High-nickel austenitic stainless steel resistant to degradation by
neutron irradiation
    4.
    发明授权
    High-nickel austenitic stainless steel resistant to degradation by neutron irradiation 失效
    高镍奥氏体不锈钢耐中子辐射降解

    公开(公告)号:US5976275A

    公开(公告)日:1999-11-02

    申请号:US836519

    申请日:1997-06-05

    摘要: The present invention aims at providing structural materials having a resistance to degradation by neutron irradiation, causing no SCC in an environment of light-water reactors even after subjecting the materials to neutron irradiation of approximately at least 1.times.10.sup.22 n/cm.sup.2 (E>1 MeV), and having thermal expansion coefficients approximately similar to that of structural materials. The high nickel austenitic stainless steels of the present invention having a resistance to degradation by neutron irradiation can be produced by subjecting stainless steels having compositions (by weight %) of 0.005 to 0.08% of carbon, at most 0.3% of Mn, at most 0.2% of (Si+P+S), 25 to 40% of Ni, 25 to 40% of Cr, at most 3% of Mo or at most 5% of (Mo+W), at most 0.3% of Nb+Ta, at most 0.3% of Ti, at most 0.001% of B and the balance of Fe to a solution-annealing treatment at a temperature of 1000 to 1150.degree. C.

    摘要翻译: PCT No.PCT / JP96 / 02442 Sec。 371日期:1997年6月5日 102(e)日期1996年6月5日PCT提交1996年8月30日PCT公布。 公开号WO97 / 09456 日期1997年3月13日本发明旨在提供具有耐中子辐射降解性的结构材料,即使在使材料经受大约至少1×1022n / cm 2的中子照射之后也不会在轻水反应堆的环境中产生SCC( E> 1 MeV),并且具有与结构材料大致相似的热膨胀系数。 具有耐中子辐射降解性的本发明的高镍奥氏体不锈钢可以通过将具有0.005-0.08%的碳,至多为0.3%Mn的组成(重量%)的不锈钢制成至多0.2 (Si + P + S),25〜40%的Ni,25〜40%的Cr,至多3%的Mo或至多5%的(Mo + W),至多0.3%的Nb + Ta ,至多0.3%的Ti,至多0.001%的B,余量为在1000至1150℃的温度下进行的溶液退火处理。

    Ultra high-strength hydraulic cement compositions
    5.
    发明授权
    Ultra high-strength hydraulic cement compositions 失效
    超高强度水泥水泥组合物

    公开(公告)号:US5466289A

    公开(公告)日:1995-11-14

    申请号:US123461

    申请日:1993-09-17

    摘要: Ultra high-strength hydraulic cement compositions with extremely low water-to-cement ratio of 10-30% and having high fluidity and improved capability of preventing slump loss, from which high-quality ultra high-strength hardened concrete and mortar can be obtained with superior workability, contain a binder composed of cement or a mixture of cement and a microscopic powder admixture, aggregates, water and a cement dispersion agent composed of water-soluble vinyl copolymers obtained by aqueous solution radical polymerization of five specified kinds of monomers at a ratio within a specified range The unit content of the binder is 400-1300kg/m.sup.3, the water-to-binder ratio is 10-30% and the content of cement dispersion agent is 0.1-2.0 weight parts for 100 weight parts of the binder.

    摘要翻译: 超高强度水泥水泥组合物,具有极低的水与水泥比为10-30%,流动性高,防止坍落度损失的能力得到提高,可以从中获得高质量的超高强度硬化混凝土和砂浆, 优异的可加工性,含有由水泥或水泥和微粉末混合物,聚集体,水和水泥分散剂组成的粘合剂,其由通过五种特定种类的单体的水溶液自由基聚合获得的水溶性乙烯基共聚物组成, 在指定范围内粘合剂的单位含量为400-1300kg / m3,水与粘合剂的比例为10-30%,100重量份粘合剂的水泥分散剂含量为0.1-2.0重量份。

    Method of making transistors by ion implantations, electron beam
irradiation and thermal annealing
    9.
    发明授权
    Method of making transistors by ion implantations, electron beam irradiation and thermal annealing 失效
    通过离子注入,电子束照射和热退火制造晶体管的方法

    公开(公告)号:US4415372A

    公开(公告)日:1983-11-15

    申请号:US313332

    申请日:1981-10-20

    摘要: The invention provides a method for fabricating a semiconductor device which comprises the steps of ion-implanting an impurity into a monocrystalline semiconductor substrate; irradiating the region into which the impurity ions have been implanted with an accelerated electron beam under the conditions that the acceleration voltage is 20 to 200 KeV, and the current is 0.01 to 1 mA and the exposure dose is 10.sup.20 to 10.sup.15 /cm.sup.2 ; and carrying out annealing to form a semiconductor region of one conductivity type. According to the present invention, a semiconductor device can be fabricated which has fewer lattice defects and in which the lifetime of the carriers is long.

    摘要翻译: 本发明提供一种制造半导体器件的方法,该方法包括以下步骤:将杂质离子注入到单晶半导体衬底中; 在加速电压为20〜200KeV,电流为0.01〜1mA,曝光量为1020〜1015 / cm2的条件下,用加速电子束照射杂质离子注入的区域; 并进行退火以形成一种导电类型的半导体区域。 根据本发明,可以制造具有更少的晶格缺陷并且其中载体的寿命长的半导体器件。