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公开(公告)号：US20200213092A1
公开(公告)日：2020-07-02
申请号：US16721986
申请日：2019-12-20
Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor： Jae Wan SHIM , Heon Phil HA
Abstract: Provided are an apparatus and method for forgery prevention of digital information. The apparatus for forgery prevention of digital information includes: a digital information obtaining unit configured to obtain digital information in real time; a seed value generator configured to generate a seed value carrying characteristics of the digital information obtained using the digital information obtaining unit; an information piece generator configured to divide the digital information obtained using the digital information obtaining unit, into continuous information pieces with a sequence; and a hash value generator configured to generate a hash value of a first information piece from the seed value and the first information piece and generate a hash value of a subsequent information piece by using a hash value of a previous information piece and the subsequent information piece as inputs.
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公开(公告)号：US20200152216A1
公开(公告)日：2020-05-14
申请号：US16546440
申请日：2019-08-21
Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor： Jae Wan SHIM , Heon Phil HA
IPC: G10L21/028 , H04R1/40 , H04R1/34 , H04R3/00 , G10L25/30
Abstract: A sound source separating apparatus may include: a housing; a plurality of microphones positioned on the housing; a plurality of sound guides positioned on the housing to be adjacent to the plurality of microphones, and configured to guide sound to the plurality of microphones and to generate a difference between a plurality of sound information respectively arriving at the plurality of microphones according to a direction of a sound source; and a processor configured to separate the sound source according to the direction of the sound source based on the plurality of sound information received by the plurality of microphones.
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公开(公告)号：US20200215518A1
公开(公告)日：2020-07-09
申请号：US16354406
申请日：2019-03-15
Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor： Jong Sik KIM , Heon Phil HA , Dong Wook KWON
IPC: B01J23/847 , B01J21/06 , B01J23/34 , B01J37/08 , B01J37/20 , B01J23/22 , B01J23/10 , B01J37/02 , B01D53/86 , B01D53/94
Abstract: Provided is a nitrogen oxide (NOX) reduction catalyst including an active site including at least one of a metal vanadate expressed by [Chemical Formula 1] and a metal vanadate expressed by [Chemical Formula 2], and a support for loading the active site thereon. (M1)XV2OX+5 [Chemical Formula 1] (where M1 denotes one selected from among manganese (Mn), cobalt (Co), and nickel (Ni), and X denotes a real number having a value between 1 and 3.) (M2)YVO4 [Chemical Formula 2] (where M2 denotes one selected from among lanthanum (La), cerium (Ce), praseodymium (Pr), neodymium (Nd), promethium (Pm), samarium (Sm), europium (Eu), gadolinium (Gd), terbium (Tb), dysprosium (Dy), holmium (Ho), erbium (Er), thulium (Tm), ytterbium (Yb), and lutetium (Lu), and Y denotes a real number having a value between 0.5 and 1.5.)
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4.发明申请公开(公告)号：US20140100106A1
公开(公告)日：2014-04-10
申请号：US13760309
申请日：2013-02-06
Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor： Heon Phil HA , Kyung Ju LEE
IPC: B01J23/22
CPC classification number: B01J23/22 , B01D53/8628 , B01D53/9418 , B01D2251/2067 , B01D2251/208 , B01D2255/2065 , B01D2255/20723 , B01D2258/012 , B01J21/063 , B01J37/04 , B01J37/08
Abstract: Provided is a catalyst including: a support including titanium oxide; an active catalyst component including vanadium oxide; and a co-catalyst including antimony and cerium, in which the catalyst is included in a deNox reduction reaction that decomposes nitrogen oxide. The catalyst may improve sulfur poisoning tolerance characteristics while improving the deNox efficiency at a temperature in a wide range from low temperature to high temperature.
Abstract translation: 提供一种催化剂，其包括：包含氧化钛的载体; 包括氧化钒的活性催化剂组分; 以及包含锑和铈的助催化剂，其中催化剂包括在分解氮氧化物的脱硝还原反应中。 催化剂可以改善硫中毒耐受特性，同时在从低温到高温的宽范围内的温度下提高脱硝效率。
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公开(公告)号：US20240066503A1
公开(公告)日：2024-02-29
申请号：US18193473
申请日：2023-03-30
Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor： Dong Wook KWON , Heon Phil HA , Min Gie JUNG
IPC: B01J23/28 , B01D53/86 , B01J21/06 , B01J35/02 , B01J35/04 , B01J35/08 , B01J37/02 , B01J37/04 , B01J37/08
CPC classification number: B01J23/28 , B01D53/8628 , B01J21/063 , B01J35/026 , B01J35/04 , B01J35/08 , B01J37/0219 , B01J37/0221 , B01J37/0236 , B01J37/04 , B01J37/088 , B01D2251/2062 , B01D2255/20723 , B01D2255/20769 , B01D2255/2098 , B01D2255/40 , B01D2257/404
Abstract: Provided is a nitrogen oxide removing denitrification catalyst having high durability against sulfur dioxide, a preparing method of the same, and a method for removing nitrogen oxide using the same. The denitrification catalyst is a quaternary denitrification catalyst containing vanadium-molybdenum-antimony-titania used in a selective catalytic reduction (SCR) reaction using an ammonia reductant to remove nitrogen oxides included in exhaust gases, antimony, molybdenum and vanadium are carried on a titania carrier, and molybdenum and vanadium are combined to be present in a form of a complex oxide (V2MoO8).
