-
公开(公告)号：US06913670B2
公开(公告)日：2005-07-05
申请号：US10118758
申请日：2002-04-08
IPC分类号： C23C16/458 , C23C16/52 , H01L21/00 , H01L21/687 , C23C16/00
CPC分类号： H01L21/68785 , C23C16/4586 , C23C16/463 , C23C16/52 , H01J37/32009 , H01J2237/2001 , H01L21/67288
摘要： A substrate support has a receiving surface capable of receiving a substrate during processing in a substrate processing chamber. The substrate support has a pedestal having a conduit to circulate a heat transfer fluid therein. A barrier about the conduit includes a fluid detection material capable of detecting a leakage of the fluid from the conduit be changing an attribute, for example, an optical or electrical property.
摘要翻译： 衬底支撑件具有能够在衬底处理室中处理期间能够接收衬底的接收表面。 衬底支撑件具有底座，其具有使传热流体在其中循环的导管。 围绕导管的屏障包括能够检测来自导管的流体泄漏的流体检测材料，以改变属性，例如光学或电学性质。
-
2.发明授权Electrostatic chuck having composite dielectric layer and method of manufacture 有权具有复合介电层的静电吸盘及其制造方法公开(公告)号：US06721162B2
公开(公告)日：2004-04-13
申请号：US10095914
申请日：2002-03-12
申请人： Edwin C. Weldon , Kenneth S. Collins , Arik Donde , Brian Lue , Dan Maydan , Robert J. Steger , Timothy Dyer , Ananda H. Kumar , Alexander M. Veytser , Kadthala R. Narendrnath , Semyon L. Kats , Arnold Kholodenko , Shamouil Shamouilian , Dennis S. Grimard
发明人： Edwin C. Weldon , Kenneth S. Collins , Arik Donde , Brian Lue , Dan Maydan , Robert J. Steger , Timothy Dyer , Ananda H. Kumar , Alexander M. Veytser , Kadthala R. Narendrnath , Semyon L. Kats , Arnold Kholodenko , Shamouil Shamouilian , Dennis S. Grimard
IPC分类号： H02N1300
CPC分类号： H01J37/321 , C23C16/4586 , H01J2237/2001 , H01L21/6831 , H01L21/6833 , Y10T279/23
摘要： An electrostatic chuck has an electrode capable of being electrically charged to electrostatically hold a substrate. A composite layer covers the electrode. The composite layer comprises (1) a first dielectric material covering a central portion of the electrode, and (2) a second dielectric material covering a peripheral portion of the electrode, the second dielectric material having a different composition than the composition of the first dielectric material. The chuck is useful in a plasma process chamber to process substrates, such as semiconductor wafers.
摘要翻译： 静电吸盘具有能够带电的电极，以静电保持基板。 复合层覆盖电极。 复合层包括（1）覆盖电极的中心部分的第一电介质材料，和（2）覆盖电极的周边部分的第二电介质材料，第二电介质材料的组成不同于第一电介质的组成 材料。 卡盘在等离子体处理室中可用于处理诸如半导体晶片的基板。
-
公开(公告)号：US06310755B1
公开(公告)日：2001-10-30
申请号：US09307215
申请日：1999-05-07
申请人： Arnold Kholodenko , Shamouil Shamouilian , You Wang , Wing L. Cheng , Alexander M. Veytser , Surinder S. Bedi , Kadthala R. Narendrnath , Semyon L. Kats , Dennis S. Grimard , Ananda H. Kumar
发明人： Arnold Kholodenko , Shamouil Shamouilian , You Wang , Wing L. Cheng , Alexander M. Veytser , Surinder S. Bedi , Kadthala R. Narendrnath , Semyon L. Kats , Dennis S. Grimard , Ananda H. Kumar
IPC分类号： H01G2300
CPC分类号： C04B35/565 , C04B35/185 , C04B35/806 , C04B37/006 , C04B37/026 , C04B41/009 , C04B41/5155 , C04B41/88 , C04B2235/402 , C04B2235/5248 , C04B2235/616 , C04B2235/96 , C04B2235/9607 , C04B2237/121 , C04B2237/343 , C04B2237/365 , C04B2237/366 , C04B2237/405 , C04B2237/60 , C22C29/00 , C22C2204/00 , H01L21/67109 , H01L21/6831 , H01L21/6833 , C04B38/00 , C04B41/4523
摘要： An electrostatic chuck 55 has an electrostatic member 100 including a dielectric 115 having a surface 120 adapted to receive the substrate 30. The dielectric 115 covers an electrode 105 that is chargeable to electrostatically hold the substrate 30. A support 190 below the electrostatic member 100 has a cavity 300 adapted to hold a gas to serve as a thermal insulator to regulate the flow of heat from the electrostatic chuck 55 to a surface 120 of the chamber 25. The cavity 300 has a cross-sectional profile that is shaped to provide a predetermined temperature profile across the substrate 30.
