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21 条记录 (耗时 0.029 秒)

    Sputtering apparatus and an ion source
    1.
    发明授权
    Sputtering apparatus and an ion source 失效
    溅射装置和离子源

    公开(公告)号：US5288386A

    公开(公告)日：1994-02-22

    申请号：US913927

    申请日：1992-07-17

    申请人： Kenichi Yanagi ,  Mitsuo Kato ,  Kazuya Tsurusaki ,  Toshio Taguchi ,  Kenji Atarashiya ,  Tadashi Rokkaku ,  Ichiro Yamashita

    发明人： Kenichi Yanagi ,  Mitsuo Kato ,  Kazuya Tsurusaki ,  Toshio Taguchi ,  Kenji Atarashiya ,  Tadashi Rokkaku ,  Ichiro Yamashita

    IPC分类号： H01J27/08 ,  H01J27/18 ,  H01J37/08 ,  H01J37/317 ,  C23C14/35

    CPC分类号： H01J27/08 ,  H01J27/18 ,  H01J37/08 ,  H01J37/3178 ,  H01J2237/0822

    摘要： A sputtering apparatus including two electrodes, a sputtering target disposed on one of the electrodes, and a gas supply for supplying a discharge gas in a vacuum to produce an electric discharge between the two electrodes and whereby particles sputtered from the target due to impact thereon of ions produced by the discharge, are deposited on a substrate. The target disposed on one electrode is formed into an elongated band and the other electrode is disposed so as to enclose the target. The other electrode is also provided with a magnet for producing a magnetic field thereon, and further includes a narrow elongated slot which defines a narrow sputter particle outlet. The narrow sputter particle outlet permits a pressure to exist near the electrical discharge which is higher than the pressure near the substrate. According to a preferred embodiment, the sputtering apparatus has an ion source combined integrally therewith.

    摘要翻译： 一种溅射装置，包括两个电极，设置在一个电极上的溅射靶，以及用于在真空中供应放电气体以在两个电极之间产生放电的气体源，由此由于其上的冲击而从靶溅射的颗粒 通过放电产生的离子沉积在基底上。 设置在一个电极上的靶被形成为细长带，并且另一个电极被设置成包围靶。 另一个电极还设置有用于在其上产生磁场的磁体，并且还包括限定窄的溅射颗粒出口的窄的细长槽。 窄的溅射粒子出口允许在高于衬底附近的压力的放电附近存在压力。 根据优选实施例，溅射装置具有与其一体地组合的离子源。

    DC or HF ion source
    2.
    发明授权
    DC or HF ion source 失效
    DC或HF离子源

    公开(公告)号：US5369337A

    公开(公告)日：1994-11-29

    申请号：US104899

    申请日：1993-08-12

    申请人： Kenichi Yanagi ,  Mitsuo Kato ,  Kazuya Tsurusaki ,  Toshio Taguchi ,  Kenji Atarashiya ,  Tadashi Rokkaku ,  Ichiro Yamashita

    发明人： Kenichi Yanagi ,  Mitsuo Kato ,  Kazuya Tsurusaki ,  Toshio Taguchi ,  Kenji Atarashiya ,  Tadashi Rokkaku ,  Ichiro Yamashita

    IPC分类号： H01J27/08 ,  H01J27/18 ,  H01J37/08 ,  H01J37/317 ,  H01J27/02

    CPC分类号： H01J27/08 ,  H01J27/18 ,  H01J37/08 ,  H01J37/3178 ,  H01J2237/0822

    摘要： A DC or high frequency ion source comprising a hollow cathode and a substantially hollow anode for applying a DC or alternating voltage; a gas inlet disposed at a first side of the cathode for supplying a discharge gas into the cathode; a cathode heater disposed between the anode and the cathode; a magnet disposed adjacent the anode to thereby improve the uniformity of a plasma; an ion extraction outlet disposed at a second side of the cathode opposite to the gas inlet and having an elongated rectangular shape; and an ion extraction electrode and an acceleration electrode for controlling the energy of extracted ions. Both the anode and cathode comprise substantially hollow boxes. The cathode includes an elongated rectangular cross section and is disposed inside the substantially hollow anode. The ion extraction electrode and the acceleration electrode have an elongated rectangular shape and an opening coextensive with the ion extraction outlet. The ion extraction electrode and the acceleration electrode are disposed adjacent, and aligned with, the ion extraction outlet. The ion source can be formed with an arcuate shape to accommodate round objects. The ion source can also be formed integrally with a sputtering device.

