公开(公告)号：US06756312B2

公开(公告)日：2004-06-29

申请号：US09934453

申请日：2001-08-22

申请人： Kenji Shintani ,  Mutsumi Tsuda ,  Masakazu Taki ,  Hiroki Ootera

发明人： Kenji Shintani ,  Mutsumi Tsuda ,  Masakazu Taki ,  Hiroki Ootera

IPC分类号： H01L21302

CPC分类号： C23F11/04 ,  C09K13/08 ,  H01L21/28035 ,  H01L21/32135

摘要： In a wafer treatment apparatus, a hydrofluoric acid gas supply pipe and an evacuation pipe are connected to a chamber storing a wafer for performing prescribed treatment. A control part is provided for controlling supply of hydrofluoric acid gas. The control part sets a time for supplying the hydrofluoric acid gas into the chamber to be longer than a time up to starting of etching of a reaction product and shorter than a time up to starting of etching of a gate insulator film. Thus, only the reaction product can be substantially etched without etching the gate insulator film.

摘要翻译： 在晶片处理装置中，将氢氟酸气体供给管和排气管连接到存储用于进行规定处理的晶片的室。 提供控制部件用于控制氢氟酸气体的供应。 控制部分设置用于将氢氟酸气体供应到室中的时间比直到开始蚀刻反应产物的时间长，并且短于开始蚀刻栅极绝缘膜的时间。 因此，只有反应产物可以被基本上蚀刻而不蚀刻栅极绝缘膜。

公开(公告)号：US6020570A

公开(公告)日：2000-02-01

申请号：US3784

申请日：1998-01-07

申请人： Masakazu Taki ,  Hiroki Ootera ,  Tatsuo Oomori ,  Kazuyasu Nishikawa ,  Kenji Shintani

发明人： Masakazu Taki ,  Hiroki Ootera ,  Tatsuo Oomori ,  Kazuyasu Nishikawa ,  Kenji Shintani

IPC分类号： C23C16/50 ,  C23C16/511 ,  C23F4/00 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31 ,  H05H1/46 ,  B23K9/00

CPC分类号： H01J37/32229 ,  H01J37/321 ,  H05H1/46

摘要： A plasma is supplied from a plasma source to a space between an upper electrode plate and a lower electrode plate disposed opposite to and in parallel with the upper electrode plate when producing a plasma in the space between the electrode plates for plasma processing by applying radio-frequency power to the electrode plates. The plasma source produce a plasma by inductively coupled discharge, radio-frequency discharge or microwave discharge. A plasma processing apparatus is obtained which is capable of producing a parallel-plate plasma by discharge in a space of a relatively low pressure and is capable of processing a large diameter workpiece uniformly at a high processing rate.

摘要翻译： 当在等离子体处理用电极板之间的空间中产生等离子体时，等离子体从等离子体源供给到与上电极板相对并平行设置的上电极板和下电极板之间的空间， 向电极板施加频率功率。 等离子体源通过电感耦合放电，射频放电或微波放电产生等离子体。 得到等离子体处理装置，其能够通过在相对低压的空间中排放而产生平行板等离子体，并且能够以高处理速率均匀地处理大直径工件。

公开(公告)号：US06076483A

公开(公告)日：2000-06-20

申请号：US48067

申请日：1998-03-26

申请人： Kenji Shintani ,  Masakazu Taki ,  Hiroki Ootera ,  Kazuyasu Nishikawa

发明人： Kenji Shintani ,  Masakazu Taki ,  Hiroki Ootera ,  Kazuyasu Nishikawa

IPC分类号： H05H1/46 ,  C23C16/50 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31 ,  C23C16/00

CPC分类号： H01J37/321 ,  H01J37/32623 ,  H01J37/32688

摘要： A plasma processing apparatus has a plurality of annular permanent magnets arranged concentrically with the same polarity in the circumferential direction at the atmosphere side of a second electrode arranged opposite to a stage on which a specimen is placed. Arrangement is provided so that the magnets located adjacent radially have opposite polarity. Furthermore, permanent magnets are arranged at the outer circumference of a vacuum vessel corresponding to a plasma generation chamber portion. A plasma processing apparatus can be provided that allows formation of uniform plasma over a large area and uniform processing of a specimen of a large diameter.

