公开(公告)号：US4342949A

公开(公告)日：1982-08-03

申请号：US93008

申请日：1979-11-09

申请人： Kenneth J. Harte ,  Edward C. Dougherty

发明人： Kenneth J. Harte ,  Edward C. Dougherty

IPC分类号： H01J31/08 ,  G11C11/30 ,  H01J29/46 ,  H01J29/62 ,  H01J29/74 ,  H01J31/58 ,  H01J29/70

CPC分类号： H01J29/46

摘要： An electron beam or other charged particle beam tube of the compound fly's eye type having a coarse deflection system is described. The beam tube comprises an evacuated housing together with an electron gun or other charged particle beam producing means disposed at one end of the evacuated housing for producing a beam of electrons or other charged particles. A coarse deflector, a compound micro lens assembly, and a fine deflector are disposed in the housing in the path of the electron or other charged particle beam for first selecting a lenslet and thereafter finely deflecting an electron or other charged particle beam to a desired spot on a target plane. The electron or other charged particle beam tube is designed in a manner such that the electron or other charged particle beam is caused to diverge at a small angle of divergence in advance of passing through the coarse deflector by appropriately locating the virtual origin or point source of the charged particle a small distance in advance of the coarse deflector.In addition, a dynamic focusing correction potential is supplied to the micro lens assembly along with a high voltage energizing potential with the dynamic focusing correction potential being derived from components of both the coarse deflection potentials and the fine deflection potentials.

摘要翻译： 描述了具有粗略偏转系统的复合蝇眼型电子束或其他带电粒子束管。 射束管包括一个抽真空的壳体，与电子枪或其他带电粒子束产生装置一起设置在抽真空壳体的一端，用于产生电子束或其他带电粒子。 在电子或其他带电粒子束的路径中的壳体中设置有粗偏转器，复合微透镜组件和精细偏转器，用于首先选择小透镜，然后将电子或其它带电粒子束精细地偏转到期望的点 在目标飞机上。 电子或其他带电粒子束管被设计成使得电子或其他带电粒子束在通过粗偏转器之前以小的发散角发散，通过适当地定位虚拟原点或点源 带电粒子在粗偏转器之前提前一小段距离。 此外，将动态聚焦校正电位与高电压激励电位一起提供给微透镜组件，其中动态聚焦校正电位源自粗略偏转电位和精细偏转电位的分量。

公开(公告)号：US06421416B1

公开(公告)日：2002-07-16

申请号：US09502759

申请日：2000-02-11

申请人： Alan P. Sliski ,  Kenneth J. Harte

发明人： Alan P. Sliski ,  Kenneth J. Harte

IPC分类号： A61N510

CPC分类号： A61N5/1001 ,  A61N2005/1022 ,  A61N2005/1095

摘要： A radiation applicator system is structured to be mounted to a radiation source for producing a predefined dose of radiation for treating a localized volume of tissue, such as the tissue surrounding the site of an excised tumor. The applicator system includes an applicator and, in some embodiments, an adapter. The adapter is formed for fixedly securing the applicator to a radiation source, such as the x-ray source of a radiosurgery system which produces a predefined radiation dose profile with respect to a predefined location along its radiation producing probe. The applicator includes a shank and an applicator head, wherein the head is located at a distal end of the applicator shank. A proximate end of the applicator shank couples to the adapter. A distal end of the shank includes the applicator head, which defines a concave treatment surface for engaging and, preferably, supporting the area to be treated with a predefined does of radiation. The applicator can include a low energy radiation filter inside of the applicator head to reduce undesirable low energy radiation emissions. A plurality of applicators having applicator heads of different sizes and shapes can be provided to accommodate treatment sites of various sizes and shapes. And, an adaptable applicator having a plurality of radiation positions can be provided to deliver a substantially cylindrical dose of radiation.

