公开(公告)号：US20120097637A1

公开(公告)日：2012-04-26

申请号：US13379192

申请日：2010-07-29

申请人： Keiji Watanabe ,  Shuji Koyama ,  Hiroyuki Abo ,  Keiji Matsumoto

发明人： Keiji Watanabe ,  Shuji Koyama ,  Hiroyuki Abo ,  Keiji Matsumoto

IPC分类号： B41J2/16

CPC分类号： B41J2/1404 ,  B41J2/14145 ,  B41J2/1603 ,  B41J2/1629 ,  B41J2/1634 ,  B41J2/1639

摘要： Provided is a method of manufacturing a substrate for a liquid discharge head including a first face, energy generating elements which generate the energy to be used to discharge a liquid to a second face opposite to the first face, and liquid supply ports for supplying the liquid to the energy generating elements. The method includes preparing a silicon substrate having, at the first face, an etching mask layer having an opening corresponding to a portion where the liquid supply ports are to be formed, and having first recesses provided within the opening, and second recesses provided in the region of the second face where the liquid supply ports are to be formed, the first recesses and the second recesses being separated from each other by a portion of the substrate; and etching the silicon substrate by crystal anisotropic etching from the opening of the first face to form the liquid supply ports.

摘要翻译： 提供了一种制造用于液体排出头的基板的方法，该液体排出头包括第一面，产生用于将液体排放到与第一面相对的第二面的能量的能量产生元件，以及用于供应液体的液体供给口 到能量产生元件。 该方法包括制备硅衬底，该硅衬底在第一面处具有一蚀刻掩模层，该蚀刻掩模层具有与形成有液体供应端口的部分相对应的开口，并且具有设置在该开口内的第一凹部， 要形成液体供给口的第二面的区域，第一凹部和第二凹部由基板的一部分彼此分离; 以及通过晶体各向异性蚀刻从第一面的开口蚀刻硅衬底以形成液体供应​​端口。

公开(公告)号：US08377828B2

公开(公告)日：2013-02-19

申请号：US12709544

申请日：2010-02-22

申请人： Keiji Matsumoto ,  Shuji Koyama ,  Hiroyuki Abo ,  Keiji Watanabe

发明人： Keiji Matsumoto ,  Shuji Koyama ,  Hiroyuki Abo ,  Keiji Watanabe

IPC分类号： H01L21/302

CPC分类号： B41J2/1629 ,  B41J2/1603 ,  B41J2/1631 ,  B41J2/1634

摘要： A method of manufacturing a substrate for a liquid discharge head, the substrate being a silicon substrate having a first surface opposed to a second surface, the method comprising the steps of providing a layer on the second surface of the silicon substrate, wherein the layer has a lower etch rate than silicon when exposed to an etchant of silicon, partially removing the layer so as to expose part of the second surface of the silicon substrate, wherein the exposed part surrounds at least one part of the layer; and wet etching the layer and the exposed part of the second surface of the silicon substrate, using the etchant of silicon, to form a liquid supply port extending from the second surface to the first surface of the silicon substrate.

摘要翻译： 一种液体排出头基板的制造方法，所述基板为具有与第二表面相对的第一表面的硅基板，所述方法包括以下步骤：在所述硅基板的第二表面上设置层，其中，所述层具有 当暴露于硅的蚀刻剂时，比硅蚀刻速率低，部分地去除该层以暴露硅衬底的第二表面的一部分，其中暴露部分围绕该层的至少一部分; 以及使用硅蚀刻剂湿法蚀刻硅衬底的第二表面的层和暴露部分，以形成从硅衬底的第二表面延伸到第一表面的液体供应端口。

公开(公告)号：US20100216264A1

公开(公告)日：2010-08-26

申请号：US12709544

申请日：2010-02-22

申请人： Keiji Matsumoto ,  Shuji Koyama ,  Hiroyuki Abo ,  Keiji Watanabe

发明人： Keiji Matsumoto ,  Shuji Koyama ,  Hiroyuki Abo ,  Keiji Watanabe

IPC分类号： H01L21/311 ,  H01L21/263

CPC分类号： B41J2/1629 ,  B41J2/1603 ,  B41J2/1631 ,  B41J2/1634

摘要： A method of manufacturing a substrate for a liquid discharge head, the substrate being a silicon substrate having a first surface opposed to a second surface, the method comprising the steps of providing a layer on the second surface of the silicon substrate, wherein the layer has a lower etch rate than silicon when exposed to an etchant of silicon, partially removing the layer so as to expose part of the second surface of the silicon substrate, wherein the exposed part surrounds at least one part of the layer; and wet etching the layer and the exposed part of the second surface of the silicon substrate, using the etchant of silicon, to form a liquid supply port extending from the second surface to the first surface of the silicon substrate.

