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    Planet carrier of a wind turbine gearbox with improved lubricant path
    1.
    发明授权
    Planet carrier of a wind turbine gearbox with improved lubricant path 有权

    公开(公告)号：US11085421B2

    公开(公告)日：2021-08-10

    申请号：US16635817

    申请日：2017-08-03

    申请人： General Electric Company ,  Kai Yang ,  Claus Kruempelbeck ,  Wei Zheng ,  Rong Li

    发明人： Kai Yang ,  Claus Kruempelbeck ,  Wei Zheng ,  Rong Li

    IPC分类号： F03D80/70 ,  F03D15/00 ,  F16H57/08 ,  F16H57/02

    摘要： A gearbox assembly includes a gearbox housing and a planetary gear system configured within the gearbox housing. The planetary gear system includes a plurality of planet gears, at least one sun gear, at least one ring gear, at least one planetary carrier operatively coupled with the plurality of planet gears, and a plurality of pin shafts. Each of the plurality of planet gears are arranged so as to rotate around one of the plurality of pin shafts. Further, the plurality of planet gears are engaged with the ring gear and configured to rotate about the sun gear. The gearbox assembly also includes a first lubricant path defined from a first location to a second location through the at least one planetary carrier. Moreover, the first lubricant path is located outside of the plurality of pin shafts.

    Methods and systems for evaluating checker quality of a verification environment
    4.
    发明授权
    Methods and systems for evaluating checker quality of a verification environment 有权
    用于评估验证环境的检验质量的方法和系统

    公开(公告)号：US08359559B2

    公开(公告)日：2013-01-22

    申请号：US12977376

    申请日：2010-12-23

    申请人： Kai Yang ,  Michael Lyons ,  Kuo-Ching Lin ,  Wei-Ting Tu ,  Chih-Wen Chang ,  Tein-Chun Wei

    发明人： Kai Yang ,  Michael Lyons ,  Kuo-Ching Lin ,  Wei-Ting Tu ,  Chih-Wen Chang ,  Tein-Chun Wei

    IPC分类号： G06F17/50 ,  G06F9/455

    CPC分类号： G06F17/5022 ,  G06F17/504 ,  G06F2217/10

    摘要： Methods and systems for evaluating checker quality of a verification environment are provided. In some embodiments, an overall sensitivity for the verification environment and an individual sensitivity for a respective checker are calculated. The overall sensitivity is a probability that a plurality of problematic design behaviors, which are propagated to a checker system including at least one checker, can be detected by the verification environment. The individual sensitivity is a probability that a plurality of problematic design behaviors, which are propagated to at least one specific probe among a plurality of probes of a design, can be detected by the checker corresponding to the specific probe. The overall checker sensitivity numbers can show the robustness of the check system. The individual checker sensitivity can guide the user which individual checker or checkers to improve.

    摘要翻译： 提供了用于评估验证环境的检查器质量的方法和系统。 在一些实施例中，计算验证环境的总体灵敏度和相应检查器的个体灵敏度。 总体灵敏度是通过验证环境可以检测到传播到包括至少一个检验器的检查系统的多个有问题的设计行为的概率。 个体敏感度是通过与特定探针对应的检查器可以检测到在设计的多个探针中传播到至少一个特定探针的多个有问题的设计行为的概率。 整体检查灵敏度数字可以显示检查系统的稳健性。 单独的检查灵敏度可以指导用户哪个单独的检查器或检查器改进。

    MULTI-FORMAT VIDEO DECODER WITH FILTER VECTOR PROCESSING AND METHODS FOR USE THEREWITH
    5.
    发明申请
    MULTI-FORMAT VIDEO DECODER WITH FILTER VECTOR PROCESSING AND METHODS FOR USE THEREWITH 有权
    具有滤波器矢量处理的多格式视频解码器及其使用方法

