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    Charged particle beam exposure apparatus and method of cleaning the same
    3.
    发明授权
    Charged particle beam exposure apparatus and method of cleaning the same 失效
    带电粒子束曝光装置及其清洗方法

    公开(公告)号：US5401974A

    公开(公告)日：1995-03-28

    申请号：US191458

    申请日：1994-02-03

    申请人： Yoshihisa Oae ,  Takamasa Satoh ,  Yasushi Takahashi ,  Kiichi Sakamoto ,  Hiroshi Yasuda ,  Soichiro Arai ,  Moritaka Nakamura

    发明人： Yoshihisa Oae ,  Takamasa Satoh ,  Yasushi Takahashi ,  Kiichi Sakamoto ,  Hiroshi Yasuda ,  Soichiro Arai ,  Moritaka Nakamura

    IPC分类号： H01J37/30 ,  H05H1/00

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3002 ,  H01J37/32082 ,  H01J37/32862 ,  H01J2237/022 ,  H01J2237/3175

    摘要： In a charged particle beam exposure apparatus in which a charged particle beam is projected onto a member to be exposed to thereby form a pattern thereon, there are provided a plurality of electrodes disposed around an optical axis of the charged particle beam, a first unit for introducing a gas containing oxygen as a main component into an inside of the charged particle beam exposure apparatus including the plurality of electrodes and for holding the inside of the apparatus at a degree of vacuum between 0.1 Torr and 4 Torr, and a second unit for selectively applying either a high-frequency signal having a frequency between 100 kHz and 800 kHz or a reference signal to each of the plurality of electrodes. A plasma radical state of the gas is generated in the inside of the apparatus so that a deposition present in the apparatus can be eliminated.

    摘要翻译： 在带电粒子束曝光装置中，带电粒子束投射到待暴露的构件上，从而在其上形成图案，设置有围绕带电粒子束的光轴设置的多个电极，第一单元， 将含有氧的气体作为主要成分引入到包括多个电极的带电粒子束曝光设备的内部，并将设备内部保持在0.1托和4托之间的真空度，以及用于选择性地将第二单元 将频率在100kHz和800kHz之间的高频信号或参考信号施加到多个电极中的每一个。 在装置的内部产生气体的等离子体自由基状态，从而可以消除装置中存在的沉积物。

    Electron beam exposure system having the capability of checking the pattern of an electron mask used for shaping an electron beam
    8.
    发明授权
    Electron beam exposure system having the capability of checking the pattern of an electron mask used for shaping an electron beam 失效
    具有检查用于成形电子束的电子掩模的图案的能力的电子束曝光系统

    公开(公告)号：US5180919A

    公开(公告)日：1993-01-19

    申请号：US761454

    申请日：1991-09-18

    申请人： Yoshihisa Oae ,  Kiichi Sakamoto ,  Hiroshi Yasuda

    发明人： Yoshihisa Oae ,  Kiichi Sakamoto ,  Hiroshi Yasuda

    IPC分类号： H01J37/304 ,  H01J37/317

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/0451 ,  H01J2237/30455 ,  H01J2237/31776

    摘要： An electron beam exposure system having a capability of checking a pattern to be written on an object comprises an electron beam source for producing an electron beam along an optical axis toward the object, a block mask provided on the optical axis and having selectable aperture patterns therein for correspondingly shaping the electron beam, an addressing deflector fixture for selectively passing the electron beam through a desired aperture on the block mask, an electron optical system for focusing the electron beam shaped by the block mask on the object such that an image of the aperture of the block mask is projected on the object, a screen provided along the optical axis between the block mask and the object for interrupting the electron beam when the electron beam is offset from the alignment with the optical axis, the screen having a through-hole in alignment with the optical axis for passing the electron beam therethrough a controller for controlling the electron optical system such that an image of the aperture of the beam shaping means through which the electron beam has passed is projected on the screen when checking the pattern of the apertures on the block mask, and a detection unit for detecting the image of the aperture that is projected on the screen.

    摘要翻译： 具有检查要写在物体上的图案的能力的电子束曝光系统包括用于沿着光轴向物体产生电子束的电子束源，设置在光轴上并具有可选孔径图案的块掩模 为了对应地形成电子束，用于选择性地使电子束通过块掩模上的所需孔的寻址偏转器固定装置，用于将由掩模掩模形成的电子束聚焦在物体上的电子光学系统，使得孔径的图像 块屏蔽物投影在物体上，当电子束偏离与光轴对准时，沿着光轴设置在屏蔽掩模和物体之间的屏幕，用于中断电子束，屏幕具有通孔 与用于使电子束通过的光轴对准用于控制电子光学系统的控制器 使得当检查块掩模上的孔的图案时，电子束已经通过的光束整形装置的孔径的图像被投影在屏幕上;以及检测单元，用于检测投影的光圈的图像 屏幕上。

    Block exposure pattern data extracting system and method for charged particle beam exposure
    10.
    发明授权
    Block exposure pattern data extracting system and method for charged particle beam exposure 失效
    块曝光图案数据提取系统和带电粒子束曝光的方法

    公开(公告)号：US5590048A

    公开(公告)日：1996-12-31

    申请号：US71262

    申请日：1993-06-04

    申请人： Tomohiko Abe ,  Hiroshi Yasuda ,  Kiichi Sakamoto ,  Yoshihisa Oae

    发明人： Tomohiko Abe ,  Hiroshi Yasuda ,  Kiichi Sakamoto ,  Yoshihisa Oae

    IPC分类号： H01J37/302 ,  G06F17/50 ,  G06K9/00

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J2237/0458 ,  H01J2237/31776

    摘要： In a block exposure pattern extracting system applied to a charged-particle beam exposure system having a block mask including a plurality of transparent stats having different shapes, a comparator unit compares first vectors connecting one of apexes of an input exposure pattern to other apexes thereof with second vectors connecting a reference point which is one of apexes of a unit block exposure pattern to other apexes of the unit block exposure pattern. A determining unit determines whether or not the first vectors coincide with the second vectors. An extracting unit extracts the input exposure pattern as the unit block exposure pattern when the determining unit determines that the first vectors coincide with the second vectors.

    摘要翻译： 在应用于具有包括具有不同形状的多个透明统计数据的块掩模的带电粒子束曝光系统的块曝光图案提取系统中，比较器单元将连接输入曝光图案的顶点之一与其他顶点的第一矢量与 将单位块曝光图案的顶点之一的参考点连接到单位块曝光图案的其他顶点的第二矢量。 确定单元确定第一矢量是否与第二矢量一致。 当确定单元确定第一向量与第二向量一致时，提取单元提取输入的曝光图案作为单位块曝光图案。