公开(公告)号：US07670436B2

公开(公告)日：2010-03-02

申请号：US10981261

申请日：2004-11-03

申请人： Keith A. Miller ,  Ilya Lavitsky

发明人： Keith A. Miller ,  Ilya Lavitsky

IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC分类号： H01L21/68735 ,  C23C14/50 ,  H01J37/32642 ,  H01L21/68721 ,  Y10S156/915

摘要： A substrate ring assembly is provided for a substrate support having a peripheral edge. The assembly has an annular band having an inner perimeter that surrounds and at least partially covers the peripheral edge of the substrate support. The assembly also has a clamp to secure the annular band to the peripheral edge of the substrate support.

摘要翻译： 为具有外围边缘的基板支撑件提供基板环组件。 组件具有环形带，其具有围绕并且至少部分地覆盖衬底支撑件的周边边缘的内周边。 组件还具有用于将环形带固定到基板支撑件的周边边缘的夹具。

公开(公告)号：US07569125B2

公开(公告)日：2009-08-04

申请号：US11124524

申请日：2005-05-05

申请人： Tza-Jing Gung ,  Xianmin Tang ,  John Forster ,  Peijun Ding ,  Marc Schweitzer ,  Keith A. Miller ,  Ilya Lavitsky

发明人： Tza-Jing Gung ,  Xianmin Tang ,  John Forster ,  Peijun Ding ,  Marc Schweitzer ,  Keith A. Miller ,  Ilya Lavitsky

IPC分类号： C23C14/35

CPC分类号： H01J37/3402 ,  C23C14/046 ,  C23C14/345 ,  C23C14/3457 ,  C23C14/358 ,  H01J37/321 ,  H01J37/32623 ,  H01J37/3408 ,  H01J37/3411 ,  H01J37/3441 ,  H01J2237/3327 ,  H01L21/2855 ,  H01L21/76843 ,  H01L21/76877

摘要： A one-piece inner shield usable in a plasma sputter reactor and extending from the target to the pedestal with a smooth inner surface and supported by an annular flange in a middle portion of the shield. The shield may be used to support the RF coil used in exciting the plasma. An outer shield includes an outwardly extending flange on its end alignable with the inner shield flange, holes in correspondence to recesses in the inner shield for standoffs for the RF coil, and circumferentially arranged gas flow holes.

摘要翻译： 可用于等离子体溅射反应器的一体式内屏蔽件，并且从目标件延伸到具有光滑内表面的基座并由屏蔽件的中间部分中的环形凸缘支撑。 屏蔽可用于支持用于激发等离子体的RF线圈。 外屏蔽件包括在其与内屏蔽凸缘对准的端部上的向外延伸的凸缘，对应于用于RF线圈的支架的内屏蔽件中的凹部的孔和周向布置的气体流动孔。

公开(公告)号：US07041201B2

公开(公告)日：2006-05-09

申请号：US10608306

申请日：2003-06-26

申请人： Tza-Jing Gung ,  Xianmin Tang ,  John Forster ,  Peijun Ding ,  Marc Schweitzer ,  Keith A. Miller ,  Ilya Lavitsky

发明人： Tza-Jing Gung ,  Xianmin Tang ,  John Forster ,  Peijun Ding ,  Marc Schweitzer ,  Keith A. Miller ,  Ilya Lavitsky

IPC分类号： C23C14/35

CPC分类号： H01J37/3402 ,  C23C14/046 ,  C23C14/345 ,  C23C14/3457 ,  C23C14/358 ,  H01J37/321 ,  H01J37/32623 ,  H01J37/3408 ,  H01J37/3411 ,  H01J37/3441 ,  H01J2237/3327 ,  H01L21/2855 ,  H01L21/76843 ,  H01L21/76877

摘要： One aspect of the invention includes an auxiliary magnet ring positioned outside of the chamber wall of a plasma sputter reactor and being disposed at least partially radially outwardly of an RF coil used to inductively generate a plasma, particularly for sputter etching the substrate being sputter deposited. Thereby, a magnetic barrier prevents the plasma from leaking outwardly to the coil and improves the uniformity of sputter etching. The magnetic field also acts as a magnetron when the coil, when made of the same material as the primary target, is being used as a secondary target. Another aspect of the invention includes a one-piece inner shield extending from the target to the pedestal with a smooth inner surface and supported by an annular flange in a middle portion of the shield. The shield may be used to support the RF coil.

