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    Apparatus and method for investigating and/or modifying a sample
    2.
    发明授权
    Apparatus and method for investigating and/or modifying a sample 有权
    用于调查和/或修改样品的装置和方法

    公开(公告)号：US08247782B2

    公开(公告)日：2012-08-21

    申请号：US12745059

    申请日：2010-05-27

    申请人： Klaus Edinger ,  Rainer Becker ,  Michael Budach ,  Thorsten Hofmann

    发明人： Klaus Edinger ,  Rainer Becker ,  Michael Budach ,  Thorsten Hofmann

    IPC分类号： H01J49/22 ,  G21K5/02

    CPC分类号： C23F4/00 ,  H01J37/3056 ,  H01J2237/28 ,  H01J2237/3174 ,  H01L21/76894 ,  H01L22/22 ,  H01L2924/0002 ,  H01L2924/00

    摘要： An apparatus and a method for investigating and/or modifying a sample is disclosed. The apparatus comprises a charged particle source, at least one particle optical element forming a charged particle beam of charged particles emitted by said charged particle source. The apparatus further comprises an objective lens which generates a charged particle probe from said charged particle beam. The objective lens defines a particle optical axis. A first electrostatic deflection element is arranged—in a direction of propagation of charged particles emitted by said charged particle source—downstream of the objective lens. The electrostatic deflection element deflecting the charged particle beam in a direction perpendicular to said charged particle optical axis and has a deflection bandwidth of at least 10 MHz.

    摘要翻译： 公开了一种用于调查和/或修改样品的装置和方法。 所述装置包括带电粒子源，至少一个粒子光学元件，形成由所述带电粒子源发射的带电粒子的带电粒子束。 该装置还包括从所述带电粒子束产生带电粒子探针的物镜。 物镜定义了粒子光轴。 第一静电偏转元件布置在由物镜的下游的所述带电粒子源发射的带电粒子的传播方向上。 静电偏转元件使垂直于所述带电粒子光轴的方向偏转带电粒子束并具有至少10MHz的偏转带宽。

    Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof
    3.
    发明授权
    Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof 有权
    电子显微镜，用于小型化结构物体的检查和处理及其方法

    公开(公告)号：US08058614B2

    公开(公告)日：2011-11-15

    申请号：US12655940

    申请日：2010-01-11

    申请人： Johannes Bihr ,  Friedhelm Panteleit ,  Tobias Clauss ,  Michael Budach

    发明人： Johannes Bihr ,  Friedhelm Panteleit ,  Tobias Clauss ,  Michael Budach

    IPC分类号： G01N23/00 ,  G21K7/00

    CPC分类号： H01J37/301 ,  G03F1/72 ,  G03F1/86 ,  H01J37/244 ,  H01J37/28 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/006 ,  H01J2237/18 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/2449 ,  H01J2237/30466 ,  H01J2237/30472 ,  H01J2237/31732 ,  H01J2237/31744

    摘要： The disclosure relates to a method for manufacturing an object with miniaturized structures. The method involves processing the object by supplying reaction gas during concurrent directing an electron beam onto a location to be processed, to deposit material or ablate material; and inspecting the object by scanning the surface of the object with an electron beam and leading generated backscattered electrons and secondary electrons to an energy selector, reflecting the secondary electrons from the energy selector, detecting the backscattered electrons passing the energy selector and generating an electron to microscopic image of the scanned region in dependence on the detected backscattered electrons; and examining the generated electron microscopic image and deciding whether further depositing or ablating of material should be carried out. The disclosure also relates to an electron microscope and a processing system which are adapted for performing the method.

    摘要翻译： 本公开涉及一种用于制造具有小型化结构的物体的方法。 该方法涉及通过在同时将电子束引导到待处理的位置，沉积材料或烧蚀材料的同时提供反应气体来处理物体; 并且通过用电子束扫描物体的表面并且将产生的后向散射的电子和二次电子引导到能量选择器来检查物体，反射来自能量选择器的二次电子，检测通过能量选择器的反向散射电子并产生电子 依赖于检测到的反向散射电子的扫描区域的微观图像; 并检查生成的电子显微镜图像，并决定是否进行进一步的沉积或消融材料。 本公开还涉及适于执行该方法的电子显微镜和处理系统。

    Determining a Repairing Form of a Defect at or Close to an Edge of a Substrate of a Photo Mask
    4.
    发明申请
    Determining a Repairing Form of a Defect at or Close to an Edge of a Substrate of a Photo Mask 有权
    确定在照相面具基材边缘处或靠近边缘处的缺陷的修复形式

    公开(公告)号：US20100154521A1

    公开(公告)日：2010-06-24

    申请号：US12640853

    申请日：2009-12-17

    申请人： Michael Budach

    发明人： Michael Budach

    IPC分类号： G01B5/28 ,  G06K9/62 ,  G01N23/00 ,  B23P6/00

    CPC分类号： G03F1/74 ,  G01Q30/06 ,  G01Q80/00 ,  G03F1/84 ,  H01J2237/2817 ,  Y10T29/49718

    摘要： Determining a repairing form of a defect at or close to an edge of a substrate. The defect may be scanned with a scanning probe microscope to determine a three-dimensional contour of the defect. The defect may be scanned with a scanning particle microscope to determine the shape of the at least one edge of the substrate. The repairing form of the defect may be determined from a combination of the three-dimensional contour and the shape of the at least one edge.