摘要翻译： 辐射施加器系统被构造成安装到辐射源，以产生用于治疗局部体积的组织的预定剂量的辐射，例如围绕切除的肿瘤部位的组织。 施用器系统包括施加器，并且在一些实施例中包括适配器。 适配器被形成用于将施加器固定地固定到辐射源，例如放射外科系统的x射线源，其相对于沿其辐射产生探针的预定位置产生预定的辐射剂量分布。 施用器包括柄和施用器头，其中头位于施用器柄的远端。 施加器柄的近端耦合到适配器。 柄的远端包括施用器头，其限定凹入的处理表面，用于接合并且优选地以预定的辐射功率来支撑待处理的区域。 施用器可以在施用头内部包括低能量辐射过滤器，以减少不期望的低能量辐射发射。 可以提供具有不同尺寸和形状的施用器头的多个施用器以适应各种尺寸和形状的处理部位。 并且，可以提供具有多个辐射位置的适应性施加器以递送基本上圆柱形的辐射剂量。

公开(公告)号：US06301328B1

公开(公告)日：2001-10-09

申请号：US09502273

申请日：2000-02-11

申请人： Alan P. Sliski ,  Kenneth J. Harte

发明人： Alan P. Sliski ,  Kenneth J. Harte

IPC分类号： A61N510

CPC分类号： A61N5/1017 ,  A61N5/1001 ,  A61N2005/1094

摘要： A radiation applicator system is structured to be mounted to a radiation source for producing a beam of radiation for treating a localized volume of tissue, such as growing blood vessels in the eye that can cause macular degeneration. The applicator system includes an applicator and, in some embodiments, an adapter. The adapter is formed for fixedly securing the applicator to a radiation source, such as a radiosurgery system which produces a predefined radiation dose profile with respect to a predefined location along the radiation producing probe. The applicator includes a shank and an applicator head. A proximate end of the applicator shank couples to the adapter. A distal end of the shank includes the applicator head, which is adapted to produce a beam of radiation. The applicator head includes a radiation shield and a beam collimator. The radiation shield selectively blocks the emitted radiation so that the applicator can be held by a surgeon during treatment. The beam collimator extends from an aperture in the shield that forms and directs a beam of radiation at a target area. Applicator systems that form different size and shape beams of radiation can be provided to accommodate a wide range of treatment volumes and for use in different treatments.

摘要翻译： 辐射施加器系统被构造成安装到辐射源，用于产生用于治疗局部体积的组织的放射线束，例如在眼睛中生长的可导致黄斑变性的血管。 施用器系统包括施加器，并且在一些实施例中包括适配器。 适配器被形成用于将施加器固定地固定到辐射源，例如放射外科系统，其相对于沿辐射产生探针的预定位置产生预定的辐射剂量分布。 施用器包括柄和施用头。 施加器柄的近端耦合到适配器。 柄的远端包括施加头，其适于产生辐射束。 施用器头包括辐射屏蔽和射束准直器。 辐射屏蔽选择性地阻挡发射的辐射，使得施用器可以在治疗期间被外科医生保持。 光束准直器从屏蔽中的孔延伸，其形成并引导目标区域的辐射束。 可以提供形成不同尺寸和形状的辐射束的施放器系统以适应宽范围的处理量并用于不同的处理。

公开(公告)号：US5621780A

公开(公告)日：1997-04-15

申请号：US507845

申请日：1995-07-27

申请人： Donald O. Smith ,  Alan P. Sliski ,  Kenneth J. Harte

发明人： Donald O. Smith ,  Alan P. Sliski ,  Kenneth J. Harte

IPC分类号： G21K5/02 ,  A61B1/00 ,  A61N5/10 ,  G01N23/083 ,  G21K5/00 ,  G21K5/04 ,  G21K5/10 ,  H01J35/08 ,  H01J35/30 ,  H01J35/32 ,  H05G1/06 ,  H05G1/10 ,  H05G1/32 ,  H05G1/34

CPC分类号： A61N5/1001 ,  G21K5/04 ,  H01J35/08 ,  H01J35/30 ,  H01J35/32 ,  H05G1/06 ,  H05G1/10 ,  H05G1/32 ,  H05G1/34 ,  A61N2005/1005 ,  H01J2201/342