摘要翻译： 一种液体排出头基板的制造方法，所述基板为具有与第二表面相对的第一表面的硅基板，所述方法包括以下步骤：在所述硅基板的第二表面上设置层，其中，所述层具有 当暴露于硅的蚀刻剂时，比硅蚀刻速率低，部分地去除该层以暴露硅衬底的第二表面的一部分，其中暴露部分围绕该层的至少一部分; 以及使用硅蚀刻剂湿法蚀刻硅衬底的第二表面的层和暴露部分，以形成从硅衬底的第二表面延伸到第一表面的液体供应端口。

公开(公告)号：US08808555B2

公开(公告)日：2014-08-19

申请号：US13379192

申请日：2010-07-29

申请人： Keiji Watanabe ,  Shuji Koyama ,  Hiroyuki Abo ,  Keiji Matsumoto

发明人： Keiji Watanabe ,  Shuji Koyama ,  Hiroyuki Abo ,  Keiji Matsumoto

IPC分类号： B41J2/16 ,  B44C1/22 ,  B41J2/14

CPC分类号： B41J2/1404 ,  B41J2/14145 ,  B41J2/1603 ,  B41J2/1629 ,  B41J2/1634 ,  B41J2/1639

摘要： Provided is a method of manufacturing a substrate for a liquid discharge head including a first face, energy generating elements which generate the energy to be used to discharge a liquid to a second face opposite to the first face, and liquid supply ports for supplying the liquid to the energy generating elements. The method includes preparing a silicon substrate having, at the first face, an etching mask layer having an opening corresponding to a portion where the liquid supply ports are to be formed, and having first recesses provided within the opening, and second recesses provided in the region of the second face where the liquid supply ports are to be formed, the first recesses and the second recesses being separated from each other by a portion of the substrate; and etching the silicon substrate by crystal anisotropic etching from the opening of the first face to form the liquid supply ports.

摘要翻译： 提供了一种制造用于液体排出头的基板的方法，该液体排出头包括第一面，产生用于将液体排放到与第一面相对的第二面的能量的能量产生元件，以及用于供应液体的液体供给口 到能量产生元件。 该方法包括制备硅衬底，该硅衬底在第一面处具有一蚀刻掩模层，该蚀刻掩模层具有与形成有液体供应端口的部分相对应的开口，并且具有设置在该开口内的第一凹部， 要形成液体供给口的第二面的区域，第一凹部和第二凹部由基板的一部分彼此分离; 以及通过晶体各向异性蚀刻从第一面的开口蚀刻硅衬底以形成液体供应​​端口。

公开(公告)号：US20110151598A1

公开(公告)日：2011-06-23

申请号：US12973708

申请日：2010-12-20

申请人： Hiroyuki Abo ,  Keiji Watanabe ,  Keiji Matsumoto

发明人： Hiroyuki Abo ,  Keiji Watanabe ,  Keiji Matsumoto

IPC分类号： H01L21/302

CPC分类号： B41J2/1603 ,  B41J2/1629

摘要： A method for manufacturing a substrate for liquid-ejecting heads includes etching a surface of a silicon substrate using a first etchant, with a silicon oxide layer as a mask, to form a depression as a part of a liquid supply port, and subsequently etching at least the silicon oxide layer and the thickness sandwiched between the depression and the etched surface of the silicon substrate with a second etchant to form the liquid supply port.