摘要翻译： 一种等离子体处理装置具有多个环状永磁体，该多个环形永久磁铁在与放置试样的阶段相对布置的第二电极的气氛侧沿圆周方向具有相同的极性。 提供了布置，使得位于径向相邻的磁体具有相反的极性。 此外，永久磁铁布置在对应于等离子体产生室部分的真空容器的外周。 可以提供等离子体处理装置，其允许在大面积上形成均匀的等离子体并且对大直径的样品进行均匀的处理。

公开(公告)号：US06167835A

公开(公告)日：2001-01-02

申请号：US09047935

申请日：1998-03-26

申请人： Hiroki Ootera ,  Masakazu Taki ,  Kenji Shintani ,  Kazuyasu Nishikawa

发明人： Hiroki Ootera ,  Masakazu Taki ,  Kenji Shintani ,  Kazuyasu Nishikawa

IPC分类号： C23C1600

CPC分类号： H01J37/32357

摘要： A plasma processing apparatus has a plurality of annular permanent magnets arranged concentrically of a polarity identical in the circumferential direction at the atmosphere side of a second electrode arranged opposite to a stage on which an object to be processed is placed. Arrangement is provided so that the polarity of magnets located adjacent radially is opposite. An insulation substrate is provided between a partition panel and a processing chamber to electrically insulate a plasma generation chamber. Direct current voltage is applied in a pulsive manner to the plasma generation chamber. Thus, a plasma processing apparatus can be provided that allows formation of plasma uniformly over a large area, and processing of a specimen of a large diameter uniformly.

摘要翻译： 等离子体处理装置具有多个环状永久磁铁，该多个环状永久磁铁与第一电极的气氛侧的圆周方向的极性相同地布置，该第二电极与放置有待处理物体的台相对。 提供了布置，使得位于径向相邻的磁体的极性相反。 绝缘基板设置在分隔板和处理室之间以电绝缘等离子体产生室。 直流电压以脉动方式施加到等离子体产生室。 因此，可以提供允许在大面积上均匀地形成等离子体的等离子体处理装置，并且均匀地处理大直径的样本。

公开(公告)号：US06929712B2

公开(公告)日：2005-08-16

申请号：US10235783

申请日：2002-09-06

申请人： Minoru Hanazaki ,  Keiichi Sugahara ,  Toshihiko Noguchi ,  Toshio Komemura ,  Masakazu Taki ,  Mutumi Tuda ,  Kenji Shintani

发明人： Minoru Hanazaki ,  Keiichi Sugahara ,  Toshihiko Noguchi ,  Toshio Komemura ,  Masakazu Taki ,  Mutumi Tuda ,  Kenji Shintani

IPC分类号： H05H1/00 ,  H01J37/32 ,  H01L21/3065 ,  H05H1/46 ,  H01L21/00 ,  C23C16/00

CPC分类号： H01J37/32082 ,  H01J37/32935

摘要： A high-frequency current detector of a plasma processing apparatus detects a high-frequency current produced when high-frequency power in the range that does not cause generation of plasma in a chamber is supplied from a high-frequency power supply source to the chamber. The high-frequency current detector outputs the detected high-frequency current to a computer. The computer compares the high-frequency current received from the high-frequency current detector with a reference high-frequency current. When the received high-frequency current matches the reference high-frequency current, the computer determines that the process performance is normal. Otherwise, the computer determines that the process performance is abnormal. In this way, high-frequency characteristics specific to the apparatus are detected and the process performance are evaluated based on the detected high-frequency characteristics.

摘要翻译： 等离子体处理装置的高频电流检测器检测从高频电源向腔室供给不在室内产生等离子体的范围内的高频电力时产生的高频电流。 高频电流检测器将检测到的高频电流输出到计算机。 计算机将从高频电流检测器接收的高频电流与参考高频电流进行比较。 当接收的高频电流与参考高频电流相匹配时，计算机确定处理性能正常。 否则，计算机会确定进程性能异常。 以这种方式，检测到对装置特有的高频特性，并且基于检测到的高频特性来评估处理性能。

公开(公告)号：US20070223792A1

公开(公告)日：2007-09-27

申请号：US11690551

申请日：2007-03-23

申请人： Junji Morimoto ,  Kenji Shintani ,  Katsunori Ishii ,  Masashi Torimoto ,  Tsutomu Nagumo ,  Takashi Yamaguchi ,  Hidekazu Takahashi

