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    Method of Producing Porous Silica-Based Particles and Porous Silica-Based Particles Produced by the Method
    1.
    发明申请
    Method of Producing Porous Silica-Based Particles and Porous Silica-Based Particles Produced by the Method 有权
    生产多孔二氧化硅基颗粒和方法生产的多孔二氧化硅颗粒的方法

    公开(公告)号：US20080160276A1

    公开(公告)日：2008-07-03

    申请号：US11793707

    申请日：2005-12-15

    申请人： Kazuaki Inoue ,  Kazuhiro Nakayama ,  Akira Nakashima

    发明人： Kazuaki Inoue ,  Kazuhiro Nakayama ,  Akira Nakashima

    IPC分类号： B32B9/00 ,  C08J9/00

    CPC分类号： C01B33/193 ,  B01J20/103 ,  B01J20/28004 ,  B01J20/28011 ,  C01B33/143 ,  C01B33/18 ,  C01P2004/03

    摘要： Provided is a method of producing porous silica-based particles with the relatively larger average diameter of 1 micron or more and also having a low particle density. The method comprises the steps of (a) preparing two-layer separated liquid consisting of an organic silicon compound layer and a water layer, then adding an organic solvent, an alkali, and a surfactant into the water layer while agitating at least the water layer so that the organic silicon compound layer and the water layer are not completely mixed with each other, further hydrolyzing and/or partial hydrolyzing the organic silicon compound in the mixed aqueous solution to prepare silica-based particle precursors, (b) adding sodium aluminate into the mixed aqueous solution containing the silica-based particle precursors and then preparing silica-based particles having pores, cavities or voids inside the particles, and (c) washing and drying the silica-based particles. Thus obtained particles are useful for various applications such as microcapsules, adsorbents, catalysts, low refractive film, low dielectric film and low reflectivity film.

    摘要翻译： 本发明提供一种具有1微米以上的平均直径相对较大并且具有低颗粒密度的多孔二氧化硅基颗粒的方法。 该方法包括以下步骤：（a）制备由有机硅化合物层和水层组成的两层分离液体，然后向水层中加入有机溶剂，碱和表面活性剂，同时至少搅拌水层 使得有机硅化合物层和水层彼此不完全混合，进一步水解和/或部分水解混合水溶液中的有机硅化合物以制备二氧化硅基颗粒前体，（b）将铝酸钠加入到 含有二氧化硅基颗粒前体的混合水溶液，然后在颗粒内制备具有孔，空洞或空隙的二氧化硅基颗粒，和（c）洗涤和干燥二氧化硅基颗粒。 这样获得的颗粒可用于微胶囊，吸附剂，催化剂，低折射膜，低介电膜和低反射率膜等各种应用。

    Method of producing porous silica-based particles
    4.
    发明授权
    Method of producing porous silica-based particles 有权
    生产多孔二氧化硅基颗粒的方法

    公开(公告)号：US07901652B2

    公开(公告)日：2011-03-08

    申请号：US11793707

    申请日：2005-12-15

    申请人： Kazuaki Inoue ,  Kazuhiro Nakayama ,  Akira Nakashima

    发明人： Kazuaki Inoue ,  Kazuhiro Nakayama ,  Akira Nakashima

    IPC分类号： C01B33/141 ,  C01B33/143

    CPC分类号： C01B33/193 ,  B01J20/103 ,  B01J20/28004 ,  B01J20/28011 ,  C01B33/143 ,  C01B33/18 ,  C01P2004/03

    摘要： Porous silica-based particles with relatively larger average diameter of 1 micron or more and a low particle density are prepared. The method includes the steps of (a) preparing two-layer separated liquid including an organic silicon compound layer and a water layer, then adding an organic solvent, an alkali, and a surfactant into the water layer while agitating at least the water layer so that the organic silicon compound layer and the water layer are not completely mixed with each other, further hydrolyzing and/or partial hydrolyzing the organic silicon compound in the mixed aqueous solution to prepare silica-based particle precursors, (b) adding sodium aluminate into the mixed aqueous solution containing the silica-based particle precursors and then preparing silica-based particles having pores, cavities or voids inside the particles, and (c) washing and drying the silica-based particles. The particles are useful for various applications such as microcapsules, adsorbents, catalysts, and so on.

