公开(公告)号：US20120321855A1

公开(公告)日：2012-12-20

申请号：US13580921

申请日：2011-02-24

申请人： Kaoru Iwato ,  Shohei Kataoka ,  Shinji Tarutani ,  Sou Kamimura ,  Keita Kato ,  Yuichiro Enomoto ,  Kazuyoshi Mizutani ,  Toru Tsuchihashi ,  Kana Fujii

发明人： Kaoru Iwato ,  Shohei Kataoka ,  Shinji Tarutani ,  Sou Kamimura ,  Keita Kato ,  Yuichiro Enomoto ,  Kazuyoshi Mizutani ,  Toru Tsuchihashi ,  Kana Fujii

IPC分类号： G03F7/027 ,  B32B3/30 ,  G03F7/004 ,  G03F7/20 ,  C08F224/00

CPC分类号： G03F7/30 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/0758 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/38 ,  Y10T428/24479

摘要： Provided is a method of forming a pattern, ensuring excellent sensitivity, limiting resolving power, roughness characteristic, exposure latitude (EL), dependence on post-exposure bake (PEB) temperature and focus latitude (depth of focus DOF), and a resist composition for use in the method. The method comprises (A) forming a film from a resist composition comprising a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, which resin thus when acted on by an acid decreases its solubility in a developer containing an organic solvent, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent.

摘要翻译： 提供了形成图案的方法，确保优异的灵敏度，限制分辨率，粗糙度特性，曝光宽容度（EL），对曝光后烘烤（PEB）温度和聚焦宽度（焦深DOF）的依赖性以及抗蚀剂组合物 用于该方法。 该方法包括（A）由抗蚀剂组合物形成膜，所述抗蚀剂组合物含有含有重复单元的树脂，所述树脂含有当被酸作用时分解的基团，从而产生醇羟基，所述树脂当被酸作用时降低 其在含有有机溶剂的显影剂中的溶解度，（B）将膜曝光，和（C）使用含有有机溶剂的显影剂显影曝光膜。

公开(公告)号：US20130017377A1

公开(公告)日：2013-01-17

申请号：US13637269

申请日：2011-03-25

申请人： Shohei Kataoka ,  Kaoru Iwato ,  Sou Kamimura ,  Toru Tsuchihashi ,  Yuichiro Enomoto ,  Kana Fujii ,  Kazuyoshi Mizutani ,  Shinji Tarutani ,  Keita Kato

发明人： Shohei Kataoka ,  Kaoru Iwato ,  Sou Kamimura ,  Toru Tsuchihashi ,  Yuichiro Enomoto ,  Kana Fujii ,  Kazuyoshi Mizutani ,  Shinji Tarutani ,  Keita Kato

IPC分类号： G03F7/004 ,  B32B3/10 ,  G03F7/20

CPC分类号： G03F7/30 ,  C08F220/28 ,  C08F232/08 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/2041 ,  G03F7/325 ,  Y10T428/24802

摘要： Provided is an actinic-ray- or radiation-sensitive resin composition and a method of forming a pattern using the same, ensuring excellent the etching resistivity and the stability during a post-exposure delay (PED) period. The composition contains a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, and a compound that generates an acid of pKa≧1.5 when exposed to actinic rays or radiation.

摘要翻译： 提供了一种光化射线或辐射敏感性树脂组合物和使用其形成图案的方法，确保了在曝光后延迟（PED）期间的蚀刻电阻率和稳定性优异。 该组合物含有含有重复单元的树脂，该重复单元含有当被酸作用时分解的基团，从而产生醇羟基，以及当暴露于光化射线或辐射时产生pKa≥1.5的酸的化合物。

公开(公告)号：US09709892B2

公开(公告)日：2017-07-18

申请号：US13637269

申请日：2011-03-25

申请人： Shohei Kataoka ,  Kaoru Iwato ,  Sou Kamimura ,  Toru Tsuchihashi ,  Yuichiro Enomoto ,  Kana Fujii ,  Kazuyoshi Mizutani ,  Shinji Tarutani ,  Keita Kato

发明人： Shohei Kataoka ,  Kaoru Iwato ,  Sou Kamimura ,  Toru Tsuchihashi ,  Yuichiro Enomoto ,  Kana Fujii ,  Kazuyoshi Mizutani ,  Shinji Tarutani ,  Keita Kato

