利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

33 条记录 (耗时 0.028 秒)

    Measuring flow properties of multiple gas nozzles of a gas distributor
    1.
    发明授权
    Measuring flow properties of multiple gas nozzles of a gas distributor 有权
    测量气体分配器的多个气体喷嘴的流量特性

    公开(公告)号：US08464594B2

    公开(公告)日：2013-06-18

    申请号：US13041293

    申请日：2011-03-04

    申请人： Kadthala R. Narendrnath ,  Ashish Bhatnagar ,  Daniel L. Martin ,  Robert T. Hirahara ,  Gangadhar Sheelavant

    发明人： Kadthala R. Narendrnath ,  Ashish Bhatnagar ,  Daniel L. Martin ,  Robert T. Hirahara ,  Gangadhar Sheelavant

    IPC分类号： G01F1/00

    CPC分类号： G01F1/28 ,  G01F1/20 ,  G01F1/663

    摘要： A gas nozzle measurement apparatus comprises a controllable gas source to provide across a gas plate having gas nozzles, a flow of gas at a constant pressure or constant flow rate, and a sensor plate sized to cover an area comprising at least a portion of the front face of the gas plate. The sensor plate comprises gas flow sensors arranged in locations that correspond to positions of individual gas nozzles of the gas nozzles of the gas plate such that each gas flow sensor can measure a pressure, flow rate, density, or velocity of a gas stream passing through the individual gas nozzle that faces the gas flow sensor, and generate a signal indicative of, or display, the pressure, flow rate, density, or velocity of the gas stream passing through the individual gas nozzle.

    摘要翻译： 气体喷嘴测量装置包括可控气体源，以跨越具有气体喷嘴的气体板，恒定压力或恒定流速的气体流，以及传感器板，其尺寸被设计成覆盖包括至少一部分前部 气板的面。 传感器板包括气体传感器，其布置在与气板的气体喷嘴的各个气体喷嘴的位置对应的位置处，使得每个气体流量传感器可以测量通过的气流的压力，流量，密度或速度 单独的气体喷嘴面向气体流量传感器，并且产生指示或显示通过各个气体喷嘴的气流的压力，流量，密度或速度的信号。

    Method to substantially enhance shelf life of hygroscopic components and to improve nano-manufacturing process tool availablity
    2.
    发明授权
    Method to substantially enhance shelf life of hygroscopic components and to improve nano-manufacturing process tool availablity 失效
    大幅提高吸湿组分的保质期和改善纳米制造工艺的可行性的方法

    公开(公告)号：US08225927B2

    公开(公告)日：2012-07-24

    申请号：US12944707

    申请日：2010-11-11

    申请人： Kadthala R. Narendrnath ,  Ashish Bhatnagar

    发明人： Kadthala R. Narendrnath ,  Ashish Bhatnagar

    IPC分类号： B65D81/28

    CPC分类号： H01L21/6831

    摘要： A process has been developed that significantly reduces moisture absorption of components, resulting in a component which is less susceptible to moisture and adsorption/absorption effects to the components functionality. In one embodiment, a component having reduced susceptibility to moisture exposure includes a component disposed in an air-tight package, the component having a blocking gas disposed in pores on a surface of the component. In another embodiment, a method for preparing a component having reduced susceptibility to moisture exposure includes driving water from a component in a controlled environment, exposing the component in the controlled environment to a blocking gas, removing the component in the controlled environment, and optionally sealing the component in an air-tight package.

    摘要翻译： 已经开发了显着减少组分的吸湿性的方法，导致对组分功能性较少易受潮和吸附/吸收影响的组分。 在一个实施例中，具有降低的对湿气暴露的敏感性的部件包括设置在气密封装中的部件，该部件具有设置在部件表面上的孔中的阻塞气体。 在另一个实施方案中，制备具有降低的对湿气暴露敏感性的组分的方法包括在受控环境中驱动来自组分的水，将受控环境中的组分暴露于阻塞气体，在受控环境中除去组分，以及任选地密封 该组件在气密包装中。

    Chemical Mechanical Planarization Pad With Surface Characteristics
    5.
    发明申请
    Chemical Mechanical Planarization Pad With Surface Characteristics 审中-公开
    具有表面特性的化学机械平面化垫

    公开(公告)号：US20110105000A1

    公开(公告)日：2011-05-05

    申请号：US12891612

    申请日：2010-09-27

    申请人： Yongqi Hu ,  Kadthala Ramaya Narendrnath ,  Ashish Bhatnagar

    发明人： Yongqi Hu ,  Kadthala Ramaya Narendrnath ,  Ashish Bhatnagar

    IPC分类号： B24B41/00 ,  B24D3/32 ,  B24D3/34

    CPC分类号： B24B37/24 ,  B24D3/32 ,  B24D3/344 ,  B24D3/346

    摘要： A polishing pad includes a polymer matrix and polyhedral oligomeric silsequioxane (“POSS”) molecules or soluble particles and a surfactant dispersed within the polymer matrix. A polishing pad can be formed by casting a liquid polymer on a conveyer belt having a casting surface with a set of projections and curing the liquid polymer on the conveyer belt such that a polymer matrix has a surface with a second set of projections complimentary to the first set of projections.

