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98 条记录 (耗时 0.039 秒)

    OPTICAL FILM, LAMINATE AND TOUCH PANEL
    1.
    发明申请
    OPTICAL FILM, LAMINATE AND TOUCH PANEL 审中-公开
    光学膜，层压板和触控面板

    公开(公告)号：US20100053101A1

    公开(公告)日：2010-03-04

    申请号：US12531992

    申请日：2009-02-24

    申请人： Kazuhiro Nozawa ,  Masato Saito

    发明人： Kazuhiro Nozawa ,  Masato Saito

    IPC分类号： G06F3/041 ,  B32B7/02

    CPC分类号： G02B1/14 ,  G02B1/105 ,  G02B1/111 ,  G02B1/16 ,  Y10T428/24942

    摘要： An optical film that can make interference fringes inconspicuous with maintaining high surface hardness and transmission sharpness is provided.The optical film 1 has a transparent base material layer 12. An undercoat layer 14 is laminated on at least one surface of the transparent base material layer 12. A transparent hard coat layer 16 is laminated on the undercoat layer 14. An anti-reflection layer 18 is laminated on the transparent hard coat layer 16. The anti-reflection layer 18 is a layer having a low refractive index smaller than the refractive index of the transparent hard coat layer 16. The layers are designed so that refractive index n0 of the transparent base material layer 12, refractive index n1 of the undercoat layer 14, refractive index n2 of the transparent hard coat layer 16, and refractive index n3 of the anti-reflection layer 18 should satisfy the relationships of n3

    摘要翻译： 提供了一种能够使干涉条纹不显眼且保持高表面硬度和透光锐度的光学膜。 光学膜1具有透明基材层12.在透明基材层12的至少一个表面层叠底涂层14.将透明硬涂层16层合在底涂层14上。防反射层 18层叠在透明硬涂层16上。防反射层18是具有比透明硬涂层16的折射率小的折射率的低层。这些层被设计成使透明的硬涂层16的折射率n0 基材层12，底涂层14的折射率n1，透明硬涂层16的折射率n2和抗反射层18的折射率n3应满足n3

    Pattern forming method, photomask manufacturing method, semiconductor device manufacturing method, and computer program product
    3.
    发明授权
    Pattern forming method, photomask manufacturing method, semiconductor device manufacturing method, and computer program product 有权
    图案形成方法，光掩模制造方法，半导体器件制造方法和计算机程序产品

    公开(公告)号：US07608368B2

    公开(公告)日：2009-10-27

    申请号：US11342677

    申请日：2006-01-31

    申请人： Hideaki Sakurai ,  Tooru Shibata ,  Masato Saito ,  Masamitsu Itoh

    发明人： Hideaki Sakurai ,  Tooru Shibata ,  Masato Saito ,  Masamitsu Itoh

    IPC分类号： G03F9/00 ,  G03C5/00

    CPC分类号： G03F7/70625 ,  G03F7/70558 ,  Y10S430/143

    摘要： A pattern forming method includes developing a resist film on a main surface of a substrate by flowing a developing solution on the film to form a resist pattern, the developing the film including partitioning the surface into M (≧2) regions and determining correction exposure dose for each of the M region, the determining the correction exposure dose including determining a correction exposure dose for an i-th (1≦i≦M) region so that an actual pattern dimension of a pattern on the i-th region matches a design pattern dimension based on a pattern opening ratio of a pattern to be formed on the substrate, the pattern being located on a region which is further upstream region than the i-th region with respect to an upstream direction of a flow of the solution, and forming the pattern by etching the substrate using the resist pattern as a mask.

    摘要翻译： 图案形成方法包括通过使显影溶液流到膜上以形成抗蚀剂图案，在基板的主表面上显影抗蚀剂膜，显影该膜包括将表面划分成M（> = 2）区域并确定校正曝光 确定校正曝光剂量，包括确定第i（1≤i≤M）区域的校正曝光剂量，使得第i个区域上的图案的实际图案尺寸 基于要在衬底上形成的图案的图案开口率来匹配设计图案尺寸，该图案位于比第i个区域的上游方向更靠上游区域的区域上 溶液，并且通过使用抗蚀剂图案作为掩模来蚀刻基板来形成图案。

    Surface Protective Sheet
    4.
    发明申请
    Surface Protective Sheet 审中-公开
    表面保护板