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Patent Agency Ranking
公开(公告)号：US20210300801A1
公开(公告)日：2021-09-30
申请号：US17115468
申请日：2020-12-08
Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor： Jongsik KIM , Heon Phil HA
Abstract: Provided is a catalyst for a Fenton system, and a method of preparing the same. The catalyst includes one or more species of d0-orbital-based or non-d0-orbital-based catalyst including NO3−/SO42−/H2PO4−/HPO42−/PO43− functional groups on the surface thereof. The method includes preparing a d0-orbital-based or non-d0-orbital-based transition metal oxide; and preparing a transition metal oxide catalyst comprising a NO3−, SO42−, H2PO4−, HPO42−, or PO43− functional group on the surface of the catalyst via nitrification, sulfation, or phosphorylation of the transition metal oxide.
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公开(公告)号：US20220021840A1
公开(公告)日：2022-01-20
申请号：US17377837
申请日：2021-07-16
Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor： Jae Wan SHIM , Heon Phil HA
Abstract: Disclosed are a method of transmitting image data having a hybrid resolution and a method of generating a hybrid-resolution image. A main region of an original image is transmitted as a high-resolution image and the remaining regions are transmitted as a low-resolution background image. Accordingly, an amount of data to be transmitted is able to be reduced.
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公开(公告)号：US20210402385A1
公开(公告)日：2021-12-30
申请号：US17324542
申请日：2021-05-19
Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor： Jongsik KIM , Heon Phil HA
Abstract: A metal oxide catalyst synthesized using supercritical carbon dioxide extraction is provided, wherein the metal oxide catalyst includes an active site containing at least one type of metal oxide and a support for loading the active site and the metal oxide is an oxide of a metal selected from the group consisting of transition metals (atomic number 21 to 29, 39 to 47, 72 to 79, or 104 to 108), lanthanide (atomic number 57 to 71), post-transition metals (atomic number 13, 30 to 31, 48 to 50, 80 to 84, and 112), and metalloids (atomic number 14, 32 to 33, 51 to 52, and 85) in the periodic table, and a combination thereof.
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公开(公告)号：US20210331141A1
公开(公告)日：2021-10-28
申请号：US17138131
申请日：2020-12-30
Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor： Jongsik KIM , Heon Phil HA , Dong-Wook KWON
IPC: B01J23/10 , B01J23/847 , B01D53/94
Abstract: Provided are catalysts for reduction of nitrogen oxides including an active site including lanthanum vanadate represented by at least one of Formula 1 and Formula 2 and a support carrying the active site. LaVO4 (wherein LaVO4 is polymorphous and has a tetragonal or monoclinic crystal structure) Formula 1 LaV3O9 (wherein LaV3O9 has a monoclinic crystal structure). Formula
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10.发明申请METHOD OF FORMING METAL THIN FILM USING ELECTROLESS DEPOSITION AND THIN FILM DEVICE FABRICATED USING THE METHOD 审中-公开使用电沉积法形成金属薄膜的方法和使用该方法制造的薄膜器件公开(公告)号：US20140030532A1
公开(公告)日：2014-01-30
申请号：US13663728
申请日：2012-10-30
Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor： Ji Young BYUN , Sang Hoon KIM , Ju Yeon HWANG , Heon Phil HA
CPC classification number: C23C18/44 , C23C18/1608 , C23C18/165 , C23C18/32 , C23C18/34 , C23C18/36 , C23C18/38 , Y10T428/31678
Abstract: Provided is a technique for electroless deposition (ELD) for forming metal conductive layer on an insulating substrate made of glass, polymer, etc. According to an aspect, an adhesive layer and a catalyst layer are formed on a substrate using a dry deposition method, such as are plasma deposition (APD) or sputtering, etc., and electroless deposition is performed thereon, thereby forming a metal thin, film. Therefore, it is possible to significantly simplify a complicated pretreatment process required for electroless depositions and increase adhesive strength of a deposited metal thin film.
Abstract translation: 提供了一种用于在由玻璃，聚合物等制成的绝缘基板上形成金属导电层的无电沉积（ELD）技术。根据一方面，使用干法沉积法在基板上形成粘合剂层和催化剂层， 例如等离子体沉积（APD）或溅射等，并在其上进行无电沉积，从而形成金属薄膜。 因此，可以显着地简化无电沉积所需的复杂的预处理工艺并增加沉积的金属薄膜的粘合强度。
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