    摘要翻译： 确定在或接近基底边缘的缺陷的修复形式。 可以用扫描探针显微镜扫描缺陷以确定缺陷的三维轮廓。 可以用扫描微粒显微镜扫描缺陷以确定衬底的至少一个边缘的形状。 可以从三维轮廓和至少一个边缘的形状的组合来确定缺陷的修复形式。

    METHOD FOR PROCESSING AN OBJECT WITH MINIATURIZED STRUCTURES
    5.
    发明申请
    METHOD FOR PROCESSING AN OBJECT WITH MINIATURIZED STRUCTURES 审中-公开
    用微型结构处理对象的方法

    公开(公告)号：US20100297362A1

    公开(公告)日：2010-11-25

    申请号：US12848871

    申请日：2010-08-02

    申请人： Michael Budach ,  Tristan Bret ,  Klaus Edinger ,  Thorsten Hofmann

    发明人： Michael Budach ,  Tristan Bret ,  Klaus Edinger ,  Thorsten Hofmann

    IPC分类号： C23C8/06

    CPC分类号： G03F1/74 ,  C23C16/047 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/24495 ,  H01J2237/30466 ,  H01J2237/30483 ,  H01J2237/31732 ,  H01J2237/31744

    摘要： A method for processing an object with miniaturized structures is provided. The method includes feeding a reaction gas onto a surface of the object. The method also includes processing the object by directing an energetic beam onto a processing site in a region, which is to be processed, on the surface of the object, in order to deposit material on the object or to remove material from the object. The method further includes detecting interaction products of the beam with the object, and deciding whether the processing of the object is to be continued or can be terminated with the aid of information which is obtained from the detected interaction products of the beam with the object. The region to be processed is subdivided into a number of surface segments, and the interaction products detected upon the beam striking regions of the same surface segment are integrated to form a total signal in order to determine whether processing of the object must be continued or can be terminated.

    摘要翻译： 提供了一种用小型化结构处理物体的方法。 该方法包括将反应气体进料到物体的表面上。 该方法还包括通过将能量束引导到物体表面上待处理的区域中的处理位置上以便将物质沉积在物体上或从物体上去除材料来处理物体。 该方法还包括检测光束与物体的相互作用产物，并且借助于从检测到的与物体的光束的相互作用产物获得的信息来确定物体的处理是继续还是可以终止。 要处理的区域被细分成多个表面段，并且在相同表面段的射束区域上检测到的相互作用产物被积分以形成总信号，以便确定物体的处理是否必须继续或可以 被终止。

    Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof
    6.
    发明授权
    Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof 有权
    电子显微镜，用于小型化结构物体的检查和处理及其方法

    公开(公告)号：US07645989B2

    公开(公告)日：2010-01-12

    申请号：US11902125

    申请日：2007-09-19

    申请人： Johannes Bihr ,  Friedhelm Panteleit ,  Tobias Clauss ,  Michael Budach

    发明人： Johannes Bihr ,  Friedhelm Panteleit ,  Tobias Clauss ,  Michael Budach

    IPC分类号： G01N23/00 ,  G21K7/00

    CPC分类号： H01J37/301 ,  G03F1/72 ,  G03F1/86 ,  H01J37/244 ,  H01J37/28 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/006 ,  H01J2237/18 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/2449 ,  H01J2237/30466 ,  H01J2237/30472 ,  H01J2237/31732 ,  H01J2237/31744

    摘要： The disclosure relates to a method for manufacturing an object with miniaturized structures. The method involves processing the object by supplying reaction gas during concurrent directing an electron beam onto a location to be processed, to deposit material or ablate material; and inspecting the object by scanning the surface of the object with an electron beam and leading generated backscattered electrons and secondary electrons to an energy selector, reflecting the secondary electrons from the energy selector, detecting the backscattered electrons passing the energy selector and generating an electron microscopic image of the scanned region in dependence on the detected backscattered electrons; and examining the generated electron microscopic image and deciding whether further depositing or ablating of material should be carried out. The disclosure also relates to an electron microscope and a processing system which are adapted for performing the method.