    公开(公告)号：US20120230427A1

    公开(公告)日：2012-09-13

    申请号：US13076568

    申请日：2011-03-31

    申请人： Edward Hong ,  Dong Liu ,  Hongri Wang ,  Kai Yang

    发明人： Edward Hong ,  Dong Liu ,  Hongri Wang ,  Kai Yang

    IPC分类号： H04N7/26

    CPC分类号： H04N19/103 ,  H04N19/136 ,  H04N19/436 ,  H04N19/44 ,  H04N19/61 ,  H04N19/91

    摘要： A video decoder includes an entropy decoding device that generates entropy decoded (EDC) data from an encoded video signal. A multi-format video decoding device includes a plurality of vector processor units that generate a decoded video signal from the EDC data. The plurality of vector processing units includes at least one filter vector processor that operates in conjunction with a plurality of programmable filter parameters.

    摘要翻译： 视频解码器包括从编码视频信号产生熵解码（EDC）数据的熵解码装置。 多格式视频解码装置包括从EDC数据生成解码视频信号的多个矢量处理器单元。 多个矢量处理单元包括至少一个与多个可编程滤波器参数相结合的滤波器矢量处理器。

    Cutting machine
    7.
    发明申请
    Cutting machine 有权
    切割机

    公开(公告)号：US20090223070A1

    公开(公告)日：2009-09-10

    申请号：US12379996

    申请日：2009-03-05

    申请人： Kai Yang ,  Kenji Abe

    发明人： Kai Yang ,  Kenji Abe

    IPC分类号： B27B9/00

    CPC分类号： B23D59/006

    摘要： It is, accordingly, an object of the present invention to provide a technique which is effective in preventing chips generated during cutting operation on a workpiece from being accumulated in a region ahead in a cutting direction. A representative cutting machine includes a motor, a blade, a body housing having a first region that houses the motor and a second region that covers the blade and projects forward of a front surface of the first region, a base, an angular plate, an outlet formed in the body housing, an opening and a blocking part. The blocking part prevents the air discharged from the outlet from flowing out laterally with respect to the moving direction of the base through a clearance between a front end of the second region and the one end of the angular plate and thereby helps the air discharged from the outlet flow into the opening.

    摘要翻译： 因此，本发明的目的是提供一种技术，其有效地防止在切割操作期间在工件上产生的碎屑积聚在切割方向上的区域中。 代表性的切割机包括马达，叶片，具有容纳马达的第一区域的主体壳体和覆盖叶片并在第一区域的前表面向前突出的第二区域，基座，角板， 出口形成在主体壳体中，一个开口和一个阻挡部分。 阻挡部防止从出口排出的空气相对于基座的移动方向横向流过第二区域的前端和角板的一端之间的间隙，从而有助于从 出口流入开口。

    Stabilizing fluorine etching of low-k materials
    8.
    发明授权
    Stabilizing fluorine etching of low-k materials 失效
    稳定低k材料的氟蚀刻

    公开(公告)号：US07132363B2

    公开(公告)日：2006-11-07

    申请号：US09817056

    申请日：2001-03-27

    申请人： Kai Yang ,  Darrell M. Erb ,  Fei Wang

    发明人： Kai Yang ,  Darrell M. Erb ,  Fei Wang

    IPC分类号： H01L21/4763

    CPC分类号： H01L21/76831 ,  H01L21/76802 ,  H01L21/76807 ,  H01L2924/0002 ,  H01L2924/00

    摘要： Damascene processing is implemented with dielectric barrier films (50, 90, 91) for improved step coverage and reduced contact resistance. Embodiments include the use of two different dielectric films (50, 31) to avoid misalignment problems. Embodiments further include dual damascene (100A, 100B) processing using Cu metallization (100).