摘要翻译： 静电吸盘55具有静电构件100，静电构件100包括具有适于接纳衬底30的表面120的电介质115.电介质115覆盖电极105，电极105可充电以静电保持衬底30.静电构件100下方的支撑件190具有 空腔300适于保持气体以用作热绝缘体，以调节从静电卡盘55到腔室25的表面120的热量流动。空腔300具有截面轮廓，其形状设置成提供预定的 跨越衬底30的温度分布。
-
4.发明授权Apparatus for measuring pedestal and substrate temperature in a semiconductor wafer processing system 失效用于测量半导体晶片处理系统中基座和基板温度的装置公开(公告)号：US06481886B1
公开(公告)日：2002-11-19
申请号：US09513726
申请日：2000-02-24
申请人： Kadthala R. Narendrnath , Liang-Guo Wang , Shamouil Shamouilian , Paul E. Luscher , Hamid Noorbakhsh
发明人： Kadthala R. Narendrnath , Liang-Guo Wang , Shamouil Shamouilian , Paul E. Luscher , Hamid Noorbakhsh
IPC分类号： G01K114
CPC分类号： H01L21/67248 , G01K11/3213 , H01J37/32431 , H01J2237/2001
摘要： Apparatus for measuring wafer support assembly temperature in a semiconductor wafer processing system. The apparatus is a modular plug that is mounted to the support assembly. The plug contains a photoluminescent material that exhibits a decay in luminescence after an excitement which is indicative of the temperature of the support assembly.
摘要翻译： 用于测量半导体晶片处理系统中的晶片支撑组件温度的装置。 该装置是安装到支撑组件的模块化插头。 塞子包含在激发后表现出发光衰减的光致发光材料，其表示支撑组件的温度。
-
公开(公告)号：US06280584B1
公开(公告)日：2001-08-28
申请号：US09124317
申请日：1998-07-29
IPC分类号： H02N1300
CPC分类号： H02N13/00
摘要： A compliant bond structure 20 comprising wire mesh 25 strands 50 surrounded by compliant metal 40 is useful for bonding a ceramic surface 30 to a metal surface 35. The wire mesh 25 comprises interlocking strands 50 having longitudinal axes that are oriented substantially parallel to the ceramic and metal surfaces 30, 35. More preferably, the wire mesh 25 comprises strands having a coefficient of thermal expansion that is about 0.4 to about 1.6 times the average of the coefficients of thermal expansion of the metal and ceramic surfaces 30, 35.