发明人： Junji Morimoto ,  Kenji Shintani ,  Katsunori Ishii ,  Masashi Torimoto ,  Tsutomu Nagumo ,  Takashi Yamaguchi ,  Hidekazu Takahashi

IPC分类号： G06K9/00

CPC分类号： G06K9/00033 ,  G06K9/00919 ,  G06K2009/0006 ,  G06K2009/00932

摘要： A portable telephone and electronic device are provided. The portable telephone includes a casing having a first surface: a finger guide section that is provided in the first surface and guides a finger of a user to allow the finger to be placed so that a side portion of the finger faces the first surface; an illuminating section provided in the first surface so as to be adjacent to the finger guide section, the illuminating section being capable of radiating light of a predetermined wavelength that transmits through the placed finger; an imaging section provided in the casing so as to be spaced at a predetermined distance from the first surface with respect to a perpendicular direction, the imaging section being capable of imaging the light that has transmitted through the finger; and a control section that performs authentication of the user on the basis of an image obtained by the imaging.

摘要翻译： 提供便携式电话和电子设备。 便携式电话机包括具有第一表面的外壳，手指引导部分设置在第一表面中并且引导使用者的手指以允许手指放置成使得手指的侧部面向第一表面; 照明部，其设置在与所述手指引导部相邻的所述第一面上，所述照明部能够照射通过所述放置的手指透过的预定波长的光; 成像部，其设置在所述壳体中，以相对于垂直方向与所述第一表面间隔预定距离，所述成像部能够对已经透过所述手指的光进行成像; 以及基于通过成像获得的图像来执行用户的认证的控制部分。

公开(公告)号：US07112746B2

公开(公告)日：2006-09-26

申请号：US10531666

申请日：2003-10-08

申请人： Nobuhiko Tsukahara ,  Yoichi Toriumi ,  Kenji Shintani ,  Hirofumi Hashimoto

发明人： Nobuhiko Tsukahara ,  Yoichi Toriumi ,  Kenji Shintani ,  Hirofumi Hashimoto

IPC分类号： H01B7/08

CPC分类号： H02G3/305 ,  G02B6/4471 ,  H01B7/08 ,  H01B7/40 ,  H02G3/26

摘要： There is provided a cable for data transmission which can be wired and constructed without damaging a surface of a wall, ceiling, floor or the like, without using any clamps and which does not degrade appearance of a wired space, and further, allows the wiring construction of the cable provided with a plurality of core wires in a state of less crosstalk. A cable (1) for data transmission includes a core wire (2) having a medium that transmits data and a coating member (4) having adhesiveness and coating at least part of the core wire (2). In this way, because of the adhesiveness of the coating member (4), it is easy to stick the cable onto a wall (6) or the like. Moreover, since a wiring construction of the cable on a surface of the wall (6) or the like without using a clamp, screw or nail is made possible, only the cable is exposed on the surface of the wall (6) or the like and the appearance thereof is improved.

公开(公告)号：US4408311A

公开(公告)日：1983-10-04

申请号：US261514

申请日：1981-05-07

申请人： Junichi Suzuki ,  Kenji Shintani

发明人： Junichi Suzuki ,  Kenji Shintani

IPC分类号： G11B7/09 ,  G11B7/08 ,  G11B7/085 ,  G11B7/12 ,  G11B7/00 ,  G11B21/10

CPC分类号： G11B7/08576 ,  G11B7/12

摘要： An optical tracking apparatus for tracing a spiral track on a recording disk includes an optical pickup device having a semiconductor laser and a photoelectric conversion element; an arm device pivotally mounted to an arm shaft with the pickup device being mounted to the free end thereof to thereby move substantially along the radial direction of the recording disk; sectorial arm drive coil attached to a rear end portion of the arm device and having a current path loop in parallel with the rotational plane of the arm device; and a pair of stationary magnetic field forming devices, each formed of a respective yoke and permanent magnet assembly, the yokes having respective air gaps in which magnetic fields in opposite directions to each other are formed, the arm drive coil being arranged to move in the air gaps and being supplied with an arm drive signal and a tracking error correction signal for causing the pickup device to trace the track.

