摘要:
This invention provides water-based compositions, particularly coating, ink, and agricultural compositions, manifesting reduced equilibrium and dynamic surface tension by the incorporation of a surface tension reducing amount of certain alkylformamide compounds of the structure where R is a C5 to C11 alkyl group.
摘要:
This invention provides water-based compositions, particularly coating, ink, adhesive, fountain solution, agricultural and photoresist developer compositions, manifesting reduced equilibrium and dynamic surface tension by the incorporation of a surface tension reducing amount of certain trialkyl urea compounds of the structure where R1 and R2 are C2 to C6 alkyl groups, R3 is methyl or ethyl, and the total number of carbon atoms in R1, R2 and R3 is from 6 to 14.
摘要:
This invention provides water-based photoresist developer/electronics cleaning compositions manifesting reduced equilibrium and dynamic surface tension by the incorporation as surfactant of an effective amount of certain N,N-dialkyl urea compounds of the structure where R and R' are independently C1 to C6 alkyl or cycloalkyl with the sum of the carbon atoms in both R and R' being 6 to 12.
摘要:
This invention provides water-based compositions, particularly coating, ink, and agricultural compositions, manifesting reduced equilibrium and dynamic surface tension by the incorporation of a surface tension reducing amount of certain cyclic urea compounds of the structure where R is a C6 to C12 alkyl group or R″O—(CH2)m—, R′ is hydrogen or methyl, R″ is a C4 to C12 alkyl group, m is 2-4 and n is 1 or 2.
摘要:
This invention provides water-based photoresist developer/electronics cleaning compositions manifesting reduced equilibrium and dynamic surface tension by the incorporation as surfactant of an effective amount of certain cyclic urea compounds of the structure where R is a C6 to C12 alkyl group or R″O—(CH2)m—, R″ is a C4 to C12 alkyl group, m is 2-4 and n is 1 or 2.
摘要:
This invention provides water-based compositions, particularly coating, ink, and agricultural compositions, manifesting reduced equilibrium and dynamic surface tension by the incorporation of a surface tension reducing amount of certain cyclic urea compounds of the structure where R is a C6 to C12 alkyl group or R″O—(CH2)m—, R′ is hydrogen or methyl, R″ is a C4 to C12 alkyl group, m is 2-4 and n is 1 or 2.
摘要:
This invention provides water-based compositions, particularly coating, ink, and agricultural compositions, manifesting reduced equilibrium and dynamic surface tension by the incorporation of an effective amount of certain N,N-dialkyl urea compounds of the structure ##STR1## where R and R' are independently C1 to C6 alkyl or cycloalkyl with the sum of the carbon atoms in both R.sub.1 and R.sub.2 being 6 to 12.
摘要:
This invention provides water-based compositions, particularly coating, ink, and agricultural compositions, manifesting reduced equilibrium and dynamic surface tension by the incorporation of a surface tension reducing amount of certain cyclic urea compounds of the structure ##STR1## where R is a C6 to C12 alkyl group or R"O--(CH.sub.2).sub.m -, R' is hydrogen or methyl, R" is a C4 to C12 alkyl group, m is 2-4 and n is 1 or 2.
摘要:
Novel alkyl aminoalkyl cyclic urea compounds of the structural formula: wherein each of m, n, and o are independently 1 or 2, p is 0 or 1, R1 is C1 to C4 linear or branched alkyl, R2 is C4 to C10 linear or branched alkyl, or, alternately, CHR1R2 forms a C6 to C12 substituted or unsubstituted cycloalkyl. These novel alkylated aminoalkyl cyclic ureas are useful as surfactants for reducing equilibrium and dynamic surface tension in water-based formulations, particularly coating, ink, and agricultural formulations.
摘要:
This invention provides water-based compositions, particularly coating, ink, fountain solution, adhesive, agricultural and photoresist developing/electronics cleaning compositions, manifesting reduced equilibrium and dynamic surface tension by the incorporation of a surface tension reducing amount of certain alkylated aminoalkylpiperazine compounds of the structure ##STR1## where one of R.sup.1 and R.sup.2 is a C5-C14 alkyl or cycloalkyl group and the other is H, or both or R.sup.1 and R.sup.2 are C5 to C8 alkyl groups, and n is 2 or 3.