IPC分类号： G03F7/30 ,  G03F7/039 ,  G03F7/075 ,  C08F220/28 ,  G03F7/004 ,  G03F7/20 ,  G03F7/32 ,  G03F7/038 ,  C08F232/08

CPC分类号： G03F7/30 ,  C08F220/28 ,  C08F232/08 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/2041 ,  G03F7/325 ,  Y10T428/24802

摘要： Provided is an actinic-ray- or radiation-sensitive resin composition and a method of forming a pattern using the same, ensuring excellent the etching resistivity and the stability during a post-exposure delay (PED) period. The composition contains a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, and a compound that generates an acid of pKa≧−1.5 when exposed to actinic rays or radiation.

公开(公告)号：US09551935B2

公开(公告)日：2017-01-24

申请号：US13636965

申请日：2011-03-25

申请人： Keita Kato ,  Shinji Tarutani ,  Toru Tsuchihashi ,  Sou Kamimura ,  Yuichiro Enomoto ,  Kana Fujii ,  Kaoru Iwato ,  Shohei Kataoka ,  Kazuyoshi Mizutani

发明人： Keita Kato ,  Shinji Tarutani ,  Toru Tsuchihashi ,  Sou Kamimura ,  Yuichiro Enomoto ,  Kana Fujii ,  Kaoru Iwato ,  Shohei Kataoka ,  Kazuyoshi Mizutani

IPC分类号： G03F7/32 ,  G03F7/039 ,  G03F7/20 ,  G03F7/004 ,  G03F7/075

CPC分类号： G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/2041 ,  Y10T428/24

摘要： Provided is a method of forming a pattern, ensuring excellent exposure latitude (EL) and focus latitude (depth of focus DOF). The method of forming a pattern includes (A) forming a film from a resist composition, the resist composition, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent, thereby forming a negative pattern. The resist composition contains (a) a resin that is configured to decompose when acted on by an acid and ΔSP thereof represented by formula (1) below is 2.5 (MPa)1/2 or above, (b) a compound that is composed to generate an acid when exposed to actinic rays or radiation, and (c) a solvent. ΔSP=SPF−SPI  (1)

摘要翻译： 提供了一种形成图案的方法，确保优异的曝光宽容度（EL）和聚焦纬度（焦深DOF）。 形成图案的方法包括（A）从抗蚀剂组合物形成膜，抗蚀剂组合物，（B）将膜曝光，和（C）使用含有有机溶剂的显影剂显影曝光膜，从而形成 负面模式。 抗蚀剂组合物含有（a）在被酸作用时被分解的树脂，由下式（1）表示的＆Dgr; SP为2.5（MPa）1/2以上，（b） 被组合以在暴露于光化射线或辐射时产生酸，和（c）溶剂。 ＆Dgr; SP = SPF-SPI（1）

公开(公告)号：US20130011785A1

公开(公告)日：2013-01-10

申请号：US13636965

申请日：2011-03-25

申请人： Keita Kato ,  Shinji Tarutani ,  Toru Tsuchihashi ,  Sou Kamimura ,  Yuichiro Enomoto ,  Kana Fujii ,  Kaoru Iwato ,  Shohei Kataoka ,  Kazuyoshi Mizutani

发明人： Keita Kato ,  Shinji Tarutani ,  Toru Tsuchihashi ,  Sou Kamimura ,  Yuichiro Enomoto ,  Kana Fujii ,  Kaoru Iwato ,  Shohei Kataoka ,  Kazuyoshi Mizutani

IPC分类号： G03F7/004 ,  H01L29/02 ,  B32B3/10 ,  G03F7/20 ,  G03F7/075

CPC分类号： G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/2041 ,  Y10T428/24

摘要： Provided is a method of forming a pattern, ensuring excellent exposure latitude (EL) and focus latitude (depth of focus DOF). The method of forming a pattern includes (A) forming a film from a resist composition, the resist composition, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent, thereby forming a negative pattern. The resist composition contains (a) a resin that is configured to decompose when acted on by an acid and ΔSP thereof represented by formula (1) below is 2.5 (MPa)1/2 or above, (b) a compound that is composed to generate an acid when exposed to actinic rays or radiation, and (c) a solvent. ΔSP=SPF−SPI  (1)