摘要： The present invention is directed to an x-ray source for irradiating a surface defining a body cavity in accordance with a predetermined dose distribution. The source comprises a housing, an elongated tubular probe, a target assembly, and an inflatable balloon. The housing encloses an electron beam source and includes elements for generating an electron beam along a beam path. The tubular probe extends along a central axis from the housing about the beam path. The target assembly extends along the central axis and is coupled to the end of the probe distal from the housing. The target assembly includes a target element is positioned in the beam path. The target element is adapted to emit x-rays in response to electrons incident thereon from the beam. The probe tip assembly and associated control electronics include elements for positioning the target element in the beam path, and is substantially x-ray transparent. The balloon is affixed to the distal end of the probe and is inflatable so that when that probe end is inserted into a body cavity, the balloon may be inflated to stretch the cavity to a known shape. Positioning the probe tip inside the inflated balloon allows delivery of a uniform, or other desired, dose of radiation to the surface defining a body cavity.

摘要翻译： 本发明涉及一种用于根据预定剂量分布照射限定体腔的表面的X射线源。 源包括壳体，细长管状探针，靶组件和可充气球囊。 壳体包围电子束源并且包括用于沿着光束路径产生电子束的元件。 管状探针沿着中心轴线从壳体围绕光束路径延伸。 目标组件沿着中心轴线延伸并且远离壳体耦合到探针的端部。 目标组件包括目标元件位于光束路径中。 目标元件适于响应于从光束入射到其上的电子而发射X射线。 探针尖端组件和相关联的控制电子器件包括用于将目标元件定位在光束路径中的元件，并且基本上是x射线透明的。 气囊固定在探头的远端，并且是可充气的，使得当该探针端插入体腔时，气囊可被充气以将空腔拉伸到已知形状。 将探针尖端定位在充气球囊内部允许将均匀的或其它所需剂量的辐射传送到限定体腔的表面。

公开(公告)号：US20110147350A1

公开(公告)日：2011-06-23

申请号：US13034352

申请日：2011-02-24

申请人： Ronald P. Millman, JR. ,  Kenneth J. Harte ,  Victoria M. Chaplick ,  David J. Elliott ,  Eugene O. Degenkolb

发明人： Ronald P. Millman, JR. ,  Kenneth J. Harte ,  Victoria M. Chaplick ,  David J. Elliott ,  Eugene O. Degenkolb

IPC分类号： B23K26/38

CPC分类号： B23K37/0426 ,  B23K26/0619 ,  B23K26/0622 ,  B23K26/0676 ,  B23K26/0823 ,  B23K26/103 ,  B23K26/142 ,  B23K26/16 ,  B23K26/361 ,  B23K26/40 ,  B23K37/047 ,  B23K2101/40 ,  B23K2103/50

摘要： A modular wafer edge processing apparatus is disclosed that overcomes the limitations of conventional edge processing methods and systems used in semiconductor manufacturing. The modular apparatus can be integrated into wafer tracks, cluster tools, and other volume manufacturing systems. The edge processing apparatus of this invention includes a laser that can either be contained inside the module, or mounted externally to feed multiple modules and thereby reduce system cost. The apparatus contains a beam delivery subsystem to direct a beam of radiation onto the edges of a rotating substrate supported by a chuck. The optical system accurately and precisely directs the beam to remove or transform organic or inorganic films, film stacks, residues, or particles, in atmosphere, from the top edge, top bevel, apex, bottom bevel, and bottom edge of the substrate in a single process step. Reaction by-products are removed by means of an exhaust tube enveloping the reaction site. This invention permits precise control of an edge exclusion width, resulting in an increase in the number of usable die on a wafer. Wafer edge processing with this invention replaces existing methods that use large volumes of purified water and hazardous chemicals including solvents, acids, alkalis, and proprietary strippers.

