-
公开(公告)号：US07501642B2
公开(公告)日：2009-03-10
申请号：US11319770
申请日：2005-12-29
申请人： Johannes Hubertus Josephina Moors , Vadim Yevgenyevich Banine , Johannes Christiaan Leonardus Franken , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Alexander Matthijs Struycken
发明人： Johannes Hubertus Josephina Moors , Vadim Yevgenyevich Banine , Johannes Christiaan Leonardus Franken , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Alexander Matthijs Struycken
IPC分类号： G21K5/10
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005
摘要： A radiation source generates short-wavelength radiation, such as extreme ultraviolet radiation, for use in lithography. Rotating electrodes are provided which dip into respective baths of liquid metal, for example, tin. An electrical discharge is produced between the electrodes to generate the radiation. Holes are provided in the electrodes and/or in a metal shielding plate around the electrodes to enable better pumping down to low pressure in the vicinity of the discharge to improve the conversion efficiency of the source. The holes in the electrodes improve cooling of the electrodes by causing stirring of the liquid metal, and by improving the thermal and electrical contact between the electrodes and the liquid metal. Improved electrical contact also reduces the time-constant of the discharge circuit, thereby further improving the conversion efficiency of the source.
摘要翻译： 辐射源产生用于光刻的短波长辐射，例如极紫外辐射。 提供旋转电极，其浸入液体金属例如锡的各个浴中。 在电极之间产生放电以产生辐射。 在电极周围设置孔和/或在电极周围的金属屏蔽板中，以便在排出附近更好地向下降低压力以提高源的转换效率。 电极中的孔通过搅拌液态金属而改善电极的冷却，并改善电极和液态金属之间的热和电接触。 改善的电接触也降低了放电电路的时间常数，从而进一步提高了源的转换效率。
-
公开(公告)号：US20100290015A1
公开(公告)日：2010-11-18
申请号：US12821033
申请日：2010-06-22
申请人： Vadim Yevgenyevich BANINE , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Harm-Jan Voorma , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Carolus Ida Maria Antonius Spee , Klaas Timmer , Johannes Bernardus Ridder
发明人： Vadim Yevgenyevich BANINE , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Harm-Jan Voorma , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Carolus Ida Maria Antonius Spee , Klaas Timmer , Johannes Bernardus Ridder
CPC分类号： G03B7/20 , B08B7/00 , G01J1/0271 , G03F7/70175 , G03F7/70916 , G03F7/70925 , G03F7/70975
摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。
-
公开(公告)号：US07767989B2
公开(公告)日：2010-08-03
申请号：US11527728
申请日：2006-09-27
申请人： Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Harm-Jan Voorma , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Carolus Ida Maria Antonius Spee , Klaas Timmer , Johannes Bernardus Ridder
发明人： Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Harm-Jan Voorma , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Carolus Ida Maria Antonius Spee , Klaas Timmer , Johannes Bernardus Ridder
IPC分类号： G03B7/20
CPC分类号： G03B7/20 , B08B7/00 , G01J1/0271 , G03F7/70175 , G03F7/70916 , G03F7/70925 , G03F7/70975
摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。
-
公开(公告)号：US20120140196A1
公开(公告)日：2012-06-07
申请号：US13365758
申请日：2012-02-03
申请人： Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Harm-Jan Voorma , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Carolus Ida Maria Antonius Spee , Klaas Timmer , Johannes Bernardus Ridder
发明人： Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Harm-Jan Voorma , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Carolus Ida Maria Antonius Spee , Klaas Timmer , Johannes Bernardus Ridder
CPC分类号： G03B7/20 , B08B7/00 , G01J1/0271 , G03F7/70175 , G03F7/70916 , G03F7/70925 , G03F7/70975
摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。
-
公开(公告)号：US08134136B2
公开(公告)日：2012-03-13
申请号：US12821033
申请日：2010-06-22
申请人： Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Johannes Bernardus Ridder , Harm-Jan Voorma , Carolus Ida Maria Antonius Spee , Klaas Timmer
发明人： Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Johannes Bernardus Ridder , Harm-Jan Voorma , Carolus Ida Maria Antonius Spee , Klaas Timmer
IPC分类号： G03B7/20
CPC分类号： G03B7/20 , B08B7/00 , G01J1/0271 , G03F7/70175 , G03F7/70916 , G03F7/70925 , G03F7/70975
摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。
-
公开(公告)号：US07372058B2
公开(公告)日：2008-05-13
申请号：US11235547
申请日：2005-09-27
申请人： Vadim Yevgenyevich Banine , Lambertus Adrianus Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Johannes Bernardus Ridder , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits
