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    Immunoadhesins and methods of production and use thereof
    1.
    发明授权
    Immunoadhesins and methods of production and use thereof 失效
    免疫粘附素及其生产和使用方法

    公开(公告)号：US5998598A

    公开(公告)日：1999-12-07

    申请号：US814567

    申请日：1997-03-10

    申请人： Karl G. Csaky ,  Eddy Anglade ,  Daniel M. Sullivan ,  William LaRochelle

    发明人： Karl G. Csaky ,  Eddy Anglade ,  Daniel M. Sullivan ,  William LaRochelle

    IPC分类号： A61K38/00 ,  A61K47/48 ,  A61K48/00 ,  C07K14/495 ,  C07K14/54 ,  C07K14/55 ,  C07K14/705 ,  C07H21/04 ,  C12N15/13 ,  C12N15/62

    CPC分类号： A61K47/48415 ,  C07K14/495 ,  C07K14/54 ,  C07K14/5406 ,  C07K14/5428 ,  C07K14/5437 ,  C07K14/55 ,  C07K14/70525 ,  A61K38/00 ,  A61K48/00 ,  C07K2319/00 ,  C07K2319/30 ,  C12N2799/022

    摘要： The invention is directed toward a compound comprising a recombinant nucleic acid encoding an immunoadhesin inserted within an adenoviral nucleic acid, wherein the recombinant nucleic acid can be packaged in an adenovirus particle and wherein expression of the recombinant nucleic acid encoding the immunoadhesin results in production of the immunoadhesin protein. The recombinant nucleic acid encoding the immunoadhesin can be within an adenovirus. The invention further provides methods for delivering an immunoadhesin to a cell or a subject comprising administering to the cell or the subject an adenovirus comprising a recombinant nucleic acid encoding an immunoadhesin; producing an immunoadhesin comprising administering to a cell an adenovirus comprising a recombinant nucleic acid encoding an immunoadhesin inserted within an adenoviral nucleic acid, whereby the cell expresses the recombinant nucleic acid encoding the immunoadhesin, thereby producing the immunoadhesin; treating an inflammatory condition in a subject comprising administering to the subject an adenovirus comprising a recombinant nucleic acid encoding an immunoadhesin inserted within an adenoviral nucleic acid or a recombinant nucleic acid encoding an immunoadhesin inserted within an adenoviral nucleic acid, whereby a cell in the subject expresses the recombinant nucleic acid encoding the immunoadhesin and produces the immunoadhesin, thereby treating the inflammatory condition or administering to the subject a recombinant nucleic acid encoding an immunoadhesin, or an immunoadhesin, wherein the immunoadhesin is selected from the group consisting of vIL-10-IgG, IL-13-IgG, LFA-IgG, IL-2ra-IgG, IL-1ra-IgG, mutant IL-4-IgG, VLA4-IgG, IL-2-IgG, TGF-.beta.1-IgG, TGF-.beta.1.sup.223,225 -IgG, and VCAM-IgG; and methods of screening an immunoadhesin for bioactivity.

    摘要翻译： 本发明涉及包含编码插入在腺病毒核酸内的免疫粘附素的重组核酸的化合物，其中所述重组核酸可以包装在腺病毒颗粒中，并且其中编码免疫粘附素的重组核酸的表达导致产生 免疫粘附蛋白。 编码免疫粘附素的重组核酸可以在腺病毒内。 本发明还提供了将免疫粘附素递送至细胞或受试者的方法，包括向细胞或受试者施用包含编码免疫粘附素的重组核酸的腺病毒; 产生免疫粘附素，其包括向细胞施用包含编码插入在腺病毒核酸内的免疫粘附素的重组核酸的腺病毒，由此所述细胞表达编码免疫粘附素的重组核酸，由此产生免疫粘附素; 治疗受试者中的炎性病症包括向受试者施用包含编码插入腺病毒核酸内的免疫粘附素的重组核酸的腺病毒或编码插入腺病毒核酸内的免疫粘附素的重组核酸，由此受试者中的细胞表达 编码免疫粘附素的重组核酸并产生免疫粘附素，从而治疗炎性病症或向受试者施用编码免疫粘附素或免疫粘附素的重组核酸，其中所述免疫粘附素选自vIL-10-IgG， IL-13-IgG，LFA-IgG，IL-2ra-IgG，IL-1ra-IgG，突变型IL-4-IgG，VLA4-IgG，IL-2-IgG，TGF-β1-IgG，TGF-β1223 ，225-IgG和VCAM-IgG; 以及筛选免疫粘附素用于生物活性的方法。

