Photocleavable and acid cleavable linkers for combinatorial chemistry
    8.
    发明授权
    Photocleavable and acid cleavable linkers for combinatorial chemistry 失效
    用于组合化学的可透光和可酸切割接头

    公开(公告)号:US06642417B2

    公开(公告)日:2003-11-04

    申请号:US09766987

    申请日:2001-01-22

    IPC分类号: C07C23304

    摘要: A substrate for solid phase synthesis comprising a solid phase-linker combination of the formula I is disclosed. Also disclosed are processes for preparing the substrate and chemical intermediates useful therein. Among the novel intermediates are compounds of the formula II wherein R1 is —NO2 or —CHO; R2 is —OCH3, —CHO or —H; R3 is chosen from the group consisting of hydroxyl, the residue of a solid support having a plurality of amino groups, and the residue of an ester, and n=1 or 3-12. A substrate of solid phase synthesis of the formula III is also disclosed.

    摘要翻译: 公开了一种用于固相合成的底物,其包含式I的固相 - 连接体组合。 还公开了制备基材和其中有用的化学中间体的方法。 其中新的中间体是式II化合物,其中R 1是-NO 2或-CHO; R 2是-OCH 3,-CHO或-H; R 3选自羟基,具有多个氨基的固体支持物的残基和酯的残基,n = 1或3-12。A的固相合成底物 还公开了式III。

    Photocleavable and acid cleavable linkers for combinatorial chemistry
    9.
    发明授权
    Photocleavable and acid cleavable linkers for combinatorial chemistry 失效
    用于组合化学的可透光和可酸切割接头

    公开(公告)号:US06310244B1

    公开(公告)日:2001-10-30

    申请号:US09121262

    申请日:1998-07-23

    IPC分类号: C07C23304

    摘要: A substrate for solid phase synthesis comprising a solid phase-linker combination of the formula I is disclosed. Also disclosed are processes for preparing the substrate and chemical intermediates useful therein. Among the novel intermediates are compounds of the formula II wherein R1 is —NO2 or —CHO; R2 is —OCH3, —CHO or —H; R3 is chosen from the group consisting of hydroxyl, the residue of a solid support having a plurality of amino groups, and the residue of an ester, and n=1 or 3. A substrate of solid phase synthesis of the formula III is also disclosed.

    摘要翻译: 公开了一种用于固相合成的底物,其包含式I的固相 - 连接体组合。 还公开了制备基材和其中有用的化学中间体的方法。 其中新型中间体为式II化合物,其中R 1为-NO 2或-CHO; R2是-OCH3,-CHO或-H; R3选自羟基,具有多个氨基的固体支持物的残基和酯的残基,n = 1或3.还公开了式III的固相合成底物 。