    摘要翻译： 用电介质阻挡膜（50,90,91）实现镶嵌加工，以改善台阶覆盖和降低的接触电阻。 实施例包括使用两种不同的介电膜（50,31）来避免不对准问题。 实施例还包括使用Cu金属化（100）的双镶嵌（100A，100B）处理。

    Measurement of Thickness Profile and Elastic Modulus Profile of a Polishing Pad
    9.
    发明申请
    Measurement of Thickness Profile and Elastic Modulus Profile of a Polishing Pad 审中-公开
    抛光垫的厚度剖面和弹性模量曲线的测量

    公开(公告)号：US20060196283A1

    公开(公告)日：2006-09-07

    申请号：US11306766

    申请日：2006-01-10

    申请人： Kai Yang ,  Sheng-Hun Jeng ,  Yu-Ting Lin

    发明人： Kai Yang ,  Sheng-Hun Jeng ,  Yu-Ting Lin

    IPC分类号： G01N19/00 ,  B24B49/00

    CPC分类号： G01B21/08 ,  B24B37/013 ,  B24B49/00 ,  G01N2203/0075

    摘要： An apparatus for measuring the thickness profile and elastic modulus profile of a polishing pad comprise an eddy current sensor and a mechanism to press the eddy current sensor against the polishing pad. The pad thickness is given by the signal of the eddy current sensor. The elastic modulus of the polishing pad is extracted from measurements at different forces applied to the eddy current sensor. The thickness profile and elastic modulus profile of the polishing pad are obtained by scanning the measurement across the whole polishing pad or along a diameter of the polishing pad. The pad thickness profile is used to adjust pad conditioning recipe so that more pad materials is eroded away at thicker area of the pad. By employing the apparatus of present invention, the thickness uniformity of a polishing pad can be better maintained, resulting in longer pad lifetime and better CMP removal rate uniformity.

    摘要翻译： 用于测量抛光垫的厚度分布和弹性模量分布的装置包括涡流传感器和将涡流传感器压靠抛光垫的机构。 焊盘厚度由涡流传感器的信号给出。 抛光垫的弹性模量从施加到涡流传感器的不同力的测量中提取出来。 抛光垫的厚度分布和弹性模量分布是通过扫描整个抛光垫或沿研磨垫的直径进行测量而得到的。 衬垫厚度轮廓用于调整衬垫调节配方，使得更多的衬垫材料在衬垫的较厚区域被侵蚀掉。 通过采用本发明的装置，可以更好地保持抛光垫的厚度均匀性，从而延长焊垫寿命和更好的CMP去除速率均匀性。

    Mask-less differential etching and planarization of copper films
    10.
    发明授权
    Mask-less differential etching and planarization of copper films 有权
    铜膜的无掩模差分蚀刻和平面化

    公开(公告)号：US06410442B1

    公开(公告)日：2002-06-25

    申请号：US09640187

    申请日：2000-08-17

    申请人： Kai Yang

    发明人： Kai Yang

    IPC分类号： H01L2100

    CPC分类号： C23F3/04 ,  C23F1/18 ,  C23F1/44 ,  H01L21/32115 ,  H01L21/3212 ,  H01L21/32134 ,  H01L21/6708 ,  H01L21/7684

    摘要： In-laid metallization patterns of copper or a copper alloy are fabricated by a damascene-type process wherein the upper surface of a thick, electroplated copper or copper alloy blanket or overburden layer filling recesses in a substrate surface is subjected to a mask-less, chemically-based differential etching step for partially planarizing/thickness reduction prior to a step of planarization by chemical-mechanical polishing (CMP). The inventive process enables an increase in manufacturing throughput, reduction in cost, and reduction in spent CMP slurry generation.

    摘要翻译： 通过镶嵌型方法制造铜或铜合金的嵌入式金属化图案，其中填充衬底表面中的凹陷的厚电镀铜或铜合金覆盖层或覆盖层的上表面经受无掩模， 通过化学机械抛光（CMP）在平坦化步骤之前进行部分平坦化/厚度还原的基于化学的差示蚀刻步骤。 本发明的方法能够增加制造生产能力，降低成本和减少废CMP废液产生。