摘要翻译： 由柔顺金属40包围的金属丝网25股线50的柔性粘合结构20可用于将陶瓷表面30粘合到金属表面35.金属丝网25包括具有基本平行于陶瓷的纵向轴线的互锁股线50，以及 金属丝网25更优选地，金属丝网25包括热膨胀系数为金属和陶瓷表面30,35的热膨胀系数的平均值的约0.4至约1.6倍的股线。
-
公开(公告)号：US6108189A
公开(公告)日：2000-08-22
申请号：US965690
申请日：1997-11-06
申请人： Edwin C. Weldon , Kenneth S. Collins , Arik Donde , Brian Lue , Dan Maydan , Robert J. Steger , Timothy Dyer , Ananda H. Kumar , Alexander M. Veytser , Kadthala R. Narendrnath , Semyon L. Kats , Arnold Kholodenko , Shamouil Shamouilian , Dennis S. Grimard
发明人： Edwin C. Weldon , Kenneth S. Collins , Arik Donde , Brian Lue , Dan Maydan , Robert J. Steger , Timothy Dyer , Ananda H. Kumar , Alexander M. Veytser , Kadthala R. Narendrnath , Semyon L. Kats , Arnold Kholodenko , Shamouil Shamouilian , Dennis S. Grimard
IPC分类号： B23Q3/15 , C23C16/458 , H01L21/683 , H02N13/00
CPC分类号： H01J37/321 , C23C16/4586 , H01L21/6831 , H01L21/6833 , H01J2237/2001 , Y10T279/23
摘要： An electrostatic chuck 100 useful for holding a substrate 55 in a high density plasma, comprises a dielectric covered electrode 110 having at least one heat transfer gas flow conduit 150 therein. An electrical isolator 200 comprising dielectric material is positioned in the gas flow conduit 150 to (i) electrically isolate the gas in the conduit from the plasma or electrode 110, and (ii) allow passage of heat transfer gas through the conduit. Preferably, the dielectric material comprises a plasma-deactivating material that has a high surface area that reduces plasma formation of gas passing through the conduit 150 in a plasma process. A semiconducting dielectric member 115 useful for rapidly charging and discharging electrostatic chucks is also described.
摘要翻译： 用于将衬底55保持在高密度等离子体中的静电卡盘100包括其中具有至少一个传热气体流动管道150的电介质覆盖电极110。 包括电介质材料的电隔离器200定位在气流导管150中以（i）将导管中的气体与等离子体或电极110电隔离，和（ii）允许传热气体通过导管。 优选地，电介质材料包括具有高表面积的等离子体钝化材料，其在等离子体工艺中减少通过导管150的气体的等离子体形成。 还描述了一种用于快速充放电静电卡盘的半导体电介质部件115。
-
7.发明授权公开(公告)号：US08464594B2
公开(公告)日：2013-06-18
申请号：US13041293
申请日：2011-03-04
申请人： Kadthala R. Narendrnath , Ashish Bhatnagar , Daniel L. Martin , Robert T. Hirahara , Gangadhar Sheelavant
发明人： Kadthala R. Narendrnath , Ashish Bhatnagar , Daniel L. Martin , Robert T. Hirahara , Gangadhar Sheelavant
IPC分类号： G01F1/00
摘要： A gas nozzle measurement apparatus comprises a controllable gas source to provide across a gas plate having gas nozzles, a flow of gas at a constant pressure or constant flow rate, and a sensor plate sized to cover an area comprising at least a portion of the front face of the gas plate. The sensor plate comprises gas flow sensors arranged in locations that correspond to positions of individual gas nozzles of the gas nozzles of the gas plate such that each gas flow sensor can measure a pressure, flow rate, density, or velocity of a gas stream passing through the individual gas nozzle that faces the gas flow sensor, and generate a signal indicative of, or display, the pressure, flow rate, density, or velocity of the gas stream passing through the individual gas nozzle.