摘要翻译： 本发明的一个方面包括位于等离子体溅射反应器的室壁外部的辅助磁环，并且至少部分地设置在用于感应地产生等离子体的RF线圈的径向外侧，特别是用于溅射蚀刻被溅射沉积的衬底。 因此，磁屏障防止等离子体向外泄漏到线圈并提高溅射蚀刻的均匀性。 当线圈由与主要靶材相同的材料制成时，磁场也用作磁控管，作为次级靶。 本发明的另一方面包括从目标件延伸到具有光滑的内表面并由屏蔽件的中间部分中的环形凸缘支撑的一体式内屏蔽件。 屏蔽可用于支持RF线圈。

公开(公告)号：US08920613B2

公开(公告)日：2014-12-30

申请号：US11669763

申请日：2007-01-31

申请人： Christopher Boitnott ,  Keith A. Miller

发明人： Christopher Boitnott ,  Keith A. Miller

IPC分类号： C23C14/34 ,  C23C14/35 ,  C23C14/04 ,  H01J37/34

CPC分类号： C23C14/35 ,  C23C14/046 ,  H01J37/3408 ,  H01J37/3452 ,  H01J37/3458

摘要： A non-axisymmetric electromagnet coil used in plasma processing in which at least one electromagnet coil is not symmetric with the central axis of the plasma processing chamber with which it is used but is symmetric with an axis offset from the central axis. When placed radially outside of an RF coil, it may reduce the azimuthal asymmetry in the plasma produced by the RF coil. Axisymmetric magnet arrays may include additional axisymmetric electromagnet coils. One axisymmetric coil is advantageously placed radially inside of the non-axisymmetric coil to carry opposed currents. The multiple electromagnet coils may be embedded in a molded encapsulant having a central bore about a central axis providing the axisymmetry of the coils.

摘要翻译： 用于等离子体处理的非轴对称电磁线圈，其中至少一个电磁线圈与其使用的等离子体处理室的中心轴不对称，但是与轴偏离中心轴对称。 当径向放置在RF线圈外部时，可以减小由RF线圈产生的等离子体的方位不对称性。 轴对称磁体阵列可以包括附加的轴对称电磁体线圈。 一个轴对称线圈有利地放置在非轴对称线圈的内侧以承载相对的电流。 多个电磁体线圈可以嵌入模制的密封剂中，其具有围绕中心轴线的中心孔，从而提供线圈的轴对称性。

公开(公告)号：US08187416B2

公开(公告)日：2012-05-29

申请号：US11134033

申请日：2005-05-20

申请人： Keith A. Miller ,  Genhua Xu ,  Shengde Zhong ,  Mahendra Bhagwat Lokhande

发明人： Keith A. Miller ,  Genhua Xu ,  Shengde Zhong ,  Mahendra Bhagwat Lokhande

IPC分类号： C23C16/00 ,  H01L21/306

CPC分类号： H01J37/3408 ,  B08B7/0035 ,  H01J37/321 ,  H01J37/32495

摘要： An antenna for coupling RF energy to a plasma in a process chamber having a wall comprises a coil having a face exposed to the plasma in the chamber. A plurality of standoffs support the coil at a set spacing from the wall of the process chamber, at least one standoff comprising a terminal thorough which electrical power is applied to the coil from an external power source. The terminal comprises a conductor receptacle having a first length L1 and a jacket around the conductor receptacle, the jacket having a second length L2. The length L1 is larger than the length L2. A conductor cup is provided about the standoff having the terminal.

