公开(公告)号：US06896466B2

公开(公告)日：2005-05-24

申请号：US10096691

申请日：2002-03-12

申请人： Joichi Nishimura ,  Masami Ohtani ,  Yasuhiko Hashimoto

发明人： Joichi Nishimura ,  Masami Ohtani ,  Yasuhiko Hashimoto

IPC分类号： B65G49/07 ,  B25J18/02 ,  B25J18/04 ,  H01L21/677 ,  H01L21/687

CPC分类号： B25J18/025 ,  B25J18/04 ,  H01L21/68707 ,  Y10S414/139

摘要： A substrate processing apparatus includes a transport robot (TR1) formed with a telescopic vertical movement mechanism of a so-called telescopially nestable multi-tier construction. A drive mechanism (D1) is initially driven to move a support member (48) upwardly to simultaneously elevate a vertical movement member (42d). As the vertical movement member (42d) rises, a pulley (47c) simultaneously moves upwardly. As the pulley (47c) moves upwardly, a vertical movement member (42c) is lifted upwardly by a belt (L1). Similar actions elevate a pair of transport arms (31a, 31b) provided on the top of a vertical movement member (42a). The increase in the number of tiers of the nestable multi-tier structure precludes the increase in height of the transport robot (TR1) in its retracted position. The substrate processing apparatus, if having an increased height, is capable of transporting a substrate to and from processing portions and eliminates the need to reassemble and adjust the transport robot (TR1) for transportation of the apparatus.

摘要翻译： 基板处理装置包括形成有所谓的可伸缩的多层结构的伸缩式垂直运动机构的输送机器人（TR1）。 驱动机构（D 1）最初被驱动以向上移动支撑构件（48）以同时升高垂直运动构件（42d）。 当垂直运动构件（42d）升高时，滑轮（47c）同时向上移动。 当滑轮（47c）向上移动时，垂直运动件（42c）被带（L1）向上提升。 类似的动作提升设置在垂直运动件（42,4a）顶部上的一对传送臂（31a，31b）。 可嵌套多层结构的层数的增加排除了运输机器人（TR 1）在缩回位置的高度增加。 基板处理装置如果具有增加的高度，则能够将基板输送到处理部分和从处理部分输送基板处理装置，并且不需要重新组装和调整运输机器人（TR 1）以便运送装置。

公开(公告)号：US06688189B2

公开(公告)日：2004-02-10

申请号：US09837109

申请日：2001-04-18

申请人： Yasuhiko Hashimoto ,  Masami Ohtani ,  Joichi Nishimura

发明人： Yasuhiko Hashimoto ,  Masami Ohtani ,  Joichi Nishimura

IPC分类号： B25J1700

CPC分类号： B25J18/025 ,  F16M11/08 ,  F16M11/18 ,  F16M11/2014 ,  F16M11/28 ,  Y10S414/135 ,  Y10T74/18848 ,  Y10T74/20323

摘要： Provided is a robot comprising a telescopic-drive mechanism which does not contaminate works in a purified environment such as a clean room, is easy to handle, and requires no cover for covering the telescopic-drive mechanism. A robot comprises: an up-down axis in which a plurality of hollow axis sectional elements telescopically continue; and a telescopic-drive mechanism for driving the up-down axis to be vertically extended or retracted between an extended state in which a tip end of the up-down axis extends with respect to a base end thereof and a retracted state in which the tip end is moved close to the base end, wherein the telescopic-drive mechanism is integrated on one side of the up-down axis without being exposed from the up-down axis.

摘要翻译： 本发明提供一种机器人，其包括不会在诸如洁净室的净化环境中污染工作的伸缩驱动机构，易于处理，并且不需要用于覆盖伸缩驱动机构的盖。 机器人包括：上下轴线，多个中空轴线部分可伸缩地延伸在其中; 以及伸缩驱动机构，用于驱动上下轴线在上下轴线的前端相对于其基端部延伸的伸出状态和垂直延伸状态之间垂直延伸或缩回，在该状态下， 端部移动靠近基端，其中伸缩驱动机构集成在上下轴线的一侧，而不会暴露于上下轴线。