摘要翻译： 公开了一种克服了半导体制造中使用的常规边缘处理方法和系统的限制的模块化晶片边缘处理装置。 模块化设备可以集成到晶片轨道，集群工具和其他体积制造系统中。 本发明的边缘处理装置包括可以被包含在模块内部的激光器，或者外部安装用于馈送多个模块，从而降低系统成本。 该装置包含用于将辐射束引导到由卡盘支撑的旋转基板的边缘上的光束传送子系统。 光学系统准确且精确地引导光束，以从空气的顶部边缘，顶部斜面，顶点，底部斜面和底部边缘中去除或转化有机或无机膜，膜堆，残余物或颗粒， 单一工艺步骤 通过包围反应部位的排气管除去反应副产物。 本发明允许对边缘排除宽度的精确控制，导致晶片上可用的管芯数量的增加。 本发明的晶圆边缘处理取代了现有的使用大量净化水和危险化学品（包括溶剂，酸，碱和专有剥离剂）的方法。

公开(公告)号：US20110139759A1

公开(公告)日：2011-06-16

申请号：US13034202

申请日：2011-02-24

申请人： Ronald P. Millman, JR. ,  Kenneth J. Harte ,  Victoria M. Chaplick ,  David J. Elliott

发明人： Ronald P. Millman, JR. ,  Kenneth J. Harte ,  Victoria M. Chaplick ,  David J. Elliott

IPC分类号： B23K26/06

CPC分类号： B23K37/0426 ,  B23K26/0619 ,  B23K26/0622 ,  B23K26/0676 ,  B23K26/0823 ,  B23K26/103 ,  B23K26/142 ,  B23K26/16 ,  B23K26/361 ,  B23K26/40 ,  B23K37/047 ,  B23K2101/40 ,  B23K2103/50

摘要： A method and apparatus for processing substrate edges is disclosed that overcomes the limitations of conventional edge processing methods and systems used in semiconductor manufacturing. The edge processing method and apparatus of this invention includes a laser and fiber-optic system to direct laser radiation onto a rotating substrate supported by a chuck. A laser beam is transmitted into a bundle of optical fibers, and the fibers accurately and precisely direct the beam to remove or transform organic or inorganic films, film stacks, residues, or particles, in atmosphere, from the top edge, top bevel, apex, bottom bevel, and bottom edge of the substrate in a single process step. Reaction by-products are removed by means of an exhaust tube enveloping the reaction site. This invention permits precise control of an edge exclusion width, resulting in an increase in the number of usable die on a wafer. Wafer edge processing with this invention replaces existing methods that use large volumes of purified water and hazardous chemicals including solvents, acids, alkalis, and proprietary strippers.

摘要翻译： 公开了用于处理衬底边缘的方法和装置，其克服了半导体制造中使用的常规边缘处理方法和系统的限制。 本发明的边缘处理方法和装置包括激光和光纤系统，用于将激光辐射引导到由卡盘支撑的旋转基底上。 激光束被传送到一束光纤中，并且光纤精确地和精确地引导光束从大气中去除或转换有机或无机膜，膜堆，残余物或颗粒，从顶部边缘，顶部斜面，顶点 ，底部斜面和底部边缘，在单个工艺步骤中。 通过包围反应部位的排气管除去反应副产物。 本发明允许对边缘排除宽度的精确控制，导致晶片上可用的管芯数量的增加。 本发明的晶圆边缘处理取代了现有的使用大量净化水和危险化学品（包括溶剂，酸，碱和专有剥离剂）的方法。

公开(公告)号：US4728799A

公开(公告)日：1988-03-01

申请号：US4235

申请日：1987-01-05

申请人： James J. Gordon ,  Kenneth J. Harte ,  Vijay K. Singhal

发明人： James J. Gordon ,  Kenneth J. Harte ,  Vijay K. Singhal

IPC分类号： G03F7/207 ,  G03F9/00 ,  H01J37/304

CPC分类号： G03F9/7053 ,  H01J37/304

摘要： An improved method of height measurement and correction for a two-stage deflection ("fly's eye" lens) electron beam accessed lithography system is provided which employs a height measuring transducer such as a capacitance gauge or an optical gauge and a two position fiducial calibration grid (LFG) set at positions LFG1 and LFG2 a known distance apart and wherein the electron beam of the electron beam lithography system is sequentially deflected to the two positions for each lenslet being corrected. Measurement signals derived at each position are processed pursuant to a unique algorithm to derive desired height correction output signals and height corrected deflection signals for control of the fine deflector of the electron beam lithography system.