    摘要翻译： 一种DC或高频离子源，包括中空阴极和用于施加DC或交流电压的基本中空的阳极; 设置在阴极的第一侧的气体入口，用于向阴极供应放电气体; 设置在阳极和阴极之间的阴极加热器; 设置在阳极附近的磁体，从而提高等离子体的均匀性; 离子提取出口，设置在与气体入口相对的阴极的第二侧，并且具有细长的矩形形状; 以及用于控制提取的离子的能量的离子提取电极和加速电极。 阳极和阴极都包括基本上空心的盒子。 阴极包括细长的矩形横截面并且设置在基本上空心的阳极内。 离子提取电极和加速电极具有细长的矩形形状和与离子提取出口共同延伸的开口。 离子提取电极和加速电极被设置成与离子提取出口相邻并对齐。 离子源可以形成为弓形以容纳圆形物体。 离子源也可以与溅射装置一体地形成。

    Vacuum vapor deposition apparatus
    3.
    发明授权
    Vacuum vapor deposition apparatus 失效
    真空蒸发器沉积装置

    公开(公告)号：US5169451A

    公开(公告)日：1992-12-08

    申请号：US766766

    申请日：1991-09-27

    申请人： Kenichi Yanagi ,  Toshio Taguchi ,  Yoshiteru Moriyama ,  Mitsuhiko Sako ,  Takuya Akio ,  Shinji Kamura ,  Heisaburo Furukawa ,  Kenji Atarashiya ,  Seiji Yokoro

    发明人： Kenichi Yanagi ,  Toshio Taguchi ,  Yoshiteru Moriyama ,  Mitsuhiko Sako ,  Takuya Akio ,  Shinji Kamura ,  Heisaburo Furukawa ,  Kenji Atarashiya ,  Seiji Yokoro

    IPC分类号： C23C14/24 ,  C23C14/56

    CPC分类号： C23C14/562 ,  C23C14/243

    摘要： An improved vacuum vapor-deposition apparatus comprises an evaporation tank for holding and evaporating vapor deposition material, a hood covering the top of the evporation tank and extended up to its outside in the horizontal direction, inlet and outlet ports of a band to be vapor-deposited, which are opened in the hood so as to penetrate a central portion of the extension on the outside of the evaporation tank, and a vacuum tank covering the evaporation tank and the hood entirely and having sealing devices for carrying in and carrying out the band to be vapor-deposited at the positions corresponding to the inlet and outlet ports in the hood. Vapor deposition is effected within the hood simultaneously onto the both front and rear surfaces of the band to be vapor-deposited. Preferably, the vacuum vapor-deposition apparatus further comprises a vapor amount control device for controlling a vapor amount of the evaporated material led to the both front and rear sides of the band to be vapor-deposited within the hood, and a vapor-deposited surface area control device provided at least on one side of the front and rear sides of the band to be vapor-deposited within the hood for controlling a vapor-deposited surface area of the band to be vapor-deposited. Then, vapor-deposition of different thickness is effected within the hood onto the front and rear surfaces of the band to be vapor-deposited.

    Vacuum vapor deposition system
    4.
    发明授权
    Vacuum vapor deposition system 失效
    真空蒸镀系统

    公开(公告)号：US4552092A

    公开(公告)日：1985-11-12

    申请号：US652676

    申请日：1984-09-19

    申请人： Kenichi Yanagi ,  Toshio Taguchi ,  Tetsuyoshi Wada ,  Heisaburo Furukawa ,  Kanji Wake

    发明人： Kenichi Yanagi ,  Toshio Taguchi ,  Tetsuyoshi Wada ,  Heisaburo Furukawa ,  Kanji Wake