公开(公告)号：US06371713B1

公开(公告)日：2002-04-16

申请号：US09143027

申请日：1998-08-28

申请人： Joichi Nishimura ,  Masami Ohtani ,  Yasuhiko Hashimoto

发明人： Joichi Nishimura ,  Masami Ohtani ,  Yasuhiko Hashimoto

IPC分类号： B65G4907

CPC分类号： B25J18/025 ,  B25J18/04 ,  H01L21/68707 ,  Y10S414/139

摘要： A substrate processing apparatus includes a transport robot (TR1) formed with a telescopic vertical movement mechanism of a so-called telescopically nestable multi-tier construction. A drive mechanism (D1) is initially driven to move a support member (48) upwardly to simultaneously elevate a vertical movement member (42d). As the vertical movement member (42d) rises, a pulley (47c) simultaneously moves upwardly. As the pulley (47c) moves upwardly, a vertical movement member (42c) is lifted upwardly by a belt (L1). Similar actions elevate a pair of transport arms (31a, 31b) provided on the top of a vertical movement member (42a). The increase in the number of tiers of the nestable multi-tier structure precludes the increase in height of the transport robot (TR1) in its retracted position. The substrate processing apparatus, if having an increased height, is capable of transporting a substrate to and from processing portions and eliminates the need to reassemble and adjust the transport robot (TR1) for transportation of the apparatus.

摘要翻译： 基板处理装置包括形成有所谓的可伸缩的多层结构的伸缩式垂直运动机构的输送机器人（TR1）。 驱动机构（D1）最初被驱动以向上移动支撑构件（48）以同时升高垂直运动构件（42d）。 当垂直运动构件（42d）升高时，滑轮（47c）同时向上移动。 当滑轮（47c）向上移动时，垂直运动构件（42c）被带（L1）向上提升。 类似的动作提升了设置在垂直运动件（42a）的顶部上的一对传送臂（31a，31b）。 可嵌套多层结构的层数的增加排除了运输机器人（TR1）处于缩回位置的高度增加。 基板处理装置如果具有增加的高度，则能够将基板输送到处理部分和从处理部分输送基板处理装置，并且不需要重新组装和调整运输机器人（TR1）以便运送装置。

公开(公告)号：US6060697A

公开(公告)日：2000-05-09

申请号：US39141

申请日：1998-03-13

申请人： Akihiko Morita ,  Masami Ohtani ,  Yasuo Imanishi ,  Masao Tsuji ,  Masaki Iwami ,  Joichi Nishimura ,  Kazuhiro Nishimura ,  Tetsuya Hamada ,  Satoshi Yamamoto ,  Kenji Kamei

发明人： Akihiko Morita ,  Masami Ohtani ,  Yasuo Imanishi ,  Masao Tsuji ,  Masaki Iwami ,  Joichi Nishimura ,  Kazuhiro Nishimura ,  Tetsuya Hamada ,  Satoshi Yamamoto ,  Kenji Kamei

IPC分类号： H01L21/02 ,  G05D23/19 ,  H02J3/00 ,  H02J13/00 ,  H05B1/02

CPC分类号： G05D23/1951

摘要： A substrate processing apparatus reduces an instantaneous maximum power consumption at turn-on. Power receiving parts of a plurality of processing units are connected to one end of a turn-on switch respectively through switches. The other end of the turn-on switch is connected to an external power source through a breaker. Timer values are set in advance in the timers, respectively. When the turn-on switch is turned on, the timers turn on the associated switches respectively after times which are defined by the timer values, whereby the processing units are provided with electric power, each with a delay of a constant time.

摘要翻译： 基板处理装置降低开启时的瞬时最大功耗。 多个处理单元的受电部分分别通过开关连接到导通开关的一端。 导通开关的另一端通过断路器连接到外部电源。 定时器值分别在定时器中设置。 当接通开关接通时，定时器分别在由定时器值定义的时间之后分别关闭相应的开关，由此处理单元被提供电力，每个具有恒定时间的延迟。

公开(公告)号：US06790286B2

公开(公告)日：2004-09-14

申请号：US10047818

申请日：2002-01-15

申请人： Joichi Nishimura ,  Masami Ohtani ,  Kenji Hashinoki ,  Masayoshi Shiga ,  Koji Hashimoto

发明人： Joichi Nishimura ,  Masami Ohtani ,  Kenji Hashinoki ,  Masayoshi Shiga ,  Koji Hashimoto

IPC分类号： B05C1100

CPC分类号： H01L21/67178 ,  H01L21/67766 ,  Y10S414/135 ,  Y10S414/137

摘要： Substrate processing parts are stacked and arranged in a multistage manner around a transport robot arranged at the center of a processing area. Rotary application units are arranged on a second layer through an indexer and the transport robot. Rotary developing units are stacked above the rotary application units respectively on a fourth layer located above the second layer. Multistage thermal processing units and an edge exposure unit are horizontally arranged in line above the indexer. In place of the processing units, inspection units performing a macro defect inspection and pattern line width measurement may be arranged in the upside region of the indexer space.