摘要翻译： 用于将RF能量耦合到具有壁的处理室中的等离子体的天线包括具有暴露于腔室中的等离子体的面的线圈。 多个支座以距离处理室的壁一定距离的方式支撑线圈，至少一个支架包括端子，通过从外部电源向线圈施加电力的端子。 端子包括具有第一长度L1的导体插座和围绕导体插座的护套，护套具有第二长度L2。 长度L1大于长度L2。 围绕具有端子的支座设置导体杯。

公开(公告)号：US20120034081A1

公开(公告)日：2012-02-09

申请号：US12852720

申请日：2010-08-09

申请人： Christopher W. Ross ,  Keith A. Miller

发明人： Christopher W. Ross ,  Keith A. Miller

IPC分类号： F02C7/00 ,  F01D5/14

CPC分类号： F01D5/147 ,  F01D5/3007 ,  F02C7/04 ,  F04D29/324 ,  F04D29/34 ,  F04D29/584 ,  F05D2260/20 ,  F05D2270/114

摘要： A compressor blade root heating system for a turbine engine is disclosed. The compressor blade root heating system may be formed from one or more induction heaters formed from one or more induction coils positioned in close proximity to a root of a compressor blade. In one embodiment, the induction heater may be coupled to a static casing component positioned immediately upstream of a first row of compressor blades on a rotor assembly such that the induction heater is stationary during turbine engine operation. The induction heater causes eddy current formation, which heats the row one compressor blades. This heating increases the fracture toughness of the material forming the rotor and compressor blades, thereby increasing the mechanical life cycle.

摘要翻译： 公开了一种用于涡轮发动机的压缩机叶片根加热系统。 压缩机叶片根部加热系统可以由一个或多个感应加热器形成，该感应加热器由位于压缩机叶片的根部附近的一个或多个感应线圈形成。 在一个实施例中，感应加热器可以耦合到位于转子组件上的第一排压缩机叶片的紧邻上游的静态壳体部件，使得感应加热器在涡轮发动机运转期间是静止的。 感应加热器引起涡流形成，这加热了一排压缩机叶片。 这种加热增加了形成转子和压缩机叶片的材料的断裂韧性，从而增加了机械寿命周期。

公开(公告)号：US20110297538A1

公开(公告)日：2011-12-08

申请号：US13213367

申请日：2011-08-19

申请人： Keith A. Miller ,  Michael Allen Flanigan ,  Hari Ponnekanti

发明人： Keith A. Miller ,  Michael Allen Flanigan ,  Hari Ponnekanti

IPC分类号： C23C14/35

CPC分类号： H01J37/3408 ,  H01J37/3455

摘要： A magnetron actuator for moving a magnetron in a nearly arbitrary radial and azimuthal path in the back of a target in a plasma sputter reactor. The magnetron includes two coaxial rotary shafts extending along the chamber central axis and coupled to two independently controllable rotary actuators. An epicyclic gear mechanism or a frog-leg structure mechanically couple the shafts to the magnetron to control its radial and azimuthal position. A vertical actuator moves the shafts vertically in tandem to vary the magnetron's separation from the target's back surface and compensate for erosion of the front surface. The rotary actuators may be separately coupled to the shafts or a rotatable ring gear may be coupled to the shafts through respectively fixed and orbiting idler gears. Two radially spaced sensors detect reflectors attached to the inner and outer arms of the epicyclic gear mechanism for homing of the controller.

摘要翻译： 一种磁控管致动器，用于在等离子体溅射反应器中的靶的背面中几乎任意的径向和方位角路径上移动磁控管。 磁控管包括沿着腔室中心轴延伸并且耦合到两个可独立控制的旋转致动器的两个同轴旋转轴。 行星齿轮机构或青蛙腿结构将轴机械地连接到磁控管以控制其径向和方位位置。 垂直致动器串联地垂直移动轴以改变磁控管与目标背面的分离并补偿前表面的侵蚀。 旋转致动器可以单独地联接到轴上，或者可旋转的环形齿轮可以通过分别固定和绕动的空转齿轮联接到轴。 两个径向间隔的传感器检测附接到行星齿轮机构的内臂和外臂的反射器，用于归位控制器。