摘要翻译： 一种液体喷射头用基板的制造方法，其特征在于，使用第一蚀刻剂，以氧化硅层作为掩模蚀刻硅基板的表面，形成作为液体供给口的一部分的凹部， 用第二蚀刻剂将硅氧化物层和夹在硅衬底的蚀刻表面之间的厚度最小化，以形成液体供应​​端口。

公开(公告)号：US08703509B2

公开(公告)日：2014-04-22

申请号：US12973708

申请日：2010-12-20

申请人： Hiroyuki Abo ,  Keiji Watanabe ,  Keiji Matsumoto

发明人： Hiroyuki Abo ,  Keiji Watanabe ,  Keiji Matsumoto

IPC分类号： H01L21/311 ,  H01L21/302

CPC分类号： B41J2/1603 ,  B41J2/1629

摘要： A method for manufacturing a substrate for liquid-ejecting heads includes etching a surface of a silicon substrate using a first etchant, with a silicon oxide layer as a mask, to form a depression as a part of a liquid supply port, and subsequently etching at least the silicon oxide layer and the thickness sandwiched between the depression and the etched surface of the silicon substrate with a second etchant to form the liquid supply port.

摘要翻译： 一种液体喷射头用基板的制造方法，其特征在于，使用第一蚀刻剂，以氧化硅层作为掩模蚀刻硅基板的表面，形成作为液体供给口的一部分的凹部， 用第二蚀刻剂将硅氧化物层和夹在硅衬底的蚀刻表面之间的厚度最小化，以形成液体供应​​端口。

公开(公告)号：US08904639B2

公开(公告)日：2014-12-09

申请号：US13223066

申请日：2011-08-31

申请人： Keiji Matsumoto ,  Shuji Koyama ,  Sakai Yokoyama ,  Kenji Fujii ,  Jun Yamamuro

发明人： Keiji Matsumoto ,  Shuji Koyama ,  Sakai Yokoyama ,  Kenji Fujii ,  Jun Yamamuro

IPC分类号： B21D53/76 ,  B23P17/00 ,  B41J2/135 ,  B41J2/16

CPC分类号： B41J2/1603 ,  B41J2/1606 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1632 ,  B41J2/1634 ,  Y10T29/49401

摘要： Disclosed is a method of including the steps of preparing a substrate having a flow-path-wall member; bonding the flow-path-wall member to a resin layer that is composed of a photo-curing resin and serves as the ejection port member such that spaces serving as the flow paths are provided between the substrate and the photo-curing resin; providing through-holes in the resin layer such that the spaces communicate with the outside air; exposing part of the resin layer to light to form an exposed portion and an unexposed portion; heating the exposed portion of the resin layer; and removing the unexposed portion from the heated resin layer to form the ejection ports, removing the unexposed portion from the heated resin layer to form the ejection ports, thereby forming the ejection port member.

摘要翻译： 公开了一种包括制备具有流路壁构件的基板的步骤的方法， 将流路壁构件结合到由光固化树脂构成的树脂层，并且用作喷射口构件，使得在基板和光固化树脂之间设置用作流路的空间; 在树脂层中设置通孔，使得空间与外部空气连通; 将树脂层的一部分暴露于光以形成暴露部分和未曝光部分; 加热树脂层的暴露部分; 从被加热的树脂层去除未曝光部分以形成喷射口，从被加热的树脂层去除未曝光部分以形成喷射口，从而形成喷射口部件。

公开(公告)号：US08429820B2

公开(公告)日：2013-04-30

申请号：US13219502

申请日：2011-08-26

申请人： Shuji Koyama ,  Sakai Yokoyama ,  Kenji Fujii ,  Jun Yamamuro ,  Keiji Matsumoto ,  Tetsuro Honda ,  Kouji Sasaki ,  Kenta Furusawa ,  Keisuke Kishimoto

发明人： Shuji Koyama ,  Sakai Yokoyama ,  Kenji Fujii ,  Jun Yamamuro ,  Keiji Matsumoto ,  Tetsuro Honda ,  Kouji Sasaki ,  Kenta Furusawa ,  Keisuke Kishimoto

IPC分类号： B21D53/76 ,  B23P17/00

CPC分类号： B41J2/1604 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1634 ,  B41J2/1635 ,  B41J2/1639 ,  B41J2/1643 ,  B41J2/1645 ,  B41J2/1646 ,  Y10T29/49401

摘要： The present invention is a method of manufacturing a liquid discharge head, which includes providing a substrate on which a solid member is disposed to surround a region that becomes the flow path, and a metal layer made of a metal or a metal compound is disposed inside of the region, forming a mold made of a metal or a metal compound inside of the region, disposing a cover layer made of a resin to cover the solid member and the mold in contact with the solid member and the mold wherein the solid member and the metal are formed with a distance therebetween, and removing the mold to form the flow path.