摘要翻译： 用于跟踪记录盘上的螺旋轨道的光学跟踪装置包括具有半导体激光器和光电转换元件的光学拾取装置; 手臂装置枢转地安装到臂轴上，拾取装置安装到其自由端，从而基本沿着记录盘的径向方向移动; 臂部驱动线圈附接到臂装置的后端部并且具有与臂装置的旋转平面平行的电流路径环路; 以及一对固定磁场形成装置，每个由各自的磁轭和永磁体组件形成，所述磁轭具有各自的空气间隙，在所述磁隙中形成彼此相反方向的磁场，所述臂驱动线圈被布置成在 并且被提供有臂驱动信号和用于使拾取装置跟踪轨道的跟踪误差校正信号。

公开(公告)号：US06651678B2

公开(公告)日：2003-11-25

申请号：US10124729

申请日：2002-04-18

申请人： Kenji Shintani ,  Mutumi Tuda ,  Junji Tanimura ,  Takahiro Maruyama ,  Ryoichi Yoshifuku

发明人： Kenji Shintani ,  Mutumi Tuda ,  Junji Tanimura ,  Takahiro Maruyama ,  Ryoichi Yoshifuku

IPC分类号： H01L21302

CPC分类号： H01L21/32137 ,  H01L21/28123

摘要： A method of etching a semiconductor device preventing tapering of a gate electrode edge includes a main etching of an electrode or wiring material supported by a dielectric film at a semiconductor substrate surface to expose the dielectric film. After the main etching step, residues of the electrode or the wiring material by sequentially etching utilizing a first gas mixture including a halogen-containing gas and an additive gas suppressing etching of the dielectric film by the halogen-containing gas, and in a second gas mixture gas including the halogen-containing gas and the additive gas and having the additive gas amount in a larger concentration than the first gas mixture.

摘要翻译： 蚀刻半导体装置防止栅电极边缘变窄的方法包括在半导体衬底表面上由电介质膜支撑的电极或布线材料的主蚀刻以暴露电介质膜。 在主蚀刻步骤之后，通过使用包含含卤素气体的第一气体混合物和通过含卤素气体抑制介电膜蚀刻的附加气体，并且在第二气体中依次蚀刻电极或布线材料的残留物 包含含卤素气体和添加气体的混合气体，其添加气体量比第一气体混合物浓度大。

公开(公告)号：US06246041B1

公开(公告)日：2001-06-12

申请号：US09182845

申请日：1998-10-29

申请人： Akihito Nakayama ,  Kenji Shintani ,  Shunsuke Kohama ,  Yukari Hashimoto

发明人： Akihito Nakayama ,  Kenji Shintani ,  Shunsuke Kohama ,  Yukari Hashimoto

IPC分类号： G02B2740

CPC分类号： G11B7/094 ,  G11B7/0945 ,  G11B2007/0006

摘要： A device for measuring focusing characteristics of an optical pickup and/or an optical disc capable of measuring characteristics of focusing states with high accuracy by a simplified circuit. An arithmetic-logic unit 12d controls an offset supplying circuit 23 for applying an offset voltage to a focusing servo control signal. This arithmetic-logic unit 12d detects an error rate of the playback data in such a state in which the focusing position of the laser light is deviated by a pre-set offset amount. The arithmetic-logic unit 12d sequentially varies the offset voltage to repeat the above processing for detecting the error rate. The arithmetic-logic unit 12d approximates the relationship of the error rate to the offset amount by a quadratic curve based on detected data. The offset amount which minimizes the error rate is found from this equation of approximation.

摘要翻译： 一种用于测量能够通过简化电路以高精度测量聚焦状态的特性的光学拾取器和/或光盘的聚焦特性的装置。 算术逻辑单元12d控制向聚焦伺服控制信号施加偏移电压的偏移供给电路23。 该算术逻辑单元12d在激光的聚焦位置偏移预设偏移量的状态下检测回放数据的错误率。 算术逻辑单元12d顺序地改变偏移电压，以重复上述用于检测错误率的处理。 算术逻辑单元12d基于检测到的数据，通过二次曲线近似误差率与偏移量的关系。 从这个近似方程式可以看出误差率最小化的偏移量。