    REVERSAL LITHOGRAPHY APPROACH BY SELECTIVE DEPOSITION OF NANOPARTICLES
    4.
    发明申请
    REVERSAL LITHOGRAPHY APPROACH BY SELECTIVE DEPOSITION OF NANOPARTICLES 有权
    通过选择性沉积纳米颗粒的反向光刻方法

    公开(公告)号：US20120193762A1

    公开(公告)日：2012-08-02

    申请号：US13017903

    申请日：2011-01-31

    申请人： Qin Lin ,  Daniel M. Sullivan ,  Hao Xu ,  Tony D. Flaim

    发明人： Qin Lin ,  Daniel M. Sullivan ,  Hao Xu ,  Tony D. Flaim

    IPC分类号： H01L29/02 ,  G03F7/20 ,  B82Y30/00

    CPC分类号： B82Y30/00 ,  B82Y10/00

    摘要： A novel reversal lithography process without etch back is described. The reversal material comprises nanoparticles that are selectively deposited into the gaps between features without overcoating the tops of the features. As a result, a patterned imaging layer can be removed using solvent, blanket exposure followed by developer washing, or dry etching directly, without an etch-back process, and the original bright field lithography pattern can be reversed into dark field features, and transferred into subsequent layers using the nanoparticle reversal material as an etch mask.

    摘要翻译： 描述了没有回蚀的新型反转光刻工艺。 反转材料包括纳米颗粒，其被选择性地沉积到特征之间的间隙中，而不覆盖特征的顶部。 结果，可以使用溶剂，毯式曝光，显影剂洗涤或直接干法蚀刻，而不用蚀刻工艺去除图案化成像层，并且原始的明视野光刻图案可以反转成暗场特征，并转移 使用纳米颗粒反转材料作为蚀刻掩模进入后续层。

    Reversal lithography approach by selective deposition of nanoparticles
    9.
    发明授权
    Reversal lithography approach by selective deposition of nanoparticles 有权
    通过选择性沉积纳米粒子的反转光刻方法

    公开(公告)号：US08836082B2

    公开(公告)日：2014-09-16

    申请号：US13017903

    申请日：2011-01-31

    申请人： Qin Lin ,  Daniel M. Sullivan ,  Hao Xu ,  Tony D. Flaim

    发明人： Qin Lin ,  Daniel M. Sullivan ,  Hao Xu ,  Tony D. Flaim

    IPC分类号： H01L29/02 ,  B82Y10/00 ,  B82Y30/00

    CPC分类号： B82Y30/00 ,  B82Y10/00

    摘要： A novel reversal lithography process without etch back is described. The reversal material comprises nanoparticles that are selectively deposited into the gaps between features without overcoating the tops of the features. As a result, a patterned imaging layer can be removed using solvent, blanket exposure followed by developer washing, or dry etching directly, without an etch-back process, and the original bright field lithography pattern can be reversed into dark field features, and transferred into subsequent layers using the nanoparticle reversal material as an etch mask.

    摘要翻译： 描述了没有回蚀的新型反转光刻工艺。 反转材料包括纳米颗粒，其被选择性地沉积到特征之间的间隙中，而不覆盖特征的顶部。 结果，可以使用溶剂，毯式曝光，显影剂洗涤或直接干法蚀刻，而不用蚀刻工艺去除图案化成像层，并且原始的明视野光刻图案可以反转成暗场特征，并转移 使用纳米颗粒反转材料作为蚀刻掩模进入后续层。