    公开(公告)号：US20090042017A1

    公开(公告)日：2009-02-12

    申请号：US10594255

    申请日：2005-03-25

    申请人： Keiichi Kitahara ,  Masato Saito ,  Masuo Koyama ,  Yoshihisa Kimura

    发明人： Keiichi Kitahara ,  Masato Saito ,  Masuo Koyama ,  Yoshihisa Kimura

    IPC分类号： B32B5/16

    CPC分类号： G09F7/002 ,  G09F7/00 ,  G09F13/04 ,  Y10T428/25

    摘要： To provide a surface protective sheet having superior anti-ultraviolet property and exhibiting little yellow tint.The surface protective sheet of the present invention has an anti-ultraviolet layer on at least one surface of a plastic film, and the anti-ultraviolet layer comprises an ultraviolet absorber, an ionizing radiation curable resin composition, and spherical microparticles having a mean particle diameter of 1 to 20 μm, and the microparticles are contained in an amount of 0.4 to 3% by weight in the anti-ultraviolet layer. The anti-ultraviolet layer preferably contains 0.01 to 1% by weight of organopolysiloxane.

    摘要翻译： 提供具有优异抗紫外线性能并且显示出很少黄色色调的表面保护片。 本发明的表面保护片在塑料膜的至少一个表面上具有防紫外线层，抗紫外线层含有紫外线吸收剂，电离辐射固化性树脂组合物，平均粒径 在抗紫外线层中含有0.4〜3重量％的微粒。 抗紫外线层优选含有0.01〜1重量％的有机聚硅氧烷。

    PHOTOMASK MANUFACTURING METHOD USING CHARGED BEAM WRITING APPARATUS
    5.
    发明申请
    PHOTOMASK MANUFACTURING METHOD USING CHARGED BEAM WRITING APPARATUS 审中-公开
    使用充电光束写入装置的光电制造方法

    公开(公告)号：US20080213677A1

    公开(公告)日：2008-09-04

    申请号：US12015032

    申请日：2008-01-16

    申请人： Masato Saito

    发明人： Masato Saito

    IPC分类号： G03F1/00 ,  G03F7/00

    CPC分类号： G03F1/78

    摘要： A first relationship between the charge dose of a charged beam writing apparatus and the dimensional accuracy of a photomask pattern is obtained, and a charge dose is determined from given dimensional accuracy on the basis of the first relationship. On the basis of the determined charge dose, a resist by which a resist pattern having desired dimensions is formed with the charge dose is selected. A second relationship between the write condition of the charged beam writing apparatus and the write time necessary to write the selected resist with the charge dose is obtained for each write pattern. The write condition is determined for each write pattern on the basis of a condition given to the write time and the second relationship.

    摘要翻译： 获得充电光束写入装置的电荷剂量与光掩模图案的尺寸精度之间的第一关系，并且基于第一关系从给定的尺寸精度确定电荷剂量。 基于确定的电荷剂量，选择形成具有所需尺寸的抗蚀剂图案的抗蚀剂，其具有电荷剂量。 对于每个写入模式，获得充电光束写入装置的写入条件和写入所选择的抗蚀剂所需的写入时间之间的第二关系。 基于给予写入时间和第二关系的条件，为每个写入模式确定写入条件。

    Pattern drawing system, electrically charged beam drawing method, photomask manufacturing method, and semiconductor device manufacturing method
    7.
    发明申请
    Pattern drawing system, electrically charged beam drawing method, photomask manufacturing method, and semiconductor device manufacturing method 有权

    公开(公告)号：US20060281198A1

    公开(公告)日：2006-12-14

    申请号：US11434258

    申请日：2006-05-16

    申请人： Masato Saito

    发明人： Masato Saito

    IPC分类号： H01L21/66 ,  H01L23/58

    CPC分类号： H01J37/3026 ,  H01J2237/31769

    摘要： A pattern drawing system includes a beam irradiating mechanism which irradiates electrically charged beams on a film to be drawn, a coefficient calculating section which calculates a backward scattering coefficient relevant to a drawing pattern in the film to be drawn, based on an approximating function for approximating a relationship between a global coating rate of the drawing pattern and a backward scattering coefficient of the electrically charged beams in the film to be drawn, and based on the global coating rate of the drawing pattern, and an irradiation quantity calculating section which calculates an electrically charged beam irradiation quantity used for drawing the pattern using an electrically charged beams irradiating mechanism, based on the backward scattering coefficient of the pattern.