摘要翻译： 衬底处理部件以布置在处理区域的中心的运输机器人的方式堆叠并布置成多级。 旋转应用单元通过分度器和输送机器人布置在第二层上。 旋转显影单元分别堆叠在位于第二层上方的第四层上的旋转施加单元上方。 多级热处理单元和边缘曝光单元在分度器上方水平排列。 代替处理单元，执行宏缺陷检查和图案线宽度测量的检查单元可以布置在分度器空间的上侧区域中。

公开(公告)号：US06260562B1

公开(公告)日：2001-07-17

申请号：US09166593

申请日：1998-10-06

申请人： Kenya Morinishi ,  Masami Ohtani ,  Joichi Nishimura ,  Akihiko Morita

发明人： Kenya Morinishi ,  Masami Ohtani ,  Joichi Nishimura ,  Akihiko Morita

IPC分类号： B08B302

CPC分类号： H01L21/67051 ,  B05C11/08 ,  Y10S134/902

摘要： A substrate cleaning apparatus includes a spin support for supporting and spinning a substrate, a nozzle for discharging a cleaning liquid with a given cleaning condition from a discharge opening, a moving mechanism for moving the nozzle at least between center and edge of the substrate, a cleaning condition adjuster for adjusting the cleaning condition, and a controller for controlling the cleaning condition adjuster to vary the cleaning condition according to a cleaning liquid supply position movable over the substrate surface.

摘要翻译： 基板清洗装置包括用于支撑和旋转基板的旋转支撑件，用于从排出口排出具有给定清洁条件的清洁液体的喷嘴，用于至少在基板的中心和边缘之间移动喷嘴的移动机构， 清洁条件调节器，用于调节清洁状态;以及控制器，用于控制清洁状态调节器，以根据可移动到基板表面上的清洁液体供应位置来改变清洁状态。

公开(公告)号：US06051101A

公开(公告)日：2000-04-18

申请号：US39824

申请日：1998-03-16

申请人： Masami Ohtani ,  Yasuo Imanishi ,  Masao Tsuji ,  Takanori Kawamoto ,  Masaki Iwami ,  Joichi Nishimura ,  Akihiko Morita

发明人： Masami Ohtani ,  Yasuo Imanishi ,  Masao Tsuji ,  Takanori Kawamoto ,  Masaki Iwami ,  Joichi Nishimura ,  Akihiko Morita

IPC分类号： B65G49/07 ,  H01L21/00 ,  H01L21/027 ,  H01L21/677 ,  B65H1/00

CPC分类号： H01L21/67161 ,  H01L21/67178 ,  H01L21/67742 ,  H01L21/67745

摘要： A unit arrangement part comprises a chemical cabinet on its lowermost part, while coating units for forming a resist film on a substrate and developing units for developing the substrate after exposure are arranged on four corners of an apparatus above the chemical cabinet. Further, multistage thermal processing units for thermal-processing the substrate are arranged on front and rear portions of the apparatus above these wet processing units. A cleaning unit for supplying a cleaning liquid such as pure water and cleaning the substrate is arranged on a front side of the apparatus between the coating units as a substrate processing unit. Thus provided is a substrate processing apparatus having excellent workability in maintenance with a high degree of freedom in arrangement of processing units.