发明人： Vadim Yevgenyevich Banine , Lambertus Adrianus Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Johannes Bernardus Ridder , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits
IPC分类号： G03B7/20
CPC分类号： G03B7/20 , B08B7/00 , G01J1/0271 , G03F7/70175 , G03F7/70916 , G03F7/70925 , G03F7/70975
摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。
-
公开(公告)号：US08598550B2
公开(公告)日：2013-12-03
申请号：US13365758
申请日：2012-02-03
申请人： Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Johannes Bernardus Ridder , Harm-Jan Voorma , Carolus Ida Maria Antonius Spee , Klaas Timmer
发明人： Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Johannes Bernardus Ridder , Harm-Jan Voorma , Carolus Ida Maria Antonius Spee , Klaas Timmer
IPC分类号： G03B7/20
CPC分类号： G03B7/20 , B08B7/00 , G01J1/0271 , G03F7/70175 , G03F7/70916 , G03F7/70925 , G03F7/70975
摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。
-
8.发明申请Lithographic apparatus, device manufacturing method, and use of a radiation collector 失效光刻设备，器件制造方法和辐射收集器的使用公开(公告)号：US20090066924A1
公开(公告)日：2009-03-12
申请号：US12289778
申请日：2008-11-04
申请人： Johannes Christiaan Leonardus Franken , Alexander Matthijs Struycken , Leon Joseph Marie Van Den Schoor
发明人： Johannes Christiaan Leonardus Franken , Alexander Matthijs Struycken , Leon Joseph Marie Van Den Schoor
CPC分类号： G03F7/70891 , F24S10/90 , F24S23/70 , F24S40/50 , G02B7/1815 , G03F7/70175
摘要： A lithographic apparatus, comprising a collector being constructed to receive radiation from a radiation source and transmit radiation to an illumination system, wherein the collector is provided with at least one fluid duct, the apparatus including a temperature conditioner to thermally condition the collector utilizing the fluid duct of the collector, the temperature conditioner being configured to feed a first fluid to the fluid duct during a first period, and to feed a second fluid to the fluid duct during at least a second period.
摘要翻译： 一种光刻设备，包括收集器，其被构造为接收来自辐射源的辐射并将辐射传输到照明系统，其中所述收集器设置有至少一个流体管道，所述设备包括温度调节器，以利用所述流体热收集器 收集器的管道，温度调节器被配置为在第一时段期间将第一流体供应到流体管道，并且在至少第二时段期间将第二流体供给到流体管道。
-
9.发明授权Lithographic apparatus, device manufacturing method, and use of a radiation collector 失效光刻设备，器件制造方法和辐射收集器的使用公开(公告)号：US07897941B2
公开(公告)日：2011-03-01
申请号：US12289778
申请日：2008-11-04
申请人： Johannes Christiaan Leonardus Franken , Alexander Matthijs Struycken , Leon Joseph Marie Van Den Schoor
发明人： Johannes Christiaan Leonardus Franken , Alexander Matthijs Struycken , Leon Joseph Marie Van Den Schoor
CPC分类号： G03F7/70891 , F24S10/90 , F24S23/70 , F24S40/50 , G02B7/1815 , G03F7/70175
摘要： A lithographic apparatus, comprising a collector being constructed to receive radiation from a radiation source and transmit radiation to an illumination system, wherein the collector is provided with at least one fluid duct, the apparatus including a temperature conditioner to thermally condition the collector utilizing the fluid duct of the collector, the temperature conditioner being configured to feed a first fluid to the fluid duct during a first period, and to feed a second fluid to the fluid duct during at least a second period.
摘要翻译： 一种光刻设备，包括收集器，其被构造为接收来自辐射源的辐射并将辐射传输到照明系统，其中所述收集器设置有至少一个流体管道，所述设备包括温度调节器，以利用所述流体热收集器 收集器的管道，温度调节器被配置为在第一时段期间将第一流体供应到流体管道，并且在至少第二时段期间将第二流体供给到流体管道。
-
10.发明授权Lithographic apparatus, device manufacturing method, and use of a radiation collector 失效光刻设备，器件制造方法和辐射收集器的使用公开(公告)号：US07462841B2
公开(公告)日：2008-12-09
申请号：US11253054
申请日：2005-10-19
申请人： Johannes Christiaan Leonardus Franken , Alexander Matthijs Struycken , Leon Joseph Marie Van Den Schoor
发明人： Johannes Christiaan Leonardus Franken , Alexander Matthijs Struycken , Leon Joseph Marie Van Den Schoor
CPC分类号： G03F7/70891 , F24S10/90 , F24S23/70 , F24S40/50 , G02B7/1815 , G03F7/70175
摘要： A lithographic apparatus, comprising a collector being constructed to receive radiation from a radiation source and transmit radiation to an illumination system, wherein the collector is provided with at least one fluid duct, the apparatus including a temperature conditioner to thermally condition the collector utilizing the fluid duct of the collector, the temperature conditioner being configured to feed a first fluid to the fluid duct during a first period, and to feed a second fluid to the fluid duct during at least a second period.
摘要翻译： 一种光刻设备，包括收集器，其被构造为接收来自辐射源的辐射并将辐射传输到照明系统，其中所述收集器设置有至少一个流体管道，所述设备包括温度调节器，以利用所述流体热收集器 收集器的管道，温度调节器被配置为在第一时段期间将第一流体供应到流体管道，并且在至少第二时段期间将第二流体供给到流体管道。
-
-
-
-
-
-
-
-
-
搜索结果
16 条记录 (耗时 0.032 秒)
