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公开(公告)号：US10669624B2
公开(公告)日：2020-06-02
申请号：US15715416
申请日：2017-09-26
IPC分类号： C23C16/34 , C23C14/54 , C23C14/06 , C10M177/00 , C23C14/02 , C23C14/00 , C10M103/02 , C10M141/06 , C23C14/46
摘要： In an amorphous carbon film of a sliding member, provided that a number of nitrogen atoms each singly bonded to three carbon atoms is A, and a number of nitrogen atoms each singly and doubly bonded to two carbon atoms, respectively, is B, a value A/B of the amorphous carbon film obtained through X-ray photoelectron spectroscopy analysis is 10 to 18. The method includes irradiating the surface of the substrate with nitrogen ion beams and irradiating a carbon target with electron beams, thereby forming an amorphous carbon film on the surface of the substrate while vapor-depositing a part of the carbon target onto the surface of the substrate. The output of the electron beams that irradiate the carbon target is 30 to 50 W.
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公开(公告)号：US20110033365A1
公开(公告)日：2011-02-10
申请号：US12517887
申请日：2007-12-07
IPC分类号： H05H1/50 , H05H1/48 , C23C16/513 , D01F9/14
CPC分类号： C23C16/26 , C23C16/4485 , C23C16/503
摘要： This invention provides a process and apparatus for producing a carbonaceous film such as a DLC film using a solid raw material without the need to supply a high energy radiation such as a laser beam. The process comprises providing a solid organic material as a raw material, applying a discharge energy to the material to form plasma, and depositing the plasma onto a base material to form a carbonaceous film. This process is preferably carried out by using a film production apparatus (1) comprising discharge means (10). The discharge means (10) comprises a pair of electrodes (a raw material holder) (12, 14) for holding a raw material (50) and voltage applying means (20) for applying voltage across the electrodes.
摘要翻译： 本发明提供一种使用固体原料生产碳质膜如DLC膜的方法和装置，而不需要提供诸如激光束的高能量辐射。 该方法包括提供作为原料的固体有机材料，向材料施加放电能量以形成等离子体，以及将等离子体沉积到基底材料上以形成碳质膜。 该方法优选通过使用包括排出装置（10）的薄膜制造装置（1）来进行。 放电装置（10）包括用于保持原料（50）的一对电极（原料保持器）（12,14）和用于在电极两端施加电压的电压施加装置（20）。
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3.发明申请Plasma Processing Device, Plasma Processing Method, and Plasma Surface Processing Method 有权等离子体处理装置，等离子体处理方法和等离子体表面处理方法公开(公告)号：US20090286011A1
公开(公告)日：2009-11-19
申请号：US12374365
申请日：2007-07-19
IPC分类号： C23C16/511 , H05H1/46
CPC分类号： H01J37/32266 , C23C16/045 , C23C16/511 , H01J37/32192 , H01J37/32229 , H05H1/46 , H05H2001/463
摘要： To generate plasma inside a tube of a small opening diameter and perform plasma processing inside the tube.A plasma processing device 2 is formed by a chamber (4) and a microwave generation device (6). A microwave is introduced into the chamber via a quartz tube (16). A tube holder (18) is arranged inside the quartz tube (16). Two holes are formed in the side surface of the tube holder (18). A tube (20) of a small opening diameter is fixed to the end of the tube holder (18).
摘要翻译： 在小孔直径的管内产生等离子体，并在管内进行等离子体处理。 等离子体处理装置2由室（4）和微波产生装置（6）形成。 微波通过石英管（16）引入腔室。 管座（18）布置在石英管（16）的内部。 在管保持器（18）的侧表面中形成有两个孔。 小开口直径的管（20）固定到管保持器（18）的端部。
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4.发明授权Plasma processing device, plasma processing method, and plasma surface processing method 有权等离子体处理装置，等离子体处理方法和等离子体表面处理方法公开(公告)号：US08752503B2
公开(公告)日：2014-06-17
申请号：US12374365
申请日：2007-07-19
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01J37/32266 , C23C16/045 , C23C16/511 , H01J37/32192 , H01J37/32229 , H05H1/46 , H05H2001/463
摘要： To generate plasma inside a tube of a small opening diameter and perform plasma processing inside the tube. A plasma processing device 2 is formed by a chamber (4) and a microwave generation device (6). A microwave is introduced into the chamber via a quartz tube (16). A tube holder (18) is arranged inside the quartz tube (16). Two holes are formed in the side surface of the tube holder (18). A tube (20) of a small opening diameter is fixed to the end of the tube holder (18).