摘要翻译： 提供了一种用于两级偏转（“飞眼”透镜）电子束存取光刻系统的高度测量和校正的改进方法，其采用高度测量传感器，例如电容量规或光学量规和两个位置基准校准网格 （LFG）设置在距离已知距离的位置LFG1和LFG2处，并且其中电子束光刻系统的电子束被顺序地偏转到正在校正的每个小透镜的两个位置。 在每个位置处导出的测量信号根据唯一的算法进行处理，以导出所需的高度校正输出信号和高度校正的偏转信号，以控制电子束光刻系统的精细偏转器。

公开(公告)号：US4661741A

公开(公告)日：1987-04-28

申请号：US749787

申请日：1985-06-28

申请人： John Valun ,  Kenneth J. Harte

发明人： John Valun ,  Kenneth J. Harte

IPC分类号： H01J37/06 ,  H01J37/065 ,  H01J29/48 ,  H01J19/46

CPC分类号： H01J37/065

摘要： An electron gun includes a preferably non-metallic apertured grid with a flat upstream-facing surface closely spaced from and parallel to a flat emitting surface of a cathode. The grid aperture diverges in a downstream direction and has its peripheral wall contoured to shape the transverse cross-section of an emitted electron beam at a predetermined downstream location, preferably at the beam crossover. The peripheral wall of the grid aperture is devoid of sharp transitions, has a circular cross section to produce a circular beam crossover of minimum diameter, and has a convex segment extending from the upstream end of the aperture and joining a concave segment extending to the downstream end of the aperture. The convex first segment has a smaller radius of curvature than the second concave segment and has its center of curvature disposed substantially at the upstream facing surface. In the preferred embodiment the grid is made of a synthetic sapphire and the cathode is a thermionic cathode made of lanthanum hexaboride.

摘要翻译： 电子枪包括具有与阴极的平坦发射表面紧密间隔并平行的平坦的上游面向表面的优选非金属有孔网格。 栅格孔径在下游方向上分叉，并且其外围壁成形以在预定的下游位置（优选地在光束交叉处）形成发射的电子束的横截面。 网格孔的周壁没有尖锐的转变，具有圆形横截面以产生最小直径的圆形横梁，并且具有从孔的上游端延伸的凸形段，并且连接延伸到下游的凹形段 孔的端部。 凸形第一段具有比第二凹形段更小的曲率半径，并且其曲率中心基本上位于上游面向表面。 在优选实施例中，栅格由合成蓝宝石制成，阴极是由六硼化镧制成的热离子阴极。

公开(公告)号：US4467211A

公开(公告)日：1984-08-21

申请号：US496902

申请日：1983-05-23

申请人： Donald O. Smith ,  Kenneth J. Harte

发明人： Donald O. Smith ,  Kenneth J. Harte

IPC分类号： H01J37/304 ,  H01J37/317 ,  G03F9/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J37/3177

摘要： An electron-beam array lithography (EBAL) system and method of operation is described. The method comprises deriving fiducial marking signals from a lenslet stitching grid of fiducial elements formed on a standard stitching target for calibrating the boundaries of the fields of view of the respective lens elements of an array of lenslets. The fiducial marking signals are used to stitch together the individual fields of view of the lens elements in the array of lenslets in order to cover a desired area of a workpiece surface to be subsequently exposed to the electron beam, for example, the surface of a semiconductor wafer upon which a plurality of integrated circuit chips are to be formed. In order to register the levels of multi-level patterns written on the same chip, each chip is provided with a registration fiducial grid comprised of fiducial marks at the corners and only at the corners of the chips. Computer mapping of the stitching calibration grid and the chip registration grid to a computer ideal mathematical grid standard is provided. This is achieved by measuring the x-y coordinate position of the fiducial marking elements after precisely locating the positions of their centers using an electron beam or light probe. From these measurements, deviations between the actual position of each marking element and its corresponding location on the computer ideal mathematical grid are determined, and such deviations are used to modify the deflection signals of the electron beam column to correct for deviations from the ideal mathematical grid.

