摘要:
A semiconductor memory device includes a number of conductive layers for bit and selection lines alternately juxtaposed on the surface of a semiconductor substrate beneath a field insulating layer, with a number of MOS type memory cells arranged between the conductive layers for the bit and selection lines.
摘要:
A semiconductor integrated circuit device and a method of manufacturing the same, wherein an MIS type memory transistor of a two-layered gate electrode structure is formed on the surface of a semiconductor substrate, and an MIS type transistor for a low voltage having a comparatively thin gate oxide film and an MIS type transistor for a high voltage having a comparatively thick gate oxide film are formed around the memory transistor.
摘要:
A semiconductor integrated circuit device and a method of manufacturing the same, wherein an MIS type memory transistor of a two-layered gate electrode structure is formed on the surface of a semiconductor substrate, and an MIS type transistor for a low voltage having a comparatively thin gate oxide film and an MIS type transistor for a high voltage having a comparatively thick gate oxide film are formed around the memory transistor.
摘要:
A semiconductor memory device and a method of manufacturing the device wherein a field insulation is formed in a surface of a semiconductor body except for the source, drain and channel regions, a first floating gate is self-aligned to the channel region, a second gate insulated from the first floating gate covers the first floating gate and the first insulator having a width substantially same as the length of the channel region between the source and the drain regions.
摘要:
A semiconductor memory device and a method of manufacturing the device wherein a field insulation is formed in a surface of a semiconductor body except for the source, drain and channel regions, a first floating gate is self-aligned to the channel region, a second gate insulated from the first floating gate covers the first floating gate and the first insulator having a width substantially same as the length of the channel region between the source and the drain regions.
摘要:
A display device includes a display panel unit and a backlight unit which radiates light toward the display panel. The display panel unit includes a display panel on an upper surface of a box-shaped panel housing which has first projecting portions on side walls of the housing. The backlight unit incorporates a light source in a bottom portion of a box-shaped light source housing which has second projecting portions on side walls of the light source housing. By bringing the first projecting portions and second projecting portions into contact with each other, a distance between the light source of the backlight unit and the display panel can be held. Further, by forming third projecting portions which project further than the first projecting portions on the panel housing, handling of the display panel unit is facilitated.
摘要:
A heat-sensitive composition is disclosed which includes a substance which absorbs light and generates heat, an anionic self water-dispersible resin particle having an acid value of 10 to 300 and an average particle diameter of 0.005 to 15 &mgr;m, and a fluorine base surfactant. An original plate for a lithographic printing plate is disclosed which includes an ordinary negative- or positive-type PS plate having coated thereon the heat-sensitive composition. The original plate is image-wise exposed with high energy density light based on digital image information from a computer, subjected to first development with an aqueous alkali solution, flood exposure with active light, a second development with a developer for a negative or a positive, and post-treatment to obtain a printing plate.
摘要:
A melt spinning pack, including a pack case, a spinneret having many spinning holes positioned at the bottom of the case, a pack cap having a polymer introducing hole at the center positioned at the top of the case, and a flow arranging plate having many flow arranging holes with restricted portions reduced in cross sectional area compared to the inlets of the holes positioned between the spinneret and the pack cap, satisfying the requirement that the contraction percentage R be 50% or less, respectively contained in the case.
摘要:
A semiconductor integrated circuit device having a switching MISFET, and a capacitor element formed over the semiconductor substrate, such as a DRAM, is disclosed. In a first aspect of the present invention, the impurity concentration of the semiconductor region of the switching MISFET to which the capacitor element is connected is less than the impurity concentration of semiconductor regions of MISFETs of peripheral circuitry. In a second aspect, the Y-select signal line overlaps the lower electrode layer of the capacitor element. In a third aspect, a potential barrier layer, provided at least under the semiconductor region of the switching MISFET to which the capacitor element is connected, is formed by diffusion of an impurity for a channel stopper region. In a fourth aspect, the dielectric film of the capacitor element is co-extensive with the capacitor electrode layer over it. In a fifth aspect, the capacitor dielectric film is a silicon nitride film having a silicon oxide layer thereon, the silicon oxide layer being formed by oxidizing a surface layer of the silicon nitride under high pressure. In sixth and seventh aspects, wiring is provided.
摘要:
A semiconductor integrated circuit device having a switching MISFET, and a capacitor element formed over the semiconductor substrate, is disclosed. In a first aspect, the impurity concentration of the semiconductor region of the switching MISFET to which the capacitor element is connected is less than the impurity concentration of semiconductor regions of MISFETs of peripheral circuitry. In other aspects, a Y-select signal line overlaps the lower electrode layer of the capacitor element; a potential barrier layer, provided at least under the semiconductor region of the switching MISFET to which the capacitor element is connected, is formed by diffusion of an impurity for a channel stopper region; the dielectric film of the capacitor element is co-extensive with the capacitor electrode layer over it, the capacitor dielectric film being a silicon nitride film having a silicon oxide layer thereon, the silicon oxide layer being formed by oxidizing a surface layer of the silicon nitride under high pressure; an aluminum wiring layer and a protective (and/or barrier) layer are formed by sputtering in the same vacuum sputtering chamber without breaking the vacuum between forming the layers; and a refractory metal, or a refractory metal silicide, is used as the protective layer for an aluminum wiring containing an added element (e.g., Cu) to prevent migration.