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    Lithographic system, method for adapting transmission characteristics of an optical pathway within a lithographic system, semiconductor device, method of manufacturing a reflective element for use in a lithographic system, and reflective element manufactured thereby
    4.
    发明申请
    Lithographic system, method for adapting transmission characteristics of an optical pathway within a lithographic system, semiconductor device, method of manufacturing a reflective element for use in a lithographic system, and reflective element manufactured thereby 有权
    平版印刷系统，用于适应光刻系统内的光学通路的传输特性的方法，半导体器件，制造用于光刻系统的反射元件的方法和由此制造的反射元件

    公开(公告)号：US20060082751A1

    公开(公告)日：2006-04-20

    申请号：US10964817

    申请日：2004-10-15

    申请人： Johannes Moors ,  Uwe Mickan ,  Wolfgang Singer ,  Hans-Juergen Mann

    发明人： Johannes Moors ,  Uwe Mickan ,  Wolfgang Singer ,  Hans-Juergen Mann

    IPC分类号： G03B27/72

    CPC分类号： G03F7/70575

    摘要： A lithographic system includes a radiation system configured to provide a beam of radiation; an illumination system configured to condition the beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the projection beam with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; and transmission adaptor arranged along an optical pathway. The radiation system includes a source configured to generate a beam of radiation. The transmission adaptor adapts an intensity profile as a function of wavelength of the beam of radiation and/or the patterned beam in such a way that the intensity profile equals a predetermined intensity profile.

    摘要翻译： 光刻系统包括被配置为提供辐射束的辐射系统; 配置成调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置被构造成在其横截面中赋予所述投影光束图案; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 和传输适配器沿着光学路径布置。 辐射系统包括被配置为产生辐射束的源。 传输适配器以强度分布等于预定强度分布的方式适应作为辐射束和/或图案化束的波长的函数的强度分布。

    Microlithographic projection exposure apparatus
    5.
    发明授权
    Microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置

    公开(公告)号：US08982325B2

    公开(公告)日：2015-03-17

    申请号：US13333350

    申请日：2011-12-21

    申请人： Michael Totzeck ,  Aksel Goehnermeier ,  Wolfgang Singer ,  Helmut Beierl ,  Heiko Feldmann ,  Hans-Juergen Mann ,  Jochen Hetzler

    发明人： Michael Totzeck ,  Aksel Goehnermeier ,  Wolfgang Singer ,  Helmut Beierl ,  Heiko Feldmann ,  Hans-Juergen Mann ,  Jochen Hetzler

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70308 ,  G03F7/70216 ,  G03F7/70566

    摘要： The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.

    摘要翻译： 本发明涉及微光刻投影曝光装置和微光刻投影曝光装置，以及通过该方法制造的相关部件，方法和制品。 微光刻投影曝光装置包括照明系统和投影物镜。 照明系统可以照亮布置在投影物镜的物平面中的掩模。 掩模可以具有待成像的结构。 该方法可以包括用光照射照明系统的光瞳平面。 该方法还可以包括在投影物镜的平面内修改通过该平面的光的相位，幅度和/或极化。 可以以相互不同的方式对至少两个衍射级进行修改。 与没有修改的方法相比，在结构成像中获得的掩模诱导的图像对比损失可以减少。

    PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS WITH NEGATIVE BACK FOCUS OF THE ENTRY PUPIL
    9.
    发明申请
    PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS WITH NEGATIVE BACK FOCUS OF THE ENTRY PUPIL 有权
    投影目标和投影曝光装置与入侵者的负面反射

    公开(公告)号：US20120075608A1

    公开(公告)日：2012-03-29

    申请号：US13312196

    申请日：2011-12-06

    申请人： Hans-Juergen Mann ,  Wolfgang Singer

    发明人： Hans-Juergen Mann ,  Wolfgang Singer

    IPC分类号： G03B27/54 ,  G02B5/08

    CPC分类号： G02B17/0615 ,  B82Y10/00 ,  G02B13/22 ,  G02B17/0657 ,  G03F7/70233 ,  G03F7/7025 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

    摘要： The disclosure concerns a projection objective, which can include an object plane in which an object field is formed, an entry pupil, a mirrored entry pupil (RE) in a mirrored entry pupil plane obtained by mirroring the entry pupil (VE) at the object plane, an image plane, an optical axis, at least a first mirror and a second mirror. The projection objective can have a negative back focus of the entry pupil, and a principal ray originating from a central point of the object field and traversing the objective from the object plane to the image plane can intersect the optical axis in at least one point of intersection, wherein the geometric locations of all points of intersection lie between the image plane and the mirrored entry pupil plane.

    摘要翻译： 本公开涉及一种投影物镜，其可以包括其中形成物场的物平面，入射光瞳，通过在物体上镜像入射光瞳（VE）获得的镜像入射光瞳平面中的镜像入射光瞳（RE） 平面，图像平面，光轴，至少第一反射镜和第二反射镜。 投影物镜可以具有入射光瞳的负的后焦点，并且源自物场的中心点并且从物体平面向图像平面穿过物镜的主射线可以在光轴的至少一点 交叉点，其中所有交点交点的几何位置位于图像平面和镜像入射光瞳平面之间。