Small scale wires with microelectromechanical devices
    1.
    发明授权
    Small scale wires with microelectromechanical devices 有权
    小型电线与微机电装置

    公开(公告)号:US07022617B2

    公开(公告)日:2006-04-04

    申请号:US10606812

    申请日:2003-06-26

    Abstract: A process cycles between etching and passivating chemistries to create rough sidewalls that are converted into small structures. In one embodiment, a mask is used to define lines in a single crystal silicon wafer. The process creates ripples on sidewalls of the lines corresponding to the cycles. The lines are oxidized in one embodiment to form a silicon wire corresponding to each ripple. The oxide is removed in a further embodiment to form structures ranging from micro sharp tips to photonic arrays of wires. Fluidic channels are formed by oxidizing adjacent rippled sidewalls. The same mask is also used to form other structures for MEMS devices.

    Abstract translation: 蚀刻和钝化化学物质之间的过程循环,以产生转变成小结构的粗糙侧壁。 在一个实施例中,使用掩模来限定单晶硅晶片中的线。 该过程在对应于循环的线的侧壁上产生波纹。 在一个实施例中,线被氧化以形成对应于每个纹波的硅线。 在另一个实施方案中去除氧化物以形成从微尖端到光线阵列的结构。 通过氧化相邻的波纹侧壁形成流体通道。 同样的掩模也用于形成MEMS器件的其他结构。

    Multi-finger z-actuator
    2.
    发明授权
    Multi-finger z-actuator 有权
    多指z致动器

    公开(公告)号:US07504757B2

    公开(公告)日:2009-03-17

    申请号:US11375860

    申请日:2006-03-15

    CPC classification number: B81C1/00626 B81B2201/033 H01L21/3086

    Abstract: Multi-level structures are formed in a semiconductor substrate by first forming a pattern of lines or structures of different widths. Width information on the pattern is decoded by processing steps into level information to form a MEMS structure. The pattern is etched to form structures having a first floor. The structures are oxidized until structures of thinner width are substantially fully oxidized. A portion of the oxide is then etched to expose the first floor. The first floor is then etched to form a second floor. The oxide is then optionally removed, leaving a multi-level structure. In one embodiment, high aspect ratio comb actuators are formed using the multi-level structure process.

    Abstract translation: 通过首先形成不同宽度的线或结构的图案,在半导体衬底中形成多层结构。 图案上的宽度信息通过处理步骤被解码成级信息以形成MEMS结构。 蚀刻图案以形成具有一层的结构。 结构被氧化,直到较薄宽度的结构基本上被完全氧化。 然后蚀刻一部分氧化物以露出第一层。 然后蚀刻第一层以形成二楼。 然后任选地除去氧化物,留下多层结构。 在一个实施例中,使用多层结构工艺形成高纵横比梳状致动器。

    Small scale wires with microelectromechanical devices
    3.
    发明授权
    Small scale wires with microelectromechanical devices 有权
    小型电线与微机电装置

    公开(公告)号:US07339244B2

    公开(公告)日:2008-03-04

    申请号:US11340135

    申请日:2006-01-26

    Abstract: A process cycles between etching and passivating chemistries to create rough sidewalls that are converted into small structures. In one embodiment, a mask is used to define lines in a single crystal silicon wafer. The process creates ripples on sidewalls of the lines corresponding to the cycles. The lines are oxidized in one embodiment to form a silicon wire corresponding to each ripple. The oxide is removed in a further embodiment to form structures ranging from micro sharp tips to photonic arrays of wires. Fluidic channels are formed by oxidizing adjacent rippled sidewalls. The same mask is also used to form other structures for MEMS devices.