    IPC分类号： C23C14/56 ,  C23C14/24

    CPC分类号： C23C14/562

    摘要： A vacuum vapor deposition system including a high-vacuum vapor deposition chamber provided with a rotary cell around which band steel is wound as it is passed through the chamber. A crucible for molten metal has a hood for guiding vapor of said metal to a vapor deposition port opposed to the rotary cell, and arcuate covers connected to the hood at the entrance and exit positions of the band steel. The vapor deposition port is spaced slightly from the rotary cell so that the covers will not come into contact with the band steel. A heater is provided for heating the surface of the rotary cell up to a temperature equal to or higher than a reevaporation temperature of the metal under a vapor pressure of the vapor of the metal in the proximity of the rotary cell so that the metal will not be deposited onto the opposite end portions of the rotary cell which are not covered by the band steel. A heater is also provided for heating the surfaces of the hood and the covers up to a temperature equal to or higher than such reevaporation temperature of the metal so that metal will not be deposited onto the hood and the covers.

    摘要翻译： 一种真空蒸镀系统，其特征在于，具有高真空蒸镀室，该真空蒸镀室设置有旋转槽，当所述旋转槽通过所述室时，带钢被卷绕。 用于熔融金属的坩埚具有用于将所述金属的蒸气引导到与旋转单元相对的气相沉积端口的罩，以及在带钢的入口和出口位置连接到罩的弓形盖。 气相沉积端口与旋转单元稍微间隔开，使得盖不会与带钢接触。 提供一种加热器，用于在旋转电池附近的金属蒸汽的蒸汽压力下，将旋转电池的表面加热至等于或高于金属的蒸发温度的温度，使金属不会 沉积在不被带钢覆盖的旋转电池的相对端部上。 还提供加热器，用于将罩和盖的表面加热到等于或高于金属的这种再蒸发温度的温度，使得金属不会沉积到罩和盖上。

    Vacuum evaporation coating equipment
    10.
    发明授权
    Vacuum evaporation coating equipment 失效
    真空蒸镀设备

    公开(公告)号：US4649860A

    公开(公告)日：1987-03-17

    申请号：US713743

    申请日：1985-03-19

    申请人： Heisaburo Furukawa ,  Kanji Wake ,  Yoshio Shimozato ,  Kenichi Yanagi ,  Mitsuo Kato ,  Tetsuyoshi Wada ,  Norio Tsukiji ,  Takuya Aiko ,  Toshiharu Kittaka ,  Yasuji Nakanishi

    发明人： Heisaburo Furukawa ,  Kanji Wake ,  Yoshio Shimozato ,  Kenichi Yanagi ,  Mitsuo Kato ,  Tetsuyoshi Wada ,  Norio Tsukiji ,  Takuya Aiko ,  Toshiharu Kittaka ,  Yasuji Nakanishi

    IPC分类号： C23C14/26 ,  C23C14/56 ,  C23C13/08

    CPC分类号： C23C14/562

    摘要： A vacuum evaporation equipment for continuous vacuum evaporation of a metal onto a band or strip of product including at least one vacuum sealing station, provision of ducts that are disposed surrounding the band product and extending from the point of vapor deposition where the band product is subjected to a vacuum evaporation process an a chamber held at a reduced pressure or vacuum state to the extent that substantially no reevaporation of once deposited metal is effectively prevented from occurring. The ducts are adapted to be heated to a temperature substantially higher than the temperature of the steel band product. In addition, there is provided at least one vacuum sealing station with rolls rotatably mounted in the interior of a casing and a complementary sealing bar mounted in a complementary engagement relationship with the rolls having a close gap therebetween. A side panel is mounted self-adjustably in sliding motion in the longitudinal direction along the axes of the rolls on the opposite ends thereof, and heaters are provided to heat the rolls, sealing bar and side panel, respectively.

    摘要翻译： 一种用于将金属连续真空蒸发到包括至少一个真空密封站的产品带或条带上的真空蒸发设备，提供围绕带产品设置并从带状产品所受到的气相沉积点延伸的管道 在真空蒸发过程中，保持在减压或真空状态的室被有效地防止发生一次沉积的金属的基本上不再蒸发。 管道适于被加热到显着高于钢带产品的温度的温度。 此外，提供了至少一个具有可旋转地安装在壳体内部的辊的真空密封站和与辊之间具有紧密间隙的互补啮合关系安装的互补密封条。 侧板在其相对端沿辊的轴线沿纵向方向自由调节地安装，并且分别设置加热器以加热辊，密封条和侧板。