摘要翻译： 提供了一种形成图案的方法，确保优异的曝光宽容度（EL）和聚焦纬度（焦深DOF）。 形成图案的方法包括（A）从抗蚀剂组合物形成膜，抗蚀剂组合物，（B）将膜曝光，和（C）使用含有有机溶剂的显影剂显影曝光膜，从而形成 负面模式。 抗蚀剂组合物含有（a）在被酸作用时被分解的树脂，由下式（1）表示的＆Dgr; SP为2.5（MPa）1/2以上，（b） 被组合以在暴露于光化射线或辐射时产生酸，和（c）溶剂。 ＆Dgr; SP = SPF-SPI（1）

公开(公告)号：US10126653B2

公开(公告)日：2018-11-13

申请号：US13580921

申请日：2011-02-24

申请人： Kaoru Iwato ,  Shohei Kataoka ,  Shinji Tarutani ,  Sou Kamimura ,  Keita Kato ,  Yuichiro Enomoto ,  Kazuyoshi Mizutani ,  Toru Tsuchihashi ,  Kana Fujii

发明人： Kaoru Iwato ,  Shohei Kataoka ,  Shinji Tarutani ,  Sou Kamimura ,  Keita Kato ,  Yuichiro Enomoto ,  Kazuyoshi Mizutani ,  Toru Tsuchihashi ,  Kana Fujii

IPC分类号： G03F7/30 ,  G03F7/004 ,  G03F7/38 ,  G03F7/075 ,  G03F7/038 ,  G03F7/039 ,  G03F7/11 ,  G03F7/20 ,  G03F7/32

摘要： Provided is a method of forming a pattern, ensuring excellent sensitivity, limiting resolving power, roughness characteristic, exposure latitude (EL), dependence on post-exposure bake (PEB) temperature and focus latitude (depth of focus DOF), and a resist composition for use in the method. The method comprises (A) forming a film from a resist composition comprising a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, which resin thus when acted on by an acid decreases its solubility in a developer containing an organic solvent, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent.

公开(公告)号：US07625690B2

公开(公告)日：2009-12-01

申请号：US11717618

申请日：2007-03-14

申请人： Kazuyoshi Mizutani ,  Kaoru Iwato ,  Kunihiko Kodama ,  Masaomi Makino ,  Toru Tsuchihashi

发明人： Kazuyoshi Mizutani ,  Kaoru Iwato ,  Kunihiko Kodama ,  Masaomi Makino ,  Toru Tsuchihashi

IPC分类号： G03F7/004 ,  G03F7/30

CPC分类号： G03F7/0392 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

摘要： A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents an aryl group; Rn represents an alkyl group, a cycloalkyl group or an aryl group; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.

摘要翻译： 一种抗蚀剂组合物，其包含：（A）含有由式（I）表示的重复单元的树脂; 和（B）能够在用光化射线或辐射照射时能够产生酸的化合物：其中AR表示芳基; Rn表示烷基，环烷基或芳基; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团，以及使用该抗蚀剂组合物的图案形成方法。

公开(公告)号：US20110081612A1

公开(公告)日：2011-04-07

申请号：US12895504

申请日：2010-09-30

申请人： Kana FUJII ,  Takamitsu Tomiga ,  Toru Tsuchihashi ,  Kazuyoshi Mizutani ,  Jiro Yokoyama ,  Shinichi Sugiyama ,  Shuji Hirano ,  Toru Fujimori

发明人： Kana FUJII ,  Takamitsu Tomiga ,  Toru Tsuchihashi ,  Kazuyoshi Mizutani ,  Jiro Yokoyama ,  Shinichi Sugiyama ,  Shuji Hirano ,  Toru Fujimori

IPC分类号： G03F7/004 ,  G03F7/20

CPC分类号： G03F7/0392 ,  C08F8/12 ,  C08F12/22 ,  C08F214/18 ,  C08F220/18 ,  C08F220/22 ,  C08F220/32 ,  C08F2220/282 ,  C08K5/375 ,  C08K5/42 ,  C08L33/068 ,  C08L51/04 ,  C08L67/02 ,  C09D125/14 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/0046 ,  C08F212/14 ,  C08F2220/1825 ,  C08F2220/185 ,  C08F220/14

摘要： According to one embodiment, an actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin containing the repeating units of formulae (I), (II) and (III) that when acted on by an acid, becomes soluble in an alkali developer, and (B) a compound that when irradiated with actinic rays or radiation, generates a fluorine-containing acid, wherein each of R1 independently represents a hydrogen atom or an optionally substituted methyl group, R2 represents a halogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted aralkyl group, and n is an integer of 0 to 5, provided that when n is 2 or greater, multiple R2s may be identical to or different from each other.