    摘要翻译： 制备相对较大的平均直径为1微米或更大并且具有低颗粒密度的多孔二氧化硅基颗粒。 该方法包括以下步骤：（a）制备包含有机硅化合物层和水层的两层分离液体，然后在至少水层搅拌的同时向水层中加入有机溶剂，碱和表面活性剂 有机硅化合物层和水层彼此不完全混合，进一步水解和/或部分水解混合水溶液中的有机硅化合物以制备二氧化硅基颗粒前体，（b）将铝酸钠加入到 混合含有二氧化硅基颗粒前体的水溶液，然后在颗粒内制备具有孔，空洞或空隙的二氧化硅基颗粒，和（c）洗涤和干燥二氧化硅基颗粒。 这些颗粒可用于各种应用，如微胶囊，吸附剂，催化剂等。

    Production of short fiber silica
    5.
    发明授权
    Production of short fiber silica 有权
    生产短纤维二氧化硅

    公开(公告)号：US06455154B1

    公开(公告)日：2002-09-24

    申请号：US09560984

    申请日：2000-04-28

    申请人： Akira Nakashima ,  Kazuaki Inoue ,  Ryo Muraguchi ,  Michio Komatsu

    发明人： Akira Nakashima ,  Kazuaki Inoue ,  Ryo Muraguchi ,  Michio Komatsu

    IPC分类号： D02G300

    CPC分类号： C08G77/02 ,  C09D183/02 ,  Y10T428/2904 ,  Y10T428/2907 ,  Y10T428/2918 ,  Y10T428/31663

    摘要： A coating liquid for forming porous silica coating, comprising a product of reaction between a short fiber silica and a hydrolyzate of an alkoxysilane of the formula XnSi(OR)4-n or a halogenated silane of the formula XnSiX′4-n (in the formula, X represents a hydrogen atom, a fluorine atom, an alkyl group having 1 to 8 carbon atoms, an aryl group or a vinyl group; R represents a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an aryl group or a vinyl group; X′ represents a chlorine atom or a bromine atom; and n is an integer of 0 to 3). A coated substrate comprising a porous silica coating film formed from the above coating liquid for forming porous silica coating. A short fiber silica having an average diameter (D) of 10 to 30 nm, a length (L) of 30 to 100 nm and an aspect ratio (L/D) of 3 to 10. The above coating liquid for forming porous silica coating enables forming an insulating film which is excellent in adherence to a substrate surface, mechanical strength, chemical resistance and crack resistance and enables flattening irregularities of a substrate surface to a high degree. The coating film of the coated substrate has the above excellent properties.

    摘要翻译： 一种用于形成多孔二氧化硅涂层的涂布液，包括短纤维二氧化硅和式XnSi（OR）4-n的烷氧基硅烷的水解产物或式XnSiX'4-n的卤代硅烷（在 式中，X表示氢原子，氟原子，碳原子数1〜8的烷基，芳基或乙烯基; R表示氢原子，碳原子数1〜8的烷基，芳基或 乙烯基; X'表示氯原子或溴原子，n表示0〜3的整数。 一种涂覆基材，包括由用于形成多孔二氧化硅涂层的上述涂布液形成的多孔二氧化硅涂膜。 平均直径（D）为10〜30nm，长度（L）为30〜100nm，纵横比（L / D）为3〜10的短纤维二氧化硅。上述用于形成多孔二氧化硅涂层的涂布液 能够形成对基板表面的粘附性优异的机械强度，耐化学性和抗裂纹性的绝缘膜，能够高度地使基板表面变得平坦化。 涂布基材的涂膜具有上述优异的性能。

    Method of forming particle layer on substrate, method of planarizing irregular surface of substrate and particle-layer-formed substrate
    6.
    发明授权
    Method of forming particle layer on substrate, method of planarizing irregular surface of substrate and particle-layer-formed substrate 失效
    在基板上形成颗粒层的方法，平面化基板和颗粒层形成的基板的不规则表面的方法