摘要翻译： 单元布置部分包括在其最下部分的化学柜，而在基板上形成抗蚀剂膜的涂布单元和曝光后用于显影基板的显影单元布置在化学柜上方的设备的四个角上。 此外，用于热处理基板的多级热处理单元布置在这些湿处理单元上方的设备的前部和后部。 在作为基板处理单元的涂布单元之间的设备的前侧设置有用于供应诸如纯水的清洁液体并清洁基板的清洁单元。 因此，提供了一种具有优异的维护可加工性的基板处理装置，并且处理单元的布置自由度高。

公开(公告)号：US06286525B1

公开(公告)日：2001-09-11

申请号：US09071683

申请日：1998-05-01

申请人： Joichi Nishimura ,  Akihiko Morita ,  Masami Ohtani

发明人： Joichi Nishimura ,  Akihiko Morita ,  Masami Ohtani

IPC分类号： B08B300

CPC分类号： H01L21/67051 ,  B08B1/04 ,  B08B3/00 ,  H01L21/67046 ,  Y10S134/902

摘要： A plurality of cleaning devices of the same type are attached to one support arm. The cleaning devices are simultaneously moved over a surface to be cleaned of a substrate supported and spun by a substrate supporting and spinning mechanism. Thus, the same type of cleaning devices share the task of cleaning the entire surface of the substrate, thereby to improve cleaning efficiency and shorten cleaning time. Different types of cleaning devices may be attached to the support arm for simultaneous cleaning of the entire surface of the substrate. Where different types of cleaning brushes are attached to the support arm, a cleaning operation may be carried out by simultaneously using cleaning brushes of optimal hardness for different regions on the substrate surface.

摘要翻译： 多个相同类型的清洁装置连接到一个支撑臂。 清洁装置同时移动到由基板支撑和旋转机构支撑和纺出的基板的待清洁表面上。 因此，相同类型的清洁装置共享清洁基板的整个表面的任务，从而提高清洁效率并缩短清洁时间。 可以将不同类型的清洁装置连接到支撑臂上，以同时清洁基板的整个表面。 在不同类型的清洁刷附接到支撑臂的情况下，清洁操作可以通过同时使用基板表面上不同区域的最佳硬度的清洁刷进行。

公开(公告)号：US20050204196A1

公开(公告)日：2005-09-15

申请号：US11078192

申请日：2005-03-11

申请人： Joichi Nishimura ,  Masami Ohtani

发明人： Joichi Nishimura ,  Masami Ohtani

IPC分类号： H01L21/02 ,  G06F11/00 ,  H01L21/00

CPC分类号： H01L21/67253 ,  H01L21/67276

摘要： A moving image representing a maintenance method is reflected on a moving image display section in an operation panel. A worker can grasp the maintenance method by seeing the moving image displayed on the moving image display section. Consequently, maintenance can be performed in a short time and accurately in accordance with the moving image displayed on the moving image display section.

摘要翻译： 表示维护方法的运动图像被反映在操作面板中的运动图像显示部分上。 工人可以通过看到运动图像显示部分上显示的运动图像来掌握维护方法。 因此，可以根据运动图像显示部分上显示的运动图像在短时间内准确地进行维护。

公开(公告)号：US06790287B2

公开(公告)日：2004-09-14

申请号：US09942153

申请日：2001-08-29

申请人： Masayoshi Shiga ,  Kenji Hashinoki ,  Masami Ohtani ,  Joichi Nishimura

发明人： Masayoshi Shiga ,  Kenji Hashinoki ,  Masami Ohtani ,  Joichi Nishimura

IPC分类号： C23C1600

CPC分类号： H01L21/67207 ,  H01L21/67253

摘要： An inspection unit is provided in a substrate processing apparatus performing resist coating processing and development processing on a substrate. In the inspection unit, a film thickness measuring device, a line width measuring device, an overlay measuring device and a macro defect inspection device are successively stacked and arranged from below. The inspection unit is provided on an intermediate portion of a substrate transport path formed in the substrate processing apparatus. The substrate processed in the substrate processing apparatus is selectively introduced into each inspection part. Therefore, the apparatus can properly inspect the substrate at need while suppressing reduction of the throughput. Thus provided are a substrate processing apparatus and a substrate inspection method capable of properly inspecting a substrate while suppressing reduction of the throughput.

摘要翻译： 在基板上进行抗蚀剂涂布处理和显影处理的基板处理装置中设置有检查单元。 在检查单元中，从下方依次堆叠并布置膜厚测量装置，线宽测量装置，覆盖测量装置和宏观缺陷检查装置。 检查单元设置在形成在基板处理装置中的基板输送路径的中间部。 将在基板处理装置中处理的基板选择性地导入各检查部。 因此，能够在抑制生产量的降低的同时适当地检查需要的基板。 这样提供了能够在抑制生产量降低的同时适当地检查基板的基板处理装置和基板检查方法。