    摘要翻译： 抛光垫包括分散在聚合物基体内的聚合物基质和多面体低聚硅氧烷（“POSS”）分子或可溶性颗粒和表面活性剂。 可以通过在具有铸造表面的输送带上浇铸具有一组突起的液体聚合物并将液体聚合物固化在输送带上的方法来形成抛光垫，使得聚合物基质具有与第二组突起互补的表面 第一套预测。

    Leak proof pad for CMP endpoint detection
    7.
    发明授权
    Leak proof pad for CMP endpoint detection 有权
    用于CMP终点检测的防漏垫

    公开(公告)号：US08662957B2

    公开(公告)日：2014-03-04

    申请号：US12825276

    申请日：2010-06-28

    申请人： Young J. Paik ,  Christopher R. Mahon ,  Ashish Bhatnagar ,  Kadthala Ramaya Narendrnath

    发明人： Young J. Paik ,  Christopher R. Mahon ,  Ashish Bhatnagar ,  Kadthala Ramaya Narendrnath

    IPC分类号： B24B49/00

    CPC分类号： B24B37/205 ,  B24B37/26 ,  B24B49/12

    摘要： In one aspect, a polishing pad includes a homogeneous unitary polishing layer having a polishing surface, an opposed bottom surface, a recess in the polishing surface extending partially but not entirely through the polishing layer, and a solid light-transmissive window is secured in the recess. In another aspect, a polishing pad includes a polishing layer having a polishing surface, and the polishing surface includes a first region having a first plurality of grooves with a first depth extending partially but not entirely through the polishing layer and a second region surrounded by the first region and having a second plurality of grooves with a second depth extending partially but not entirely through the polishing layer, the second depth greater than the first depth.

    摘要翻译： 在一个方面，抛光垫包括具有研磨表面，相对的底表面，抛光表面中的部分但不完全延伸穿过抛光层的凹部的均匀单一抛光层，并且固体透光窗口固定在 休息。 在另一方面，抛光垫包括具有抛光表面的抛光层，并且抛光表面包括具有第一多个凹槽的第一区域，该第一区域具有部分但不完全延伸穿过该抛光层的第一深度和由该抛光层包围的第二区域 第一区域并且具有第二多个凹槽，其具有部分但不完全延伸穿过抛光层的第二深度，第二深度大于第一深度。

    MIXOTROPHIC ALGAE FOR THE PRODUCTION OF ALGAE BIOFUEL FEEDSTOCK ON WASTEWATER
    8.
    发明申请
    MIXOTROPHIC ALGAE FOR THE PRODUCTION OF ALGAE BIOFUEL FEEDSTOCK ON WASTEWATER 审中-公开
    用于生产废水中的生物燃料原料的混合物

    公开(公告)号：US20120028338A1

    公开(公告)日：2012-02-02

    申请号：US13257351

    申请日：2010-04-20

    申请人： Ashish Bhatnagar ,  Senthil Chinnasamy ,  Keshav C. Das

    发明人： Ashish Bhatnagar ,  Senthil Chinnasamy ,  Keshav C. Das

    IPC分类号： C12N1/12

    CPC分类号： C12N1/12 ,  C02F3/322 ,  C02F2103/22 ,  C12P7/649 ,  Y02E50/13 ,  Y02W10/37

    摘要： The disclosure encompasses, among other aspects, mixed algal populations able to survive and proliferate on culture media that have a high proportion of an industry wastewater. In particular, at least one strain of an alga in the algal population proliferates mixotrophically. Embodiments further encompass methods of cultivating mixed populations of freshwater and marine alga comprising a plurality of genera and species to provide a biomass from which may be extracted lipids, or converted into biodiesel by such procedures as pyrolysis. Lipid material extracted from the algae may be converted to biodiesel or other organic products. Native algal strains were isolated from industrial and in particular agricultural wastewater inoculated with mixed populations derived from environments exposed to such wastewater. Both fresh water and marine algae showed good growth in wastewaters. About 65% of the algal oil obtained from the algal consortium cultured on an industry wastewater could be converted into biodiesel.

