晶片上的辐射剂量，从而可以优化晶片的生产量，可以提供可变衰减器来改变投射光束的强度，同时不改变光束的位置。 可变衰减器包括两个平行的反射镜，其被定位成使得输入的辐射束入射在第一反射镜上，通过该反射镜被反射到第二反射镜，通过该反射镜反射光束以产生所需强度的辐射输出束 用于输入到照明系统，以及倾斜机构，用于倾斜反射镜，使得反射镜保持彼此平行，并且改变反射镜上的光束的入射角度，以便改变输出光束的强度。 这允许投影光束的强度连续变化而不改变光束的位置，无论输入光束是会聚，发散还是平行。
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8.发明申请Method for exposing a substrate, patterning device, and lithographic apparatus 审中-公开曝光基板，图案形成装置和光刻装置的方法公开(公告)号：US20050134820A1
公开(公告)日：2005-06-23
申请号：US10740830
申请日：2003-12-22
申请人： Heine Mulder , Antonius Johannes Van Dijsseldonk , Erik Loopstra , Uwe Mickan , Johannes Catharinus Mulkens , Harm-Jan Voorma
发明人： Heine Mulder , Antonius Johannes Van Dijsseldonk , Erik Loopstra , Uwe Mickan , Johannes Catharinus Mulkens , Harm-Jan Voorma
CPC分类号： G03F7/70075 , G03F7/701 , G03F7/70425 , G03F7/70566
摘要： A method using a lithographic apparatus comprising a reflective integrator is claimed that optimizes the exposure of features on a target area of a substrate, when the features make an angle between 5 and 85 degrees with respect to the target area. The method comprises rotating the reflective integrator with respect to the target area providing a rotated mirror-symmetric pupil shape, which is implemented by either rotating the substrate or rotating the reflective integrator with respect to the machine or the patterning device. The patterning device comprises a maximum usable area and a patterned area which are rotated with respect to each other if a rotated substrate is employed. The method can be used in single exposure or double exposure mode. A further advantage of the method of using a rotated wafer is that it can be used for exposing features on a substrate in any direction even when the projection system of the lithographic apparatus shows a preferred polarization direction.
摘要翻译： 要求使用包括反射积分器的光刻设备的方法，当特征相对于目标区域形成5至85度的角度时，可优化基板目标区域上的特征的曝光。 该方法包括使反射积分器相对于目标区域旋转，从而提供旋转的对称瞳孔形状，其通过旋转基底或相对于机器或图案形成装置旋转反射积分器来实现。 如果使用旋转的衬底，则图案形成装置包括相对于彼此旋转的最大可用面积和图案化区域。 该方法可用于单次曝光或双曝光模式。 使用旋转晶片的方法的另一个优点是，即使当光刻设备的投影系统显示优选的偏振方向时，其可以用于在任何方向上曝光衬底上的特征。
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公开(公告)号：US20060141375A1
公开(公告)日：2006-06-29
申请号：US11020557
申请日：2004-12-27
申请人： Jan Hauschild , Arie Den Boef , Martinus Antonius Leenders , Uwe Mickan , Roeland Maria Vanneer
发明人： Jan Hauschild , Arie Den Boef , Martinus Antonius Leenders , Uwe Mickan , Roeland Maria Vanneer
CPC分类号： G03F7/70191 , G03F7/70108 , G03F7/70125 , G03F7/70641
摘要： The present invention relates to an exposure apparatus that includes an illumination system for providing a projection beam of radiation, a support structure for supporting a device provided with a pattern, the device serving to impart the projection beam with a pattern in its cross-section; a table for holding a target object, a projection system for projecting the patterned beam onto the target object and a tilting device for providing the projection beam with a tilt. The tilting device is provided substantially in a pupil plane of the projection system.
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10.发明授权Actuator system, lithographic apparatus, method of controlling the position of a component and device manufacturing method 失效执行器系统，光刻设备，控制部件位置的方法和装置的制造方法公开(公告)号：US08634062B2
公开(公告)日：2014-01-21
申请号：US12627776
申请日：2009-11-30
IPC分类号： G03B27/54
CPC分类号： G03F7/70825 , G03F7/70141
摘要： An actuator system is provided that is configured to move a component relative to a base of the actuator system. The actuator system may include first and second actuating elements, each including two sections of material that are joined to each other and have different coefficients of thermal expansion. The two actuating elements may be configured such that if the temperature of one is increased it applies a force on the component in a direction that is opposite to the force applied by the other actuating element if its temperature is increased. The actuator system may further include at least one power supply configured to provide independently controllable heating to the first and second actuating elements.
摘要翻译： 提供致动器系统，其构造成相对于致动器系统的基座移动部件。 致动器系统可以包括第一和第二致动元件，每个致动元件包括彼此连接并且具有不同的热膨胀系数的两部分材料。 两个致动元件可被构造成使得如果一个温度升高，则如果其温度升高，则该部件在与另一致动元件施加的力相反的方向上施加力。 致动器系统还可以包括被配置为向第一和第二致动元件提供独立可控加热的至少一个电源。
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