摘要:
This invention provides an anode for a fuel cell which can realize stable output for a long period of time, and a fuel cell using the anode for a fuel cell. The anode for a fuel cell comprises an electrode catalyst layer, the electrode catalyst layer comprising a supported catalyst comprising an electroconductive carrier material and catalyst fine particles supported on the electroconductive carrier material, a proton conductive inorganic oxide, and a proton conductive organic polymer binder, the weight ratio between the supported catalyst (C) and the proton conductive inorganic oxide (SA), WSA/WC, being 0.06 to 0.38, the weight ratio between the proton conductive inorganic oxide (SA) and the proton conductive organic polymer binder (P), WP/WSA, being 0.125 to 0.5.
摘要:
A fuel cell, which can supply stable output even at elevated temperatures and can maintain its power generation performance over a long period of time, can be realized by an electrode for a fuel cell comprising a catalyst layer formed of a catalyst composite and a binder, the catalyst composite comprising a proton-conductive inorganic oxide and an oxidation-reduction catalyst phase supported on the proton-conductive inorganic oxide, the proton-conductive inorganic oxide comprising a catalyst carrier selected from tin(Sn)-doped In2O3, fluorine(F)-doped SnO2, and antimony(Sb)-doped SnO2 and an oxide particle phase chemically bonded to the surface of the catalyst carrier. The catalyst composite is manufactured by dispersing a catalyst carrier in a solution containing a material as a starting material for an oxide particle phase, heat treating the dispersion to form a proton-conductive inorganic oxide, further dispersing the proton-conductive inorganic oxide in a catalyst precursor-containing solution, and subjecting the dispersion to heat treatment or pH adjustment to deposit a catalyst phase.
摘要:
A cathode for a fuel cell is provided, which includes an electrode catalyst layer. This electrode catalyst layer is constituted by a carried catalyst including a conductive carrier and catalytic fine particles carried on the conductive carrier, by a proton-conductive inorganic oxide containing an oxide carrier and oxide particles carried on a surface of the oxide carrier, and by a proton-conductive organic polymer binder. The carried catalyst is incorporated therein at a weight of WC. Silicon oxide is carried on the surface of the proton-conductive inorganic oxide at a weight ratio of 0.1-0.5 times as much as the weight of the proton-conductive inorganic oxide. The proton-conductive inorganic oxide is incorporated at a weight of WSA+SiO2. The weight ratio (WSA+SiO2/WC) is confined to 0.01-0.25. The proton-conductive organic polymer binder is incorporated at a weight of WP, the weigh ratio (WP/WSA+SiO2) is confined to 0.5-43.
摘要:
The substrate processing apparatus includes a susceptor, which is connected to a high frequency power source and on which a substrate is held, an upper electrode plate facing the susceptor, and a processing space PS formed between the susceptor and the upper electrode, to perform a plasma etching process on the wafer by using plasma. The substrate processing apparatus includes a dielectric plate which covers a surface of the upper electrode plate, the surface of which faces the processing space PS, the upper electrode plate is divided into an inner electrode facing a center portion of the wafer and an outer electrode facing a circumferential portion of the wafer, the inner electrode and the outer electrode are electrically insulated from each other, and a second variable DC power source applies a positive DC voltage to the inner electrode and the outer electrode is electrically grounded.
摘要:
A substrate processing apparatus includes a chamber accommodating a wafer, a susceptor disposed inside the chamber and on which the wafer is held, an upper electrode facing the susceptor, and a second high frequency power source connected to the susceptor, wherein the upper electrode is electrically connected to a ground and is moveable with respect to the susceptor. The substrate processing apparatus divides a potential difference between plasma generated in a processing space and the ground into a potential difference between the plasma and a dielectric and a potential difference between the dielectric and the ground by burying the dielectric in the upper electrode, and changes a gap between the upper electrode and the susceptor. Accordingly, plasma density between the upper electrode and the susceptor is changed
摘要:
Disclosed is a substrate processing apparatus capable of suppressing generation of plasma in the space between a moving electrode and an end wall at one side of a cylindrical chamber. The substrate processing apparatus includes a cylindrical chamber to receive a wafer, a shower head movable along a central axis of the chamber inside the chamber, a susceptor opposing the shower head in the chamber, and a flexible bellows connecting the shower head to a cover of the chamber, wherein a high frequency power is applied to a processing space presented between the shower head and the susceptor, processing gas is introduced into the processing space, the shower head and the side wall of the chamber are non-contact to each other, and a bypass member is installed electrically connecting the shower head and the cover or the side wall of the chamber.
摘要:
A semiconductor device in which current flows in a vertical direction includes a structure that decreases resistance between a source electrode and a drain electrode along with a current path at a position different from a position having highest electric field intensity between the source electrode and the drain electrode.