    Cathode for electronic tube
    9.
    发明授权
    Cathode for electronic tube 失效
    电子管阴极

    公开(公告)号：US6054802A

    公开(公告)日：2000-04-25

    申请号：US29032

    申请日：1998-02-20

    申请人： Takuya Ohira ,  Masato Saito ,  Hiroyuki Teramoto

    发明人： Takuya Ohira ,  Masato Saito ,  Hiroyuki Teramoto

    IPC分类号： H01J1/142 ,  H01J1/26 ,  H01J1/00

    CPC分类号： H01J1/142 ,  H01J1/26

    摘要： Problems with a conventional cathode for electronic tubes arose because metals composing the substrate were subjected to heat deformation, resulting in a relatively lage drift of cutoff voltage. The present invention diminishes the heat deformation of the substrate to obtain a cathode with a small drift of cutoff voltage. Particularly, heat expansion coefficients can be made uniform while metals in the metal layer are prevented from diffusing into the substrate. This is done by incorporating the same metals present in the metal layer into the metals composing the substrate, thereby supressing deformation of the substrate.

    摘要翻译： PCT No.PCT / JP97 / 01976 Sec。 371日期：1998年2月20日 102（e）1998年2月20日PCT 1997年6月10日PCT公布。 公开号WO97 / 49108 PCT。 日期1997年12月24日由于构成基板的金属受到热变形，导致电子管的常规阴极的问题，导致截止电压相对较大的漂移。 本发明减小了基板的热变形以获得具有小的截止电压漂移的阴极。 特别地，可以使热膨胀系数均匀，防止金属层中的金属扩散到基板中。 这通过将金属层中存在的相同金属掺入构成基板的金属中，从而抑制基板的变形。

    Image display apparatus
    10.
    发明授权
    Image display apparatus 失效
    图像显示装置

    公开(公告)号：US5604394A

    公开(公告)日：1997-02-18

    申请号：US256278

    申请日：1994-07-06

    申请人： Masato Saito ,  Ryo Suzuki ,  Tetsuya Shiroishi ,  Kouichi Sakurai ,  Yoshio Yamane ,  Hidenobu Murakami

    发明人： Masato Saito ,  Ryo Suzuki ,  Tetsuya Shiroishi ,  Kouichi Sakurai ,  Yoshio Yamane ,  Hidenobu Murakami

    IPC分类号： H01J31/12 ,  H01J29/70 ,  H01J1/62

    CPC分类号： H01J31/126 ,  H01J2329/8625

    摘要： It is an object of the present invention to provide an image display apparatus which is light and thin and is manufactured with reduced cost and which assures a clear image with no luminance unevenness over the entire screen. The image display apparatus includes: a string like hot cathode for emitting electrons; a perforated cover electrode for leading out and accelerating the electrons emitted from the cathode; a control electrode disposed substantially parallel with the cathode and having an electron-pass aperture permitting an electron beam to pass therethrough, the control electrode being adapted to control the electron beam; a luminous element which emits light when irradiated with the electron beam and is disposed on a curved surface; and a focusing electrode disposed between the control electrode and the luminous element, the focusing electrode being divided into focusing electrodes. Where the luminous element, the focusing electrode and the control electrode comprise respective curved surfaces and the string like hot cathode and the perforated cover electrode are formed on a flat plane, a second grid is provided between the control electrode and the perforated cover electrode.

    摘要翻译： PCT No.PCT / JP93 / 01600 Sec。 371日期：1994年7月6日 102（e）日期1994年7月6日PCT 1993年11月4日PCT公布。 出版物WO94 / 11896 日期：1994年5月26日本发明的目的是提供一种轻薄的图像显示装置，并且以低成本制造，并且确保在整个屏幕上没有亮度不均匀的清晰图像。 图像显示装置包括：用于发射电子的热阴极线; 用于引出并加速从阴极发射的电子的穿孔盖电极; 控制电极，其基本上平行于阴极设置并具有允许电子束通过的电子通过孔，所述控制电极适于控制电子束; 发光元件，其在用电子束照射时发光，并设置在曲面上; 以及设置在控制电极和发光元件之间的聚焦电极，聚焦电极被分成聚焦电极。 在发光元件，聚焦电极和控制电极包括相应的曲面，并且像热阴极和多孔盖电极之类的线形成在平面上的情况下，在控制电极和多孔盖电极之间设置第二格栅。