摘要翻译： 本发明是一种液体排出头的制造方法，其特征在于，具备：设置固体部件的基板，围绕成为流路的区域，金属或金属化合物构成的金属层配置在内部 在该区域内形成由金属或金属化合物制成的模具，设置由树脂制成的覆盖层以覆盖固体构件和与实心构件和模具接触的模具，其中固体构件和 金属形成在它们之间的距离，并且移除模具以形成流动路径。

公开(公告)号：US20120047738A1

公开(公告)日：2012-03-01

申请号：US13219502

申请日：2011-08-26

申请人： Shuji Koyama ,  Sakai Yokoyama ,  Kenji Fujii ,  Jun Yamamuro ,  Keiji Matsumoto ,  Tetsuro Honda ,  Kouji Sasaki ,  Kenta Furusawa ,  Keisuke Kishimoto

发明人： Shuji Koyama ,  Sakai Yokoyama ,  Kenji Fujii ,  Jun Yamamuro ,  Keiji Matsumoto ,  Tetsuro Honda ,  Kouji Sasaki ,  Kenta Furusawa ,  Keisuke Kishimoto

IPC分类号： B23P17/00

CPC分类号： B41J2/1604 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1634 ,  B41J2/1635 ,  B41J2/1639 ,  B41J2/1643 ,  B41J2/1645 ,  B41J2/1646 ,  Y10T29/49401

摘要： The present invention is a method of manufacturing a liquid discharge head, which includes providing a substrate on which a solid member that becomes a flow path wall member is disposed to surround a region that becomes a flow path, forming a mold made of a metal or a metal compound inside of the region, disposing a cover layer made of a resin to cover the solid member and the mold, and removing the mold to form the flow path.

摘要翻译： 本发明是一种液体排出头的制造方法，其特征在于，提供一种基板，在该基板上设置成为流路壁部件的实心部件，以围绕成为流路的区域，形成由金属制成的模具， 在该区域内部的金属化合物，设置由树脂制成的覆盖层以覆盖实心构件和模具，并且移除模具以形成流路。

公开(公告)号：US20130017496A1

公开(公告)日：2013-01-17

申请号：US13540960

申请日：2012-07-03

申请人： Keiji Matsumoto ,  Kazuhiro Asai ,  Tetsuro Honda ,  Kunihito Uohashi ,  Shuji Koyama ,  Masaki Ohsumi

发明人： Keiji Matsumoto ,  Kazuhiro Asai ,  Tetsuro Honda ,  Kunihito Uohashi ,  Shuji Koyama ,  Masaki Ohsumi

IPC分类号： G03F7/20

CPC分类号： G03F7/095 ,  B41J2/1603 ,  B41J2/1628 ,  B41J2/1631 ,  B41J2/1632 ,  G03F7/0035 ,  G03F7/038 ,  G03F7/094 ,  G03F7/38

摘要： A method for manufacturing a recording head including forming a flow-channel side-wall forming layer which contains a photosensitive resin, on a substrate having ejection energy generating elements and wiring thereon; exposing the flow-channel side-wall forming layer to light, and optically determining a flow channel; forming a shape stabilizing layer which contains a photosensitive resin; forming an ejection orifice forming layer which contains a photopolymerization initiator and a negative photosensitive resin; exposing the ejection orifice forming layer to light, and optically determining an ejection orifice; and developing the ejection orifice forming layer, shape stabilizing layer, and flow-channel side-wall forming layer, in the order named. The photosensitive resin in the shape stabilizing layer is a material to be cured by a component that is produced upon the exposure of the ejection orifice forming layer and derives from the photopolymerization initiator.

摘要翻译： 一种用于制造记录头的方法，包括在具有喷射能量产生元件的基板和其上布线的基板上形成包含感光性树脂的流路侧壁形成层; 将流路侧壁形成层暴露于光，并光学地确定流路; 形成含有感光性树脂的形状稳定层; 形成含有光聚合引发剂和负性感光性树脂的喷射孔形成层; 将喷射孔形成层暴露于光，并且光学地确定喷射孔; 并按顺序显影喷射孔形成层，形状稳定层和流动通道侧壁形成层。 形状稳定层中的感光性树脂是通过喷射孔形成层的曝光而产生并从光聚合引发剂得到的成分固化的材料。