摘要翻译： 在小孔直径的管内产生等离子体，并在管内进行等离子体处理。 等离子体处理装置2由室（4）和微波产生装置（6）形成。 微波通过石英管（16）引入腔室。 管座（18）布置在石英管（16）的内部。 在管保持器（18）的侧表面中形成有两个孔。 小开口直径的管（20）固定到管保持器（18）的端部。
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公开(公告)号：US06878824B2
公开(公告)日：2005-04-12
申请号：US10390706
申请日：2003-03-19
申请人： Isao Hashiba , Takayuki Tamura , Hiroyuki Kousaka
发明人： Isao Hashiba , Takayuki Tamura , Hiroyuki Kousaka
IPC分类号： C07D251/56 , C07D251/70
CPC分类号： C07D251/56
摘要： The present invention provides a process for preparing N-methylated melamines in simple steps by using inexpensive raw materials in such a manner that the proportion of mono-type, bis-type and tris-type of the N-methylated melamines as prepared can be controlled. The process comprises reacting by heating melamine with methylamine in the presence of an acidic catalyst under pressure to substitute at least one amino group of the melamine by methylamino group.
摘要翻译： 本发明提供了以简单的步骤制备N-甲基化三聚氰胺的方法，其方法是以可以控制所制备的N-甲基化三聚氰胺的单型，双型和三种类型的比例来控制 。 该方法包括通过在压力下在酸性催化剂存在下加三聚氰胺与甲胺反应，以通过甲基氨基代替至少一个三聚氰胺的氨基。
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公开(公告)号：US06307046B1
公开(公告)日：2001-10-23
申请号：US09600122
申请日：2000-07-31
IPC分类号： C07D25170
CPC分类号： C07D251/70
摘要： The present invention provides a method for modifying melamine derivatives that can produce N-substituted melamine derivatives by introducing a substituent group to melamine or N-substituted melamine derivatives. The method is characterized by heating melamine or an N-substituted melamine derivative and an alcohol in the presence of a mixed catalyst comprising a hydrogenation catalyst and a dehydrogenation catalyst and hydrogen to allow reaction or heating melamine or an N-substituted melamine derivative and an alcohol in the presence of a hydrogenation catalyst and hydrogen with addition/coexistence of a metal to allow reaction. The compound groups obtained by introducing a substituent group to the amino group of melamine derivative with an alcohol by the method of the present invention can be used widely as intermediates of fine chemicals such as various agricultural chemicals, medicines, dyes, paints, etc. and as various resin materials and flame retardant materials.
