摘要:
Economical production of laser-drilled high-precision, ultra-miniature multiple-via-hole patterns is accomplished by multiplexing the homogenized, shaped, nearly-collimated output of a high-power excimer laser into a modular set of condenser lens/mask/projection lens beamlines. A substrate delivery subsystem provides a continuous supply of film substrate segments as blanks during production. Functional modularization permits the building and easy retooling of a hard-tooling multiple-beamline system powered by a high-power laser. Vertical modularization permits the building of a single-beamline soft-tooling pilot system, which may be used to demonstrate a production technique, or may be used for short production runs, and which may later be incremented with additional vertical subassemblies for additional beamlines. Multiplexing of the laser output beam into the set of beamlines is accomplished by an illumination module, which may be implemented as a single 100%-reflective fold mirror for a single-beamline pilot system, and can also be implemented as a single-block echelon mirror, or implemented as a multi-beamsplitter set of decreasing-reflectivity mirrors as mirror position approaches the beam source. The resulting product is a film blank with a via-pattern of precise micro-vias, useful as an aerosol nozzle or filter.
摘要:
In the manufacturing of flexible, large-area electronic modules such as flat-panel displays (FPDs), the high cost and low yields of currently available patterning equipment represent a significant barrier to cost-effective production. This invention provides a projection imaging system that can pattern very large, flexible substrates at very high exposure speeds with almost any desired image resolution. The master pattern to be imprinted on the substrate is contained on a mask which, similar to the substrate, is made of a flexible material The mask and substrate are scanned by rollers through the object and the image field, respectively, of a 1:1 projection lens. All of the rollers are driven by identical drive systems linked to a common motor; therefore, the scanning of the mask and substrate is perfectly synchronized. Both the mask and the substrate, along with their rollers, are mounted on a linear translation stage. The translation stage scans continuously at a velocity which is chosen such that, for every complete rotation of the mask and substrate, the linear stage will move by the effective scan width. The entire substrate is patterned using one continuous helical scan. Suitable overlap between complementary intensity profiles produced by a hexagonal illumination configuration ensures seamless joining of the scans. The use of rollers significantly enhances the throughput and effectively reduces the payload and footprint of the scanning stage leading to substantial system cost savings.
摘要:
This single-actuator-and-cam, remotely adjustable, exterior vehicle rear-view mirror provides the driver with glare-free viewing toward the rear of the vehicle, by switching between a high-reflectivity position and a low-reflectivity position at the same view adjustment. The exterior rear-view mirrors are repositioned with only a single motor working with a rotary cam to scan all possible mirror positions. The single-motor mechanism increases the reliability of the mirror system. The single motor accomplishes both the directional alignment and the day/night reflectivity adjustment of the mirror by use of a cam which has positions for all predicted view positions, with two reflectivity positions for each view. This invention works equally well with flat wedge mirrors and wide-angle convex wedge mirrors. Since each position is unique, each directional/reflectivity position can be assigned a set of digital coordinates which can be stored for each vehicle driver and each glare condition, for an initial setting which can be easily, or even automatically, adjusted for changes as the driver desires. Customizing features include manual and vehicle driver identification controlled override, start-up reset, and glare threshold setting.
摘要:
This single-actuator-and-cam, remotely adjustable, exterior vehicle rear-view mirror provides the driver with glare-free viewing toward the rear of the vehicle, by switching between a high-reflectivity position and a low-reflectivity position at the same view adjustment. The exterior rear-view mirrors are repositioned with only a single motor working with a rotary cam to scan all possible mirror positions. The single-motor mechanism increases the reliability of the mirror system. The single motor accomplishes both the directional alignment and the day/night reflectivity adjustment of the mirror by use of a cam which has positions for all predicted view positions, with two reflectivity positions for each view. This invention works equally well with flat wedge mirrors and wide-angle convex wedge mirrors. Since each position is unique, each directional/reflectivity position can be assigned a set of digital coordinates which can be stored for each vehicle driver and each glare condition, for an initial setting which can be easily, or even automatically, adjusted for changes as the driver desires. Customizing features include manual and vehicle driver identification controlled override, start-up reset, and glare threshold setting.
摘要:
This single-actuator-and-cam, remotely adjustable, exterior vehicle rear-view mirror provides the driver with glare-free viewing toward the rear of the vehicle, by switching between a high-reflectivity position and a low-reflectivity position at the same view adjustment. The exterior rear-view mirrors are repositioned with only a single motor working with a rotary cam to scan all possible mirror positions. The single-motor mechanism increases the reliability of the mirror system. The single motor accomplishes both the directional alignment and the day/night reflectivity adjustment of the mirror by use of a cam which has positions for all predicted view positions, with two reflectivity positions for each view. This invention works equally well with flat wedge mirrors and wide-angle convex wedge mirrors. Since each position is unique, each directional/reflectivity position can be assigned a set of digital coordinates which can be stored for each vehicle driver and each glare condition, for an initial setting which can be easily, or even automatically, adjusted for changes as the driver desires. Customizing features include manual and vehicle driver identification controlled override, start-up reset, and glare threshold setting.
