公开(公告)号：US20050206869A1

公开(公告)日：2005-09-22

申请号：US10805526

申请日：2004-03-22

申请人： Harm-Jan Voorma ,  Antonius Johannes Van Dijsseldonk ,  Uwe Mickan

发明人： Harm-Jan Voorma ,  Antonius Johannes Van Dijsseldonk ,  Uwe Mickan

IPC分类号： H01L21/027 ,  G03F7/20 ,  G03B27/52

CPC分类号： G03F7/70558

摘要： A lithographic apparatus includes an illumination system for providing a projection beam of radiation, a support structure for supporting patterning structure for imparting a pattern to the projection beam, a substrate table for holding a wafer and a projection system for projecting the patterned beam onto a target portion of the wafer. In order to permit control of the radiation dose at the wafer so that the throughput of wafers can be optimised, a variable attenuator is provided to vary the intensity of the projection beam while not changing the position of the beam. The variable attenuator comprises two parallel mirrors positioned such that an input beam of radiation is incident on a first of the mirrors by which it is reflected towards a second of the mirrors by which the beam is reflected to produce an output beam of radiation of required intensity for input to the illumination system, and a tilting mechanism for tilting the mirrors such that the mirrors remain parallel to one another and the angles of incidence of the beams on the mirrors are changed so as to vary the intensity of the output beam. This allows the intensity of the projection beam to be varied continuously without changing the position of the beam, whether the input beam is converging, diverging or parallel.

摘要翻译： 光刻设备包括用于提供投射辐射束的照明系统，用于支撑用于将投影光束赋予图案的图形结构的支撑结构，用于保持晶片的基板台和用于将图案化光束投影到目标上的投影系统 部分晶片。 为了允许控制晶片上的辐射剂量，从而可以优化晶片的生产量，可以提供可变衰减器来改变投影光束的强度，同时不改变光束的位置。 可变衰减器包括两个平行的反射镜，其被定位成使得输入射线束入射在第一反射镜上，通过该反射镜被反射到第二反射镜，通过该反射镜反射光束以产生所需强度的辐射输出束 用于输入到照明系统，以及倾斜机构，用于倾斜反射镜，使得反射镜保持彼此平行，并且改变反射镜上的光束的入射角度，以便改变输出光束的强度。 这允许投影光束的强度连续变化而不改变光束的位置，无论输入光束是会聚，发散还是平行。

公开(公告)号：US20050134820A1

公开(公告)日：2005-06-23

申请号：US10740830

申请日：2003-12-22

申请人： Heine Mulder ,  Antonius Johannes Van Dijsseldonk ,  Erik Loopstra ,  Uwe Mickan ,  Johannes Catharinus Mulkens ,  Harm-Jan Voorma

发明人： Heine Mulder ,  Antonius Johannes Van Dijsseldonk ,  Erik Loopstra ,  Uwe Mickan ,  Johannes Catharinus Mulkens ,  Harm-Jan Voorma

IPC分类号： G03B27/54 ,  G03F7/20

CPC分类号： G03F7/70075 ,  G03F7/701 ,  G03F7/70425 ,  G03F7/70566

摘要： A method using a lithographic apparatus comprising a reflective integrator is claimed that optimizes the exposure of features on a target area of a substrate, when the features make an angle between 5 and 85 degrees with respect to the target area. The method comprises rotating the reflective integrator with respect to the target area providing a rotated mirror-symmetric pupil shape, which is implemented by either rotating the substrate or rotating the reflective integrator with respect to the machine or the patterning device. The patterning device comprises a maximum usable area and a patterned area which are rotated with respect to each other if a rotated substrate is employed. The method can be used in single exposure or double exposure mode. A further advantage of the method of using a rotated wafer is that it can be used for exposing features on a substrate in any direction even when the projection system of the lithographic apparatus shows a preferred polarization direction.

摘要翻译： 要求使用包括反射积分器的光刻设备的方法，当特征相对于目标区域形成5至85度的角度时，可优化基板目标区域上的特征的曝光。 该方法包括使反射积分器相对于目标区域旋转，从而提供旋转的对称瞳孔形状，其通过旋转基底或相对于机器或图案形成装置旋转反射积分器来实现。 如果使用旋转的衬底，则图案形成装置包括相对于彼此旋转的最大可用面积和图案化区域。 该方法可用于单次曝光或双曝光模式。 使用旋转晶片的方法的另一个优点是，即使当光刻设备的投影系统显示优选的偏振方向时，其可以用于在任何方向上曝光衬底上的特征。

公开(公告)号：US20050157284A1

公开(公告)日：2005-07-21

申请号：US10758270

申请日：2004-01-16

申请人： Johannes Moors ,  Uwe Mickan ,  Harm-Jan Voorma ,  Johannes Leonardus Franken

发明人： Johannes Moors ,  Uwe Mickan ,  Harm-Jan Voorma ,  Johannes Leonardus Franken

IPC分类号： G02B17/00 ,  G03F7/20 ,  H01L21/027 ,  G03B27/72

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891

摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the beam with a pattern in its cross-section. The apparatus further includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a collector which is arranged for transmitting radiation, received from a first radiation source, to the illumination system. The apparatus includes at least a heater for heating the collector when the collector receives substantially no radiation from the first radiation source. Further aspects of the invention relate to a device manufacturing method as well as a device manufactured thereby.