摘要翻译： 描述了电子束阵列光刻（EBAL）系统和操作方法。 该方法包括从形成在标准缝合目标上的基准元件的小孔缝合网格导出基准标记信号，以校准透镜阵列的各个透镜元件的视场的边界。 基准标记信号用于将透镜元件的各个视场拼接在小透镜阵列中，以覆盖随后暴露于电子束的工件表面的期望区域，例如， 将要形成多个集成电路芯片的半导体晶片。 为了注册写在同一芯片上的多级模式的级别，每个芯片都设有一个注册基准网格，它由角点上的基准标记组成，仅在芯片的角落处。 提供了拼接校准网格和芯片配准网格计算机映射到计算机理想数学网格标准。 这是通过使用电子束或光探测器精确地定位其中心的位置之后测量基准标记元件的x-y坐标位置来实现的。 从这些测量中，确定每个标记元件的实际位置与其在计算机理想数学网格上的相应位置之间的偏差，并且使用这种偏差来修改电子束列的偏转信号以校正与理想数学网格的偏差 。

公开(公告)号：US08183500B2

公开(公告)日：2012-05-22

申请号：US13034247

申请日：2011-02-24

申请人： Kenneth J. Harte ,  Ronald P. Millman, Jr. ,  Victoria M. Chaplick

发明人： Kenneth J. Harte ,  Ronald P. Millman, Jr. ,  Victoria M. Chaplick

IPC分类号： B23K26/00

CPC分类号： B23K37/0426 ,  B23K26/0619 ,  B23K26/0622 ,  B23K26/0676 ,  B23K26/0823 ,  B23K26/103 ,  B23K26/142 ,  B23K26/16 ,  B23K26/361 ,  B23K26/40 ,  B23K37/047 ,  B23K2101/40 ,  B23K2103/50

摘要： A method and apparatus for processing substrate edges is disclosed that overcomes the limitations of conventional edge processing methods and systems used in semiconductor manufacturing. The edge processing method and apparatus of this invention includes a laser and optical system to direct a beam of radiation onto a rotating substrate supported by a chuck, in atmosphere. The optical system accurately and precisely directs the beam to remove or transform organic or inorganic films, film stacks, residues, or particles from the top edge, top bevel, apex, bottom bevel, and bottom edge of the substrate in a single process step. Reaction by-products are removed by means of an exhaust tube enveloping the reaction site. This invention permits precise control of an edge exclusion width, resulting in an increase in the number of usable die on a wafer. Wafer edge processing with this invention replaces existing methods that use large volumes of purified water and hazardous chemicals including solvents, acids, alkalis, and proprietary strippers.

摘要翻译： 公开了用于处理衬底边缘的方法和装置，其克服了半导体制造中使用的常规边缘处理方法和系统的限制。 本发明的边缘处理方法和装置包括激光和光学系统，用于在大气中将辐射束引导到由卡盘支撑的旋转基板上。 光学系统在单个工艺步骤中精确和精确地引导光束从衬底的顶部边缘，顶部斜面，顶点，底部斜面和底部边缘去除或转换有机或无机膜，膜堆，残余物或颗粒。 通过包围反应部位的排气管除去反应副产物。 本发明允许对边缘排除宽度的精确控制，导致晶片上可用的管芯数量的增加。 本发明的晶圆边缘处理取代了现有的使用大量净化水和危险化学品（包括溶剂，酸，碱和专有剥离剂）的方法。