摘要:
A large-format substrate patterning system, for microelectronics manufacturing, utilizes a substrate docking fixture to enable relative motion between the substrate stage and the substrate. This enables exposure of a large-format substrate which has been partitioned into different modules where each module contains an entire pattern transferred from a mask. This projection system enables patterning of a large multi-module substrate using a stage whose range of travel is smaller than the size of the substrate and using a mask whose area is smaller than the size of the substrate. This is accomplished by repositioning the substrate to expose each module sequentially. In order to reposition the substrate, its location is maintained fixed in space by a substrate docking fixture while the movable stage of the lithography system is repositioned to position a different module of the substrate in the image field of the lithography tool. This allows the use of a mask whose size is determined by the size of each substrate module, and the use of a scanning stage whose required range of travel is determined by the size of the substrate module, and not by the size of the entire substrate. This eliminates the size limitation of the substrate from dependence on the range of travel of the stage, and permits the repetitive use of a small mask or series of small masks to produce a composite multi-module pattern on the substrate.
摘要:
A large-format substrate patterning system, for microelectronics manufacturing, utilizes a substrate docking fixture to enable relative motion between the substrate stage and the substrate. This enables exposure of a large-format substrate which has been partitioned into different modules where each module contains an entire pattern transferred from a mask. This projection system enables patterning of a large multi-module substrate using a stage whose range of travel is smaller than the size of the substrate and using a mask whose area is smaller than the size of the substrate. This is accomplished by repositioning the substrate to expose each module sequentially In order to reposition the substrate, its location is maintained fixed in space by a substrate docking fixture while the movable stage of the lithography system is repositioned to position a different module of the substrate in the image field of the lithography tool. This allows the use of a mask whose size is determined by the size of each substrate module, and the use of a scanning stage whose required range of travel is determined by the size of the substrate module, and not by the size of the entire substrate. This eliminates the size limitation of the substrate from dependence on the range of travel of the stage, and permits the repetitive use of a small mask or series of small masks to produce a composite multi-module pattern on the substrate.
摘要:
High-performance microelectronic modules, such as chip-scale packages, flip-chip modules, integrated micro-opto-electronic boards, fine-line printed circuits, and system-on-a-package modules, span a range of sizes and interconnect densities. Current technologies for via generation are not optimized for the varied cost considerations of different manufacturing requirements—direct-write tools address low-volume needs, whereas mask-projection systems are designed for very high via-density products. The system disclosed here will be highly cost-efficient for producing a wide range of modules. Its desirable features are high-speed via generation for different via densities, full via-pattern programmability, capability to drill high-threshold photo-ablation substrates, and full and efficient utilization of available high-power excimer lasers. A high-power laser beam is divided into multiple beamlets which are simultaneously directed to different via sites by a spatial light modulator array. Beamlets not needed for via generation are returned to the illumination system and recycled with the beamlets that reach via generation sites. A control system uses via site information and material characteristics to direct necessary numbers of laser pulses to selected via sites for optimum via generation efficiency.
摘要:
A three-dimensional Universal Mounting Component (UMC) system of UMC blocks provides general mounting for use in optical research in constructing layouts for experiments and breadboard-type prototypes. In such optical layouts laser beams or other light beams are directed about complex paths, often on several planes or levels. Use of the invention overcomes the problem of creating three-dimensional optical layouts with less standardized, and much more expensive, mounting adapters and posts. An economical, standardized set of UMC blocks, each with a number of holes in grid configurations, enables users to construct custom three-dimensional optical layouts. Each UMC block is a right rectangular solid of substantial standardized thickness sufficient to support it on edge. Each UMC block has a set of smooth counterbored holes from front to back and has another set of such holes from back to front. These holes allow the UMC blocks to be bolted to each other and to optical breadboards with full recessing of mounting bolts for flush connections. Each UMC block also has a set of tapped holes extending through from front to back to accommodate the direct mounting of optical components. Each UMC block also has at least one set of tapped edge holes for accepting connecting bolts in L- and T-configurations to matching counterbored holes in another appropriately sized UMC block.
摘要:
A materials-processing system based on projection irradiation using a pulsed-laser source is disclosed. The salient features include a novel illumination system containing a homogenizer that produces a self-luminous light beam of selected cross-section, spatially uniform intensity, and selected numerical aperture, as well as a novel high-efficiency, energy-recycling exposure system that provides pulse-duration extension. The output of the pulsed-laser source is shaped, optionally attenuated, and homogenized, and the pulse duration is extended by the illumination system, including beam-shaping optics, homogenizer, and optionally a condenser lens or pulse-extender-plate (PEP). The illumination is imaged either onto the mask, which is in turn imaged onto the substrate, or the illumination is imaged onto the substrate directly. The high-fluence irradiation effects a desired physical change in the material, for example melting and solidification as required in the sequential lateral solidification (SLS) process. Concurrently, the substrate and/or mask are translated, in a manner precisely coordinated with the laser pulses, as dictated by the particular process being conducted. The high efficiency of the illumination system, combined with the ability to shape the homogeneous illumination into a variety of shapes, such as a high-aspect-ratio rectangle, for example, and the pulse-duration extension, renders the system uniquely capable of executing various materials-processing operations, such as SLS, post-doping annealing, and ablation in a high-throughput manner.