摘要翻译： 本发明提供了一种通过将取代基引入三聚氰胺或N-取代的三聚氰胺衍生物来修饰可以产生N-取代的三聚氰胺衍生物的三聚氰胺衍生物的方法。 该方法的特征在于在包含氢化催化剂和脱氢催化剂和氢气的混合催化剂存在下加热三聚氰胺或N-取代的三聚氰胺衍生物和醇，以允许反应或加热三聚氰胺或N-取代的三聚氰胺衍生物和醇 在氢化催化剂和氢气的存在下，加入/共存金属以允许反应。 通过本发明的方法，通过用醇将三聚氰胺衍生物的氨基引入取代基而获得的化合物基团可广泛用作各种农药，药物，染料，油漆等精细化学品的中间体，以及 作为各种树脂材料和阻燃材料。
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公开(公告)号：US20090194236A1
公开(公告)日：2009-08-06
申请号：US11630774
申请日：2005-06-20
申请人： Kouichi Ono , Hiroyuki Kousaka , Kiyotaka Ishibashi , Ikuo Sawada
发明人： Kouichi Ono , Hiroyuki Kousaka , Kiyotaka Ishibashi , Ikuo Sawada
CPC分类号： H01J37/32192 , H01J37/3222 , H05H1/46
摘要： A plurality of concentric ring-shaped slots (300) to (304) are formed in a planar antenna member (3), and the thickness of conductors in the central part is made relatively thin and the thickness of peripheral conductors is made relatively thick, so that a microwave can easily pass through the slots (300) to (304) without being attenuated, and a uniform electric field distribution can be provided and uniform high-density plasma can be generated in a processing space on an average. As a result, an object to be processed can be provided close to the antenna member (3) and the object can be uniformly processed at high speed.
摘要翻译： 在平面天线构件（3）中形成有多个同心环状的槽（300）至（304），并且使中心部的导体的厚度相对较薄，并且使周边导体的厚度相对较厚， 使得微波可以容易地穿过狭槽（300）至（304）而不被衰减，并且可以提供均匀的电场分布，并且可以在处理空间中平均生成均匀的高密度等离子体。 结果，能够靠近天线部件（3）设置被加工物，能够高速地均匀地进行物体的加工。
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8.发明授权公开(公告)号：US08389738B2
公开(公告)日：2013-03-05
申请号：US13002837
申请日：2009-07-09
IPC分类号： C07D261/04
CPC分类号： C07D261/04
摘要： A production method of an isoxazoline-substituted benzoic acid amide compound of Formula (1) where X is a halogen atom, C1-6 haloalkyl, etc., Y is a halogen atom, C1-6 alkyl, etc., R1 is a C1-6 haloalkyl, etc., R2 and R3 independently of each other are a hydrogen atom, C1-6 alkyl, etc., R4 is C1-6 alkyl, C1-6 haloalkyl, etc., R5 is a hydrogen atom, c1-6 alkyl, etc., m is an integer of 0 to 5, n is an integer of 0 to 4, including: reacting an isoxazoline-substituted benzene compound of Formula (3) where X, Y, R1, m, and n are the same as defined above, L is a chlorine atom, a bromine atom, —C(O)OH, —C(O)J, etc., J is a halogen atom, with a 2-aminoacetic acid amide compound of Formula (2) where R2, R3, R4, and R5 are the same as defined above, or a salt thereof; crystal forms and the production method thereof.
摘要翻译： 其中X是卤素原子，C 1-6卤代烷基等的式（1）的异恶唑啉取代的苯甲酸酰胺化合物的制备方法，Y是卤素原子，C 1-6烷基等，R 1是C 1 -6卤代烷基等，R2和R3彼此独立地是氢原子，C1-6烷基等，R4是C1-6烷基，C1-6卤代烷基等，R5是氢原子，c1- 6烷基等，m为0〜5的整数，n为0〜4的整数，包括：使式（3）的异恶唑啉取代的苯化合物，其中X，Y，R 1，m和n分别为 与上述相同，L是氯原子，溴原子，-C（O）OH，-C（O）J等，J是卤素原子，与式（2）的2-氨基乙酰胺化合物 2）其中R2，R3，R4和R5与上述定义相同，或其盐; 晶体形式及其制备方法。
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9.发明申请PRODUCTION METHOD OF ISOXAZOLINE-SUBSTITUTED BENZOIC ACID AMIDE COMPOUND 有权ISOXAZOLINE-取代苯甲酸酰胺化合物的生产方法公开(公告)号：US20110144349A1
公开(公告)日：2011-06-16
申请号：US13002837
申请日：2009-07-09
IPC分类号： C07D261/04
CPC分类号： C07D261/04
摘要： A production method of an isoxazoline-substituted benzoic acid amide compound of Formula (1) where X is a halogen atom, C1-6 haloalkyl, etc., Y is a halogen atom, C1-6 alkyl, etc., R1 is a C1-6 haloalkyl, etc., R2 and R3 independently of each other are a hydrogen atom, C1-6 alkyl, etc., R4 is C1-6 alkyl, C1-6 haloalkyl, etc., R5 is a hydrogen atom, c1-6 alkyl, etc., m is an integer of 0 to 5, n is an integer of 0 to 4, including: reacting an isoxazoline-substituted benzene compound of Formula (3) where X, Y, R1, m, and n are the same as defined above, L is a chlorine atom, a bromine atom, —C(O)OH, —C(O)J, etc., J is a halogen atom, with a 2-aminoacetic acid amide compound of Formula (2) where R2, R3, R4, and R5 are the same as defined above, or a salt thereof; crystal forms and the production method thereof.