    摘要翻译： 本公开涉及一种用于制造具有小型化结构的物体的方法。 该方法涉及通过在同时将电子束引导到待处理的位置，沉积材料或烧蚀材料的同时提供反应气体来处理物体; 并通过用电子束扫描物体的表面来检查物体，并将产生的反向散射电子和二次电子引导到能量选择器，反射来自能量选择器的二次电子，检测通过能量选择器的反向散射电子并产生电子显微镜 依赖于检测到的反向散射电子的扫描区域的图像; 并检查生成的电子显微镜图像，并决定是否进行进一步的沉积或消融材料。 本公开还涉及适于执行该方法的电子显微镜和处理系统。

    APPARATUS AND METHOD FOR INVESTIGATING AND/OR MODIFYING A SAMPLE
    8.
    发明申请
    APPARATUS AND METHOD FOR INVESTIGATING AND/OR MODIFYING A SAMPLE 有权
    用于调查和/或修改样品的装置和方法

    公开(公告)号：US20110210181A1

    公开(公告)日：2011-09-01

    申请号：US12745059

    申请日：2010-05-27

    申请人： Klaus Edinger ,  Rainer Becker ,  Michael Budach ,  Thorsten Hofmann

    发明人： Klaus Edinger ,  Rainer Becker ,  Michael Budach ,  Thorsten Hofmann

    IPC分类号： B05B5/025

    CPC分类号： C23F4/00 ,  H01J37/3056 ,  H01J2237/28 ,  H01J2237/3174 ,  H01L21/76894 ,  H01L22/22 ,  H01L2924/0002 ,  H01L2924/00

    摘要： An apparatus and a method for investigating and/or modifying a sample is disclosed. The apparatus comprises a charged particle source, at least one particle optical element forming a charged particle beam of charged particles emitted by said charged particle source. The apparatus further comprises an objective lens which generates a charged particle probe from said charged particle beam. The objective lens defines a particle optical axis. A first electrostatic deflection element is arranged—in a direction of propagation of charged particles emitted by said charged particle source—downstream of the objective lens. The electrostatic deflection element deflecting the charged particle beam in a direction perpendicular to said charged particle optical axis and has a deflection bandwidth of at least 10 MHz.

    摘要翻译： 公开了一种用于调查和/或修改样品的装置和方法。 所述装置包括带电粒子源，至少一个粒子光学元件，形成由所述带电粒子源发射的带电粒子的带电粒子束。 该装置还包括从所述带电粒子束产生带电粒子探针的物镜。 物镜定义了粒子光轴。 第一静电偏转元件布置在由物镜的下游的所述带电粒子源发射的带电粒子的传播方向上。 静电偏转元件使垂直于所述带电粒子光轴的方向偏转带电粒子束并具有至少10MHz的偏转带宽。

    Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof
    9.
    发明申请
    Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof 有权
    电子显微镜，用于小型化结构物体的检查和处理及其方法

    公开(公告)号：US20100119698A1

    公开(公告)日：2010-05-13

    申请号：US12655940

    申请日：2010-01-11

    申请人： Johannes Bihr ,  Friedhelm Panteleit ,  Tobias Clauss ,  Michael Budach

    发明人： Johannes Bihr ,  Friedhelm Panteleit ,  Tobias Clauss ,  Michael Budach

    IPC分类号： C23C16/44 ,  G01N23/00

    CPC分类号： H01J37/301 ,  G03F1/72 ,  G03F1/86 ,  H01J37/244 ,  H01J37/28 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/006 ,  H01J2237/18 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/2449 ,  H01J2237/30466 ,  H01J2237/30472 ,  H01J2237/31732 ,  H01J2237/31744

    摘要： The disclosure relates to a method for manufacturing an object with miniaturized structures. The method involves processing the object by supplying reaction gas during concurrent directing an electron beam onto a location to be processed, to deposit material or ablate material; and inspecting the object by scanning the surface of the object with an electron beam and leading generated backscattered electrons and secondary electrons to an energy selector, reflecting the secondary electrons from the energy selector, detecting the backscattered electrons passing the energy selector and generating an electron to microscopic image of the scanned region in dependence on the detected backscattered electrons; and examining the generated electron microscopic image and deciding whether further depositing or ablating of material should be carried out. The disclosure also relates to an electron microscope and a processing system which are adapted for performing the method.

    摘要翻译： 本公开涉及一种用于制造具有小型化结构的物体的方法。 该方法涉及通过在同时将电子束引导到待处理的位置，沉积材料或烧蚀材料的同时提供反应气体来处理物体; 并且通过用电子束扫描物体的表面并且将产生的后向散射的电子和二次电子引导到能量选择器来检查物体，反射来自能量选择器的二次电子，检测通过能量选择器的反向散射电子并产生电子 依赖于检测到的反向散射电子的扫描区域的微观图像; 并检查生成的电子显微镜图像，并决定是否进行进一步的沉积或消融材料。 本公开还涉及适于执行该方法的电子显微镜和处理系统。