    公开(公告)号：US6090446A

    公开(公告)日：2000-07-18

    申请号：US624537

    申请日：1996-04-12

    申请人： Akira Nakashima ,  Michio Komatsu ,  Kenji Ohno ,  Kuniharu Teramoto ,  Kazuaki Inoue

    发明人： Akira Nakashima ,  Michio Komatsu ,  Kenji Ohno ,  Kuniharu Teramoto ,  Kazuaki Inoue

    IPC分类号： B01J19/00 ,  B05D1/20 ,  G11B5/84 ,  G11B7/26 ,  H01L21/768 ,  B05D5/00 ,  B05D1/18 ,  B32B3/00

    CPC分类号： B05D1/20 ,  Y10T428/24372 ,  Y10T428/24893

    摘要： The present invention provides a method of forming on a substrate a particle layer highly adherent to the substrate, which comprises the steps of spreading a dispersion (I) comprising a dispersing medium and, dispersed therein, solid particles being surface treated with a compound acting as a binder on a liquid (II) having a specific gravity higher than that of the dispersing medium, said liquid (II) being immiscible with the dispersing medium, subsequently removing the dispersing medium from the dispersion (I) to thereby arrange the solid particles on the liquid (II) so that a particle layer is formed on the liquid (II) and thereafter transferring the particle layer onto a substrate. Moreover, the present invention provides a method of planarizing an irregular surface of a substrate, which comprises transferring the above particle layer to an irregular surface of a substrate and removing parts of the particle layer formed on protrudent parts of the substrate to thereby planarize the irregular surface of the substrate and also provides a particle-layer-formed substrate comprising a substrate and, superimposed on a surface thereof, the particle layer obtained by each of the above methods.

    摘要翻译： PCT No.PCT / JP95 / 01610 Sec。 371日期：1996年4月12日 102（e）日期1996年4月12日PCT提交1995年8月11日PCT公布。 出版物WO96 / 04998 日本1996年2月22日本发明提供了在基材上形成与基材高度附着的颗粒层的方法，其包括以下步骤：将包含分散介质的分散体（I）铺展并分散在其中进行表面处理的固体颗粒 在比重高于分散介质的液体（II）上作为粘合剂的化合物，所述液体（II）与分散介质不混溶，随后从分散体（I）中除去分散介质，由此 将固体颗粒布置在液体（II）上，使得在液体（II）上形成颗粒层，然后将颗粒层转移到基材上。 此外，本发明提供一种平面化基板的不规则表面的方法，其包括将上述颗粒层转移到基板的不规则表面，并除去形成在基板突出部分上的颗粒层的部分，从而平坦化不规则 并且还提供了包含基材的颗粒层形成的基材，并且在其表面上叠加通过上述方法获得的颗粒层​​。

    Coating liquid for forming porous silica coating, coated substrate and short fiber silica
    7.
    发明授权
    Coating liquid for forming porous silica coating, coated substrate and short fiber silica 有权
    用于形成多孔二氧化硅涂层，涂布基材和短纤维二氧化硅的涂布液

    公开(公告)号：US6083314A

    公开(公告)日：2000-07-04

    申请号：US130043

    申请日：1998-08-06

    申请人： Akira Nakashima ,  Kazuaki Inoue ,  Ryo Muraguchi ,  Michio Komatsu

    发明人： Akira Nakashima ,  Kazuaki Inoue ,  Ryo Muraguchi ,  Michio Komatsu

    IPC分类号： C08L83/04 ,  C08G77/02 ,  C09D7/12 ,  C09D183/02 ,  C09D183/04 ,  C09D183/07 ,  C09D183/05 ,  C09D183/06 ,  C09D183/08

