公开(公告)号：US20050061441A1

公开(公告)日：2005-03-24

申请号：US10942180

申请日：2004-09-16

申请人： Kenji Hashinoki ,  Satoshi Yamamoto ,  Yasufumi Koyama

发明人： Kenji Hashinoki ,  Satoshi Yamamoto ,  Yasufumi Koyama

IPC分类号： H01L21/677 ,  G03F7/38 ,  H01L21/00 ,  H01L21/027 ,  C23F1/00

CPC分类号： H01L21/67173 ,  G03F7/38 ,  H01L21/67098 ,  H01L21/67178 ,  H01L21/67184

摘要： A substrate treating apparatus is capable of promptly heating substrates after exposure, and avoiding an adverse thermal influence on an exposing apparatus. A developing block includes heating modules for heating exposed substrates. An interface block is interposed between the heating modules and the exposing apparatus to isolate the exposing apparatus from the thermal influence of the heating modules. The interface block has a transport mechanism for transporting the substrates to the heating modules, whereby the exposed substrates are promptly transferred to the heating modules.

摘要翻译： 基板处理装置能够在曝光后迅速地加热基板，并且避免对曝光装置的不利的热影响。 显影块包括用于加热曝光的基底的加热模块。 在加热模块和曝光装置之间插入界面块，以使曝光装置与加热模块的热影响隔离。 接口块具有用于将基板输送到加热模块的输送机构，由此将暴露的基板迅速地转移到加热模块。

公开(公告)号：US07563323B2

公开(公告)日：2009-07-21

申请号：US10942180

申请日：2004-09-16

申请人： Kenji Hashinoki ,  Satoshi Yamamoto ,  Yasufumi Koyama

发明人： Kenji Hashinoki ,  Satoshi Yamamoto ,  Yasufumi Koyama

IPC分类号： B05C11/00 ,  B05C13/00 ,  B05C13/02 ,  B05C11/02

CPC分类号： H01L21/67173 ,  G03F7/38 ,  H01L21/67098 ,  H01L21/67178 ,  H01L21/67184

摘要： A substrate treating apparatus is capable of promptly heating substrates after exposure, and avoiding an adverse thermal influence on an exposing apparatus. A developing block includes heating modules for heating exposed substrates. An interface block is interposed between the heating modules and the exposing apparatus to isolate the exposing apparatus from the thermal influence of the heating modules. The interface block has a transport mechanism for transporting the substrates to the heating modules, whereby the exposed substrates are promptly transferred to the heating modules.

摘要翻译： 基板处理装置能够在曝光后迅速地加热基板，并且避免对曝光装置的不利的热影响。 显影块包括用于加热曝光的基底的加热模块。 在加热模块和曝光装置之间插入界面块，以使曝光装置与加热模块的热影响隔离。 接口块具有用于将基板输送到加热模块的输送机构，由此将暴露的基板迅速地转移到加热模块。

公开(公告)号：US06837632B2

公开(公告)日：2005-01-04

申请号：US10646902

申请日：2003-08-22

申请人： Yasufumi Koyama ,  Kenji Kamei ,  Toru Kitamoto ,  Kenji Hashinoki ,  Satoshi Yamamoto ,  Toshiaki Dainin

发明人： Yasufumi Koyama ,  Kenji Kamei ,  Toru Kitamoto ,  Kenji Hashinoki ,  Satoshi Yamamoto ,  Toshiaki Dainin

IPC分类号： B65G49/07 ,  H01L21/00 ,  H01L21/027 ,  H01L21/677 ,  H01L21/68 ,  G03D5/00 ,  B05C13/00

CPC分类号： H01L21/67173 ,  H01L21/67178 ,  H01L21/67184 ,  Y10S414/135

摘要： A substrate treating apparatus has an antireflection film forming block, a resist film forming block and a developing block arranged in juxtaposition, each of these blocks including treating modules and a single main transport mechanism. The main transport mechanism transports substrates within each block, and transfers the substrates between the blocks through inlet substrate rests and outlet substrate rests provided as separate components. This construction realizes improved throughput of the substrate treating apparatus.

公开(公告)号：US11167637B2

公开(公告)日：2021-11-09

申请号：US14390693

申请日：2012-04-12

申请人： Satoshi Yamamoto ,  Chiaki Kataoka ,  Masaki Akagi

发明人： Satoshi Yamamoto ,  Chiaki Kataoka ,  Masaki Akagi

IPC分类号： B60K15/04

摘要： To obtain a fuel filler structure for a fuel tank wherein when causing an opening and closing valve to close, it can be ensured that the opening and closing valve does not rapidly rotate to a closed position in which it closes a fuel fill inlet, and when causing the opening and closing valve to open, the opening and closing valve can be opened with a small force. A fuel filler structure is equipped with a damper on the near side of a flapper valve in the insertion direction of a fuel nozzle. When the flapper valve rotates to an open position, the damper does not act on the flapper valve, and when the flapper valve rotates to a closed position, the damper acts on the flapper valve.