公开(公告)号：US20100243440A1

公开(公告)日：2010-09-30

申请号：US12794452

申请日：2010-06-04

申请人： Keith A. Miller ,  Anantha K. Subramani ,  Maurice E. Ewert ,  Tza Jing Gung ,  Hong S. Yang ,  Vincent E. Burkhart

发明人： Keith A. Miller ,  Anantha K. Subramani ,  Maurice E. Ewert ,  Tza Jing Gung ,  Hong S. Yang ,  Vincent E. Burkhart

IPC分类号： C23C14/35

CPC分类号： H01J37/3455 ,  C23C14/35 ,  H01J37/3408

摘要： A continuously variable multi-position magnetron that is rotated about a central axis in back of a sputtering target at a freely selected radius. The position is dynamically controlled from the outside, for example, through a hydraulic actuator connected between a pivoting arm supporting the magnetron and an arm fixed to the shaft, by two coaxial shafts independent controllable from the outside and supporting the magnetron through a frog-leg mechanism, or a cable connected between the pivoting arms and moved by an external slider. The magnetron can be rotated at two, three, or more discrete radii or be moved in a continuous spiral pattern.

摘要翻译： 一种连续可变的多位磁控管，其以可自由选择的半径在溅射靶的背面绕中心轴旋转。 该位置从外部动态地控制，例如通过连接在支撑磁控管的枢转臂和固定到轴的臂之间的液压致动器，通过两个独立可从外部控制的同轴轴并且通过青蛙支撑磁控管 机构或连接在枢转臂之间并由外部滑块移动的电缆。 磁控管可以以两个，三个或更多个离散的半径旋转或以连续的螺旋图案移动。

公开(公告)号：US07520969B2

公开(公告)日：2009-04-21

申请号：US11369884

申请日：2006-03-07

申请人： Keith A. Miller

发明人： Keith A. Miller

IPC分类号： C23C14/35 ,  C23C16/00

CPC分类号： H01L21/68735 ,  H01J37/32495

摘要： A process kit for a semiconductor processing chamber is provided. In one embodiment, a process kit includes a notched deposition ring. In another embodiment, a process kit includes a cover ring configured to engage the notched deposition ring. In another embodiment, a process kit includes an annular deposition ring body having inner, outer, upper and bottom walls. A trough is recessed into an upper surface of the body between the upper and inner walls. A recessed surface is formed on a lower surface of the body between the bottom and inner walls. A notch extends inward from the body to catch deposition material passing through a notch of the substrate being processed.

摘要翻译： 提供了一种用于半导体处理室的处理套件。 在一个实施例中，处理套件包括缺口沉积环。 在另一个实施例中，处理套件包括构造成接合缺口沉积环的盖环。 在另一个实施例中，处理套件包括具有内壁，外壁，上壁和底壁的环形沉积环体。 槽在上壁和内壁之间凹陷到主体的上表面中。 凹陷表面形成在主体的底壁和内壁之间的下表面上。 凹口从主体向内延伸以捕捉穿过正被处理的基板的凹口的沉积材料。

公开(公告)号：US07263265B2

公开(公告)日：2007-08-28

申请号：US11438801

申请日：2006-05-23

申请人： Christopher S. Grubish ,  Randy G. Cloud ,  Keith A. Miller

发明人： Christopher S. Grubish ,  Randy G. Cloud ,  Keith A. Miller

IPC分类号： G02B6/00

CPC分类号： G02B6/445

摘要： An optical fiber splice case particularly adapted for providing fiber optic links directly to a home, business, et al. is provided wherein at least one enclosure base has at least one cover member selectively sealingly engaged with at least one side of the at least one enclosure base. The at least one enclosure base includes at least one bulkhead having a selective plurality of optical fiber ports therethrough.

摘要翻译： 一种特别适用于将光纤链路直接提供给家庭，商业等的光纤接头盒。 其中至少一个外壳底座具有至少一个盖构件，所述至少一个盖构件选择性地密封地与所述至少一个外壳基座的至少一个侧面接合。 所述至少一个外壳基座包括至少一个具有穿过其中的选择性多个光纤端口的隔板。