    CPC分类号： C08G77/02 ,  C09D183/02 ,  Y10T428/2904 ,  Y10T428/2907 ,  Y10T428/2918 ,  Y10T428/31663

    摘要： A coating liquid for forming porous silica coating, comprising a product of reaction between a short fiber silica and a hydrolyzate of an alkoxysilane of the formula X.sub.n Si(OR).sub.4-n or a halogenated silane of the formula X.sub.n SiX'.sub.4-n (in the formula, X represents a hydrogen atom, a fluorine atom, an alkyl group having 1 to 8 carbon atoms, an aryl group or a vinyl group; R represents a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an aryl group or a vinyl group; X' represents a chlorine atom or a bromine atom; and n is an integer of 0 to 3). A coated substrate comprising a porous silica coating film formed from the above coating liquid for forming porous silica coating. A short fiber silica having an average diameter (D) of 10 to 30 nm, a length (L) of 30 to 100 nm and an aspect ratio (L/D) of 3 to 10. The above coating liquid for forming porous silica coating enables forming an insulating film which is excellent in adherence to a substrate surface, mechanical strength, chemical resistance and crack resistance and enables flattening irregularities of a substrate surface to a high degree. The coating film of the coated substrate has the above excellent properties.

    摘要翻译： 一种用于形成多孔二氧化硅涂层的涂布液，包括短纤维二氧化硅和式XnSi（OR）4-n的烷氧基硅烷的水解产物或式XnSiX'4-n的卤代硅烷（在 式中，X表示氢原子，氟原子，碳原子数1〜8的烷基，芳基或乙烯基; R表示氢原子，碳原子数1〜8的烷基，芳基或 乙烯基; X'表示氯原子或溴原子，n表示0〜3的整数。 一种涂覆基材，包括由用于形成多孔二氧化硅涂层的上述涂布液形成的多孔二氧化硅涂膜。 平均直径（D）为10〜30nm，长度（L）为30〜100nm，纵横比（L / D）为3〜10的短纤维二氧化硅。上述用于形成多孔二氧化硅涂层的涂布液 能够形成对基板表面的粘附性优异的机械强度，耐化学性和抗裂纹性的绝缘膜，能够高度地使基板表面变得平坦化。 涂布基材的涂膜具有上述优异的性能。

    Spinous silica-based sol and method of producing the same
    9.
    发明授权
    Spinous silica-based sol and method of producing the same 有权
    二氧化硅基溶胶及其制备方法

    公开(公告)号：US08118898B2

    公开(公告)日：2012-02-21

    申请号：US11907318

    申请日：2007-10-11

    申请人： Yoshinori Wakamiya ,  Hiroyasu Nishida ,  Yuji Tawarazako ,  Kazuaki Inoue ,  Osamu Yoshida ,  Akira Nakashima

    发明人： Yoshinori Wakamiya ,  Hiroyasu Nishida ,  Yuji Tawarazako ,  Kazuaki Inoue ,  Osamu Yoshida ,  Akira Nakashima

    IPC分类号： C09G1/04 ,  B01F3/12 ,  C01B33/12

    CPC分类号： C09G1/02 ,  C01B33/14 ,  C09K3/1436 ,  C09K3/1463

    摘要： The present invention provides a sol of spinous silica-based particles in which silica-based particles having peculiar forms, spinous forms are dispersed in a solvent. The spinous silica-based particles have verrucous projections formed on surfaces of spherical silica-based particles. In the spinous particles, a value of the surface roughness (SA1/SA2, SA1 indicating a specific surface area measured by the BET method or the Sears method and SA2 indicating a specific surface area converted from an average particle diameter (D2) measured by the image analysis method) is in the range from 1.7 to 10. Furthermore the average diameter (D2) measured by the image analysis method is in the range from 7 to 150 nm.

    摘要翻译： 本发明提供一种其中具有特殊形式的二氧化硅基颗粒，棘突分散在溶剂中的棘状二氧化硅基颗粒的溶胶。 棘状二氧化硅基颗粒在球状二氧化硅基颗粒的表面上形成疣状突起。 在棘突中，表示粗糙度（SA1 / SA2，SA1，表示通过BET法测定的比表面积或Sears法）的SA1，SA2表示由平均粒径（D2）测定的比表面积 图像分析方法）在1.7至10的范围内。此外，通过图像分析方法测量的平均直径（D2）在7至150nm的范围内。