摘要翻译： 根据一个实施方案，光化射线敏感或辐射敏感性树脂组合物包含（A）含有式（I），（II）和（III）的重复单元的树脂，当被酸作用时，其变得易溶于 碱显影剂和（B）当用光化射线或辐射照射时产生含氟酸的化合物，其中R 1各自独立地表示氢原子或任选取代的甲基，R 2表示卤素原子，任选地 取代的烷基，任选取代的环烷基，任选取代的芳基或任选取代的芳烷基，n为0至5的整数，条件是当n为2或更大时，多个R 2可以相同或不同 彼此。

公开(公告)号：US08349535B2

公开(公告)日：2013-01-08

申请号：US12895504

申请日：2010-09-30

申请人： Kana Fujii ,  Takamitsu Tomiga ,  Toru Tsuchihashi ,  Kazuyoshi Mizutani ,  Jiro Yokoyama ,  Shinichi Sugiyama ,  Shuji Hirano ,  Toru Fujimori

发明人： Kana Fujii ,  Takamitsu Tomiga ,  Toru Tsuchihashi ,  Kazuyoshi Mizutani ,  Jiro Yokoyama ,  Shinichi Sugiyama ,  Shuji Hirano ,  Toru Fujimori

IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30

CPC分类号： G03F7/0392 ,  C08F8/12 ,  C08F12/22 ,  C08F214/18 ,  C08F220/18 ,  C08F220/22 ,  C08F220/32 ,  C08F2220/282 ,  C08K5/375 ,  C08K5/42 ,  C08L33/068 ,  C08L51/04 ,  C08L67/02 ,  C09D125/14 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/0046 ,  C08F212/14 ,  C08F2220/1825 ,  C08F2220/185 ,  C08F220/14

摘要： According to one embodiment, an actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin containing the repeating units of formulae (I), (II) and (III) that when acted on by an acid, becomes soluble in an alkali developer, and (B) a compound that when irradiated with actinic rays or radiation, generates a fluorine-containing acid, wherein each of R1 independently represents a hydrogen atom or an optionally substituted methyl group, R2 represents a halogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted aralkyl group, and n is an integer of 0 to 5, provided that when n is 2 or greater, multiple R2s may be identical to or different from each other.

摘要翻译： 根据一个实施方案，光化射线敏感或辐射敏感性树脂组合物包含（A）含有式（I），（II）和（III）的重复单元的树脂，当被酸作用时，其变得可溶于 碱显影剂和（B）当用光化射线或辐射照射时产生含氟酸的化合物，其中R 1各自独立地表示氢原子或任选取代的甲基，R 2表示卤素原子，任选地 取代的烷基，任选取代的环烷基，任选取代的芳基或任选取代的芳烷基，n为0至5的整数，条件是当n为2或更大时，多个R 2可以相同或不同 彼此。

公开(公告)号：US07887988B2

公开(公告)日：2011-02-15

申请号：US11717645

申请日：2007-03-14

申请人： Kazuyoshi Mizutani ,  Kaoru Iwato ,  Kunihiko Kodama ,  Masaomi Makino

发明人： Kazuyoshi Mizutani ,  Kaoru Iwato ,  Kunihiko Kodama ,  Masaomi Makino

IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30

CPC分类号： G03F7/0397 ,  Y10S430/108 ,  Y10S430/111

摘要： A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents a benzene ring or a naphthalene ring; R represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group; Z represents a linking group for forming a ring together with AR; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.

摘要翻译： 一种抗蚀剂组合物，其包含：（A）含有由式（I）表示的重复单元的树脂; 和（B）能够在用光化射线或辐射照射时能产生酸的化合物：其中AR表示苯环或萘环; R表示氢原子，烷基，环烷基或芳基; Z表示与AR一起形成环的连接基团; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团，以及使用该抗蚀剂组合物的图案形成方法。