摘要翻译： 其中X是卤素原子，C 1-6卤代烷基等的式（1）的异恶唑啉取代的苯甲酸酰胺化合物的制备方法，Y是卤素原子，C 1-6烷基等，R 1是C 1 -6卤代烷基等，R2和R3彼此独立地是氢原子，C1-6烷基等，R4是C1-6烷基，C1-6卤代烷基等，R5是氢原子，c1- 6烷基等，m为0〜5的整数，n为0〜4的整数，包括：使式（3）的异恶唑啉取代的苯化合物，其中X，Y，R 1，m和n分别为 与上述相同，L是氯原子，溴原子，-C（O）OH，-C（O）J等，J是卤素原子，与式（2）的2-氨基乙酰胺化合物 2）其中R2，R3，R4和R5与上述定义相同，或其盐; 晶体形式及其制备方法。
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10.发明申请PLASMA PROCESS APPARATUS, PLASMA PROCESS METHOD, AND OBJECT PROCESSED BY THE PLASMA PROCESS METHOD 审中-公开等离子体处理装置，等离子体处理方法和等离子体处理方法的对象公开(公告)号：US20090246542A1
公开(公告)日：2009-10-01
申请号：US12410492
申请日：2009-03-25
申请人： Ken Nakao , Shuji Moriya , Hiroyuki Kousaka
发明人： Ken Nakao , Shuji Moriya , Hiroyuki Kousaka
IPC分类号： B32B15/04 , C23C16/513
CPC分类号： H05H1/46 , H05H2001/4622 , H05H2240/10 , H05H2245/123 , Y10T428/31678
摘要： A disclosed plasma process apparatus includes an electromagnetic wave generator that generates electromagnetic waves; a vacuum vessel configured to be hermetically connected with an object to be processed, and evacuated to reduced pressures along with the object to be processed hermetically connected to the vacuum vessel; an electromagnetic wave guiding portion configured to guide the electromagnetic waves generated by the electromagnetic wave generator so that plasma is ignited in the vacuum vessel; a gas supplying portion configured to supply a process gas to the object to be processed hermetically connected to the vacuum vessel; an evacuation portion configured to evacuate the object to be processed hermetically connected to the vacuum vessel; and a voltage source configured to apply a predetermined voltage to the object to be processed hermetically connected to the vacuum vessel so that the plasma ignited in the vacuum vessel is guided to the object to be processed.
摘要翻译： 所公开的等离子体处理装置包括产生电磁波的电磁波发生器; 真空容器，其构造成与待处理物体气密连接，并与被加工物体一起被抽空到与真空容器密封连接的被处理物体上; 电磁波引导部，被配置为引导由电磁波发生器产生的电磁波，使得等离子体在真空容器中点燃; 气体供给部构造成将处理气体供给到与真空容器密封连接的待加工对象物; 排气部，其构造成对与所述真空容器密封连接的待加工物体进行抽真空; 以及电压源，其构造成对与所述真空容器进行气密连接的待加工对象施加预定电压，使得在所述真空容器中点燃的等离子体被引导到被处理物体。
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