摘要翻译： 气体喷嘴测量装置包括可控气体源，以跨越具有气体喷嘴的气体板，恒定压力或恒定流速的气体流，以及传感器板，其尺寸被设计成覆盖包括至少一部分前部 气板的面。 传感器板包括气体传感器，其布置在与气板的气体喷嘴的各个气体喷嘴的位置对应的位置处，使得每个气体流量传感器可以测量通过的气流的压力，流量，密度或速度 单独的气体喷嘴面向气体流量传感器，并且产生指示或显示通过各个气体喷嘴的气流的压力，流量，密度或速度的信号。
-
公开(公告)号：US06462928B1
公开(公告)日：2002-10-08
申请号：US09306944
申请日：1999-05-07
申请人： Shamouil Shamouilian , You Wang , Surinder S. Bedi , Arnold Kholodenko , Alexander M. Veytser , Kadthala R. Narendrnath , Semyon L. Kats , Dennis S. Grimard , Wing L. Cheng , Ananda H. Kumar
发明人： Shamouil Shamouilian , You Wang , Surinder S. Bedi , Arnold Kholodenko , Alexander M. Veytser , Kadthala R. Narendrnath , Semyon L. Kats , Dennis S. Grimard , Wing L. Cheng , Ananda H. Kumar
IPC分类号： H02N1300
CPC分类号： H02N13/00 , H01L21/6833
摘要： An electrostatic chuck 55 comprises an electrical connector 140 which is connected to the electrode 105 to conduct an electrical charge to the electrode 105. The electrical connector 140 comprises a refractory metal having a melting temperature of at least about 1500° C., such as for example, tungsten, titanium, nickel, tantalum, molybdenum, or alloys thereof. Preferably, the electrical connector 140 is bonded to the electrode 105 by a metal having a softening temperature of less than about 600° C., such as aluminum, indium, or low melting point alloys.
摘要翻译： 静电卡盘55包括电连接器140，电连接器140连接到电极105以将电荷引导到电极105.电连接器140包括具有至少约1500℃的熔化温度的难熔金属，例如用于 例如钨，钛，镍，钽，钼或其合金。 优选地，电连接器140通过软化温度小于约600℃的金属（例如铝，铟或低熔点合金）结合到电极105。
-
公开(公告)号：US06220607B1
公开(公告)日：2001-04-24
申请号：US09062380
申请日：1998-04-17
IPC分类号： F16J1500
CPC分类号： H01L21/67115 , H01L21/67103 , Y10S277/933
摘要： A thermally conductive medium includes a body with a first melting point and phase-changing material encapsulating a portion of the body, with the phase-changing material having a second melting point. The first melting point is greater than the second melting point, and the phase-changing material is configured to be in a liquid phase at temperatures above the second melting point and a solid phase at temperatures below the same. In the liquid phase, an adhesive force is present between the body and the phase-changing material due to capillary attraction, and the phase-changing material may be wettable to one of the two surfaces.
摘要翻译： 导热介质包括具有第一熔点的主体和封装该体的一部分的相变材料，相变材料具有第二熔点。 第一个熔点大于第二个熔点，并且相变材料被配置为在高于第二个熔点的温度下处于液相，在低于相同温度的温度下是固相。 在液相中，由于毛细管吸引，在本体和相变材料之间存在粘合力，并且相变材料可以被润湿到两个表面之一。
-
公开(公告)号：US5700327A
公开(公告)日：1997-12-23
申请号：US402091
申请日：1995-03-10
IPC分类号： B08B7/00
CPC分类号： B08B7/0035
摘要： A method of cleaning a hollow article comprises a step of introducing an oxidizing working gas into at least an interior portion of the hollow article, while a sub-atmospheric pressure is being maintained therein. Then, an electric field is applied, so as to convert the oxidizing working gas within at least the interior portion of the article into a low temperature plasma. This leads to oxidizing substances situated at least within the interior portion of the hollow article.
摘要翻译： 清洁中空制品的方法包括将氧化工作气体引入至中空制品的至少内部的步骤，同时保持低于大气压的压力。 然后，施加电场，以将氧化工作气体至少在物品的内部部分转化成低温等离子体。 这导致至少位于中空制品内部的氧化物质。
-
-
-
-
-
-
-
-
-
搜索结果
18 条记录 (耗时 0.024 秒)