摘要翻译： 光刻设备包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，所述图案形成装置用于在其横截面中赋予光束图案。 该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统以及被布置成用于将从第一辐射源接收的辐射传送到照明系统的收集器。 当收集器基本上不接收来自第一辐射源的辐射时，该装置至少包括用于加热集电器的加热器。 本发明的其它方面涉及一种装置制造方法以及由此制造的装置。

公开(公告)号：US07145640B2

公开(公告)日：2006-12-05

申请号：US10805526

申请日：2004-03-22

申请人： Harm-Jan Voorma ,  Antonius Johannes Josephus Van Dijsseldonk ,  Uwe Mickan

发明人： Harm-Jan Voorma ,  Antonius Johannes Josephus Van Dijsseldonk ,  Uwe Mickan

IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70558

摘要： A lithographic apparatus includes an illumination system for providing a projection beam of radiation, a support structure for supporting patterning structure for imparting a pattern to the projection beam, a substrate table for holding a wafer and a projection system for projecting the patterned beam onto a target portion of the wafer. In order to permit control of the radiation dose at the wafer so that the throughput of wafers can be optimised, a variable attenuator is provided to vary the intensity of the projection beam while not changing the position of the beam. The variable attenuator includes two parallel mirrors positioned such that an input beam of radiation is incident on a first of the mirrors by which it is reflected towards a second of the mirrors by which the beam is reflected to produce an output beam of radiation of required intensity for input to the illumination system, and a tilting mechanism for tilting the mirrors such that the mirrors remain parallel to one another and the angles of incidence of the beams on the mirrors are changed so as to vary the intensity of the output beam. This allows the intensity of the projection beam to be varied continuously without changing the position of the beam, whether the input beam is converging, diverging or parallel.

摘要翻译： 光刻设备包括用于提供投射辐射束的照明系统，用于支撑用于将投影光束赋予图案的图形结构的支撑结构，用于保持晶片的基板台和用于将图案化光束投影到目标上的投影系统 部分晶片。 为了允许控制晶片上的辐射剂量，从而可以优化晶片的生产量，可以提供可变衰减器来改变投射光束的强度，同时不改变光束的位置。 可变衰减器包括两个平行的反射镜，其被定位成使得输入的辐射束入射在第一反射镜上，通过该反射镜被反射到第二反射镜，通过该反射镜反射光束以产生所需强度的辐射输出束 用于输入到照明系统，以及倾斜机构，用于倾斜反射镜，使得反射镜保持彼此平行，并且改变反射镜上的光束的入射角度，以便改变输出光束的强度。 这允许投影光束的强度连续变化而不改变光束的位置，无论输入光束是会聚，发散还是平行。

公开(公告)号：US07098994B2

公开(公告)日：2006-08-29

申请号：US10758270

申请日：2004-01-16

申请人： Johannes Hubertus Josephina Moors ,  Uwe Mickan ,  Harm-Jan Voorma ,  Johannes Christiaan Leonardus Franken

发明人： Johannes Hubertus Josephina Moors ,  Uwe Mickan ,  Harm-Jan Voorma ,  Johannes Christiaan Leonardus Franken

IPC分类号： G03B27/72 ,  G03B27/52 ,  G03B27/54

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891

摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the beam with a pattern in its cross-section. The apparatus further includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a collector which is arranged for transmitting radiation, received from a first radiation source, to the illumination system. The apparatus includes at least a heater for heating the collector when the collector receives substantially no radiation from the first radiation source. Further aspects of the invention relate to a device manufacturing method as well as a device manufactured thereby.

摘要翻译： 光刻设备包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，所述图案形成装置用于在其横截面中赋予光束图案。 该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统以及被布置成用于将从第一辐射源接收的辐射传送到照明系统的收集器。 当收集器基本上不接收来自第一辐射源的辐射时，该装置至少包括用于加热集电器的加热器。 本发明的其它方面涉及一种装置制造方法以及由此制造的装置。

公开(公告)号：US20070069162A1

公开(公告)日：2007-03-29

申请号：US11527728

申请日：2006-09-27

申请人： Vadim Banine ,  Vladimir Ivanov ,  Josephus Smits ,  Harm-Jan Voorma ,  Lambertus Adrianus Den Wildenberg ,  Vladimir Krivtsun ,  Alexander Struycken ,  Carolus Ida Antonius Spee ,  Klaas Timmer ,  Johannes Ridder

发明人： Vadim Banine ,  Vladimir Ivanov ,  Josephus Smits ,  Harm-Jan Voorma ,  Lambertus Adrianus Den Wildenberg ,  Vladimir Krivtsun ,  Alexander Struycken ,  Carolus Ida Antonius Spee ,  Klaas Timmer ,  Johannes Ridder

IPC分类号： G01J3/10

CPC分类号： G03B7/20 ,  B08B7/00 ,  G01J1/0271 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70975

摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.

摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。

公开(公告)号：US07023524B2

公开(公告)日：2006-04-04

申请号：US10738129

申请日：2003-12-18

申请人： Antonius Johannes Josephus Van Dijsseldonk ,  Marcel Mathijs Theodore Marie Dierichs ,  Harm-Jan Voorma

发明人： Antonius Johannes Josephus Van Dijsseldonk ,  Marcel Mathijs Theodore Marie Dierichs ,  Harm-Jan Voorma

IPC分类号： G03B27/52 ,  G03B27/72

CPC分类号： G03F7/70216 ,  G03F7/70275 ,  G03F7/70308

摘要： A lithographic apparatus including a radiation attenuator or a variable aperture system, such as masking blades, arranged in or adjacent an intermediate focus of the projection system. Besides a radiation attenuator or a variable aperture system, a measuring system may be arranged in the intermediate focus. By placing one or more of such systems in or adjacent the intermediate focus of the projection system, instead of adjacent the reticle in the illumination system, fewer design restrictions occur because of more space available, resulting in a lower design cost.

摘要翻译： 包括布置在投影系统的中间焦点中或邻近投影系统的中间焦点的辐射衰减器或可变孔径系统（例如掩模刀片）的光刻设备。 除了辐射衰减器或可变孔径系统之外，测量系统可以布置在中间焦点中。 通过将一个或多个这样的系统放置在投影系统的中间焦点中或邻近投影系统的中间焦点，而不是靠近照明系统中的掩模版，由于更多的可用空间，出现了更少的设计限制，导致较低的设计成本。

公开(公告)号：US20100290015A1

公开(公告)日：2010-11-18

申请号：US12821033

申请日：2010-06-22

申请人： Vadim Yevgenyevich BANINE ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Harm-Jan Voorma ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer ,  Johannes Bernardus Ridder

发明人： Vadim Yevgenyevich BANINE ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Harm-Jan Voorma ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer ,  Johannes Bernardus Ridder

IPC分类号： G03F7/20 ,  G02B27/00 ,  G03B27/54 ,  B08B5/00

CPC分类号： G03B7/20 ,  B08B7/00 ,  G01J1/0271 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70975

摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.

摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。

公开(公告)号：US20050134818A1

公开(公告)日：2005-06-23

申请号：US10738129

申请日：2003-12-18

申请人： Antonius Van Dijsseldonk ,  Marcel Marie Dierichs ,  Harm-Jan Voorma

发明人： Antonius Van Dijsseldonk ,  Marcel Marie Dierichs ,  Harm-Jan Voorma

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F7/70216 ,  G03F7/70275 ,  G03F7/70308

摘要： A lithographic apparatus including a radiation attenuator or a variable aperture system, such as masking blades, arranged in or near an intermediate focus of the projection system. Besides a radiation attenuator or a variable aperture system, a measuring system may be arranged in the intermediate focus. By placing one or more of such systems in the intermediate focus of the projection system, instead of near the reticle in the illumination system, fewer design restrictions occur because of more space available, resulting in a lower design cost.

摘要翻译： 包括布置在投影系统的中间焦点中或其附近的辐射衰减器或可变孔径系统（例如掩模刀片）的光刻设备。 除了辐射衰减器或可变孔径系统之外，测量系统可以布置在中间焦点中。 通过将一个或多个这样的系统放置在投影系统的中间焦点中，而不是靠近照明系统中的掩模版，由于更多的可用空间而发生较少的设计限制，导致较低的设计成本。

公开(公告)号：US07875863B2

公开(公告)日：2011-01-25

申请号：US11643951

申请日：2006-12-22

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Mandeep Singh ,  Harm-Jan Voorma ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Mandeep Singh ,  Harm-Jan Voorma ,  Derk Jan Wilfred Klunder

IPC分类号： G21G5/00

CPC分类号： G03F7/70958 ,  B82Y10/00 ,  G03F7/70925 ,  G21K1/062 ,  G21K2201/067

摘要： An EUV illumination system, for example, for use in a photolithographic apparatus is configured to condition a radiation beam. A hydrogen radical source configured to supply gas containing hydrogen or hydrogen radicals into the illumination system. The hydrogen gas is effective to remove carbonaceous contamination from the surface of a mirror in the illumination system or to form a buffer against unwanted gases. In order to prevent damage by hydrogen that penetrates the mirror, the mirror comprises a layer made of metal non-metal compound adjacent a reflection surface of the mirror. A transition metal carbide, nitride, boride or silicide compound or mixture thereof may be used for example.

摘要翻译： 例如，用于光刻设备的EUV照明系统被配置为调节辐射束。 氢自由基源，被配置为将含有氢或氢自由基的气体供应到照明系统中。 氢气有效地从照明系统中的反射镜表面除去碳质污染物或形成缓冲液以防止不需要的气体。 为了防止穿透反射镜的氢的破坏，反射镜包括与反射镜的反射面相邻的金属非金属化合物制成的层。 可以使用过渡金属碳化物，氮化物，硼化物或硅化物或其混合物。