公开(公告)号：US20170271214A1

公开(公告)日：2017-09-21

申请号：US15253476

申请日：2016-08-31

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Kentaro KASA ,  Kazuya FUKUHARA ,  Kazutaka ISHIGO ,  Manabu TAKAKUWA ,  Yoshinori HAGIO ,  Kazuhiro SEGAWA ,  Yuki MURASAKA ,  Tetsuya KUGIMIYA ,  Yuu YAMAYOSE ,  Yosuke OKAMOTO

IPC: H01L21/66 ,  G01B11/30 ,  G01N25/72 ,  G03F7/26 ,  H01L21/027 ,  G03F7/20 ,  G03F7/039 ,  G01B11/27 ,  H01L21/67

CPC classification number: H01L22/20 ,  G01B11/002 ,  G01B11/24 ,  G01B11/27 ,  G01B11/306 ,  G01B2210/44 ,  G01B2210/56 ,  G01N25/72 ,  G03F7/039 ,  G03F7/20 ,  G03F7/26 ,  H01L21/0274 ,  H01L21/67248 ,  H01L21/67288 ,  H01L21/68 ,  H01L22/12

Abstract: A pattern accuracy detecting apparatus includes a stage for supporting a substrate, an optical warpage detecting unit that measures a shape of a substrate disposed on the stage, an optical pattern detection unit that detects a position of a pattern on the substrate, and a processing unit that corrects the detected pattern position based on the measured shape of the substrate.

公开(公告)号：US20150251350A1

公开(公告)日：2015-09-10

申请号：US14481381

申请日：2014-09-09

Applicant: Kabushiki Kaisha Toshiba

Inventor： Yosuke OKAMOTO ,  Nobuhiro KOMINE ,  Kazuhiro SEGAWA ,  Manabu TAKAKUWA ,  Kentaro KASA

IPC: B29C59/16 ,  B29C59/02

CPC classification number: G03F7/0002

Abstract: According to one embodiment, an imprint device includes a holding unit, a mounting unit, a moving unit, a curing unit, a pressing portion, and a detecting portion. The holding unit holds template having a pattern portion pressed onto a transfer portion provided on a substrate. The mounting unit mounts the substrate. The moving unit is provided on at least either the holding unit or the mounting unit. The moving unit moves the holding unit and the mounting unit in directions approaching each other or directions away from each other. The curing unit cures the transfer portion onto which the pattern portion of the template is pressed. The pressing portion pushes the template pressed onto the transfer portion in a direction intersecting a pressing direction of the template. The detecting portion detects a position of the template pushed by the pressing portion.

Abstract translation: 根据一个实施例，压印装置包括保持单元，安装单元，移动单元，固化单元，按压部分和检测部分。 保持单元保持具有压制在设置在基板上的转印部上的图案部分的模板。 安装单元安装基板。 移动单元设置在保持单元或安装单元中的至少一个上。 移动单元在彼此接近或彼此远离的方向上移动保持单元和安装单元。 固化单元固化模板的图案部分被按压到的转印部分。 按压部按照与模板的按压方向交叉的方向推压按压在转印部上的模板。 检测部分检测由按压部分推动的模板的位置。

公开(公告)号：US20170229300A1

公开(公告)日：2017-08-10

申请号：US15231576

申请日：2016-08-08

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Takumi OTA ,  Kentaro KASA ,  Takayuki NAKAMURA

IPC: H01L21/027 ,  B29C59/02 ,  B05C5/02

CPC classification number: H01L21/0271 ,  B05B5/0255 ,  G03F7/0002 ,  H01L21/30604

Abstract: An imprint apparatus includes a template holder configured to hold a template that has a pattern formed thereon, the pattern to be transferred to a substrate by an imprinting process, a stage configured to hold the substrate, a liquid ejecting device configured to eject a resin precursor onto the substrate, an electric field plate configured to apply an electric field to the resin precursor on the substrate, and an electric field controller configured to apply a voltage to the electric field plate.

公开(公告)号：US20160043037A1

公开(公告)日：2016-02-11

申请号：US14580472

申请日：2014-12-23

Applicant: Kabushiki Kaisha Toshiba

Inventor： Shinichi NAKAGAWA ,  Nobuhiro KOMINE ,  Yoshinori HAGIO ,  Kentaro KASA

IPC: H01L23/544

CPC classification number: H01L23/544 ,  G03F7/70633 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/5446 ,  H01L2924/0002 ,  H01L2924/00

Abstract: According to one embodiment, there is provided a mark comprising a first mark pattern, a second mark pattern, and an opening pattern. The first mark pattern is arranged in a lower layer of a semiconductor wafer that includes a substrate, the lower layer, an intermediate layer, and an upper layer. The second mark pattern is arranged in the upper layer. The opening pattern exposes the first mark pattern.

Abstract translation: 根据一个实施例，提供了包括第一标记图案，第二标记图案和开口图案的标记。 第一标记图案布置在包括衬底，下层，中间层和上层的半导体晶片的下层中。 第二标记图案布置在上层。 打开图案暴露了第一个标记图案。

公开(公告)号：US20140094015A1

公开(公告)日：2014-04-03

申请号：US13771968

申请日：2013-02-20

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Kentaro KASA ,  Manabu TAKAKUWA ,  Masato SUZUKI ,  Shizuo KINOSHITA

IPC: H01L21/66 ,  G01B11/26

CPC classification number: H01L22/12 ,  G01B11/26 ,  G03F9/7076 ,  G03F9/708 ,  H01L23/544 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

Abstract: According to one embodiment, an alignment measurement system is configured to measure a position of a mark having the highest identifiability of a plurality of marks formed in a substrate. The plurality of marks are made of mutually different patterns. A device pattern is formed in the substrate using directed self-assembly after the plurality of marks is formed.

Abstract translation: 根据一个实施例，对准测量系统被配置为测量在衬底中形成的多个标记具有最高可识别性的标记的位置。 多个标记由相互不同的图案制成。 在形成多个标记之后，使用定向自组装在基板中形成器件图案。

公开(公告)号：US20140065528A1

公开(公告)日：2014-03-06

申请号：US13779209

申请日：2013-02-27

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Kentaro KASA ,  Manabu Takakuwa ,  Yosuke Okamoto ,  Masamichi Kishimoto

IPC: G03F7/20

CPC classification number: G03F7/20 ,  G03F9/70

Abstract: An exposure apparatus according to an embodiment controls the positioning between layers using an alignment correction value calculated on the basis of lower layer position information of a lower-layer-side pattern and upper layer position information of an upper-layer-side pattern. The lower layer position information includes alignment data, a focus map, and a correction value which is set on the basis of the previous substrate. The upper layer position information includes alignment data, a focus map, and a correction value which is a correction value for the positioning and is used when the upper-layer-side pattern is transferred.

Abstract translation: 根据实施例的曝光装置使用基于下层侧图案的下层位置信息和上层侧图案的上层位置信息计算的对准校正值来控制层之间的定位。 下层位置信息包括对准数据，焦点图和基于先前基板设置的校正值。 上层位置信息包括对准数据，焦点图和作为定位的校正值的校正值，并且当上层侧图案被传送时使用。