    Abstract translation: 蚀刻和钝化化学物质之间的过程循环,以产生转变成小结构的粗糙侧壁。 在一个实施例中,使用掩模来限定单晶硅晶片中的线。 该过程在对应于循环的线的侧壁上产生波纹。 在一个实施例中,线被氧化以形成对应于每个纹波的硅线。 在另一个实施方案中去除氧化物以形成从微尖端到光线阵列的结构。 通过氧化相邻的波纹侧壁形成流体通道。 同样的掩模也用于形成用于MEMS器件的其它结构。

    Three dimensional high aspect ratio micromachining
    4.
    发明授权
    Three dimensional high aspect ratio micromachining 有权
    三维高宽比微加工

    公开(公告)号:US07045466B2

    公开(公告)日:2006-05-16

    申请号:US10607838

    申请日:2003-06-27

    CPC classification number: B81C1/00626 B81B2201/033 H01L21/3086

    Abstract: Multi-level structures are formed in a semiconductor substrate by first forming a pattern of lines or structures of different widths. Width information on the pattern is decoded by processing steps into level information to form a MEMS structure. The pattern is etched to form structures having a first floor. The structures are oxidized until structures of thinner width are substantially fully oxidized. A portion of the oxide is then etched to expose the first floor. The first floor is then etched to form a second floor. The oxide is then optionally removed, leaving a multi-level structure. In one embodiment, high aspect ratio comb actuators are formed using the multi-level structure process.

    Abstract translation: 通过首先形成不同宽度的线或结构的图案,在半导体衬底中形成多层结构。 图案上的宽度信息通过处理步骤被解码成级信息以形成MEMS结构。 蚀刻图案以形成具有一层的结构。 结构被氧化,直到较薄宽度的结构基本上被完全氧化。 然后蚀刻一部分氧化物以露出第一层。 然后蚀刻第一层以形成二楼。 然后任选地除去氧化物,留下多层结构。 在一个实施例中,使用多层结构工艺形成高纵横比梳状致动器。

    Optically gated MEMS switch
    7.
    发明授权
    Optically gated MEMS switch 有权
    光电门控MEMS开关

    公开(公告)号:US08101898B2

    公开(公告)日:2012-01-24

    申请号:US12408937

    申请日:2009-03-23

    CPC classification number: H03K17/941 H01H59/0009

    Abstract: An optically powered MEMS gate driver includes a photovoltaic converter configured to receive a light signal from a light source and output a DC supply voltage for a MEMS gate driver in response thereto. The MEMS gate driver further includes a DC to DC converter electrically coupled to the photovoltaic converter and configured to output a line level DC voltage in response to the DC supply voltage. An electrical circuit, also included as a portion of the MEMS gate driver is electrically coupled to both the photovoltaic converter and the DC to DC converter is configured to receive the supply voltage and the line level voltage and to output a line level drive signal in response thereto. The optically powered MEMS gate driver is self-contained within a common EMI enclosure thus providing isolation between the gate driver and command signal electronics.

    Abstract translation: 光学驱动的MEMS栅极驱动器包括光电转换器,其被配置为从光源接收光信号,并响应于此向MEMS栅极驱动器输出DC电源电压。 MEMS栅极驱动器还包括电耦合到光伏转换器并被配置为响应于DC电源电压输出线路电平DC电压的DC-DC转换器。 还包括作为MEMS栅极驱动器的一部分的电路电耦合到光伏转换器和DC-DC转换器两者被配置为接收电源电压和线路电平电压并且响应地输出线路电平的驱动信号 到此。 光学驱动的MEMS栅极驱动器是独立于普通的EMI外壳内,从而提供栅极驱动器和命令信号电子器件之间的隔离。

    Method and Apparatus for Switching Electrical Power
    10.
    发明申请
    Method and Apparatus for Switching Electrical Power 有权
    用于切换电力的方法和装置

    公开(公告)号:US20110127853A1

    公开(公告)日:2011-06-02

    申请号:US12629309

    申请日:2009-12-02

    Abstract: A current control device is described. The current control device includes at least one line socket configured to couple to a first power system. The current control device also includes at least one load socket configured to couple to a second power system and at least one micro-electromechanical system (MEMS) switching device coupled between the at least one line socket and the at least one load socket. The at least one MEMS switching device is configured to selectably couple the first power system to the second power system.

    Abstract translation: 描述电流控制装置。 电流控制装置包括配置成耦合到第一电力系统的至少一个线路插座。 电流控制装置还包括配置成耦合到第二电力系统的至少一个负载插座和耦合在所述至少一个线路插座和所述至少一个负载插座之间的至少一个微机电系统(MEMS)开关装置。 所述至少一个MEMS开关装置被配置为将所述第一电力系统可选择地耦合到所述第二电力系统。

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