公开(公告)号：US10534236B2

公开(公告)日：2020-01-14

申请号：US15737115

申请日：2016-06-17

申请人： Satoshi Yamamoto ,  Daisuke Goto ,  Toshiya Sagisaka ,  Masato Shinoda ,  Mamiko Inoue ,  Fuminari Kaneko ,  Tohru Yashiro

发明人： Satoshi Yamamoto ,  Daisuke Goto ,  Toshiya Sagisaka ,  Masato Shinoda ,  Mamiko Inoue ,  Fuminari Kaneko ,  Tohru Yashiro

IPC分类号： G02F1/15 ,  C07D265/28 ,  G09F9/30 ,  C09K9/02 ,  C08F20/36 ,  C07D265/38 ,  G02F1/1516

摘要： Provided is an electrochromic compound represented by the following general formula (I) or (II) where R1 to R13 are each independently a hydrogen atom, a halogen atom, a monovalent organic group, or a polymerizable functional group, and at least one of the R1 to the R13 is a polymerizable functional group.

公开(公告)号：US09869918B2

公开(公告)日：2018-01-16

申请号：US14988992

申请日：2016-01-06

申请人： Takahiko Matsumoto ,  Keiichiroh Yutani ,  Hidekazu Yaginuma ,  Koh Fujimura ,  Fuminari Kaneko ,  Mamiko Inoue ,  Sukchan Kim ,  Satoshi Yamamoto ,  Tohru Yashiro

发明人： Takahiko Matsumoto ,  Keiichiroh Yutani ,  Hidekazu Yaginuma ,  Koh Fujimura ,  Fuminari Kaneko ,  Mamiko Inoue ,  Sukchan Kim ,  Satoshi Yamamoto ,  Tohru Yashiro

IPC分类号： G02F1/155 ,  G02F1/1343

CPC分类号： G02F1/155 ,  G02F1/13439 ,  G02F2001/1552

摘要： An electrochromic apparatus including a first support, a first electrode, a first transparent conductive layer, an electrochromic layer, a second support, a second electrode, a second transparent conductive layer, and an electrolyte layer is provided. The first and second supports have first and second surfaces, respectively, on each of which a plurality of grooves is formed. The grooves on the second surface are facing the grooves on the first surface. The first and second electrodes are disposed at each one of the plurality of grooves of the first and second supports, respectively. The first and second transparent conductive layers are in contact with the first and second surfaces, respectively. The electrochromic layer is in contact with the first transparent conductive layer. The electrolyte layer is between the electrochromic layer and the second transparent conductive layer.

公开(公告)号：US09312036B2

公开(公告)日：2016-04-12

申请号：US13315887

申请日：2011-12-09

申请人： Yuki Minato ,  Toshihiro Yasuda ,  Kunihiko Kinugasa ,  Hajime Mori ,  Satoshi Yamamoto ,  Jun Suzuki ,  Tadahiro Mitsuhashi

发明人： Yuki Minato ,  Toshihiro Yasuda ,  Kunihiko Kinugasa ,  Hajime Mori ,  Satoshi Yamamoto ,  Jun Suzuki ,  Tadahiro Mitsuhashi

IPC分类号： G21C15/25 ,  F04F5/54 ,  G21C17/017 ,  G21C19/14 ,  G21C17/10

CPC分类号： G21C15/25 ,  F04F5/54 ,  G21C17/017 ,  G21C17/10 ,  G21C19/14 ,  Y02E30/40 ,  Y10T29/49735

摘要： In a jet pump measurement pipe repair method according to the present embodiment, a breakage part of a measurement pipe horizontally fixed to a lower part of a jet pump provided in reactor water in a reactor pressure vessel is repaired. The method has: a step of cutting and removing the measurement pipe including the breakage part; a step of retaining a connection pipe for connecting the remaining measurement pipe on the jet pump by means of a clamp; and a step of connecting ends of the remaining measurement pipe by means of the connection pipe.

摘要翻译： 在根据本实施例的喷射泵测量管道修复方法中，修复水平固定到设置在反应堆压力容器中的反应器水中的喷射泵的下部的测量管的断裂部分。 该方法具有：切断除去包含断裂部的测量管的步骤; 保持用于通过夹具连接喷射泵上的剩余测量管的连接管的步骤; 以及通过连接管连接剩余测量管的端部的步骤。

公开(公告)号：US09291893B2

公开(公告)日：2016-03-22

申请号：US13281145

申请日：2011-10-25

申请人： Tatsuro Masuyama ,  Satoshi Yamamoto ,  Koji Ichikawa

发明人： Tatsuro Masuyama ,  Satoshi Yamamoto ,  Koji Ichikawa

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/20

CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/2041

摘要： A resist composition contains; a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C24 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.