    摘要翻译： 本公开包括其他方面，能够在具有高比例的工业废水的培养基上存活和增殖的混合藻类群。 特别地，藻类中藻类的至少一种菌株在营养中增殖。 实施方案还包括培养淡水和海藻的混合群体的方法，其包括多个属和物种，以提供生物质，其可从其中提取脂质，或通过热解等方法转化为生物柴油。 从藻类提取的脂质物质可转化为生物柴油或其他有机产物。 从工业上，特别是从暴露于这种废水的环境的混合种群中接种的农业废水中分离出天然藻类菌株。 淡水和海藻都在废水中表现出良好的生长。 从工业废水中培养的藻类财团获得的大约65％的藻油可以转化为生物柴油。

    EMI/RF SHIELDING OF THERMOCOUPLES
    9.
    发明申请
    EMI/RF SHIELDING OF THERMOCOUPLES 有权
    热电偶的EMI / RF屏蔽

    公开(公告)号：US20110013669A1

    公开(公告)日：2011-01-20

    申请号：US12838455

    申请日：2010-07-17

    申请人： GOVINDA RAJ ,  Bopanna Ichettria ,  Ashish Bhatnagar ,  Cariappa Baduvamanda

    发明人： GOVINDA RAJ ,  Bopanna Ichettria ,  Ashish Bhatnagar ,  Cariappa Baduvamanda

    IPC分类号： G01K7/02

    CPC分类号： G01K7/02 ,  G01K1/08

    摘要： Embodiments disclosed herein generally relate to a temperature sensor disposed in an apparatus. In many semiconductor, liquid crystal display, solar panel or organic light emitting display fabrication processes, RF power is utilized to either ignite a plasma within the processing chamber or to provide supplemental energy to the process. Temperature control during many processes may be beneficial in order to produce a consistent product. Temperature sensors or thermocouples are sometimes utilized to measure the temperature of a substrate within a processing chamber. The RF power may have a negative impact on the temperature sensor. By coating the temperature sensor with a nanoparticle based metal coating, such as a silver coating, the negative impacts of the RF power on the temperature sensor may be reduced without contaminating the process, and an accurate temperature measurement may be obtained.

    摘要翻译： 本文公开的实施例通常涉及设置在设备中的温度传感器。 在许多半导体，液晶显示器，太阳能电池板或有机发光显示器制造工艺中，利用RF功率来点燃处理室内的等离子体或向该过程提供补充能量。 在许多过程中的温度控制可能是有益的，以便产生一致的产品。 温度传感器或热电偶有时用于测量处理室内的衬底的温度。 RF功率可能对温度传感器有负面影响。 通过用诸如银涂层的纳米颗粒基金属涂层涂覆温度传感器，可以减少RF功率对温度传感器的负面影响，而不会污染该过程，并且可以获得精确的温度测量。

    CMP PAD IDENTIFICATION AND LAYER RATIO MODELING
    10.
    发明申请
    CMP PAD IDENTIFICATION AND LAYER RATIO MODELING 审中-公开
    CMP PAD标识和层数比建模

    公开(公告)号：US20090305609A1

    公开(公告)日：2009-12-10

    申请号：US12477458

    申请日：2009-06-03

    申请人： MICHAEL E. KHAU ,  Nishal Shah ,  Ashish Bhatnagar

    发明人： MICHAEL E. KHAU ,  Nishal Shah ,  Ashish Bhatnagar

    IPC分类号： B24B1/00 ,  B24B37/04 ,  B24B49/00 ,  B24B57/02

    CPC分类号： B24B37/04 ,  B24B49/00

    摘要： The present invention relates to methods and apparatus for improving productivity of chemical mechanical polishing (CMP) processes and lowering operating costs of CMP systems. Embodiments of the present invention provide a method for improving the ratio of the layer thickness of composite polishing pads for improved removal rates. Embodiments of the present also provide specific polishing pad identification for monitoring and controlling processes developed for the specific pad to improve overall productivity and reduce downtime of the CMP system.

    摘要翻译： 本发明涉及用于提高化学机械抛光（CMP）工艺的生产率并降低CMP系统的运行成本的方法和装置。 本发明的实施例提供了一种用于改善复合抛光垫的层厚比以提高去除速率的方法。 本发明的实施例还提供特定的抛光垫识别，用于监测和控制针对特定焊盘开发的工艺，以提高总体生产率并减少CMP系统的停机时间。