摘要翻译： 抗蚀剂组合物含有 具有由式（aa）表示的结构单元的树脂和由式（ab）表示的结构单元; 和酸产生剂，其中Raa1表示氢原子和甲基; Aaa1表示可以具有取代基的C1〜C6烷二基等。 Raa2表示任选取代的C1至C18脂族烃基; Rab1表示氢原子和甲基; Aab1表示单键，任选取代的C 1至C 6烷二基等; W1表示任选取代的C4至C24脂环族烃基; n表示1或2; Aab2各自独立地表示任选取代的C 1至C 6脂族烃基; Rab2各自独立地表示C1〜C12氟化烷基。

公开(公告)号：US09229320B2

公开(公告)日：2016-01-05

申请号：US13196446

申请日：2011-08-02

申请人： Koji Ichikawa ,  Satoshi Yamamoto

发明人： Koji Ichikawa ,  Satoshi Yamamoto

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/20

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/2059

摘要： A resist composition contains; a resin having a structural unit derived from a compound represented by the formula (a); and an acid generator represented by the formula (B1). wherein R1 represents a hydrogen atom or a methyl group; A10 represents a single bond, an optionally substituted C1 to C6 alkanediyl group or a group represented by formula (a-1) defined in the specification; W1 represents an optionally substituted C4 to C36 alicyclic hydrocarbon group; A20 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; R2 in each occurrence independently represents a C1 to C12 perfluoroalkyl group; n represents 1 or 2; Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; Lb1 represents an optionally substituted C1 to C17 divalent aliphatic hydrocarbon group; Y represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; and Z+ represents an organic cation.

摘要翻译： 抗蚀剂组合物含有 具有衍生自由式（a）表示的化合物的结构单元的树脂; 和由式（B1）表示的酸发生剂。 其中R1表示氢原子或甲基; A10表示单键，可以具有取代基的C1〜C6烷二基或由说明书中定义的式（a-1）表示的基团; W1表示任选取代的C4至C36脂环族烃基; A20每次独立地表示任选取代的C 1至C 6脂族烃基; R2各自独立地表示C1〜C12全氟烷基; n表示1或2; Q1和Q2独立地表示氟原子或C1〜C6全氟烷基; Lb1表示任选取代的C 1至C 17二价脂族烃基; Y表示任选取代的C 1至C 18脂族烃基; Z +表示有机阳离子。

公开(公告)号：US09224959B2

公开(公告)日：2015-12-29

申请号：US14172572

申请日：2014-02-04

申请人： Daisuke Goto ,  Satoshi Yamamoto ,  Toshiya Sagisaka ,  Takuji Kato ,  Takashi Okada ,  Masato Shinoda ,  Shinji Matsumoto ,  Masataka Mohri ,  Keiichiro Yutani

发明人： Daisuke Goto ,  Satoshi Yamamoto ,  Toshiya Sagisaka ,  Takuji Kato ,  Takashi Okada ,  Masato Shinoda ,  Shinji Matsumoto ,  Masataka Mohri ,  Keiichiro Yutani

IPC分类号： C07D495/02 ,  H01L51/00 ,  C07C1/213 ,  C07C15/20 ,  C07C15/24 ,  C07C15/28 ,  C07C15/38 ,  C07C15/56 ,  C07C15/58 ,  C07C15/60 ,  C07C17/093 ,  C07C17/10 ,  C07C17/361 ,  C07C25/22 ,  C07C69/013 ,  C07C69/18 ,  C07C69/63 ,  C07D321/00 ,  C07D409/14 ,  C07D495/04 ,  C07D495/06 ,  H01L51/05

CPC分类号： H01L51/0052 ,  C07C1/213 ,  C07C15/20 ,  C07C15/24 ,  C07C15/28 ,  C07C15/38 ,  C07C15/56 ,  C07C15/58 ,  C07C15/60 ,  C07C17/093 ,  C07C17/10 ,  C07C17/361 ,  C07C25/22 ,  C07C69/013 ,  C07C69/18 ,  C07C69/63 ,  C07C2602/10 ,  C07C2603/24 ,  C07C2603/44 ,  C07C2603/50 ,  C07C2603/52 ,  C07D321/00 ,  C07D409/14 ,  C07D495/04 ,  C07D495/06 ,  H01L51/0074 ,  H01L51/0558

摘要： A leaving substituent-containing compound including a partial structure represented by the following General Formula (I): where a pair of X1 and X2 or a pair of Y1 and Y2 each represent a hydrogen atom; the other pair each represent a group selected from the group consisting of a halogen atom and a substituted or unsubstituted acyloxy group having one or more carbon atoms; a pair of the acyloxy groups represented by the pair of X1 and X2 or the pair of Y1 and Y2 may be identical or different, or may be bonded together to form a ring; R1 to R4 each represent a hydrogen atom or a substituent; and Q1 and Q2 each represent a hydrogen atom, a halogen atom or a monovalent organic group, and may be bonded together to form a ring.

摘要翻译： 含有由以下通式（I）表示的部分结构的含有取代基的化合物：其中一对X1和X2或一对Y1和Y2各自表示氢原子; 另一对各自表示选自卤原子和具有一个或多个碳原子的取代或未取代的酰氧基的基团; 由一对X1和X2表示的一对酰氧基或一对Y1和Y2可以相同或不同，或者可以结合在一起形成环; R 1〜R 4各自表示氢原子或取代基; 并且Q1和Q2各自表示氢原子，卤素原子或一价有机基团，并且可以结合在一起形成环。